公开(公告)号：US08191856B2

公开(公告)日：2012-06-05

申请号：US12852220

申请日：2010-08-06

申请人： Atsushi Matsumoto ,  Kaoru Hirata ,  Ryousuke Dohi ,  Nobukazu Ikeda ,  Kouji Nishino

发明人： Atsushi Matsumoto ,  Kaoru Hirata ,  Ryousuke Dohi ,  Nobukazu Ikeda ,  Kouji Nishino

IPC分类号： F16K31/02

CPC分类号： F16K24/04 ,  F16K7/14 ,  F16K31/004 ,  F16K31/007 ,  F16K51/02

摘要： A control valve has a body that forms a valve chamber and a valve seat, a metal diaphragm installed inside the valve chamber and making contact with and departing from the valve seat, an actuator box fixed to the side of the body, a piezoelectric element installed inside the actuator box to thrust the metal diaphragm through mediation of a metal diaphragm presser by elongating downward when voltage is applied, a conical spring mechanism that absorbs elongation of the piezoelectric element at the time when the metal diaphragm makes contact with the valve seat and a prescribed thrust is applied to the valve seat and the like, and a preload mechanism that applies upward compressive force to the piezoelectric element all the time wherein the compressive force applied to the piezoelectric element is externally adjustable.

摘要翻译： 控制阀具有形成阀室和阀座的主体，安装在阀室内部并与阀座接触和离开的金属隔膜，固定在主体侧的致动器盒，安装在压缩元件侧的压电元件 在致动器箱内部，通过金属隔膜压板的调节，通过在施加电压时向下延伸来推动金属隔膜;锥形弹簧机构，其在金属隔膜与阀座接触时吸收压电元件的伸长， 规定的推力被施加到阀座等，以及预压机构，其向压电元件施加向上的压缩力，其中施加到压电元件的压缩力是外部可调节的。

公开(公告)号：US08181932B2

公开(公告)日：2012-05-22

申请号：US12161549

申请日：2006-11-13

申请人： Atsushi Matsumoto ,  Kaoru Hirata ,  Ryousuke Dohi ,  Nobukazu Ikeda ,  Kouji Nishino

发明人： Atsushi Matsumoto ,  Kaoru Hirata ,  Ryousuke Dohi ,  Nobukazu Ikeda ,  Kouji Nishino

IPC分类号： F16K31/02

CPC分类号： F16K24/04 ,  F16K7/14 ,  F16K31/004 ,  F16K31/007 ,  F16K51/02

摘要： A control valve has a body that forms a valve chamber and a valve seat, a metal diaphragm installed inside the valve chamber and making contact with and departing from the valve seat, an actuator box fixed to the side of the body, a piezoelectric element installed inside the actuator box to thrust the metal diaphragm through mediation of a metal diaphragm presser by elongating downward when voltage is applied, a conical spring mechanism that absorbs elongation of the piezoelectric element at the time when the metal diaphragm makes contact with the valve seat and a prescribed thrust is applied to the valve seat and the like, and a preload mechanism that applies upward compressive force to the piezoelectric element all the time wherein the compressive force applied to the piezoelectric element is externally adjustable.

摘要翻译： 控制阀具有形成阀室和阀座的主体，安装在阀室内部并与阀座接触和离开的金属隔膜，固定在主体侧的致动器盒，安装在压缩元件侧的压电元件 在致动器箱内部，通过金属隔膜压板的调节，通过在施加电压时向下延伸来推动金属隔膜;锥形弹簧机构，其在金属隔膜与阀座接触时吸收压电元件的伸长， 规定的推力被施加到阀座等，以及预压机构，其向压电元件施加向上的压缩力，其中施加到压电元件的压缩力是外部可调节的。

公开(公告)号：US08047510B2

公开(公告)日：2011-11-01

申请号：US12306904

申请日：2007-06-13

申请人： Kaoru Hirata ,  Masaaki Nagase ,  Atsushi Hidaka ,  Atsushi Matsumoto ,  Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda

发明人： Kaoru Hirata ,  Masaaki Nagase ,  Atsushi Hidaka ,  Atsushi Matsumoto ,  Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda

IPC分类号： B01F3/04

CPC分类号： C23C16/4481 ,  C23C16/52 ,  G05D16/2013 ,  Y10T137/7737

摘要： An evaporation supply apparatus for raw material used in semiconductor manufacturing includes a source tank in which a raw material is pooled; a flow rate control device that supplies carrier gas at a regulated flow rate into the source tank; a primary piping path for feeding mixed gas G0, made up of raw material vapor G4 and carrier gas G1, an automatic pressure regulating device that regulates a control valve based on the detected values of the pressure and temperature of mixed gas G0 to regulate the cross-sectional area of the passage through which the mixed gas G0 is distributed so as to hold the pressure of the mixed gas G0 inside the source tank constant; and a constant-temperature heating unit for heating the source tank to a set temperature, in which mixed gas G0 is supplied to a process chamber while controlling the pressure inside the source tank.

