公开(公告)号：US20060139616A1

公开(公告)日：2006-06-29

申请号：US11157201

申请日：2005-06-21

申请人： Hernes Jacobs ,  Harmen Van Der Schoot ,  Petrus Vosters ,  Bernardus Luttikhuis

发明人： Hernes Jacobs ,  Harmen Van Der Schoot ,  Petrus Vosters ,  Bernardus Luttikhuis

IPC分类号： G03B27/32 ,  G03B27/62

CPC分类号： G03F7/7075 ,  G03F7/70691 ,  G03F7/70733 ,  G03F7/70791

摘要： A substrate handler for moving a substrate relative to a substrate table of a lithographic apparatus. The substrate handler comprises at least one support surface or platform adapted to carry a plurality of independent substrates simultaneously. The substrate handler adapted to load substrates onto and unload substrates from the substrate table before and after exposure.

公开(公告)号：US20060011855A1

公开(公告)日：2006-01-19

申请号：US11231791

申请日：2005-09-22

申请人： Martinus Arnoldus Terken ,  Hernes Jacobs ,  Harmen Klaas Schoot ,  Petrus Matthijs Vosters ,  Koen Jacobus Zaal

发明人： Martinus Arnoldus Terken ,  Hernes Jacobs ,  Harmen Klaas Schoot ,  Petrus Matthijs Vosters ,  Koen Jacobus Zaal

IPC分类号： G21K5/10

CPC分类号： G03F7/70716

摘要： A movable carriage for moving an article support member in a lithographic apparatus is provided. The article support member is constructed and arranged to move and support an article to be placed in a beam path of the lithographic apparatus. The carriage includes a compartmented composite structure.

摘要翻译： 提供了用于在光刻设备中移动物品支撑构件的可动托架。 物品支撑构件被构造和布置成移动和支撑待放置在光刻设备的光束路径中的物品。 托架包括隔层复合结构。

公开(公告)号：US20050200208A1

公开(公告)日：2005-09-15

申请号：US10796291

申请日：2004-03-10

申请人： Sven Johan Hol ,  Henrikus Marie Cox ,  Hernes Jacobs ,  Patricia Vreugdewater ,  Koen Marie Zaal

发明人： Sven Johan Hol ,  Henrikus Marie Cox ,  Hernes Jacobs ,  Patricia Vreugdewater ,  Koen Marie Zaal

IPC分类号： G03F7/20 ,  H01L21/027 ,  H02K41/035 ,  H02K41/00 ,  G03B27/58 ,  H02K13/00

CPC分类号： G03F7/70758 ,  G03F7/70941

摘要： A lithographic apparatus comprising a highly effective Lorentz actuator, is presented. The Lorentz actuator comprises a main magnet system and a subsidiary magnet system arranged in Halbach configuration, an electrically conductive element for producing a force via the interaction of an electric current carried by the electrically conductive element and a resulting field of the first and second magnetic field generated by the main and subsidiary magnet system, respectively. The actuator further comprises a magnetic element extending substantially between outer sides of the first and second magnet system subassemblies. The magnetic element guides a portion of the second, subsidiary field between the first and second magnet system subassemblies.

摘要翻译： 提出了包括高效洛伦兹致动器的光刻设备。 洛伦兹致动器包括以Halbach构造布置的主磁体系统和辅助磁体系统，用于通过由导电元件承载的电流和第一和第二磁场的所得场的相互作用产生力的导电元件 分别由主磁铁系统产生。 致动器还包括基本上在第一和第二磁体系统子组件的外侧之间延伸的磁性元件。 磁性元件引导第一和第二磁体系统子组件之间的第二辅助磁场的一部分。

公开(公告)号：US08416383B2

公开(公告)日：2013-04-09

申请号：US11987009

申请日：2007-11-26

申请人： Hernes Jacobs ,  Eva Mondt ,  Alexander Nikolov Zdravkov

发明人： Hernes Jacobs ,  Eva Mondt ,  Alexander Nikolov Zdravkov

IPC分类号： G03B27/52 ,  G03B27/58 ,  G03B27/32 ,  G03B27/42 ,  G03B27/60

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： A lithographic apparatus is disclosed that includes a seal provided in a substrate table, the seal being actuatable from an open configuration to a closed configuration, the closed configuration being such that when a substrate is located on the substrate table, the seal closes a gap between the substrate and the substrate table.

摘要翻译： 公开了一种光刻设备，其包括设置在基板台中的密封件，所述密封件可从打开构造致动至封闭构造，所述封闭构造使得当基板位于所述基板台上时，所述密封件封闭 基板和基板台。

公开(公告)号：US20110090474A1

公开(公告)日：2011-04-21

申请号：US12980406

申请日：2010-12-29

申请人： Hans JANSEN ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Bob Streefkerk ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen

发明人： Hans JANSEN ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Bob Streefkerk ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

公开(公告)号：US07633073B2

公开(公告)日：2009-12-15

申请号：US11285774

申请日：2005-11-23

申请人： Hans Jansen ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen ,  Bob Streefkerk

发明人： Hans Jansen ,  Sebastiaan Maria Johannes Cornelissen ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Hernes Jacobs ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Jan-Gerard Cornelis Van Der Toorn ,  Peter Smits ,  Franciscus Johannes Joseph Janssen ,  Michel Riepen ,  Bob Streefkerk

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.

