-
51.发明授权公开(公告)号：US07041846B2
公开(公告)日：2006-05-09
申请号：US10791843
申请日：2004-03-04
申请人： Takeru Watanabe , Jun Hatakeyama , Takeshi Kinsho
发明人： Takeru Watanabe , Jun Hatakeyama , Takeshi Kinsho
IPC分类号： C07C69/74 , C07C69/75 , C07C69/753
CPC分类号： C07D307/93 , C07C69/732 , C07C69/734 , C07C2601/08 , C07C2603/68 , C07C2603/74 , G03F7/0397
摘要： Alicyclic methacrylate compounds having an oxygen substituent group on their α-methyl group, represented by formula (1), are novel wherein R1 is H or C1–C10 alkyl which may contain a halogen atom, hydroxyl group, ether bond, carbonyl group, carboxyl group or cyano group, and R2 is a monovalent C3–C20 organic group having an alicyclic structure. Polymers prepared from these alicyclic methacrylate compounds have improved transparency, especially at the exposure wavelength of an excimer laser, and improved dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, show a high resolution, allow smooth development, lend themselves to micropatterning, and are thus suitable as micropatterning material for VLSI fabrication
摘要翻译： 由式（1）表示的在其α-甲基上具有氧取代基的脂环族甲基丙烯酸酯化合物是新的，其中R 1是H或C 1 -C 3 可以含有卤素原子，羟基，醚键，羰基，羧基或氰基的烷基，R 2是一价C 3〜 具有脂环结构的-C 20官能团。 由这些脂环族甲基丙烯酸酯化合物制备的聚合物具有改善的透明度，特别是在准分子激光的曝光波长下，以及改进的耐干蚀刻性。 包含聚合物的抗蚀剂组合物对高能辐射敏感，显示高分辨率，允许平滑显影，适合于微图案化，因此适用于VLSI制造的微图案材料
-
52.发明授权Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process 有权可聚合氟化合物，制备方法，聚合物，抗蚀剂组合物和图案化工艺公开(公告)号：US07592407B2
公开(公告)日：2009-09-22
申请号：US11259179
申请日：2005-10-27
申请人： Yuji Harada , Jun Hatakeyama , Takeru Watanabe , Takeshi Kinsho
发明人： Yuji Harada , Jun Hatakeyama , Takeru Watanabe , Takeshi Kinsho
IPC分类号： C07C69/52
CPC分类号： G03F7/0397 , C07D309/10 , C08F220/24 , G03F7/0046 , G03F7/0392 , Y02P20/55
摘要： A polymerizable fluorinated compound having formula (2a) or (2b) wherein R1 and R2 are H or C1-C20 alkyl or fluoroalkyl, R3 is H, F or C1-C4 alkyl or fluoroalkyl, and R is H or a protective group is polymerized into a fluorinated polymer which is used as a base polymer to formulate a resist composition having transparency to laser light of wavelength≦300 nm, alkali development amenability, and dry etch resistance.
摘要翻译： 具有式（2a）或（2b）的可聚合氟化化合物，其中R 1和R 2是H或C 1 -C 20烷基或氟代烷基，R 3是H，F或C 1 -C 4烷基或氟代烷基，R是H或保护基团是聚合的 转化成氟化聚合物，其用作基础聚合物以配制对波长<= 300nm的激光具有透明度的抗蚀剂组合物，碱显影易化性和耐干蚀刻性。
-
53.发明申请Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process 有权可聚合氟化酯，制造方法，聚合物，光致抗蚀剂组合物和图案化工艺公开(公告)号：US20060009602A1
公开(公告)日：2006-01-12
申请号：US11175346
申请日：2005-07-07
IPC分类号： C08F118/02 , C07C69/62 , C07C69/52
CPC分类号： C08F114/18 , C07C69/653 , C07C2601/14 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： Polymerizable fluorinated ester compounds having formula (1) or (2) are novel wherein R1 is H, methyl or trifluoromethyl, R2 is a divalent hydrocarbon group, R3 is H or a monovalent hydrocarbon group, or R2 and R3, taken together, may form a ring, R4 is H, OH or a monovalent hydrocarbon group, and R5 is an acid labile group. They are most useful as monomers to produce polymers for the manufacture of radiation-sensitive resist compositions.
摘要翻译： 具有式（1）或（2）的可聚合氟化酯化合物是新的，其中R 1是H，甲基或三氟甲基，R 2是二价烃基，R SUP > 3是H或一价烃基，或R 2和R 3一起可以形成环，R 4， SUP>是H，OH或一价烃基，R 5是酸不稳定基团。 它们作为制备用于制造辐射敏感抗蚀剂组合物的聚合物的单体最有用。
-
54.发明授权Antireflective coating composition, antireflective coating, and patterning process 有权抗反射涂料组合物，抗反射涂层和图案化工艺公开(公告)号：US08313890B2
公开(公告)日：2012-11-20
申请号：US12636546
申请日：2009-12-11
CPC分类号： G03F7/091 , C09D133/16 , C08L2666/02
摘要： A composition comprising (A) a fluorinated polymer having k=0.01-0.4 and n=1.4-2.1 and (B) an aromatic ring-bearing polymer having k=0.3-1.2 is used to form an antireflective coating. The ARC-forming composition can be deposited by the same process as prior art ARCs. The resulting ARC is effective in preventing reflection of exposure light in photolithography and has an acceptable dry etching rate.
