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公开(公告)号：US20090160594A1
公开(公告)日：2009-06-25
申请号：US12245090
申请日：2008-10-03
Applicant: Takahiro Sakaguchi
Inventor： Takahiro Sakaguchi
IPC: H01F27/29
Abstract: According to one embodiment, a coiled component includes a conductor wire including a portion coiled around a core and an end portion out of the core, a lead including a first end portion and a second end portion to which the end portion of the conductor wire is connected, and a protrusion section protruding at a position outwardly shifted from the second end portion of the lead as seen from the core. The conductor wire is extended from the core to the second end portion of the lead in such a manner that the conductor wire is curved to pass the protrusion section. The protrusion section includes an inclined part around which the conductor wire is windable, and which is inclined in such a manner that a protrusion height of the protrusion section decreases in a direction away from the core.
Abstract translation: 根据一个实施例，线圈部件包括导体线，该导体线包括围绕芯部卷绕的部分和离开芯部的端部，引线，包括第一端部和第二端部，导体线的端部 以及在从芯部看时从引线的第二端部向外偏移的位置突出的突出部。 导体线以这样的方式从引线的芯延伸到第二端部，使得导线弯曲以使突出部分通过。 突出部分包括倾斜部分，导体线可绕着该倾斜部分倾斜，并且倾斜部分使突出部分的突出高度沿离开芯部的方向减小。
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52.发明申请
公开(公告)号：US20090053647A1
公开(公告)日：2009-02-26
申请号：US11921790
申请日：2006-05-24
Applicant: Tomoyuki Enomoto , Takahiro Kishioka , Takahiro Sakaguchi
Inventor： Tomoyuki Enomoto , Takahiro Kishioka , Takahiro Sakaguchi
Abstract: [Object] To provide a coating-type underlayer coating forming composition containing a naphthalene resin derivative. [Means for Solving Problems] A coating-type underlayer coating forming composition for lithography comprising a compound of formula (1): wherein A is an organic group having an aromatic group, R1 is hydroxy group, an alkyl group, an alkoxy group, a halogen group, a thiol group, an amino group or an amide group, m1 is the number of A substituted on the naphthalene ring and is an integer of 1 to 6, m2 is the number of R1 substituted on the naphthalene ring and is an integer of 0 to 5, a sum of m1 and m2 (m1+m2) is an integer of 1 to 6, in cases where the sum is an integer other than 6, the reminder is hydrogen atom, and n is the number of repeating units ranging from 2 to 7000.
Abstract translation: 提供一种含有萘树脂衍生物的涂布型下层涂料形成组合物。 [用于解决问题的方法]一种用于光刻的涂布型下层涂料组合物，其包含式（1）化合物：其中A是具有芳基的有机基团，R 1是羟基，烷基，烷氧基， 卤素基，硫醇基，氨基或酰胺基，m1是在萘环上取代的A的数，为1〜6的整数，m2为在萘环上取代的R 1的数，为整数 为0〜5，m1和m2（m1 + m2）的和为1〜6的整数，在和为6以外的整数的情况下，提醒为氢原子，n为重复单元数 范围从2到7000。
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公开(公告)号：US20080070132A1
公开(公告)日：2008-03-20
申请号：US11898587
申请日：2007-09-13
Applicant: Masahiro Hashimoto , Tomoyuki Enomoto , Takahiro Sakaguchi , Rikimaru Sakamoto , Masaki Nagai
Inventor： Masahiro Hashimoto , Tomoyuki Enomoto , Takahiro Sakaguchi , Rikimaru Sakamoto , Masaki Nagai
IPC: G03F1/00
Abstract: A mask blank is equipped with a thin film that forms a mask pattern formed on a substrate and a chemically amplified type resist film that is formed above the thin film. In the mask blank, a protective film that prevents movement of a substance that inhibits a chemical amplification function of the resist film from a bottom portion of the resist film to inside the resist film is provided between the thin film and the resist film. The mask blank suppresses the error of the line width dimension of the transfer pattern formed on the substrate to the design dimension of the transfer pattern line width of the transfer mask (actual dimension error) and also suppress linearity up to 10 nm.