摘要翻译： 在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积和/或覆盖间隙来降低或防止浸没液中的气泡形成。

公开(公告)号：US07034924B2

公开(公告)日：2006-04-25

申请号：US10754634

申请日：2004-01-12

申请人： Harmen Klass Van Der Schoot ,  Hernes Jacobs ,  Martinus Arnoldus Henricus Terken

发明人： Harmen Klass Van Der Schoot ,  Hernes Jacobs ,  Martinus Arnoldus Henricus Terken

IPC分类号： G03B27/60

CPC分类号： G03F7/70841 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70991

摘要： A lithographic apparatus includes at least one object support structure in a high vacuum chamber. The object support structure includes a carrier device in which a number of dividing walls are provided forming a number of compartments in the carrier device. At least one of the compartments is shielded from the high vacuum chamber and is provided with separate gas evacuating structures.

摘要翻译： 光刻设备包括在高真空室中的至少一个物体支撑结构。 物体支撑结构包括载体装置，其中多个分隔壁被设置成在载体装置中形成多个隔间。 隔室中的至少一个与高真空室隔离，并设有单独的排气结构。

公开(公告)号：US20060082753A1

公开(公告)日：2006-04-20

申请号：US10967306

申请日：2004-10-19

申请人： Henrikus Cox ,  Sven Hol ,  Hernes Jacobs

发明人： Henrikus Cox ,  Sven Hol ,  Hernes Jacobs

IPC分类号： G03B27/58

CPC分类号： G03F7/70758

摘要： An actuator assembly includes a coil moveably positionable in a magnetic field generated by a magnet assembly, each of the coil and the magnet having substantially only one side facing the other. A magnetized field-shaping element is provided for shaping the magnetic field such that the magnetic field is substantially perpendicular to the direction of the electrical current for generating a force in a first degree of freedom. Thus, the coil may easily be mounted, since it does not need to be enclosed by magnet poles.

摘要翻译： 致动器组件包括能够由磁体组件产生的磁场中的可移动地定位的线圈，线圈和磁体中的每一个基本上只有一个面朝向另一侧。 提供磁化场成形元件用于使磁场成形，使得磁场基本上垂直于用于产生第一自由度的电流的方向。 因此，线圈可以容易地安装，因为它不需要被磁极包围。

公开(公告)号：US20050151945A1

公开(公告)日：2005-07-14

申请号：US10754634

申请日：2004-01-12

申请人： Harmen Van Der Schoot ,  Hernes Jacobs ,  Martinus Terken

发明人： Harmen Van Der Schoot ,  Hernes Jacobs ,  Martinus Terken

IPC分类号： G03F7/20 ,  G03B27/42

CPC分类号： G03F7/70841 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70991

摘要： A lithographic apparatus includes at least one object support structure in a high vacuum chamber. The object support structure includes a carrier device in which a number of dividing walls are provided forming a number of compartments in the carrier device. At least one of the compartments is shielded from the high vacuum chamber and is provided with separate gas evacuating structures.

摘要翻译： 光刻设备包括在高真空室中的至少一个物体支撑结构。 物体支撑结构包括载体装置，其中多个分隔壁被设置成在载体装置中形成多个隔间。 隔室中的至少一个与高真空室隔离，并设有单独的排气结构。

公开(公告)号：US08675172B2

公开(公告)日：2014-03-18

申请号：US12709278

申请日：2010-02-19

申请人： Hernes Jacobs ,  Erik Roelof Loopstra ,  Michel Riepen ,  Eva Mondt

发明人： Hernes Jacobs ,  Erik Roelof Loopstra ,  Michel Riepen ,  Eva Mondt

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/58

CPC分类号： G03F7/70341

摘要： A method of removing liquid from a substrate supported on a substrate table and from a gap between the substrate and the substrate table includes: providing a liquid removal device with at least one outlet connected to an under pressure source, the outlet forming an elongated extractor of a predetermined geometry; relatively moving the substrate table and the liquid removal device such that the extractor is adapted to pass over all of the substrate and gap and such that substantially at any given time any local part of the extractor at the edge of a non-dried portion of the gap has, in a plane, its local tangent orientated at an angle of between about 35° and 90° to the local tangent of the gap.

摘要翻译： 从支撑在基板台上的基板和从基板和基板台之间的间隙去除液体的方法包括：提供液体去除装置，其具有连接到下压源的至少一个出口，所述出口形成细长的提取器 预定的几何形状; 相对移动衬底台和液体去除装置，使得提取器适于通过所有衬底和间隙，并且使得基本上在任何给定时间，提取器的任何局部部分在非干燥部分的边缘处 间隙在平面中具有与间隙的局部切线成35°至90°之间的角度的局部切线。