摘要翻译： 用于半导体制造的原料的蒸发供给装置包括：原料汇集在其中的源罐; 流量控制装置，其以规定的流量将载气供给到所述源罐; 用于供给由原料蒸气G4和载气G1组成的混合气体G0的主要管路，基于混合气体G0的压力和温度的检测值来调节控制阀的自动调压装置，以调节十字 混合气体G0通过其分配的通道的截面积，以将混合气体G0的压力保持在源箱内部恒定; 以及用于将源罐加热到设定温度的恒温加热单元，其中将混合气体G0供给到处理室，同时控制源罐内的压力。

公开(公告)号：US20110139271A1

公开(公告)日：2011-06-16

申请号：US12996370

申请日：2009-04-06

申请人： Kaoru Hirata ,  Katsuyuki Sugita ,  Kouji Nishino ,  Ryousuke Dohi ,  Nobukazu Ikeda ,  Takeo Sugimoto

发明人： Kaoru Hirata ,  Katsuyuki Sugita ,  Kouji Nishino ,  Ryousuke Dohi ,  Nobukazu Ikeda ,  Takeo Sugimoto

IPC分类号： F16K31/02

CPC分类号： G05D7/0635 ,  Y10T137/7761

摘要： The invention prevents overshoot from occurring in flow rate on the output side of a flow rate regulator when output flow rate is changed or the gas type distributed is changed. Thus, an automatic pressure regulator is provided to supply gas pressure to a flow rate regulator that includes a piezoelectric element driving type pressure regulating valve, a control pressure detector provided on the output side of the pressure regulating valve, and a controller to which a detected value P2 of the control pressure detector and a set value Pst for control pressure are input, wherein the controller supplies a control signal to a piezoelectric element driving unit of the pressure regulating valve using a proportional control system to perform valve opening regulation, in which the proportional control system of the controller is set to control to bring about a residual deviation in control pressure by disabling an integral action.

摘要翻译： 本发明防止了当流量改变或气体分布改变时流量调节器的输出侧的流量发生过冲。 因此，提供了一种自动压力调节器，用于向包括压电元件驱动型压力调节阀的流量调节器，设置在压力调节阀的输出侧的控制压力检测器和控制器提供气体压力， 输入控制压力检测器的值P2和用于控制压力的设定值Pst，其中控制器使用比例控制系统向压力调节阀的压电元件驱动单元提供控制信号，以执行阀开启调节，其中 控制器的比例控制系统设置为通过禁用积分作用来控制控制压力的残留偏差。

公开(公告)号：US20110108138A1

公开(公告)日：2011-05-12

申请号：US12989614

申请日：2009-02-18

申请人： Katsuyuki Sugita ,  Nobukazu Ikeda ,  Kouji Nishino ,  Ryousuke Dohi ,  Kaoru Hirata ,  Takatoshi Nakatani

发明人： Katsuyuki Sugita ,  Nobukazu Ikeda ,  Kouji Nishino ,  Ryousuke Dohi ,  Kaoru Hirata ,  Takatoshi Nakatani

IPC分类号： F16K31/12

CPC分类号： G05D7/0635 ,  Y10T137/7762

摘要： A pressure control valve piezoelectric element driving circuit is provided for a pressure type flow rate control device provided with a flow rate self-diagnosis function for comparing initial pressure drop characteristics data measured and with pressure drop characteristics data in a flow rate diagnosis which are measured under conditions that are the same for both measurements to detect malfunction in flow rate control from a difference between both characteristics data, wherein a first discharge circuit slowly discharges a piezoelectric element driving voltage applied to the piezoelectric element according to a step-down command signal from a CPU, through a step-down command circuit to step down the voltage, and a second discharge circuit that rapidly discharges a piezoelectric element driving voltage applied to the piezoelectric element according to a high-speed step-down command signal from the CPU, through a high-speed step-down command circuit to step down the voltage.

摘要翻译： 为压力式流量控制装置设置压力式流量控制装置，该压力式流量控制装置具有用于比较测定的初始压降特性数据和流量诊断中的压降特性数据的流量自我诊断功能， 两个测量结果相同的条件是根据两个特性数据之间的差异来检测流量控制的故障，其中第一放电电路根据来自一个压电元件的降压命令信号缓慢放电施加到压电元件的压电元件驱动电压 CPU通过降压指令电路降低电压，以及第二放电电路，其根据来自CPU的高速降压命令信号快速放电施加到压电元件的压电元件的驱动电压，通过 高速降压指令电路降压。

公开(公告)号：US20100229976A1

公开(公告)日：2010-09-16

申请号：US12303841

申请日：2007-06-13

申请人： Kaoru Hirata ,  Yohei Sawada ,  Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda

