摘要:
A magnetic head with improved hard magnet properties includes a sensor stack structure and a multi-layered seed layer structure formed over crystalline materials of the sensor stack structure. The multi-layered structure has a first layer including chromium-molybdenum (CrMo); a second layer including nitrogenated nickel-tantalum (NiTa+N); and a third layer including chromium-molybdenum (CrMo). A hard bias layer formed over the multi-layered structure is preferably cobalt-platinum-chromium (CoPtCr). Methods of making the magnetic head are also described.
摘要:
A tunnel junction magnetoresistive sensor having improved TMR performance (dR/R) and improved area resistance. The sensor includes a barrier layer sandwiched between a magnetic pinned layer structure and a magnetic free layer structure. The barrier layer includes a thin layer of Mg and a layer of MgOx. The barrier layer could also include a second thin layer of Mg such that the MgOx layer is sandwiched between the first and second Mg layers.
摘要:
A method for fabricating a read head for a magnetic disk drive having a read head sensor and a hard bias layer, where the read head has a shaped junction between the read head sensor and the hard bias layer. The method includes providing a layered wafer stack to be shaped. A single- or multi-layered photoresist mask having no undercut is deposited upon the layered wafer stack to be shaped. The layered wafer stack is shaped by the output of a milling source, where the shaping includes partial milling to within a partial milling range to form a shaped junction. A hard bias layer is then deposited which is in contact with the shaped junction of the wafer stack.
摘要:
A process for defining and controlling the track width for sensor devices is disclosed. An RIE-resistant, image layer, such as Cu or NiFe, is deposited after the DLC layer. A combination of RIE and ion milling processes or reactive ion beam etching processes are used to form the mask structure. Having an RIE-resistant layer precisely defines the DLC edge and minimizes the line edge roughness that result from fast removal of duramide during RIE. This solution controls the formation of the edges of the sensors and provides good definition for DLC mask edges. The image layer may be chemical mechanical polished to eliminate ion milling before the final RIE step.
摘要:
A tunnel junction having reduced free layer coercivity for improved sensitivity. The tunnel valve has a free layer that has been deposited in the presence of a nitrogen gas, which reduces the coercivity of the free layer, thereby improving the sensor's sensitivity and performance.
摘要:
A method for constructing a magnetoresistive sensor that avoids shadowing effects of a mask structure during sensor definition. The method includes the use of an antireflective coating (ARC) and a photosensitive mask deposited there over. The photosensitive mask is formed to cover a desired sensor area, leaving non-sensor areas exposed. A reactive ion etch is performed to transfer the pattern of the photosensitive mask onto the underlying ARC layer. The reactive ion etch (RIE) is performed with a relatively high amount of platen power. The higher platen power increases ion bombardment of the wafer, thereby increasing the physical (ie mechanical) component of material removal relative to the chemical component. This increase in the physical component of material removal result in an increased rate of removal of the photosensitive mask material relative to the ion mill resistant mask. This avoids the formation of a bulbous or mushroom shaped photoresist mask and therefore, avoids shadowing effects during subsequent manufacturing processes.
摘要:
A magnetic head for a hard disk drive having a CPP read head sensor that includes a layered sensor stack including a free magnetic layer and hard bias elements that are disposed on the sides of the free magnetic layer to provide a biasing magnetization for the free magnetic layer. To increase the coercivity of the hard bias elements, and thereby improve the biasing of the magnetization of the free magnetic layer, the ratio (t/H) of the thickness t to the height H of the hard bias elements is fabricated to be within the range of from approximately 1 to approximately 1/15.
摘要:
A tunnel junction magnetoresistive sensor having improved TMR performance (dR/R) and improved area resistance. The sensor includes a barrier layer sandwiched between a magnetic pinned layer structure and a magnetic free layer structure. The barrier layer includes a thin layer of Mg and a layer of MgOx. The barrier layer could also include a second thin layer of Mg such that the MgOx layer is sandwiched between the first and second Mg layers.
摘要:
A magnetic head fabrication process in which a stencil layer is deposited upon a plurality of sensor layers. A photoresist mask in the desired read track width is fabricated upon the stencil layer. A reactive ion milling step is then conducted to remove the unmasked portions of the stencil layer. Where the stencil layer is composed of an organic compound, such as Duramide and/or diamond-like-carbon, a reactive ion milling step utilizing oxygen species produces a stencil of the present invention having exceptionally straight side walls with practically no undercuts. Thereafter, an ion milling step is undertaken in which the sensor layers that are not covered by the stencil are removed. The accurately formed stencil results in correspondingly accurately formed side walls of the remaining central sensor layers. A magnetic head sensor structure having a desired read track width and accurately formed side walls is thus fabricated.
摘要:
A magnetoresistive sensor having a hard magnetic layer extending from the stripe height of the pinned layer to assist in pinning the pinned layer. The pinned layer extends beyond the stripe height of the free layer so that the back stripe height edge of the pinned layer is significantly beyond the stripe height edge of the free layer. The pinned layer is preferably constructed to have a net magnetic moment such that magnetostatic coupling between the hard magnetic layer and the pinned layer pins the moment of the layers. The hard magnetic layer can be used in addition to or in lieu of an AFM pinning layer.