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公开(公告)号：US09499906B2
公开(公告)日：2016-11-22
申请号：US14621437
申请日：2015-02-13
Applicant: Eastman Kodak Company
Inventor： Kurt D. Sieber , Kam Chuen Ng , Ronald Steven Cok
IPC: C23C16/455 , C23C16/48 , C23C16/458
CPC classification number: C23C16/45525 , C23C16/405 , C23C16/4412 , C23C16/453 , C23C16/45508 , C23C16/45544 , C23C16/458 , C23C16/4583 , C23C16/48 , H01L21/6838
Abstract: A method for depositing a thin film on a moveable substrate using atmospheric pressure atomic-layer deposition provides a chamber including a stationary support, through which fluid flows, that supports a moveable substrate. A moveable substrate includes a levitation stabilizing structure on the substrate that defines an enclosed interior impingement area of the substrate. The moveable substrate is positioned proximate to the stationary support so that the stationary support extends beyond the enclosed interior impingement area and the fluid flow is directed within the enclosed interior impingement area of the moveable substrate. A fluid flow, provided from a pressurized-gas source through the stationary support, impinges on the moveable substrate surface within the enclosed interior impingement area to levitate and expose the moveable substrate to the fluid while restricting the lateral motion of the moveable substrate with the levitation stabilizing structure to deposit a thin film on the moveable substrate.
Abstract translation: 使用大气压原子层沉积在可移动衬底上沉积薄膜的方法提供了一个腔室，其包括支撑可移动衬底的流体流过的固定支撑件。 可移动衬底包括在衬底上的悬浮稳定结构，其限定衬底的封闭内部冲击区域。 可移动基底定位成靠近固定支撑件，使得固定支撑件延伸超过封闭的内部冲击区域，并且流体流动被引导到可移动基底的封闭内部冲击区域内。 从加压气体源通过固定支撑件提供的流体流动冲击在封闭的内部冲击区域内的可移动基底表面上，以悬浮并将可移动基底暴露于流体，同时以悬浮限制可移动基底的横向运动 稳定结构以在可移动基底上沉积薄膜。
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52.发明申请FRAME SEALANT AND METHOD OF PREPARING THE SAME AND DISPLAY DEVICE COMPRISING SAID FRAME SEALANT 审中-公开框架密封剂及其制备方法和包含固定框架密封剂的显示装置
公开(公告)号：US20160251551A1
公开(公告)日：2016-09-01
申请号：US14386491
申请日：2013-12-30
IPC: C09J133/08 , G02F1/1339 , G02F1/1335 , G02B5/20
CPC classification number: C09J133/08 , C08K3/22 , C08K2003/2296 , C08L33/04 , C08L33/06 , C08L33/068 , C08L63/10 , C09J133/068 , C09J163/10 , C23C16/458 , G02B5/201 , G02F1/133514 , G02F1/1339
Abstract: A frame sealant and a method of preparing the same as well as a display device containing the frame sealant. The frame sealant includes an epoxy-acrylic resin, an acrylic resin, a thermal curing agent, a coupling agent, a photoinitiator, and an organic filler, and further an one-dimensional nano-material as an inorganic filler which is capable of cross-linking with the epoxy-acrylic resin. The one-dimensional nano-material after cross-linking with the epoxy-acrylic resin will form an interlaced network, which can prevent granular materials from precipitating and improve the display quality.
