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公开(公告)号：US20050083519A1
公开(公告)日：2005-04-21
申请号：US10971109
申请日：2004-10-25
申请人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
发明人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
IPC分类号： G01B11/30 , G01N21/956 , G02B21/06 , G06T1/00 , G11B7/00
CPC分类号： G01N21/956
摘要： A defect inspection apparatus for inspecting a fine circuit pattern with high resolution to detect a defective portion is constructed to have an objective lens for detecting an image of a sample, a laser illumination unit for illuminating the sample through the objective lens, a unit for reducing the coherence of the laser illumination, an accumulation type detector, and a unit for processing the detected image signal.
摘要翻译： 用于检测高分辨率的精细电路图案以检测缺陷部分的缺陷检查装置被构造成具有用于检测样本的图像的物镜，用于通过物镜照射样品的激光照明单元，用于减少 激光照明的相干性，累积型检测器和用于处理检测到的图像信号的单元。
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公开(公告)号：US06850320B2
公开(公告)日：2005-02-01
申请号：US09906678
申请日：2001-07-18
申请人： Yukihiro Shibata , Shunji Maeda , Yukio Kembo
发明人： Yukihiro Shibata , Shunji Maeda , Yukio Kembo
IPC分类号： G01B11/30 , G01N21/95 , G01N21/956 , G01N23/205 , H01L21/66 , G01N21/00 , G06K9/00
CPC分类号： G01N21/956 , G01N21/9501
摘要： The present invention provides a highly sensitive inspection technology that prevents false detections. The present invention includes means for detecting an image of an entire chip. Using this image, inspection regions are defined based on criticality. Detection sensitivities can be set for each of these inspection sensitivities. Alternatively, false detections can be eliminated in post-inspection processing by recording characteristic values used to evaluate defects, e.g., concentration differences, in the inspection results. Furthermore, by providing a system that allows sharing of inspection conditions and the like needed by multiple inspection devices, the time required for determining inspection conditions can be shortened and stability and reliability can be monitored.
摘要翻译： 本发明提供了一种防止错误检测的高灵敏度检测技术。 本发明包括用于检测整个芯片的图像的装置。 使用该图像，基于关键性定义检查区域。 可以对这些检测灵敏度设置检测灵敏度。 或者，通过在检查结果中记录用于评估缺陷的特征值，例如浓度差异，可以在检查后处理中消除错误检测。 此外，通过提供允许多个检查装置所需的检查条件等的共享的系统，可以缩短确定检查条件所需的时间，并且可以监视稳定性和可靠性。
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公开(公告)号：US07916929B2
公开(公告)日：2011-03-29
申请号：US12359452
申请日：2009-01-26
申请人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
发明人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T7/0004 , G06T2207/30148
摘要： A method of inspecting patterns, including: adjusting a brightness of at least one of a first bright field image and a second bright field image detected from a specimen and directed to similar patterns on differing parts of the specimen, so as to more closely match a brightness; comparing the images which are adjusted in brightness to match with each other to detect dissimilarities indicative of a defect of the pattern, wherein in adjusting the brightness, the brightness between the first bright field image and the second bright field image is adjusted by performing a gradation conversion of at least one of the brightness between the first bright field image and the second bright field image; and wherein in the comparing, said defect of the pattern is detected by using information of a scattered diagram of brightness of the first bright field image and the second bright field image.
摘要翻译： 一种检查图案的方法，包括：调整从样本检测到的第一明视野图像和第二亮视场图像中的至少一个的亮度，并且针对样本的不同部分上的相似图案，以便更紧密地匹配 亮度; 将亮度调整后的图像进行比较以相互匹配，以检测表示图案缺陷的不相似性，其中在调整亮度时，通过执行渐变来调整第一亮场图像和第二亮视场图像之间的亮度 第一亮场图像和第二亮场图像之间的亮度中的至少一个的转换; 并且其中在所述比较中，通过使用所述第一亮场图像和所述第二亮视场图像的亮度的散射图的信息来检测所述图案的所述缺陷。
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公开(公告)号：US20090214102A1
公开(公告)日：2009-08-27
申请号：US12359452
申请日：2009-01-26
申请人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
发明人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T7/0004 , G06T2207/30148
摘要： A method of inspecting patterns, including: adjusting a brightness of at least one of a first bright field image and a second bright field image detected from a specimen and directed to similar patterns on differing parts of the specimen, so as to more closely match a brightness; comparing the images which are adjusted in brightness to match with each other to detect dissimilarities indicative of a defect of the pattern, wherein in adjusting the brightness, the brightness between the first bright field image and the second bright field image is adjusted by performing a gradation conversion of at least one of the brightness between the first bright field image and the second bright field image; and wherein in the comparing, said defect of the pattern is detected by using information of a scattered diagram of brightness of the first bright field image and the second bright field image.
