公开(公告)号：US20060137721A1

公开(公告)日：2006-06-29

申请号：US11361926

申请日：2006-02-24

申请人： Osamu Kuroda

发明人： Osamu Kuroda

IPC分类号： B08B3/00

CPC分类号： H01L21/67173 ,  H01L21/6704 ,  H01L21/67253 ,  H01L21/67276 ,  H01L21/68707

摘要： A liquid processing apparatus comprises a liquid processing section for applying a liquid processing to wafers W, a carrier delivery section for delivering the carrier housing the wafers W, a carrier stock section capable of storing a plurality of carriers, an interface section for transferring the wafers W between the carrier stock section and the liquid processing section, a carrier transfer device for transferring the carrier, a wafer inspecting device for inspecting the wafers W within the carrier, and a carrier transfer device control section for controlling the carrier transfer device. The carrier transfer device control section controls the carrier transfer device such that the carrier, which has been judged to be capable of a liquid processing on the basis of the result of the inspection of the wafers W, is stored in the carrier stock section, and the liquid processing is started after completion of the inspection of a predetermined number of carriers.

公开(公告)号：US06678081B2

公开(公告)日：2004-01-13

申请号：US10253482

申请日：2002-09-25

申请人： Sumihiro Nishihata ,  Osamu Kuroda

发明人： Sumihiro Nishihata ,  Osamu Kuroda

IPC分类号： G02B2608

CPC分类号： G02B26/126

摘要： A light scanning system causes a light spot to scan a surface at a constant speed. The light scanning system includes a light source radiating a light bundle, a deflector which deflects the light bundle, a line image imaging optical system which images the light bundle on a deflecting surface of the deflector as a line image, and a scanning/imaging optical system which images the deflected light bundle on the surface as a light spot. The scanning/imaging optical system consists of a first aspheric mirror which is symmetric with respect to an axis of rotation and is disposed on the light inlet side and a second aspheric mirror which is anamorphic and is disposed on the light outlet side. The first aspheric mirror has a negative power in the light deflecting direction and the second aspheric mirror has a positive power in the light deflecting direction.

摘要翻译： 光扫描系统使得光斑以恒定速度扫描表面。 光扫描系统包括发射光束的光源，使光束偏转的偏转器，将偏转器的偏转表面上的光束成像为线图像的线像成像光学系统，以及扫描/成像光学 系统，其将偏转的光束在表面上成像为光点。 扫描/成像光学系统包括相对于旋转轴线对称并设置在光入口侧的第一非球面镜和变形的第二非球面镜，并设置在光出射侧。 第一非球面反射镜在光偏转方向上具有负的功率，而第二非球面反射镜在光偏转方向上具有正的功率。

公开(公告)号：US06171403B2

公开(公告)日：2001-01-09

申请号：US09552569

申请日：2000-04-19

申请人： Yuji Kamikawa ,  Osamu Kuroda ,  Kenji Soejima ,  Tsuyoshi Nomura

发明人： Yuji Kamikawa ,  Osamu Kuroda ,  Kenji Soejima ,  Tsuyoshi Nomura

IPC分类号： B08B304

CPC分类号： H01L21/67028 ,  H01L21/67781 ,  Y10S134/902

摘要： A drying unit is disposed above a cleaning tank containing a cleaning liquid for cleaning semiconductor wafers W. A wafer boat holding semiconductor wafers moves between the cleaning tank and the drying unit. The drying unit has a fixed base surrounding an opening formed in the cleaning tank, a liftable top cover placed on the fixed base, and an O ring interposed between the fixed base and the liftable top cover. The liftable top cover can be moved vertically by a first lifting means.

摘要翻译： 干燥单元设置在包含用于清洁半导体晶片W的清洁液体的清洗槽的上方。保持半导体晶片的晶片舟皿在清洁槽和干燥单元之间移动。 干燥单元具有围绕形成在清洗槽中的开口的固定基座，设置在固定基座上的可升降顶盖以及置于固定基座和可升降顶盖之间的O形环。 可升降顶盖可以通过第一提升装置垂直移动。

公开(公告)号：US6009890A

公开(公告)日：2000-01-04

申请号：US7753

申请日：1998-01-15

申请人： Satoshi Kaneko ,  Yuji Kamikawa ,  Akira Koguchi ,  Osamu Kuroda ,  Shigenori Kitahara ,  Tatsuya Nishida

发明人： Satoshi Kaneko ,  Yuji Kamikawa ,  Akira Koguchi ,  Osamu Kuroda ,  Shigenori Kitahara ,  Tatsuya Nishida

