摘要:
A static-random-access memory cell comprising floating node capacitors is disclosed. In one embodiment, the storage nodes acts as the first plates for the floating node capacitors, and a conductive member acts as the second plates for the floating node capacitors. The conductive member also electrically connects the second plates together, but is not electrically connected to other parts of the memory cell. In another embodiment, a conductive member acts as the second plates of a plurality of memory cells. The conductive member also electrically connects the second plates together, but is not electrically connected to other parts of the memory cells. Processes for forming the memory cells is also disclosed.
摘要:
A silicon-on insulator film (38) is formed by solid phase epitaxial re-growth. A layer of amorphous silicon (36) is formed such that it is only in direct contact with an underlying portion of a silicon substrate (12). The layer of amorphous silicon (36) is subsequently annealed to form a monocrystalline layer of epitaxial silicon (38). Because the amorphous silicon layer (36) is in contact with only the silicon substrate (12), during the re-growth process, the resulting epitaxial layer (38) is formed with a reduced number of crystal defects. The resulting epitaxial silicon layer (38) may then be used to form semiconductor devices.
摘要:
The disclosure includes a vertical field-effect transistor (115) with a laterally recessed channel region (92), a vertical field-effect transistor (116) having a graded diffusion junction (31), a static random access memory cell (110) having a vertical n-channel field-effect transistor (116) and a vertical p-channel field-effect transistor (115) and methods of forming them. In one embodiment, a six-transistor static random access memory cell (110) has two pass transistors (111 and 114), which are planar n-channel field-effect transistors, two latch transistors (113 and 116), which are vertical n-channel field-effect transistors with drain regions having graded diffusion junctions (31), and two load transistors (112 and 115), which are vertical p-channel thin-film field-effect transistors having laterally recessed channel regions (92).
摘要:
A dynamic memory obtains reduced leakage currents through the access transistors by preventing the low-going column conductors from reaching zero volts for at least a majority of the duration of the active portion of a memory cycle. The low-going conductors are allowed to reach zero volts during the refresh operation. One advantage is a possible increase in the data storage time between required refresh operations. An increase in the refresh interval is especially useful for memory operations wherein a multiplicity of columns are selected for a given row selection. The present technique also addresses the tendency toward increased sub-threshold leakage as field effect transistor thresholds decrease.
摘要:
A delay gate circuit consists of first and second stages which each have two serially connected MOS transistors and of a fifth MOS transistor. The gates of the transistors of the first stage serve as first and second circuit input terminals. The gate of the second transistor of the first stage is connected to the gate of the first transistor of the second stage. An output terminal of the first stage is connected to the gate of the second transistor of the second stage and to the drain of the fifth MOS transistor. An output terminal of the second stage is connected to the gate of the fifth transistor and serves as the output circuit terminal.
摘要:
Voltage generator circuitry uses a first capacitor (Q1) that is selectively isolated from an output terminal (26) by a first transistor (Q4). The gate of Q4 is coupled to a circuit terminal (16) which is capacitively coupled via second capacitor (Q5) to the output terminal (20) of a delay gate (28). The first capacitor (Q1) is charged to a potential level near or at that of a power supply (VDD) and then a positive going waveform applied to Q1 causes it to be charged to a potential level above VDD. Terminal 16 is charged by the positive going waveform to a value at or near VDD and then it is increased in potential after the delay time of the delay gate (28). This enables (biases on) Q4 and allows the output terminal (26) to assume a potential level greater than that of VDD.
摘要:
A semiconductor device is provided that includes a fin having a first gate and a second gate formed on a first sidewall of the fin in a first trench, wherein the first gate is formed above the second gate. The device includes a third gate and a fourth gate formed on a second sidewall of the fin in a second trench, wherein the third gate is formed above the fourth gate. Methods of manufacturing and operating the device are also included. A method of operation may include biasing the first gate and the fourth gate to create a current path across the fin.
摘要:
Described embodiments are directed to line drivers, such as those for providing reduced gate induced drain leakage in a memory array. Corresponding methods of operation of line drivers are also disclosed.
摘要:
Memory devices configured to reduce coupling noise between adjacent wordlines in a memory array. More specifically, wordline drivers are interleaved such that adjacent wordlines are driven by wordline drivers enabled by different row decoders. Each wordline driver includes a weak transistor to ground and a strong transistor to ground. By disabling the wordline driver on the wordlines directly adjacent to the active wordlines, a path is provided to drive the coupling noise from the active wordline to ground through the strong transistor.
摘要:
A voltage level translator boosts the gate voltage of a transistor, and increases the gate to source voltage, to allow operation over a wider range of supply voltages. The P/N ratio of transistors in the voltage level translator is therefore increased, and control of the flipping of nodes is dependent on gate voltages as opposed to P/N ratios.