公开(公告)号：US08921812B2

公开(公告)日：2014-12-30

申请号：US13446436

申请日：2012-04-13

申请人： Motoko Suzuki ,  Yukiharu Okubo

发明人： Motoko Suzuki ,  Yukiharu Okubo

IPC分类号： H01L21/027 ,  G03F7/20 ,  G03F1/66 ,  G03F9/00 ,  H01L21/673

CPC分类号： H01L21/027 ,  G03F1/66 ,  G03F7/70741 ,  G03F9/7084 ,  H01L21/67353 ,  H01L21/67359

摘要： A position measurement device measures the position of a position measurement mark formed on the lower surface of a reticle, thereby measuring the position of the reticle. A position measurement device measures the position of the position measurement mark formed on the lower surface of a lower lid, thereby measuring the position of the lower lid. The relative displacement of the reticle and lower lid is known when the position of the reticle and the position of the lower lid are known. Therefore, when the lower lid having the reticle loaded thereon is carried with a carrying device and set in an exposure device, the stop position of the lower lid is determined by taking this displacement into account. As a result, the reticle can be correctly set in the exposure device.

摘要翻译： 位置测量装置测量形成在掩模版的下表面上的位置测量标记的位置，从而测量掩模版的位置。 位置测量装置测量形成在下盖的下表面上的位置测量标记的位置，从而测量下盖的位置。 当掩模版的位置和下盖的位置是已知的时，标线片和下盖的相对位移是已知的。 因此，当将装载有掩模版的下盖带有承载装置并设置在曝光装置中时，通过考虑该位移来确定下盖的停止位置。 结果，可以将掩模版正确地设置在曝光装置中。

公开(公告)号：US20140360915A1

公开(公告)日：2014-12-11

申请号：US14468240

申请日：2014-08-25

申请人： TEXCHEM ADVANCED PRODUCTS INCORPORATED SDN. BHD.

发明人： James D. PYLANT ,  Alan L. WABER

IPC分类号： H01L21/673

CPC分类号： H01L21/67353 ,  H01L21/67373 ,  H01L21/67379 ,  H01L21/67386

摘要： Improvements in a semiconductor wafer container including improvements in side protection to the wafers, improved cover design to minimize rotation, a simplified top cover orientation mechanism and an improved bottom holding mechanism for automation. The side protection to the wafers is with multiple staggered inner and outer walls. The improved cover design improves alignment of the top and bottom housings and minimizes rotation of the housings in transit or motion. The housings have a recessed tab ramp feature with bi-directional locking that also increases the rigidity of the containment device when the two housings are assembled. The latching mechanism is located in a protective latch well that minimizes accidental opening of the latch(s). The improved bottom holding mechanism for automation is an integrated feature that is molded into the bottom housing and not assembled in a secondary operation.

摘要翻译： 半导体晶片容器的改进，包括对晶片的侧面保护的改进，改进的盖设计以使旋转最小化，简化的顶盖定向机构和用于自动化的改进的底部保持机构。 对晶片的侧面保护是具有多个交错的内壁和外壁。 改进的盖设计改善了顶部和底部壳体的对准，并最大限度地减少了运输或运动中壳体的旋转。 这些外壳具有带双向锁定的凹陷突出部斜面特征，当两个壳体组装时，这也增加了容纳装置的刚度。 闩锁机构位于保护闩锁孔中，以最小化闩锁的意外打开。 用于自动化的改进的底部保持机构是模制到底部壳体中并且未组装在二次操作中的集成特征。

公开(公告)号：US08613359B2

公开(公告)日：2013-12-24

申请号：US13562087

申请日：2012-07-30

申请人： Steven Kolbow ,  Kevin McMullen ,  Anthony M. Tieben ,  Matthew Kusz ,  Christian Andersen ,  Huaping Wang ,  Michael Cisewski ,  Michael L. Johnson ,  David L. Halbmaier ,  John Lystad