发明人： Kaoru Hirata ,  Yohei Sawada ,  Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda

IPC分类号： F16L41/00 ,  G01F1/42

CPC分类号： G05D7/0664 ,  Y10T137/85938 ,  Y10T137/87314 ,  Y10T137/87539

摘要： A flow rate ratio variable type fluid supply apparatus includes a flow rate control system supplying gas of flow rate Q that is diverted to first flow diverting pipe passage and second flow diverting pipe passage with prescribed flow rates Q1/Q0 so gas is supplied to a chamber, and a first orifice having opening area S1 is installed on the first flow diverting passage, and the second flow diverting passage is connected to a plurality of branch pipe passages connected in parallel, orifices having opening area installed on the branch passages, and open/close valves installed on all, or some of, the branch passages so gas is diverted to flow diverting passages with flow rate ratio Q1/Q0 equivalent to the ratio of the first orifice and the total opening area S2o of flow passable orifices of the second flow diverting passage by regulating total opening area of the flow passable orifices.

摘要翻译： 流量比可变型流体供给装置包括：流量控制系统，其将具有规定流量Q1 / Q0的第一分流管路和第二分流管路的流量Q的气体供给到气室， 并且具有开口面积S1的第一孔口安装在第一分流通道上，第二分流通道连接到并联连接的多个支管通道，开口区域安装在分支通道上，开口/ 安装在所有或一些分支通道上的关闭阀，使得气体转向流动转向通道，流量比Q1 / Q0等于第一孔口与第二流量的可流通孔口的总开口面积S2o的比值 通过调节流通孔的总开口面积来分流通道。

公开(公告)号：US20100207044A1

公开(公告)日：2010-08-19

申请号：US12439572

申请日：2007-08-21

申请人： Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda ,  Yohei Sewada

发明人： Ryousuke Dohi ,  Kouji Nishino ,  Nobukazu Ikeda ,  Yohei Sewada

IPC分类号： F16K31/02 ,  F16K1/36

CPC分类号： F16K31/04 ,  F16K7/16 ,  F16K31/52491

摘要： In a step motor driven cam valve a stem freely ascends and descends within a body having an in-flow passage, an out-flow passage, a valve chamber, and a valve seat. The stem is descended by an actuator, composed of a step motor and a cam mechanism located at a position above the stem, that changes a rotational motion of the step motor to a linear motion and transmits the linear motion to the stem. A diaphragm within a valve chamber or a valve body at a lower end part of the stem rests on the valve seat. A lift support mechanism that supports the actuator to freely ascend and descend is arranged at a bonnet that covers the valve chamber. A height fine-adjustment mechanism, arranged at the lift supporting mechanism, finely adjusts the height of the actuator relative to the stem so as to perform zero-point adjustment of the valve.

摘要翻译： 在步进马达驱动的凸轮阀中，杆在具有流入通道，​​流出通道，阀室和阀座的主体内自由上升和下降。 杆由致动器下降，该致动器由位于杆上方的位置的步进电动机和凸轮机构组成，其将步进电动机的旋转运动改变为线性运动，并将线性运动传递到杆。 阀室内的隔膜或阀杆的下端部的阀体位于阀座上。 支撑致动器自由上升和下降的提升支撑机构布置在覆盖阀室的发动机罩上。 布置在升降支撑机构处的高度精细调节机构，精细地调节致动器相对于杆的高度，以便执行阀的零点调节。

公开(公告)号：US20090292399A1

公开(公告)日：2009-11-26

申请号：US12307554

申请日：2007-06-13

申请人： Masaaki Nagase ,  Ryousuke Dohi ,  Nobukazu Ikeda ,  Kouji Nishino ,  Kaoru Hirata ,  Katsuyuki Sugita ,  Atsushi Matsumoto

发明人： Masaaki Nagase ,  Ryousuke Dohi ,  Nobukazu Ikeda ,  Kouji Nishino ,  Kaoru Hirata ,  Katsuyuki Sugita ,  Atsushi Matsumoto

IPC分类号： G05D7/06

CPC分类号： G05D7/0635 ,  G01F1/36 ,  G01F15/005 ,  G01F15/022

摘要： With a pressure type flow control apparatus, a valve on the downstream side of a throttle mechanism is released and a flow rate setting value Qe inputted to the pressure type flow control apparatus is changed to detect the magnitude ΔV of change of a flow rate output signal Qo from the pressure type flow control apparatus while the flow rate setting value Qe is changed, so that normal functioning of the releasing operations of the valve on the downstream side of the throttle mechanism is confirmed when the magnitude ΔV of change of the flow rate output signal Qo is above the predetermined value. If the releasing operations are malfunctioning, the magnitude ΔV of changes is found to be below the predetermined value.

