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公开(公告)号：US07311592B2
公开(公告)日：2007-12-25
申请号：US11556011
申请日：2006-11-02
申请人： Liang-Yuh Chen , Yuchun Wang , Yan Wang , Alain Duboust , Daniel A. Carl , Ralph Wadensweiler , Manoocher Birang , Paul D. Butterfield , Rashid Mavliev , Stan D. Tsai
发明人： Liang-Yuh Chen , Yuchun Wang , Yan Wang , Alain Duboust , Daniel A. Carl , Ralph Wadensweiler , Manoocher Birang , Paul D. Butterfield , Rashid Mavliev , Stan D. Tsai
CPC分类号： B82Y30/00 , B24B37/046 , B24B37/24 , B24B37/26 , B24D3/34
摘要： An article of manufacture and apparatus are provided for planarizing a substrate surface. In one aspect, an article of manufacture is provided for polishing a substrate including polishing article comprising a body having at least a partially conductive surface adapted to polish the substrate. A plurality of perforations may be formed in the polishing article for flow of material therethrough. An electrode is also exposed to the polishing surface by at least a portion of the plurality of perforations. The article of manufacture may also include a polishing surface having a plurality of grooves, wherein a portion of the plurality of grooves intersect with a portion of the plurality of perforations.
摘要翻译： 提供了一种用于平坦化基板表面的制造和设备。 在一个方面，提供了一种用于抛光衬底的制品，所述衬底包括抛光制品，所述抛光制品包括具有适于抛光所述衬底的至少部分导电表面的主体。 可以在抛光制品中形成多个穿孔，以使材料流过其中。 电极还通过多个穿孔的至少一部分暴露于抛光表面。 制品还可以包括具有多个凹槽的抛光表面，其中多个凹槽的一部分与多个穿孔的一部分相交。
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公开(公告)号：US07066800B2
公开(公告)日：2006-06-27
申请号：US10033732
申请日：2001-12-27
申请人： Liang-Yuh Chen , Yuchun Wang , Yan Wang , Alain Duboust , Daniel A. Carl , Ralph Wadensweiler , Manoocher Birang , Paul D. Butterfield , Rashid Mavliev , Stan D. Tsai
发明人： Liang-Yuh Chen , Yuchun Wang , Yan Wang , Alain Duboust , Daniel A. Carl , Ralph Wadensweiler , Manoocher Birang , Paul D. Butterfield , Rashid Mavliev , Stan D. Tsai
IPC分类号： B24D11/00
CPC分类号： H01L21/32125 , B23H5/08 , B24B37/22 , B24B37/24 , B24B37/26 , B24B53/017 , B24B57/02 , B82Y30/00 , Y10T428/24273 , Y10T428/24355 , Y10T428/24628 , Y10T428/24917
摘要： An article of manufacture and apparatus are provided for planarizing a substrate surface. In one aspect, an article of manufacture is provided for polishing a substrate including polishing article comprising a body having at least a partially conductive surface adapted to polish the substrate and a mounting surface. A plurality of perforations may be formed in the polishing article for flow of material therethrough. In another aspect, a polishing article for polishing a substrate includes a body having a polishing surface and a conductive element disposed therein. The conductive element may have a contact surface that extends beyond a plane defined by the polishing surface. The polishing surface may have one or more pockets formed therein. The conductive element may be disposed in each of the polishing pockets.
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43.发明申请Abrasive conductive polishing article for electrochemical mechanical polishing 审中-公开用于电化学机械抛光的磨料导电抛光制品公开(公告)号：US20060030156A1
公开(公告)日：2006-02-09
申请号：US11194432
申请日：2005-08-01
IPC分类号： H01L21/302 , B24B29/00
CPC分类号： B24B37/245 , B23H5/08 , B24B37/046 , C25F7/00
摘要： Articles of manufacture and processes for planarizing a layer on a substrate are provided. In one aspect, a process is provided for manufacturing a polishing article comprising combining a conductive material component and components of a binder material to form a composite material, at least partially curing the composite material, and introducing abrasive particles of about 0.01 inches or greater in diameter to form an abrasive-containing composite material.
摘要翻译： 提供了用于平坦化衬底上的层的制造和工艺。 在一个方面，提供了一种用于制造抛光制品的方法，包括将导电材料组分和粘合剂材料的组分结合以形成复合材料，至少部分固化复合材料，并将约0.01英寸或更大的磨料颗粒引入 直径以形成含磨料的复合材料。
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公开(公告)号：US06679755B1
公开(公告)日：2004-01-20
申请号：US09718552
申请日：2000-11-22
IPC分类号： B24B5100
CPC分类号： B24B37/345 , B23Q3/186 , B23Q7/1426 , B24B41/06 , H01L21/682
摘要： A processing system and method for processing a workpiece is generally provided. In one embodiment, the system includes a processing module and a substrate transfer shuttle. The processing module includes a polishing surface and at least one polishing head disposed above the polishing surface. The substrate transfer shuttle is movable between at least a first position and a second position where the second position is disposed adjacent the polishing head. At least one nest is disposed therein to receive and align the substrate. The nest also facilitates transfer of the workpiece to the processing head.
摘要翻译： 通常提供用于处理工件的处理系统和方法。 在一个实施例中，系统包括处理模块和基板传送梭。 处理模块包括抛光表面和设置在抛光表面上方的至少一个抛光头。 衬底传送梭可在至少第一位置和第二位置之间移动，其中第二位置邻近抛光头设置。 在其中设置至少一个嵌套以接收和对准衬底。 嵌套还有助于将工件传送到加工头。
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公开(公告)号：US5525766A
公开(公告)日：1996-06-11
申请号：US344382
申请日：1994-11-23
CPC分类号： G10K11/20
摘要： A portable acoustical shell for the performing arts and the like, and which includes a plurality of generally quadrilateral, and preferably trapezoidal, sound reflecting panels arranged together as an assembly along adjacent long side edge margins in substantially abutting juxtaposed relation to form a forwardly open, arch-like configuration. The arch-like panel assembly is supported and held in place by a modular frame assembly formed from a plurality of pyramidal frame modules, each of which is associated with a respective one of the plurality of sound reflecting panels. The modular frame assembly further includes a number of cross members which connect the apexes of adjacent pyramidal frame modules to one another. In an alternate embodiment of the invention, the cross members are length-adjustable and thereby permit the arch-like curvature of the acoustical shell to be flattened or steepened as desired.
摘要翻译： 一种用于表演艺术等的便携式声学外壳，其包括多个大致四边形，优选梯形的声音反射面板，该反射面板沿着相邻的长边缘边缘以大致相邻并置的关系布置在一起作为组件，以形成向前打开的， 拱形配置。 拱形面板组件通过由多个锥形框架模块形成的模块化框架组件支撑并保持就位，每个框架模块与多个声音反射面板中的相应一个相关联。 模块化框架组件还包括将相邻锥形框架模块的顶点彼此连接的多个横向构件。 在本发明的替代实施例中，横向构件是长度可调节的，从而允许声学壳体的拱形曲率根据需要变平或陡化。
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