IPC分类号： H01L21/00 ,  H01L21/677 ,  B08B3/04

CPC分类号： H01L21/67769 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67757 ,  H01L21/67775 ,  H01L21/67778 ,  Y10S134/902

摘要： A substrate transporting and processing system generally comprises: a supply section of a carrier 1 for housing therein wafers W to be processed, in a horizontal state; a discharge section of the carrier 1; a wafer unloading arm 14 for unloading the wafers W from said carrier 1; a wafer loading arm 16 for loading the wafers W into the carrier 1; an attitude changing unit 40 for changing the attitude of the wafers W between a horizontal state and a vertical state; a processing section 3 for suitably processing the wafers W; and a wafer transport arm 56 for delivering the wafers W between the attitude changing unit 40 and the processing section 3 and for transporting the wafers W into and from the processing section. Thus, after the wafers W housed in the carrier 1 in the horizontal state are unloaded and the attitude of the wafers W is changed into the vertical state, suitable processes are carried out, and the attitude of the wafers W is changed in the horizontal state after processing, so that the wafers W can be housed in the carrier 1. Thus, it is possible to decrease the size of the whole system to improve the throughput and to improve the yield of products.

摘要翻译： 基板输送和处理系统通常包括：载体1的供应部分，用于在水平状态下容纳待处理的晶片W; 载体1的放电部分; 用于从所述载体1卸载晶片W的晶片卸载臂14; 用于将晶片W装载到载体1中的晶片装载臂16; 姿态改变单元40，用于在水平状态和垂直状态之间改变晶片W的姿态; 用于适当地处理晶片W的处理部分3; 以及晶片传送臂56，用于在姿态改变单元40和处理部分3之间传送晶片W，并将晶片W输送到处理部分和从处理部分传送。 因此，在水平状态下容纳在载体1中的晶片W被卸载并且晶片W的姿态变为垂直状态之后，进行合适的处理，并且晶片W的姿态在水平状态下变化 在处理之后，可以将晶片W容纳在载体1中。因此，可以减小整个系统的尺寸以提高生产量并提高产品的产量。

公开(公告)号：US5877508A

公开(公告)日：1999-03-02

申请号：US643977

申请日：1996-05-07

申请人： Satoshi Arakawa ,  Osamu Kuroda

发明人： Satoshi Arakawa ,  Osamu Kuroda

IPC分类号： A61B6/00 ,  G03B42/02 ,  G21K4/00

CPC分类号： G03B42/02

摘要： A radiation image storage panel comprises a substrate and a stimulable phosphor layer, which is overlaid on the substrate and emits light in proportion to the amount of energy stored thereon during its exposure to radiation when it is exposed to stimulating rays. The substrate is constituted of a material, which transmits the light emitted by the stimulable phosphor layer and absorbs and/or scatters light having wavelengths falling within a stimulation wavelength range for the stimulable phosphor layer. The light having wavelengths falling within the stimulation wavelength range is thus prevented from passing or propagating through the substrate, and the signal-to-noise ratio of an image signal detected from the radiation image storage panel is thereby prevented from becoming low.

摘要翻译： 辐射图像存储面板包括基底和可激发的荧光体层，该基底和可激发的荧光体层在被暴露于刺激光线时在暴露于辐射期间被覆盖在基底上并与其上存储的能量的比例成比例地发射光。 基板由透射由可刺激荧光体层发射的光并吸收和/或散射波长落入刺激波长范围内的光的材料构成，用于可刺激荧光体层。 因此，防止波长在刺激波长范围内的光通过或传播通过基板，从而防止从放射线图像存储面板检测的图像信号的信噪比变低。

公开(公告)号：US5560201A

公开(公告)日：1996-10-01

申请号：US382402

申请日：1995-02-01

申请人： Masakatsu Fujishita ,  Takeshi Atago ,  Akio Honji ,  Osamu Kuroda ,  Toshio Ogawa ,  Noriko Watanabe ,  Minoru Osuga

发明人： Masakatsu Fujishita ,  Takeshi Atago ,  Akio Honji ,  Osamu Kuroda ,  Toshio Ogawa ,  Noriko Watanabe ,  Minoru Osuga

IPC分类号： F01N3/02 ,  F01N3/08 ,  F01N3/20 ,  F01N3/22 ,  F01N3/24 ,  F01N9/00 ,  F01N13/02 ,  F01N13/04 ,  F02M25/07 ,  F01N3/30

CPC分类号： F01N3/0835 ,  F01N13/009 ,  F01N13/011 ,  F01N3/0814 ,  F01N3/0871 ,  F01N3/0878 ,  F01N3/2093 ,  F01N2240/02 ,  F01N2240/18 ,  F01N2250/12 ,  F01N2410/12 ,  F01N3/20 ,  F02M26/15