Abstract translation: 掩模坯料配备有形成在基板上形成的掩模图案的薄膜和形成在薄膜上方的化学放大型抗蚀剂膜。 在掩模坯料中，在薄膜和抗蚀剂膜之间设置防止从抗蚀剂膜的底部到抗蚀剂膜内部阻止抗蚀剂膜的化学放大功能的物质的移动的保护膜。 掩模坯料将形成在基板上的转印图案的线宽尺寸的误差抑制为转印掩模的转印图案线宽度的设计尺寸（实际尺寸误差），并且还抑制高达10nm的线性度。
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54.发明申请Resist underlayer coating forming composition for mask blank, mask blank and mask 有权用于掩模毛坯，掩模毛坯和掩模的抗蚀剂下层涂料形成组合物
公开(公告)号：US20070190459A1
公开(公告)日：2007-08-16
申请号：US11703723
申请日：2007-02-08
Applicant: Masahiro Hashimoto , Tomoyuki Enomoto , Takahiro Sakaguchi , Rikimaru Sakamoto , Masaki Nagai
Inventor： Masahiro Hashimoto , Tomoyuki Enomoto , Takahiro Sakaguchi , Rikimaru Sakamoto , Masaki Nagai
IPC: G03F1/00
Abstract: There is provided a resist underlayer coating forming composition used in processes for manufacturing a mask blank and a mask, and a mask blank and a mask manufactured from the composition. The resist underlayer coating forming composition comprises a polymer compound having a halogen atom-containing repeating structural unit and a solvent. In a mask blank including a thin film for forming transfer pattern and a chemically-amplified type resist coating on a substrate in that order, the composition is used for forming a resist underlayer coating between the thin film for forming transfer pattern and the resist coating. The polymer compound is preferably a compound containing a halogen atom in an amount of at least 10 mass %.
Abstract translation: 提供了用于制造掩模坯料和掩模的方法中的抗蚀剂下层涂层形成组合物，以及由该组合物制造的掩模坯料和掩模。 抗蚀剂下层涂层形成组合物包含具有含卤原子的重复结构单元和溶剂的高分子化合物。 在包括用于形成转印图案的薄膜和基板上的化学放大型抗蚀剂涂层的掩模坯料中，该组合物用于在用于形成转印图案的薄膜和抗蚀剂涂层之间形成抗蚀剂下层涂层。 高分子化合物优选为含有至少10质量％的卤素原子的化合物。
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55.发明授权
公开(公告)号：US5524175A
公开(公告)日：1996-06-04
申请号：US141798
申请日：1993-10-27
Applicant: Yuji Sato , Katsunari Shibata , Takahiro Sakaguchi , Mitsuo Asai , Masashi Hashimoto , Hiroshi Takayanagi , Tatsuo Okahashi , Keiji Moki , Yoshihiro Kuwabara , Tatsuo Ochiai , Masaru Ohki , Hisao Ogata
Inventor： Yuji Sato , Katsunari Shibata , Takahiro Sakaguchi , Mitsuo Asai , Masashi Hashimoto , Hiroshi Takayanagi , Tatsuo Okahashi , Keiji Moki , Yoshihiro Kuwabara , Tatsuo Ochiai , Masaru Ohki , Hisao Ogata
Abstract: A general neuro-computer and system using it is capable of executing a plurality of learning algorithms, providing an instruction execution speed comparable with a hard wired system, and practically neglecting a time required for rewriting microprograms. The neuro-computer is constituted by a neuron array having a plurality of neurons, a control storage unit for storing microinstructions, a parameter register, a control logic, and a global memory. A host computer as a user interface inputs information necessary for the learning and execution of the neuro-computer to the system, the information including learning algorithms, neural network architecture, the number of learnings, the number of input patterns, input signals, and desired signals. The information inputted from the host computer is transferred via a SCSI to the neuro-computer to perform a desired neural network operation.
