公开(公告)号：US20160056342A1

公开(公告)日：2016-02-25

申请号：US14646915

申请日：2014-12-29

Applicant: BOE TECHNOLOGY GROUP CO., LTD. ,  ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.

Inventor： Haidong Wu ,  Tae Gyu Kim ,  Qun Ma ,  Juanjuan Bai

IPC: H01L33/44 ,  C23C14/04 ,  H01L33/08

CPC classification number: H01L33/44 ,  C23C14/042 ,  H01L27/3211 ,  H01L33/08 ,  H01L51/0011

Abstract: Embodiments of the disclosure provide a mask, a mask group, a manufacturing method of pixels and a pixel structure. The mask includes a shielding region and an opening region which are alternately arranged. A width of the opening region is twice of a width of one sub pixel, and a width of the shielding region between two adjacent opening regions is four times of the width of one sub pixel.

Abstract translation: 本公开的实施例提供了一种掩模，掩模组，像素和像素结构的制造方法。 掩模包括交替布置的屏蔽区域和开口区域。 开口区域的宽度是一个子像素的宽度的两倍，并且两个相邻开口区域之间的屏蔽区域的宽度是一个子像素的宽度的四倍。