公开(公告)号：US20200006134A1

公开(公告)日：2020-01-02

申请号：US16022956

申请日：2018-06-29

Applicant: Texas Instruments Incorporated

Inventor： Nazila Dadvand ,  Christopher Daniel Manack ,  Salvatore Frank Pavone

IPC: H01L21/768 ,  H01L23/00 ,  H01L23/532

Abstract: Described examples provide microelectronic devices and fabrication methods, including fabricating a contact structure by forming a titanium or titanium tungsten barrier layer on a conductive feature, forming a tin seed layer on the barrier layer, forming a copper structure on the seed layer above the conductive feature of the wafer or die, heating the seed layer and the copper structure to form a bronze material between the barrier layer and the copper structure, removing the seed layer using an etching process that selectively removes an exposed portion of the seed layer, and removing an exposed portion of the barrier layer.