Abstract translation: 使用它的一般神经计算机和系统能够执行多个学习算法，提供与硬连线系统相当的指令执行速度，并且实际上忽略重写微程序所需的时间。 神经计算机由具有多个神经元的神经元阵列，用于存储微指令的控制存储单元，参数寄存器，控制逻辑和全局存储器构成。 作为用户界面的主计算机输入为系统学习和执行神经计算机所必需的信息，包括学习算法，神经网络架构，学习次数，输入模式数量，输入信号以及期望的信息 信号。 从主计算机输入的信息通过SCSI传送到神经计算机以执行所需的神经网络操作。
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56.发明授权Electronic index pulse generating system for speed control in rotating disk data 失效电子索引脉冲发生系统，用于旋转磁盘数据中的速度控制
公开(公告)号：US5371635A
公开(公告)日：1994-12-06
申请号：US894512
申请日：1992-06-04
Applicant: Takahiro Sakaguchi , Daihachiro Takasu
Inventor： Takahiro Sakaguchi , Daihachiro Takasu
CPC classification number: G11B19/28
Abstract: An index pulse generating system utilizes two periodic motor speed signals, one generated by a speed sensor coil actuated upon by a permanent magnet rotor mounted to a turntable, and the other generated by one of magnetoelectric converters acted upon by another permanent magnet rotor mounted to the turntable as a part of a disk drive motor. The two motor speed signals are translated respectively into two series of discrete motor speed pulses. One of the two series of motor speed pulses are produced at rates of two different predetermined numbers per complete revolution of the turntable. The two predetermined numbers have no common measure so that an AND gate or the like inputting the two series of motor speed pulses puts out at least one pulse during each turntable revolution, with the output pulse being representative of a specific angular position of the turntable.
Abstract translation: 索引脉冲发生系统利用两个周期性的电动机速度信号，一个由安装在转台上的永磁转子致动的速度传感器线圈产生的电动机速度信号，另一个由安装在该转盘上的另一个永磁转子 转盘作为磁盘驱动器电机的一部分。 两个电机速度信号分别转换成两个系列的分立电机速度脉冲。 两组电动机速度脉冲中的一个以转盘的每转一圈的两个不同的预定数量产生。 这两个预定数量没有共同的测量，因此输入两组电动机速度脉冲的“与”门等在每个转盘旋转期间输出至少一个脉冲，输出脉冲代表转台的特定角位置。
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公开(公告)号：US09994685B2
公开(公告)日：2018-06-12
申请号：US14129426
申请日：2012-06-27
Applicant: Takahiro Sakaguchi
Inventor： Takahiro Sakaguchi
IPC: C08J5/18 , C08F212/08 , C08F212/02 , C08F220/28 , C08F220/32 , C08F220/34 , C08F220/36 , G02B1/04 , G02B3/00 , C08G59/02 , C08L25/04 , C08L25/14 , C08L63/00
CPC classification number: C08J5/18 , C08F212/08 , G02B1/041 , C08F220/34 , C08F2220/282 , C08F2220/281 , C08F2220/325 , C08F220/32 , C08F2220/343 , C08F220/20 , C08F220/58 , C08L25/14
Abstract: There is provided a resin composition including a copolymer having structural units of Formula (1), Formula (2), and Formula (3), and a solvent; or a resin composition including a copolymer having structural units of Formula (1), Formula (4), and Formula (5), and a solvent.
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公开(公告)号：US08940470B2
公开(公告)日：2015-01-27
申请号：US12451474
申请日：2008-05-14
Applicant: Takayuki Negi , Takahiro Sakaguchi , Takahiro Kishioka
Inventor： Takayuki Negi , Takahiro Sakaguchi , Takahiro Kishioka
CPC classification number: G03F7/0233 , G02B3/00 , G03F7/0005 , G03F7/38
Abstract: A material for a microlens having heat resistance, high resolution and high light-extraction efficiency is provided. A positive resist composition comprises an alkali-soluble polymer containing a unit structure having an aromatic fused ring or a derivative thereof, and a compound having an organic group which undergoes photodecomposition to yield an alkali-soluble group. The positive resist composition has coating film properties of a refractive index at a wavelength of 633 nm of 1.6 or more and a transmittance at wavelengths of 400 to 730 nm of 80% or more. A pattern forming method comprises applying the positive resist composition, drying the composition, exposing the composition to light, and developing the composition.