摘要翻译： 一种检查图案的方法，包括：调整从样本检测到的第一明视野图像和第二亮视场图像中的至少一个的亮度，并指示到样本的不同部分上的相似图案，以便更紧密地匹配 亮度; 将亮度调整后的图像进行比较以相互匹配，以检测表示图案缺陷的不相似性，其中在调整亮度时，通过执行渐变来调整第一亮场图像和第二亮视场图像之间的亮度 第一亮场图像和第二亮场图像之间的亮度中的至少一个的转换; 并且其中在所述比较中，通过使用所述第一亮场图像和所述第二亮视场图像的亮度的散射图的信息来检测所述图案的所述缺陷。
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公开(公告)号：US20090059216A1
公开(公告)日：2009-03-05
申请号：US12136799
申请日：2008-06-11
IPC分类号： G01N21/88
CPC分类号： G01N21/956 , G01N2021/8822
摘要： A defect inspection apparatus comprises: a stage which scans a sample in a horizontal plane; an illumination optical system which illuminates light at an oblique angle with respect to a normal of a sample surface, and illuminates light in a linear form on the sample at an angle inclined to a direction perpendicular to the scanning direction of the stage; a front scattered light detection optical system which is disposed in the same orientation as the scanning direction, positioned at an elevation angle where a specular reflection light from a pattern parallel to the scanning direction is not spatially detected, and detects scattered light from a region illuminated in the linear form; an image sensor detecting an image formed by the front scattered light detection optical system; and an image processing unit performing a comparison operation of the image detected by the image sensor, thereby determining a defect candidate.
摘要翻译： 缺陷检查装置包括：在水平面扫描样品的台阶; 照射光学系统，其以相对于样品表面的法线倾斜的角度照射光，并以垂直于所述载物台的扫描方向的方向以样品的线性方式照射样品上的光; 以与扫描方向相同的方向设置的前散射光检测光学系统，位于与扫描方向平行的图案的镜面反射光未被空间检测的仰角处，并且检测来自被照射的区域的散射光 呈线形; 检测由前散射光检测光学系统形成的图像的图像传感器; 以及图像处理单元，执行由图像传感器检测到的图像的比较操作，从而确定缺陷候选。
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公开(公告)号：US07092095B2
公开(公告)日：2006-08-15
申请号：US10761493
申请日：2004-01-20
申请人： Yukihiro Shibata , Shunji Maeda , Kazuo Yamaguchi , Minoru Yoshida , Atsushi Yoshida , Kenji Oka , Kenji Watanabe
发明人： Yukihiro Shibata , Shunji Maeda , Kazuo Yamaguchi , Minoru Yoshida , Atsushi Yoshida , Kenji Oka , Kenji Watanabe
IPC分类号： G01J4/00
CPC分类号： G01N21/21 , G01N21/9501 , G01N21/956 , G01N21/95607 , G02B21/0016
摘要： A defect inspecting apparatus can detect finer defects with high resolution optical images of those defects. The apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. A display displays the optical image detected by this lighting and detecting apparatus. An optical parameter setting device sets and displays optical parameters for the lighting and detecting apparatus on the display. An optical parameter adjusting apparatus adjusts optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus. A storage device stores comparative image data. A defect detecting device detects defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.
摘要翻译： 缺陷检查装置可以利用这些缺陷的高分辨率光学图像检测更细的缺陷。 该装置包括用于安装样品的样品安装装置; 照明和检测装置，用于照亮安装在安装件上的图案样品，并检测由其获得的反射光的光学图像。 显示器显示由该照明和检测装置检测的光学图像。 光学参数设定装置在显示器上设置并显示照明和检测装置的光学参数。 光学参数调整装置根据由光学参数设定装置设定的光学参数来调整对照明和检测装置设定的光学参数。 存储装置存储比较图像数据。 缺陷检测装置通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。
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公开(公告)号：US20060012780A1
公开(公告)日：2006-01-19
申请号：US11180536
申请日：2005-07-14
IPC分类号： G01N21/88
CPC分类号： G01N21/95 , G01N2021/9513
摘要： A method of inspecting pattern defects can detect target defects in various processes stably by reducing erroneous detection of grains and morphology and decreasing the influence of an intensity nonuniformity in interference light. For this purpose, lights emitted from two sources of illumination capable of outputting a plurality of wavelengths are reflected by a beam splitter and irradiated onto a wafer. Diffracted light from the wafer is converged by an objective lens, is made to pass through light modulation units and imaged on an image sensor in a light detection unit. Then, defects are detected in a signal processing unit. Further, the optical modulation unit is made to have a structure that uses a plurality of optical components selectively and which can be optimized according to target defects.