Abstract translation: 框架密封剂及其制备方法以及包含框架密封剂的显示装置。 框架密封剂包括环氧丙烯酸树脂，丙烯酸树脂，热固化剂，偶联剂，光引发剂和有机填料，以及作为无机填料的一维纳米材料， 与环氧丙烯酸树脂连接。 与环氧丙烯酸树脂交联后的一维纳米材料将形成交错网络，可以防止颗粒物质沉淀并提高显示质量。
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53.发明授权Inhibitor plasma mediated atomic layer deposition for seamless feature fill 有权抑制剂等离子体介导的原子层沉积用于无缝特征填充
公开(公告)号：US09425078B2
公开(公告)日：2016-08-23
申请号：US14630852
申请日：2015-02-25
Applicant: LAM RESEARCH CORPORATION
Inventor： Wei Tang , Bart Van Schravendijk , Jun Qian , Hu Kang , Adrien LaVoie , Deenesh Padhi , David C. Smith
IPC: H01L21/3205 , H01L21/283 , H01L21/762 , C23C16/455 , C23C16/52 , H01L21/02
CPC classification number: H01L21/76224 , C23C16/02 , C23C16/045 , C23C16/402 , C23C16/45527 , C23C16/45534 , C23C16/4554 , C23C16/45544 , C23C16/458 , C23C16/50 , C23C16/52 , H01J37/32082 , H01J37/32449 , H01L21/02164 , H01L21/02274 , H01L21/0228 , H01L21/02315 , H01L21/32051 , H01L21/76837
Abstract: Systems and methods for depositing film in a substrate processing system includes performing a first atomic layer deposition (ALD) cycle in a processing chamber to deposit film on a substrate including a feature; after the first ALD cycle, exposing the substrate to an inhibitor plasma in the processing chamber for a predetermined period to create a varying passivated surface in the feature; and after the predetermined period, performing a second ALD cycle in the processing chamber to deposit film on the substrate.
Abstract translation: 用于在衬底处理系统中沉积膜的系统和方法包括在处理室中执行第一原子层沉积（ALD）循环以在包括特征的衬底上沉积膜; 在第一ALD循环之后，将衬底暴露于处理室中的抑制剂等离子体一段预定时间段，以在该特征中产生变化的钝化表面; 并且在所述预定时段之后，在所述处理室中执行第二ALD循环以将膜沉积在所述基板上。
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公开(公告)号：US20160240419A1
公开(公告)日：2016-08-18
申请号：US14621432
申请日：2015-02-13
Applicant: Eastman Kodak Company
Inventor： Kurt D. Sieber , Kam Chuen Ng , Ronald Steven Cok
IPC: H01L21/68 , C23C16/458
CPC classification number: C23C16/4585 , C23C16/4412 , C23C16/45544 , C23C16/45574 , C23C16/45576 , C23C16/458 , C23C16/4584 , H01L21/67784 , H01L21/6838
Abstract: A substrate for fluidic levitation processing includes a moveable substrate and a levitation stabilizing structure located on the moveable substrate. The levitation stabilizing structure defines an enclosed interior impingement area of the moveable substrate that stabilizes lateral displacement of the moveable substrate during fluidic levitation processing.
Abstract translation: 用于流体悬浮处理的衬底包括位于可移动衬底上的可移动衬底和悬浮稳定结构。 悬浮稳定结构限定可移动基底的封闭内部冲击区域，其在流体悬浮处理期间稳定可移动基底的横向位移。
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公开(公告)号：US20160237565A1
公开(公告)日：2016-08-18
申请号：US14621437
申请日：2015-02-13
Applicant: Eastman Kodak Company
Inventor： Kurt D. Sieber , Kam Chuen Ng , Ronald Steven Cok
IPC: C23C16/455 , C23C16/48 , C23C16/458
CPC classification number: C23C16/45525 , C23C16/405 , C23C16/4412 , C23C16/453 , C23C16/45508 , C23C16/45544 , C23C16/458 , C23C16/4583 , C23C16/48 , H01L21/6838
Abstract: A method for depositing a thin film on a moveable substrate using atmospheric pressure atomic-layer deposition provides a chamber including a stationary support, through which fluid flows, that supports a moveable substrate. A moveable substrate includes a levitation stabilizing structure on the substrate that defines an enclosed interior impingement area of the substrate. The moveable substrate is positioned proximate to the stationary support so that the stationary support extends beyond the enclosed interior impingement area and the fluid flow is directed within the enclosed interior impingement area of the moveable substrate. A fluid flow, provided from a pressurized-gas source through the stationary support, impinges on the moveable substrate surface within the enclosed interior impingement area to levitate and expose the moveable substrate to the fluid while restricting the lateral motion of the moveable substrate with the levitation stabilizing structure to deposit a thin film on the moveable substrate.
