摘要:
There is disclosed a process for producing an acrylamide polymer which comprises polymerizing acrylamide monomer alone or a monomer mixture composed of 50 mole % or more of acrylamide monomer and a monomer capable of copolymerizing with acrylamide monomer in the presence of an azo series polymerization initiator and 0.1% by weight or more of 2-mercaptobenzothiazole or a salt thereof based on the weight of the monomer in an aqueous medium having a pH of 6 or higher at a temperature range of 5 to 100.degree. C., and then drying the resulting material.
摘要:
A film-forming resin which is a copolymer comprising specific monomers and a hair dressing composition containing the film-forming resin are disclosed. This film-forming resin is highly compatible in LPG and thus useful in the replacement of conventionally employed Freon gas by LPG. The hair dressing composition shows excellent effects including a good set-retention.
摘要:
The invention relates to a novel absorbent composition and manner of using the same. The absorbent has at least the following two components:(a) a swellable hydrophobic polymer being capable of absorbing a quantity of water which is at least about 10 times the dry weight of said polymer; and(b) an amount of an ionizable surfactant sufficient to form at least a monolayer of said surfactant about said polymer.The novel absorbent is substantially tolerant to an aqueous solution having a soluble salt, such as sodium chloride.
摘要:
Radiation-sensitive film composed of at least one monomolecular layer of fluorine-containing amphiphiles. If a vinyl monomer containing fluoroalkyl side groups is copolymerized with a vinyl monomer containing oxirane groups, an amphiphilic polymer is obtained. To prepare a sandwich, a polymer is dissolved in a volatile organic solvent which is immiscible with water, the solution is spread on the water/air boundary surface, the resultant layer is compressed after the solvent has evaporated and transferred to a solid layer support by the Langmuir-Blodgett technique. The oxirane rings are cleaved and the film crosslinked by the action of high-energy radiation on the film.
摘要:
Organic groups covalently bound to a polymer backbone provide second or third order nonlinear susceptibilities to the polymer. In another aspect, a method is disclosed for providing the novel polymers of the invention. Polymers of the invention can be directionally oriented to provide useful optically nonlinear media for use in nonlinear optical devices such as optical switches or light modulation devices.
摘要:
The present invention relates to polymers capable of oxidative crosslinking, characterized in that they contain 10 to 80% by weight of structural units corresponding to formula (I) and/or (Ia) ##STR1## wherein R.sub.1 is an aliphatic saturated hydrocarbon radical containing 2 to 6 carbon atoms, provided that at least 2 carbon atoms are arranged between the nitrogen atom and the oxygen atom, andR.sub.2 at least 30% of the substituents R are monoolefinically or polyolefinically unsaturated hydrocarbon radicals and the remainder, i.e. up to 70% of the substituents R.sub.2, are saturated aliphatic and/or aromatic hydrocarbon radicals which may optionally contain oxygen and/or nitrogen as hetero atoms in the form of ether, ester, keto, urethane, urea and/or amide groups, provided that substituent R.sub.2 contains at least 2.0% by weight, based on the weight of the polymer, of aliphatically unsaturated double bonds, expressed as C.dbd.C (molecular weight=24).The present invention also relates to a process for the production of these polymers and to the use of these polymers as binders or binder component for coating or sealing compositions.
摘要:
A shading and light-responsive plate or film is composed of a transparent polymer containing a novel phthalic acid derivative metal salt and further a near infrared ray shading plate or film is composed of a transparent polymer containing the aforesaid phthalic acid derivative copper salt or lead salt and a near infrared absorbing coloring material formed from a thioamide derivative or thiourea derivative.
摘要:
A thermosetting resin composition comprising a maleimide having at least one N-substituted maleimide group in the molecule thereof and a silicon compound having conjugated double bonds is easily workable and yields cured products having improved heat resistance.
摘要:
The invention relates to a thermally crosslinkable hydrophilic copolymer have the general structure:. . . --(A).sub.m --. . . --(B).sub.n --. . . --(C).sub.o --. . . --(D).sub.p --. . .in whichA is at least one polymerizable monomer having an acidic side group,B is at least one polymerizable monomer having a basic side group,C is at least one polymerizable monomer having a non-polar, non-hydrophilic side group, andD is N-butoxymethylmethacrylamide,m, n, o and p are the monomer contents of monomers A, B, C and D, respectively, in mol %, with m+n +o+p=100 mol %, with the proviso that the sum of m+n=about 5 to 90 mol %, m and n are each .gtoreq.2 mol % and p is .gtoreq.1 mol %,wherein the copolymer is a linear copolymer having a random structure of the monomers. The copolymer is useful as a hydrophilizing agent for lithographic and offset printing plates.
摘要翻译:本发明涉及一种热交联亲水共聚物,其具有以下一般结构: 。 。 -(上午-。 。 。 - (B)n-。 。 。 - (C)o-。 。 。 - (D)p-。 。 。 其中A是具有酸性侧基的至少一种可聚合单体,B是至少一种具有碱性侧基的可聚合单体,C是至少一种具有非极性,非亲水侧基的可聚合单体,D是 N-丁氧基甲基甲基丙烯酰胺,m,n,o和p分别是单体A,B,C和D的单体含量,分别为mol%,m + n + o + p = 100mol%,条件是总和 m + n =约5〜90摩尔%,m和n分别为≥2摩尔%,p为≥1摩尔%,其中共聚物为具有单体无规结构的线性共聚物。 该共聚物可用作平版印刷版和胶版印刷版的亲水剂。
摘要:
A high energy radiation-sensitive, pattern-forming resist composition comprising a polymer of the formula (I): ##STR1## in which R.sub.1 represents an alkyl groups, cyano group, --CH.sub.2 OH or --CH.sub.2 CO.sub.2 R wherein R represents an alkyl group, R.sub.2 represents a hydrocarbon group containing at least one silicon atom, R.sub.3 represents a group capable of causing crosslinking of the polymer upon application of heat, and m and n each is an integer. The resist composition is particularly useful as a top layer resist of the bi-level resist system, and the exposed top layer resist can be stably developed because of a remarkably increased difference of the solubility in the developer of the exposed and unexposed areas thereof.