摘要翻译： 包含（A）具有k = 0.01-0.4和n = 1.4-2.1的氟化聚合物和（B）具有k = 0.3-1.2的含芳环的聚合物的组合物用于形成抗反射涂层。 ARC形成组合物可以通过与现有技术ARC相同的方法沉积。 所得到的ARC有效地防止曝光光在光刻中的反射并且具有可接受的干蚀刻速率。
-
公开(公告)号：US08062828B2
公开(公告)日：2011-11-22
申请号：US12370652
申请日：2009-02-13
申请人： Youichi Ohsawa , Takeshi Kinsho , Masaki Ohashi , Seiichiro Tachibana , Takeru Watanabe , Jun Hatakeyama
发明人： Youichi Ohsawa , Takeshi Kinsho , Masaki Ohashi , Seiichiro Tachibana , Takeru Watanabe , Jun Hatakeyama
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/2041 , Y10S430/108 , Y10S430/111 , Y10S430/143
摘要： A positive resist composition comprises a polymer comprising recurring units having a sulfonium salt incorporated therein as a base resin which becomes soluble in alkaline developer under the action of acid. The polymer generates a strong sulfonic acid upon exposure to high-energy radiation so as to facilitate effective scission of acid labile groups in the resist composition.
摘要翻译： 正型抗蚀剂组合物包含含有其中掺入其中的锍盐作为基础树脂的重复单元的聚合物，其在酸的作用下变得可溶于碱性显影剂。 聚合物在暴露于高能量辐射时产生强烈的磺酸，以促进抗蚀剂组合物中酸不稳定基团的有效断裂。
-
56.发明授权公开(公告)号：US07378548B2
公开(公告)日：2008-05-27
申请号：US11423524
申请日：2006-06-12
申请人： Takeru Watanabe , Koji Hasegawa , Takeshi Kinsho , Jun Hatakeyama
发明人： Takeru Watanabe , Koji Hasegawa , Takeshi Kinsho , Jun Hatakeyama
IPC分类号： C07C205/00
CPC分类号： C07D307/33 , C07C229/12 , C07C229/16 , C07C2601/14 , C07D307/12 , C07D309/12 , C07D317/24 , G03F7/0045 , G03F7/0388 , G03F7/0392 , G03F7/0397
摘要： The present invention provides ester group-containing tertiary amine compounds of the formula (R1OCH2CH2)nN(CH2CH2CO2R2)3-n which, when used as additives in chemical amplification photolithography, can yield photoresists having a high resolution and an excellent focus margin. The present invention also provides a process comprising the step of subjecting a primary or secondary amine compound to Michael addition to an acrylic ester compound; a process comprising the steps of subjecting monoethanolamine or diethanolamine to Michael addition to an acrylic ester compound so as to form an ester group-containing amine compound and introducing a R1 group to the resultant ester group-containing amine compound; and a process comprising the step of effecting the ester exchange reaction of an ester group-containing tertiary amine with R2OH.
摘要翻译： 本发明提供了式（R 1）2 OCH 2 CH 2 N酯的含酯基的叔胺化合物 > N（CH 2 CH 2）2 CO 2 N 2 - （CH 2）3 - n - 当用作化学放大光刻中的添加剂时，可以产生具有高分辨率和优异聚焦余量的光致抗蚀剂。 本发明还提供了一种方法，其包括使伯胺或仲胺化合物与丙烯酸酯化合物进行迈克尔加成步骤; 一种方法包括以下步骤：将一乙醇胺或二乙醇胺加入到丙烯酸酯化合物中以形成含酯基的胺化合物并将R 1 O 2基团引入所得的含酯基胺 复合; 以及包括使含酯基的叔胺与R 2 OH进行酯交换反应的步骤的方法。
-
57.发明授权Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process 有权可聚合氟化酯，制造方法，聚合物，光致抗蚀剂组合物和图案化工艺公开(公告)号：US07202318B2
公开(公告)日：2007-04-10
申请号：US11175346
申请日：2005-07-07
IPC分类号： C08F12/20
CPC分类号： C08F114/18 , C07C69/653 , C07C2601/14 , G03F7/0046 , G03F7/0392 , G03F7/0397
摘要： Polymerizable fluorinated ester compounds having formula (1) or (2) are novel wherein R1 is H, methyl or trifluoromethyl, R2 is a divalent hydrocarbon group, R3 is H or a monovalent hydrocarbon group, or R2 and R3, taken together, may form a ring, R4 is H, OH or a monovalent hydrocarbon group, and R5 is an acid labile group. They are most useful as monomers to produce polymers for the manufacture of radiation-sensitive resist compositions
摘要翻译： 具有式（1）或（2）的可聚合氟化酯化合物是新的，其中R 1是H，甲基或三氟甲基，R 2是二价烃基，R SUP > 3是H或一价烃基，或R 2和R 3一起可以形成环，R 4， SUP>是H，OH或一价烃基，R 5是酸不稳定基团。 它们作为制备用于制造辐射敏感抗蚀剂组合物的聚合物的单体最有用
-
58.发明申请Novel Tertiary Amine Compounds Having An Ester Structure And Processes For Preparing The Same 有权具有酯结构的新型三元胺化合物及其制备方法公开(公告)号：US20060217570A1