发明人： Steven Kolbow ,  Kevin McMullen ,  Anthony M. Tieben ,  Matthew Kusz ,  Christian Andersen ,  Huaping Wang ,  Michael Cisewski ,  Michael L. Johnson ,  David L. Halbmaier ,  John Lystad

IPC分类号： B65D85/48

CPC分类号： B65D85/48 ,  G03F1/66 ,  H01L21/67353 ,  H01L21/67359 ,  H01L21/67383 ,  H01L21/67386

摘要： A dual containment pod having an outer pod and an inner pod that provides support structure and environmental control means. The inner pod includes a base having a flat, polished surface with protrusions upon which the reticle seats and providing a gap between the reticle and the polished surface. The gap separates the reticle from the flat, polished surface of the base and is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. The top cover of the inner pod seats on the polished surface proximate a periphery of the base. Moveable reticle engaging pins on the top cover of the inner pod are engaged by the top cover of the outer container when the inner pod is assembled inside the outer pod providing reticle restraint.

摘要翻译： 一个双重安全壳，具有一个外舱和一个提供支撑结构和环境控制装置的内舱。 内部容器包括具有平坦的抛光表面的基部，该表面具有突出部，所述掩模版位于所述底部上并且在所述掩模版和抛光表面之间提供间隙。 该间隙将掩模版与基底的平坦抛光表面分开，并且其尺寸被设计成抑制颗粒迁移到间隙中，从而防止晶片或掩模版的敏感表面的污染。 内部容器的顶盖位于靠近基座周边的抛光表面上。 内部容器的顶盖上的可移动的标线接合销与外部容器的顶盖接合，当内部容器组装在外部容器内部时，提供掩模版限制。

公开(公告)号：US08490796B2

公开(公告)日：2013-07-23

申请号：US13304166

申请日：2011-11-23

申请人： Morihiro Saito

发明人： Morihiro Saito

IPC分类号： B65D85/00 ,  A45C5/14

CPC分类号： H01L21/67363 ,  H01L21/67353

摘要： A probe card container having a main case consisting of upper and lower case portions for storing therein a prove card, a handle provided on one side surface of the main case, one or more members for preventing the movement of the main case provided on a mounting surface of the main case, and one or more rollers for assisting the movement of the main case provided on the mounting surface or a corner formed between the mounting surface and the other side surface of the main case so as to project obliquely downward from the corner.

摘要翻译： 一种探针卡容器，具有由上下壳体部分组成的主壳体，用于在其中存储证明卡，设置在主壳体的一个侧表面上的手柄，用于防止设置在安装件上的主壳体的移动的一个或多个构件 主壳体的表面，以及用于辅助设置在安装表面上的主壳体的运动的一个或多个辊或形成在主壳体的安装表面和另一侧表面之间的角部，以从角部向斜下方突出 。

公开(公告)号：US20130160279A1

公开(公告)日：2013-06-27

申请号：US13537604

申请日：2012-06-29

申请人： Marcel SIEME ,  Michael Kellerer ,  Jens Eckstein

发明人： Marcel SIEME ,  Michael Kellerer ,  Jens Eckstein

IPC分类号： B05C13/00 ,  F26B25/00 ,  C03B35/00

CPC分类号： H01L21/67353 ,  H01L21/67376 ,  H01L21/67386 ,  Y10T29/49998

摘要： A process cap for protecting a top side of a flat substrate includes a cap and a seal. The seal is circumferentially arranged on a circumferential rim of the cap such that the cap effects a liquid-tight and vapor-tight closure between cap and flat substrate when the cap is fitted on a top side of the flat substrate. The process cap touches the flat substrate only in a circumferential rim area of the same, when it is fitted on the flat substrate and defines a fluid-tight space without any openings between process cap and flat substrate.

