Lithographic apparatus and device manufacturing method
    41.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号:US08767171B2

    公开(公告)日:2014-07-01

    申请号:US12727456

    申请日:2010-03-19

    IPC分类号: G03B27/42

    CPC分类号: G03F7/70866 G03F7/70341

    摘要: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

    摘要翻译: 公开了一种用于浸没式光刻投影装置的液体供应系统,其中在投影系统,阻挡构件和基板之间限定空间。 阻挡构件不被密封,使得在使用期间,允许浸没液体流出空间以及阻挡构件和基底之间。

    Lithographic apparatus and device manufacturing method
    43.
    发明授权
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号:US07710541B2

    公开(公告)日:2010-05-04

    申请号:US11882292

    申请日:2007-07-31

    IPC分类号: G03B27/42 G03B27/52

    CPC分类号: G03F7/70341 G03F7/7085

    摘要: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

    摘要翻译: 公开了一种用于浸没式光刻投影装置的液体供应系统,其中在投影系统,阻挡构件和基板之间限定空间。 阻挡构件不被密封,使得在使用期间,允许浸没液体流出空间以及阻挡构件和基底之间。

    LENS SYSTEM
    44.
    发明申请
    LENS SYSTEM 审中-公开
    镜头系统

    公开(公告)号:US20090116125A1

    公开(公告)日:2009-05-07

    申请号:US12302049

    申请日:2007-05-25

    IPC分类号: G02B9/00 G02B17/00 G01J5/08

    摘要: The present invention concerns a lens system. More specifically, it concerns a lens system comprising a first lens (3), a deflection element (5) and a second lens (6), wherein the deflection element (5) is arranged between the first lens (3) and the second lens (6). The deflection element comprises at least a first annular zone and a second annular zone, the annular zones being arranged in a concentric fashion and wherein the deflection angle of each annular zone is different from the deflection angle of every other annular zone. Furthermore, the present invention concerns a temperature analysis system comprising a lens system and the use of a temperature analysis system.

    摘要翻译: 本发明涉及一种透镜系统。 更具体地,涉及一种包括第一透镜(3),偏转元件(5)和第二透镜(6)的透镜系统,其中偏转元件(5)布置在第一透镜(3)和第二透镜 (6)。 偏转元件至少包括第一环形区域和第二环形区域,环形区域以同心方式布置,并且其中每个环形区域的偏转角度与每隔一个环形区域的偏转角度不同。 此外,本发明涉及包括透镜系统和使用温度分析系统的温度分析系统。

    Lithographic apparatus and device manufacturing method
    47.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    光刻设备和器件制造方法

    公开(公告)号:US07394521B2

    公开(公告)日:2008-07-01

    申请号:US10743271

    申请日:2003-12-23

    IPC分类号: G03B27/42 G03B27/52

    CPC分类号: G03F7/70341 G03F7/7085

    摘要: A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to flow out the space and between the barrier member and the substrate.

    摘要翻译: 公开了一种用于浸没式光刻投影装置的液体供应系统,其中在投影系统,阻挡构件和基板之间限定空间。 阻挡构件不被密封,使得在使用期间,允许浸没液体流出空间以及阻挡构件和基底之间。

    Imprint lithography
    48.
    发明申请

    公开(公告)号:US20060230959A1

    公开(公告)日:2006-10-19

    申请号:US11108904

    申请日:2005-04-19

    IPC分类号: B41G7/00

    摘要: An imprint template configured to imprint an imprintable medium by an imprint lithography process is disclosed, the imprint template having a pattern with a pattern density corresponding to a volume of imprintable medium used to substantially fill pattern features per unit area of a contact face of the imprint template, wherein adjacent regions of the pattern on the imprint template contact face, each of which will provide different functionality once imprinted onto a substrate, have substantially the same pattern density, have differences in pattern density which are minimized, or differences in pattern density which are maintained below a maximum.

    Wardrobe Management System
    49.
    发明申请
    Wardrobe Management System 审中-公开
    衣柜管理系统

    公开(公告)号:US20070225859A1

    公开(公告)日:2007-09-27

    申请号:US11568812

    申请日:2005-05-09

    IPC分类号: G06F7/00

    CPC分类号: G06Q10/087

    摘要: The invention relates to an intelligent wardrobe management system for advising appropriate clothing to a user. It comprises a wardrobe controller which is arranged to: receive input data, said input data comprising information about the clothing in a wardrobe; receive user data; process said input data and said user data; and output, on the basis thereof, a clothing proposal to the user. The system facilitates and accelerates the user's access to the wardrobe.

    摘要翻译: 本发明涉及一种智能衣柜管理系统,用于向用户提供适当的服装。 它包括衣柜控制器,其被布置为:接收输入数据,所述输入数据包括关于衣柜中的衣服的信息; 接收用户数据; 处理所述输入数据和所述用户数据; 并基于此向用户输出服装提案。 该系统有助于和加速用户对衣柜的访问。