Abstract translation: 提供了具有耐热性，高分辨率和高光提取效率的微透镜材料。 正型抗蚀剂组合物包含含有具有芳香稠合环或其衍生物的单元结构的碱溶性聚合物和具有经历光分解以产生碱溶性基团的有机基团的化合物。 正型抗蚀剂组合物具有在633nm的折射率为1.6以上的折射率和400〜730nm的波长的透射率为80％以上的涂膜性质。 图案形成方法包括施加正性抗蚀剂组合物，干燥组合物，使组合物曝光并显影组合物。
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公开(公告)号：US08867824B2
公开(公告)日：2014-10-21
申请号：US13408024
申请日：2012-02-29
Applicant: Kazuki Yokoyama , Takahiro Sakaguchi , Mayuko Maruyama
Inventor： Kazuki Yokoyama , Takahiro Sakaguchi , Mayuko Maruyama
CPC classification number: G06T7/90 , G06T5/003 , G06T5/008 , G06T7/593 , G06T2207/10021 , G06T2207/10024 , G06T2207/10028 , G06T2207/20076 , G06T2207/20172 , G06T2207/30201 , H04N13/128 , H04N13/271
Abstract: An image processing apparatus includes a depth control signal generation unit generating a depth control signal controlling emphasis of the feel of each region of an input image based on the depth position of a subject in each region of the input image; a face skin region control signal generation unit generating a face skin region control signal controlling emphasis of the feel of each region in the input image based on the human face skin region in the input image; a person region control signal generation unit generating a person region control signal controlling emphasis of the feel of each region in the input image based on the region of the person in the input image; and a control signal synthesis unit synthesizing the depth control signal, the face skin region control signal, and the person region control signal to generate a control signal.
Abstract translation: 图像处理装置包括：深度控制信号生成单元，根据输入图像的各区域中的被摄体的深度位置，生成控制输入图像的各区域的感觉强度的深度控制信号; 面部皮肤区域控制信号生成单元，基于输入图像中的人脸皮肤区域生成控制输入图像中的各区域的感觉的强调的面部皮肤区域控制信号; 人物区域控制信号生成单元，基于输入图像中的人的区域，生成控制输入图像中的各区域的感觉的强调的人物区域控制信号; 以及合成深度控制信号，面部皮肤区域控制信号和人物区域控制信号的控制信号合成单元，以产生控制信号。
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公开(公告)号：US08766158B2
公开(公告)日：2014-07-01
申请号：US13574897
申请日：2011-01-20
Applicant: Shinya Arase , Takahiro Sakaguchi
Inventor： Shinya Arase , Takahiro Sakaguchi
CPC classification number: G02B3/0012 , G02B3/0056 , H01L27/14627 , H01L27/14685
Abstract: A production method of a solid-state imaging device in which microlenses are arranged adjacent to each other on a substrate, includes: a first process of forming first microlenses on a surface of the substrate leaving space therebetween for providing second microlenses; and a second process of applying an overcoating material onto the surface of the substrate on which the first microlenses are formed, drying the overcoating material, exposing the overcoating material to light using a gray scale mask, and developing the exposed overcoating material, so as to form second microlenses in the space between the first microlenses adjacent to each other.
Abstract translation: 其中微透镜在衬底上彼此相邻布置的固态成像器件的制造方法包括：在衬底的表面上形成第一微透镜并在其间留出空间以提供第二微透镜的第一工艺; 以及将外涂层材料施加到其上形成有第一微透镜的基板的表面上的第二过程，干燥外涂层材料，使用灰度掩模将外涂层材料暴露于光，并显影曝光的外涂层材料，以便 在彼此相邻的第一微透镜之间的空间中形成第二微透镜。