摘要翻译： 用于保护平坦基板的顶侧的工艺帽包括盖和密封件。 密封件周向地布置在盖的圆周边缘上，使得当盖安装在平坦基板的顶侧时，盖在盖和平坦基板之间实现液密和气密的封闭。 只有当平板基板安装在平坦的基板上并且限定了流体密封的空间而没有在处理盖和平的基板之间没有任何开口的情况下，处理盖仅在其平坦的基板上触及平面基板。

公开(公告)号：US20130020220A1

公开(公告)日：2013-01-24

申请号：US13562087

申请日：2012-07-30

申请人： Steven P. Kolbow ,  Kevin McMullen ,  Anthony Mathius Tieben ,  Matthew Kusz ,  Christian Andersen ,  Huaping Wang ,  Michael Cisewski ,  Michael L. Johnson ,  David L. Halbmaier ,  John Lystad

发明人： Steven P. Kolbow ,  Kevin McMullen ,  Anthony Mathius Tieben ,  Matthew Kusz ,  Christian Andersen ,  Huaping Wang ,  Michael Cisewski ,  Michael L. Johnson ,  David L. Halbmaier ,  John Lystad

IPC分类号： B65D85/48

CPC分类号： B65D85/48 ,  G03F1/66 ,  H01L21/67353 ,  H01L21/67359 ,  H01L21/67383 ,  H01L21/67386

摘要： A dual containment pod having an outer pod and an inner pod that provides support structure and environmental control means. The inner pod includes a base having a flat, polished surface with protrusions upon which the reticle seats and providing a gap between the reticle and the polished surface. The gap separates the reticle from the flat, polished surface of the base and is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. The top cover of the inner pod seats on the polished surface proximate a periphery of the base. Moveable reticle engaging pins on the top cover of the inner pod are engaged by the top cover of the outer container when the inner pod is assembled inside the outer pod providing reticle restraint.

摘要翻译： 一个双重安全壳，具有一个外舱和一个内舱，提供支撑结构和环境控制装置。 内部容器包括具有平坦的抛光表面的基部，该表面具有突出部，所述掩模版位于所述底部上并且在所述掩模版和抛光表面之间提供间隙。 该间隙将掩模版与基底的平坦抛光表面分开，并且其尺寸被设计成抑制颗粒迁移到间隙中，从而防止晶片或掩模版的敏感表面的污染。 内部容器的顶盖位于靠近基座周边的抛光表面上。 内部容器的顶盖上的可移动的标线接合销与外部容器的顶盖接合，当内部容器组装在外部容器内部时，提供掩模版限制。

公开(公告)号：US08357599B2

公开(公告)日：2013-01-22

申请号：US13025098

申请日：2011-02-10

申请人： Callie A. Schieffer ,  Ismail T. Emesh

发明人： Callie A. Schieffer ,  Ismail T. Emesh

IPC分类号： H01L21/20

CPC分类号： H01L24/33 ,  H01L21/321 ,  H01L21/67353 ,  H01L21/67393 ,  H01L21/76831 ,  H01L21/76856 ,  H01L21/76864 ,  H01L21/76873 ,  H01L23/53238 ,  H01L2924/1461 ,  H01L2924/00

摘要： A method of processing a microfeature workpiece generally includes depositing a first conducting layer, at least partially reducing oxides on the first conducting layer to provide a reduced first conducting layer, and exposing the reduced first conducting layer to a substantially oxygen-free environment to provide a passivated first conducting layer. A microfeature workpiece generally includes a first conducting layer, a monolayer directly on the first conducting layer, and a second conducting layer.

摘要翻译： 处理微特征工件的方法通常包括沉积第一导电层，至少部分地还原第一导电层上的氧化物以提供减小的第一导电层，以及将还原的第一导电层暴露于基本上无氧的环境中，以提供 钝化的第一导电层。 微特征工件通常包括第一导电层，直接在第一导电层上的单层和第二导电层。