公开(公告)日：2006-09-28
申请号：US11423524
申请日：2006-06-12
申请人： Takeru Watanabe , Koji Hasegawa , Takeshi Kinsho , Jun Hatakeyama
发明人： Takeru Watanabe , Koji Hasegawa , Takeshi Kinsho , Jun Hatakeyama
IPC分类号： C07C229/22
CPC分类号： C07D307/33 , C07C229/12 , C07C229/16 , C07C2601/14 , C07D307/12 , C07D309/12 , C07D317/24 , G03F7/0045 , G03F7/0388 , G03F7/0392 , G03F7/0397
摘要： The present invention provides ester group-containing tertiary amine compounds of the formula (R1OCH2CH2)nN(CH2CH2CO2R2)3-n which, when used as additives in chemical amplification photolithography, can yield photoresists having a high resolution and an excellent focus margin. The present invention also provides a process comprising the step of subjecting a primary or secondary amine compound to Michael addition to an acrylic ester compound; a process comprising the steps of subjecting monoethanolamine or diethanolamine to Michael addition to an acrylic ester compound so as to form an ester group-containing amine compound and introducing a R1 group to the resultant ester group-containing amine compound; and a process comprising the step of effecting the ester exchange reaction of an ester group-containing tertiary amine with R2OH.
摘要翻译： 本发明提供了式（R 1）2 OCH 2 CH 2 N酯的含酯基的叔胺化合物 > N（CH 2 CH 2）2 CO 2 N 2 - （CH 2）3 - n - 当用作化学放大光刻中的添加剂时，可以产生具有高分辨率和优异聚焦余量的光致抗蚀剂。 本发明还提供了一种方法，其包括使伯胺或仲胺化合物与丙烯酸酯化合物进行迈克尔加成步骤; 一种方法包括以下步骤：将一乙醇胺或二乙醇胺加入到丙烯酸酯化合物中以形成含酯基的胺化合物并将R 1 O 2基团引入所得的含酯基胺 复合; 以及包括使含酯基的叔胺与R 2 OH进行酯交换反应的步骤的方法。
-
59.发明申请Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process 有权可聚合氟化合物，制备方法，聚合物，抗蚀剂组合物和图案化工艺公开(公告)号：US20060094817A1
公开(公告)日：2006-05-04
申请号：US11259179
申请日：2005-10-27
申请人： Yuji Harada , Jun Hatakeyama , Takeru Watanabe , Takeshi Kinsho
发明人： Yuji Harada , Jun Hatakeyama , Takeru Watanabe , Takeshi Kinsho
IPC分类号： C08L27/12
CPC分类号： G03F7/0397 , C07D309/10 , C08F220/24 , G03F7/0046 , G03F7/0392 , Y02P20/55
摘要： A polymerizable fluorinated compound having formula (2a) or (2b) wherein R1 and R2 are H or C1-C20 alkyl or fluoroalkyl, R3 is H, F or C1-C4 alkyl or fluoroalkyl, and R is H or a protective group is polymerized into a fluorinated polymer which is used as a base polymer to formulate a resist composition having transparency to laser light of wavelength≦300 nm, alkali development amenability, and dry etch resistance.
摘要翻译： 具有式（2a）或（2b）的可聚合氟化化合物，其中R 1和R 2是H或C 1 -C 3 - 20个或多个烷基或氟烷基，R 3是H，F或C 1 -C 4烷基或氟代烷基，R是H 或保护基团聚合成氟化聚合物，其用作基础聚合物以配制对波长<= 300nm的激光具有透明度的抗蚀剂组合物，碱显影性能和耐干蚀刻性。
-
公开(公告)号：US08431323B2
公开(公告)日：2013-04-30
申请号：US12608556
申请日：2009-10-29
申请人： Takeru Watanabe , Satoshi Shinachi , Takeshi Kinsho , Koji Hasegawa , Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Tomohiro Kobayashi
发明人： Takeru Watanabe , Satoshi Shinachi , Takeshi Kinsho , Koji Hasegawa , Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Tomohiro Kobayashi
CPC分类号： G03F7/11 , C07D307/04 , C07D307/77 , C07D315/00 , C07D319/06 , C08F14/18 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , C08F2/00
摘要： A fluorinated monomer of cyclic acetal structure has formula (1) wherein R is a C1-C20 alkyl group which may be substituted with halogen or separated by oxygen or carbonyl, and Z is a divalent organic group which forms a ring with alkylenoxy and contains a polymerizable unsaturated group. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water sliding property, lipophilicity, acid lability and hydrolyzability and is useful in formulating a protective coating composition and a resist composition.
-
-
-
-
-
-
-
-
-
搜索结果
217 条记录 (耗时 0.038 秒)