摘要： A system for purifying an exhaust gas for use in an automobile is disclosed which does not externally discharge unburnt hydrocarbons until a catalyst becomes active. An adsorbent is provided upstream of the catalyst. A heat exchanger is disposed between an upstream portion of the adsorbent and a portion between the adsorbent and the catalyst for controlling the elevation of the temperature of the adsorbent and for promoting the elevation of the temperature of the catalyst. The unburnt hydrocarbons are absorbed by the adsorbent in the initial period of time from starting of an engine until the catalyst becomes active. Temperature control is made in such a manner that the unburnt hydrocarbons which are adsorbed by the adsorbent begins to be desorbed therefrom substantially simultaneously with the time when the catalyst begins to function. A large quantity of unburnt hydrocarbons which are emitted from an engine immediately after the starting of the engine are prevented from being externally discharged without being treated.

公开(公告)号：US4756515A

公开(公告)日：1988-07-12

申请号：US18104

申请日：1987-02-20

申请人： Osamu Kuroda ,  Kazumasa Kuze ,  Zenji Nakajima ,  Satoshi Itoh ,  Shuichi Okamoto ,  Motoo Kunihiro ,  Masahiro Ishigaki

发明人： Osamu Kuroda ,  Kazumasa Kuze ,  Zenji Nakajima ,  Satoshi Itoh ,  Shuichi Okamoto ,  Motoo Kunihiro ,  Masahiro Ishigaki

IPC分类号： F16F13/26 ,  B60K5/12 ,  F16F13/00 ,  F16F13/10 ,  F16F13/18 ,  F16M7/00 ,  F16M5/00 ,  B60G15/04 ,  F16K15/14 ,  F16M13/00

CPC分类号： F16F13/105 ,  Y10T137/789

摘要： A fluid-damping vibration-isolating support device comprising a main support body having a rubber base member and a closed enclosure internally thereof; and a partition plate dividing the enclosure into two chambers which intercommunicate through an orifice and are filled with a liquid. The partition plate comprises a separator member and a stopper member. The separator member is formed of an outer peripheral thick wall portion having an orifice and an inner thin flat plate portion having at least one through-hole. The stopper member has two opposed plate sections provided so as to cover the through-hole and is captured to the separator member slightly movably to the degree that the plate sections are in contact with or separate from both faces of the flat plate portion. The stopper member serves to close upon low frequency vibration and open upon high frequency vibration, so that in the high frequency region rise of hydraulic pressure can be suppressed and dynamic spring rate can be lowered.

摘要翻译： 一种流体阻尼振动隔离支撑装置，包括：主支撑体，其具有橡胶基部构件和内部的封闭壳体; 以及将外壳分隔成两个腔室的隔板，这两个腔室通过孔口相互连通并且填充有液体。 隔板包括分隔件和止动件。 隔板构件由具有孔口的外周厚壁部分和具有至少一个通孔的内部薄平板部分形成。 止动件具有设置成覆盖通孔的两个相对的板部分，并且被轻轻地移动到捕获到分隔件部件到板部分与平板部分的两个面接触或分离的程度。 止动构件用于在低频振动时闭合，并且在高频振动下打开，使得在高频区域中可以抑制液压的上升并且可以降低动态弹簧速率。

公开(公告)号：US4311575A

公开(公告)日：1982-01-19

申请号：US138975

申请日：1980-04-10

申请人： Harumi Matsuzaki ,  Osamu Kuroda ,  Isao Okouchi ,  Kenkichi Izumi ,  Sankichi Takahashi

发明人： Harumi Matsuzaki ,  Osamu Kuroda ,  Isao Okouchi ,  Kenkichi Izumi ,  Sankichi Takahashi

IPC分类号： B01D61/48 ,  B01D57/02 ,  B01D61/44 ,  B01D61/50 ,  B01D61/52 ,  B01D61/54 ,  B01D65/02 ,  C02F1/46 ,  C02F1/469

CPC分类号： B01D61/44 ,  C02F1/469 ,  B01D2311/10 ,  B01D2311/2661 ,  C02F1/4604 ,  C02F1/4693 ,  C02F2201/46115 ,  Y02W10/37

摘要： In electrodialysis for desalting or concentrating an electrolyte solution in desalting chambers and concentrating chambers constituted by alternately juxtaposing a plurality of anion and cation exchange membranes between at least a pair of electrodes by supplying the electrolyte solution into the desalting and concentrating chambers while introducing a gas in a bubble state into the electrolyte solution between the ion exchange membranes, the electrolyte solution is made to contact the gas in the bubble state while providing a temperature difference between the gas and the electrolyte solution. The scale deposition onto the ion exchange membranes is prevented with an increase in electrodialysis efficiency.