摘要翻译： 利用压力式流量控制装置，释放节气门机构下游侧的阀，改变输入到压力式流量控制装置的流量设定值Qe，以检测流量输出信号的变化幅度DeltaV 当流量设定值Qe变化时，来自压力式流量控制装置的Qo，使得当流量输出的变化幅度DeltaV被确定时，节气门机构的下游侧的阀的释放操作的正常功能被确认 信号Qo高于预定值。 如果释放操作发生故障，则发现变化幅度DeltaV低于预定值。

公开(公告)号：US20070193628A1

公开(公告)日：2007-08-23

申请号：US10566495

申请日：2004-07-28

申请人： Hiroshi Kannan ,  Tomio Uno ,  Ryousuke Dohi ,  Kouji Nishino ,  Osamu Nakamura ,  Atsushi Matsumoto ,  Nobukazu Ikeda

发明人： Hiroshi Kannan ,  Tomio Uno ,  Ryousuke Dohi ,  Kouji Nishino ,  Osamu Nakamura ,  Atsushi Matsumoto ,  Nobukazu Ikeda

IPC分类号： G05D7/06

CPC分类号： G05D7/0652 ,  Y10T137/7761 ,  Y10T137/8741 ,  Y10T137/87507

摘要： The present invention makes it possible to prevent substantial reduction of flow rate control accuracy in a small flow quantity range, to achieve an accurate flow rate control over the entire range of a flow rate control, and also to allow control of a wide pressure range of a chamber with an accurate flow rate control. Namely, with a gas supply facility having a plurality of pressure type flow controllers connected in parallel and a controller to control operation of pressure type flow controllers to supply a desired gas exhausted by a vacuum pump to a chamber while controlling its flow rate, one pressure type flow controller is made to be a controller to control a gas flow rate range up to 10% of the maximum flow rate to be supplied to a chamber, while the remaining pressure type flow controllers are made to be ones to control the rest of the gas flow rate range.

摘要翻译： 本发明使得可以防止在小流量范围内的流量控制精度的显着降低，从而在流量控制的整个范围内实现精确的流量控制，并且还可以控制宽的压力范围 具有精确流量控制的室。 也就是说，具有并联连接的多个压力式流量控制器的气体供给装置和控制器，用于控制压力式流量控制器的操作，以在控制其流量的同时将由真空泵排出的所需气体供应到腔室，一个压力 型流量控制器被制成控制器，以控制最高流量的10％的气体流量范围供给到室，而剩余的压力式流量控制器被制成控制其余的 气体流量范围。

公开(公告)号：US09163743B2

公开(公告)日：2015-10-20

申请号：US13505620

申请日：2010-11-04

申请人： Atsushi Hidaka ,  Kaoru Hirata ,  Masaaki Nagase ,  Nobukazu Ikeda ,  Ryousuke Dohi ,  Kouji Nishino

发明人： Atsushi Hidaka ,  Kaoru Hirata ,  Masaaki Nagase ,  Nobukazu Ikeda ,  Ryousuke Dohi ,  Kouji Nishino

IPC分类号： G05D7/06 ,  F16K31/00 ,  F16K7/14 ,  F16K25/00

CPC分类号： F16K31/007 ,  F16K7/14 ,  F16K25/005 ,  G05D7/0629 ,  Y10T137/6416 ,  Y10T137/7759 ,  Y10T137/776 ,  Y10T137/7761

摘要： A piezoelectrically driven valve and a piezoelectrically driven fluid control device are provided that may control a fluid even if the temperature of the fluid is higher than an operating temperature range of a piezoelectric actuator. The piezoelectrically driven valve includes a valve element for opening and closing a fluid passage, a piezoelectric actuator for driving the valve element by utilizing extension of a piezoelectric element, and a radiation spacer that lifts and supports the piezoelectric actuator away from the fluid passage, and radiates heat that is transferred from fluid flowing in the fluid passage to the piezoelectric actuator, and preferably further includes a support cylinder that houses and supports both of the piezoelectric actuator and the radiation spacer, wherein the support cylinder is made of a material with the same thermal expansion coefficient as that of the radiation spacer, at least at a portion for housing the radiation spacer.

摘要翻译： 提供了一种压电驱动阀和压电驱动的流体控制装置，其可以控制流体，即使流体的温度高于压电致动器的工作温度范围。 压电驱动阀包括用于打开和关闭流体通道的阀元件，通过利用压电元件的延伸来驱动阀元件的压电致动器，以及将压电致动器提升和支撑远离流体通道的辐射间隔件，以及 辐射从在流体通道中流动的流体转移到压电致动器的热量，并且优选地还包括容纳和支撑压电致动器和辐射间隔物的支撑筒，其中支撑筒由具有相同材料的材料制成 至少在用于容纳辐射间隔物的部分处，与辐射间隔物的热膨胀系数相同。