Imaging array and methods for fabricating same
    41.
    发明授权
    Imaging array and methods for fabricating same 有权
    成像阵列及其制造方法

    公开(公告)号:US07115876B2

    公开(公告)日:2006-10-03

    申请号:US10613061

    申请日:2003-07-02

    IPC分类号: G01T1/20

    CPC分类号: G01T1/1644

    摘要: A radiation detector includes a first array including a first photon incident surface, a second array including a second photon incident surface, and a scintillator array extending from the first photon incident surface to the second photon incident surface. The second detector offsets from the first detector by approximately one-half detector pitch normal to an incident x-ray direction.

    摘要翻译: 辐射检测器包括包括第一光子入射表面的第一阵列,包括第二光子入射表面的第二阵列和从第一光子入射表面延伸到第二光子入射表面的闪烁体阵列。 第二检测器与入射的X射线方向垂直约1/2检测器间距从第一检测器偏移。

    Imaging array and methods for fabricating same
    42.
    发明授权
    Imaging array and methods for fabricating same 有权
    成像阵列及其制造方法

    公开(公告)号:US07105826B2

    公开(公告)日:2006-09-12

    申请号:US10308233

    申请日:2002-12-02

    IPC分类号: G01T1/20

    CPC分类号: G01T1/1644

    摘要: A radiation detector includes a first array including a first photon incident surface, a second array including a second photon incident surface, and a scintillator array extending from the first photon incident surface to the second photon incident surface.

    摘要翻译: 辐射检测器包括包括第一光子入射表面的第一阵列,包括第二光子入射表面的第二阵列和从第一光子入射表面延伸到第二光子入射表面的闪烁体阵列。