摘要翻译： 检查图案缺陷的方法可以通过减少误差检测晶粒和形态并减少干涉光中的强度不均匀性的影响来稳定地检测各种工艺中的目标缺陷。 为此，从能够输出多个波长的两个照明源发射的光被分束器反射并照射到晶片上。 来自晶片的衍射光被物镜会聚，使其通过光调制单元并且成像在光检测单元中的图像传感器上。 然后，在信号处理单元中检测到缺陷。 此外，光调制单元具有选择性地使用多个光学部件并且可以根据目标缺陷进行优化的结构。
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公开(公告)号：US06947587B1
公开(公告)日：2005-09-20
申请号：US09294137
申请日：1999-04-20
申请人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
发明人： Shunji Maeda , Kenji Oka , Yukihiro Shibata , Minoru Yoshida , Chie Shishido , Yuji Takagi , Atsushi Yoshida , Kazuo Yamaguchi
IPC分类号： G01N21/95 , G01N21/956 , G06K9/00 , G06T7/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/95607 , G06T7/0004 , G06T2207/30148
摘要： A method of inspecting defects of a plurality of patterns that are formed on a substrate to have naturally the same shape. According to this method, in order to detect very small defects of the patterns with high sensitivity without being affected by irregular brightness due to the thickness difference between the patterns formed on a semiconductor wafer, a first pattern being inspected is detected to produce a first image of the first pattern, the first image is stored, a second pattern being inspected is detected to produce a second image of said second pattern, the stored first image and the second image are matched in brightness, and the brightness-matched first and second images are compared with each other so that the patterns can be inspected.
摘要翻译： 检查在基板上形成的具有自然相同形状的多个图案的缺陷的方法。 根据该方法，为了以高灵敏度检测图案的非常小的缺陷，不受由于在半导体晶片上形成的图案之间的厚度差而引起的不规则亮度的影响，检测出被检查的第一图案以产生第一图像 第一图案被存储，检测出被检查的第二图案以产生所述第二图案的第二图像，所存储的第一图像和第二图像的亮度相匹配，并且亮度匹配的第一和第二图像 彼此进行比较，从而可以检查图案。
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公开(公告)号：US06819416B2
公开(公告)日：2004-11-16
申请号：US10295909
申请日：2002-11-18
申请人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
发明人： Shunji Maeda , Atsushi Yoshida , Yukihiro Shibata , Minoru Yoshida , Sachio Uto , Hiroaki Shishido , Toshihiko Nakata
IPC分类号： G01N2100
CPC分类号： G01N21/956
摘要： A method of inspecting a pattern formed on a substrate, comprising the steps of emitting an ultraviolet laser beam from a light source, polarizing the ultraviolet laser beam, scanning the polarized ultraviolet laser beam on a pupil of an objective lens, illuminating a sample with the polarized ultraviolet laser beam after the polarized ultraviolet light beam has passed through the objective lens, analyzing light reflected from the sample as a result of the illuminating step after the reflected light has passed through the objective lens, detecting an image of the sample formed by the analyzed light with a time delay integration sensor, outputting signals corresponding to the detected image of the sample from the time delay integration sensor in parallel, and processing the parallel signals outputted from the time delay integration sensor to detect a defect of a pattern on the sample.
摘要翻译： 一种检查形成在基板上的图案的方法，包括以下步骤：从光源发射紫外激光束，使紫外激光束偏振，扫描物镜的光瞳上的偏振紫外激光束，照射样品 在偏光紫外光束通过物镜之后，偏振紫外激光束作为反射光通过物镜后的照明步骤的结果分析从样品反射的光，检测由所述物镜形成的样品的图像 用时间延迟积分传感器对光进行分析，并行地从时间延迟积分传感器输出与检测出的样本图像相对应的信号，对从时间延迟积分传感器输出的并行信号进行处理，检测样本上的图案缺陷 。
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公开(公告)号：US06762831B2
公开(公告)日：2004-07-13
申请号：US10279790
申请日：2002-10-25
申请人： Yukihiro Shibata , Shunji Maeda
发明人： Yukihiro Shibata , Shunji Maeda
IPC分类号： G01N2100
CPC分类号： G01N21/33 , G01N21/21 , G01N21/9501 , G01N21/95607
摘要： Laser lights having a plurality of wavelengths from DUV to VUV range are used to inspect defects of a pattern at high speeds and in a high sensitivity using high light-output lasers, while solving a temporal/spatial coherence problem caused by using lasers as light source. This reduces the laser light temporal/spatial coherence. Further, to correct chromatic aberration caused by illumination with VUV and DUD lights, the lights of the VUV and DUV wavelengths are arranged in a coaxial illumination relation. The chromatic aberration left uncorrected is detected such that a detection optical path is branched into two optical path systems corresponding to respective wavelengths and an image sensor is placed on an image plane of each wavelength.
摘要翻译： 使用从DUV到VUV范围的多个波长的激光可用于利用高光输出激光器在高速和高灵敏度下检测图案的缺陷，同时解决使用激光作为光源引起的时间/空间相干性问题 。 这降低了激光的时间/空间相干性。 此外，为了校正由VUV和DUD光照明引起的色差，VUV和DUV波长的光以同轴照明关系布置。 检测未校正的色差，使得检测光路分支成对应于各个波长的两个光路系统，并且将图像传感器放置在每个波长的图像平面上。
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