公开(公告)号：US20120060971A1

公开(公告)日：2012-03-15

申请号：US13287534

申请日：2011-11-02

申请人： Vinay K. Shah ,  Eric Englhardt ,  Jeffrey C. Hudgens ,  Martin R. Elliott

发明人： Vinay K. Shah ,  Eric Englhardt ,  Jeffrey C. Hudgens ,  Martin R. Elliott

IPC分类号： B65B31/00 ,  B65D51/04

CPC分类号： H01L21/67393 ,  H01L21/67017 ,  H01L21/67353 ,  Y10S414/135 ,  Y10S414/137 ,  Y10T137/0318 ,  Y10T137/0396

摘要： In a first aspect, a loadport is provided. The loadport has a plate adapted to couple to a door of a substrate carrier to open the substrate carrier wherein the plate includes a first opening adapted to couple to a first port in the door of the substrate carrier on a first side of the plate and to couple to a gas source on a second side of the plate, and wherein the loadport is adapted to allow a flow of gas into the substrate carrier via the first opening in the plate. Methods of purging substrate carriers are provided, as are numerous other aspects.

摘要翻译： 在第一方面，提供一种加载端口。 装载端口具有适于联接到基板载体的门以打开衬底载体的板，其中板包括适于联接到板的第一侧上的衬底载体的门中的第一端口的第一开口，并且 耦合到所述板的第二侧上的气体源，并且其中所述负载端口适于允许气体经由所述板中的所述第一开口流入所述衬底载体。 提供清洗衬底载体的方法，以及许多其它方面。

公开(公告)号：US08123038B1

公开(公告)日：2012-02-28

申请号：US11539602

申请日：2006-10-06

申请人： William E. Wallace

发明人： William E. Wallace

IPC分类号： B65D81/02 ,  B65D85/30

CPC分类号： B65D81/107 ,  B65D85/30 ,  H01L21/67353 ,  H01L21/67369 ,  H01L21/67386

摘要： A packaging system for holding an object is provided. An outer container comprising a top, a bottom, and a plurality of sides is provided. An inner container comprising a top, a bottom, and a plurality of sides is provided. A top floater is attached to the top of the outer container. The top of the inner container is attached to the top floater. A bottom floater is attached to the bottom of the outer container. The bottom of the inner container is attached to the bottom floater. An internal support is attached to the inner container.

摘要翻译： 提供了一种用于保持物体的包装系统。 提供了包括顶部，底部和多个侧面的外部容器。 提供包括顶部，底部和多个侧面的内部容器。 顶部浮子连接到外部容器的顶部。 内部容器的顶部连接到顶部浮子。 底部浮子附着在外部容器的底部。 内部容器的底部附着在底部浮子上。 内部支架附着在内部容器上。

公开(公告)号：US07830497B2

公开(公告)日：2010-11-09

申请号：US11785548

申请日：2007-04-18

申请人： Santiago del Puerto ,  Erik R. Loopstra ,  Andrew Massar ,  Duane P. Kish ,  Abdullah Alikhan ,  Woodrow J. Olsen ,  Jonathan H. Feroce

发明人： Santiago del Puerto ,  Erik R. Loopstra ,  Andrew Massar ,  Duane P. Kish ,  Abdullah Alikhan ,  Woodrow J. Olsen ,  Jonathan H. Feroce

IPC分类号： G03B27/32 ,  G03B27/52 ,  G03B27/62

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/62 ,  G03F1/64 ,  G03F1/66 ,  G03F7/70741 ,  G03F7/70983 ,  G03F9/7011 ,  H01L21/67353 ,  H01L21/67359 ,  Y10S414/135

摘要： Systems and methods to protect a mask from being contaminated by airborne particles are described. The systems and methods include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.

摘要翻译： 描述了保护面罩免受空气传播颗粒污染的系统和方法。 这些系统和方法包括提供固定在两部分覆盖物中的掩模版。 两部分盖子包括一个可拆卸的保护装置，用于保护光罩免受污染。 盖可以保持在可以用于将盖通过光刻系统从大气部分输送到真空部分的盒或盒中。 在真空部分中，可移动的盖可以在曝光过程中移动，在曝光过程期间可以在晶片上形成掩模版上的图案。