摘要翻译： 在用于在脱盐室和浓缩室中脱盐或浓缩电解质溶液的电渗析中，其通过将电解质溶液供应到脱盐浓缩室中而将至少一对电极交替并置，从而将多个阴离子和阳离子交换膜交替并置， 气泡状态进入离子交换膜之间的电解质溶液中，使电解质溶液以气泡状态接触气体，同时提供气体和电解质溶液之间的温度差。 随着电渗析效率的提高，防止了离子交换膜上的垢沉积。

公开(公告)号：US4160713A

公开(公告)日：1979-07-10

申请号：US873680

申请日：1978-01-30

申请人： Harumi Matsuzaki ,  Sankichi Takahashi ,  Osamu Kuroda

发明人： Harumi Matsuzaki ,  Sankichi Takahashi ,  Osamu Kuroda

IPC分类号： B01D65/06 ,  B01D13/02

CPC分类号： B01D61/44 ,  B01D2311/165 ,  B01D2311/243 ,  B01D2311/2661

摘要： In a process for electro-dialysis which comprises passing an electrolyte through dilution chambers and concentration chambers formed between a large number of alternately counterposed anion exchange membranes and cation exchange membranes, and applying an electric potential to a pair of electrodes provided at both ends of a plurality of these chambers, thereby migrating ions in the electrolyte through the membranes and effecting dilution or concentration of the electrolyte, such a volumic rate of air bubbles is introduced to the lower parts of the dilution chambers as to make the thickness of a diffusion layer formed by concentration polarization near the ion exchange membranes in the dilution chambers smaller than when air bubbles are not introduced thereto, and make the resistance between the electrodes smaller than when the air bubbles are not introduced thereto. Superficial air velocity of air bubbles introduced into the dilution chambers is preferably 1-4 cm/sec.

摘要翻译： 在电透析过程中，该方法包括使电解液通过稀释室和形成在大量交替对置的阴离子交换膜和阳离子交换膜之间的浓缩室，并将电位施加到设置在 多个这样的室，从而通过膜将电解质中的离子迁移并进行电解质的稀释或浓缩，将这样的体积的气泡引入稀释室的下部，以形成扩散层的厚度 通过在稀释室内的离子交换膜附近的浓度偏振小于不引入气泡时的离子交换膜的极化浓度，并且使得电极之间的电阻小于不引入气泡时的电阻。 引入稀释室的气泡的表观空气速度优选为1-4cm / sec。

公开(公告)号：US08978670B2

公开(公告)日：2015-03-17

申请号：US12897384

申请日：2010-10-04

申请人： Junya Minamida ,  Issei Ueda ,  Yasuhiro Chouno ,  Osamu Kuroda ,  Kazuyoshi Eshima ,  Masahiro Yoshida ,  Satoshi Morita

发明人： Junya Minamida ,  Issei Ueda ,  Yasuhiro Chouno ,  Osamu Kuroda ,  Kazuyoshi Eshima ,  Masahiro Yoshida ,  Satoshi Morita

IPC分类号： B08B3/00 ,  H01L21/67

CPC分类号： H01L21/67051 ,  H01L21/6708 ,  H01L21/67178 ,  H01L21/6719 ,  H01L21/67196 ,  Y10S414/135

摘要： Provided is a substrate processing apparatus wherein, even if a trouble occurs, it is bound to continue a process for the substrate without stopping the substrate processing apparatus entirely. The substrate processing apparatus according to the present disclosure includes first and second substrate conveying devices configured to convey wafers, and first and second processing blocks provided on the right and left sides of the substrate conveying device and having processing unit arrays each configured to perform the same process. Processing unit arrays on one side and processing unit arrays on the other side are respectively connected to a processing liquid supply system commonly provided with them. And, when any one of substrate conveying devices, processing liquid supply systems has a problem, the process for the wafer can be performed in the processing unit array to which the substrate conveying device and the processing liquid supply system under normal operation belong.

摘要翻译： 提供了一种基板处理装置，其中即使发生故障，也必须在不停止基板处理装置的情况下继续进行基板的处理。 根据本公开的基板处理装置包括被配置为输送晶片的第一和第二基板输送装置，以及设置在基板输送装置的左侧和左侧的第一和第二处理块，并且具有各自被配置为执行相同的处理单元阵列 处理。 一侧的处理单元阵列和另一侧的处理单元阵列分别连接到通常设置有它们的处理液体供应系统。 并且，当基板输送装置中的任一个处理液供给系统存在问题时，可以在基板输送装置和处理液供给系统正常运转所属的处理单元阵列中进行晶片的处理。