Abstract translation: 使用大气压原子层沉积在可移动衬底上沉积薄膜的方法提供了一个腔室，其包括支撑可移动衬底的流体流过的固定支撑件。 可移动衬底包括在衬底上的悬浮稳定结构，其限定衬底的封闭内部冲击区域。 可移动基底定位成靠近固定支撑件，使得固定支撑件延伸超过封闭的内部冲击区域，并且流体流动被引导到可移动基底的封闭内部冲击区域内。 从加压气体源通过固定支撑件提供的流体流动冲击在封闭的内部冲击区域内的可移动基底表面上，以悬浮并将可移动基底暴露于流体，同时以悬浮限制可移动基底的横向运动 稳定结构以在可移动基底上沉积薄膜。
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公开(公告)号：US20160237563A1
公开(公告)日：2016-08-18
申请号：US14621423
申请日：2015-02-13
Applicant: Eastman Kodak Company
Inventor： Kurt D. Sieber , Kam Chuen Ng , Ronald Steven Cok
IPC: C23C16/458 , C23C16/44 , C23C16/455
CPC classification number: C23C16/4584 , C23C16/4412 , C23C16/45544 , C23C16/45574 , C23C16/45576 , C23C16/458 , C23C16/4581 , C23C16/4585 , C23C16/4586
Abstract: A thin film deposition system for depositing a thin film on a moveable substrate using atmospheric pressure atomic-layer deposition includes a chamber and a moveable substrate having a levitation stabilizing structure located on the moveable substrate that defines an enclosed interior impingement area of the moveable substrate. A stationary support, located in the chamber, supports the moveable substrate. The stationary support extends beyond the enclosed interior impingement area. A pressurized-fluid source provides a fluid flow through the stationary support that impinges on the moveable substrate within the enclosed interior impingement area of the moveable substrate sufficient to levitate the moveable substrate and expose the moveable substrate to the fluid while restricting the lateral motion of the moveable substrate with the levitation stabilizing structure.
Abstract translation: 用于使用大气压原子层沉积在可移动基底上沉积薄膜的薄膜沉积系统包括室和可移动基板，其具有位于可移动基板上的悬浮稳定结构，其限定可移动基板的封闭内部冲击区域。 位于腔室中的固定支撑件支撑可移动基底。 固定支撑件延伸超出封闭的内部冲击区域。 加压流体源提供穿过固定支撑件的流体流动，其冲击在可移动基板的封闭内部冲击区域内的可移动基板上，足以悬浮可移动基板并将可移动基板暴露于流体，同时限制可移动基板的横向运动 具有悬浮稳定结构的可移动基板。
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57.发明申请METAL DOPING OF AMORPHOUS CARBON AND SILICON FILMS USED AS HARDMASKS IN SUBSTRATE PROCESSING SYSTEMS 有权在基板处理系统中用作非晶态碳和硅膜的金属掺杂
公开(公告)号：US20160225632A1
公开(公告)日：2016-08-04
申请号：US14612750
申请日：2015-02-03
Applicant: LAM RESEARCH CORPORATION
Inventor： Fayaz Shaikh , Sirish Reddy , Alice Hollister
IPC: H01L21/308 , C23C16/458 , H01L21/3065 , C23C16/50 , H01L21/02 , H01J37/32 , C23C16/52
CPC classification number: C23C16/458 , C23C16/24 , C23C16/26 , C23C16/50 , C23C16/52 , H01J37/32082 , H01J37/32449 , H01L21/02115 , H01L21/02274 , H01L21/033 , H01L21/32055
Abstract: Systems and methods for depositing a metal-doped amorphous carbon hardmask film or a metal-doped amorphous silicon hardmask film includes arranging a substrate in a processing chamber; supplying a carrier gas to the processing chamber; supplying a hydrocarbon precursor gas or a silicon precursor gas to the processing chamber, respectively; supplying a metal-based precursor gas to the processing chamber; one of creating or supplying plasma in the processing chamber; and depositing a metal-doped amorphous carbon hardmask film or a metal-doped amorphous silicon hardmask film on the substrate, respectively.
Abstract translation: 用于沉积金属掺杂的无定形碳硬掩模薄膜或金属掺杂的非晶硅硬掩模薄膜的系统和方法包括将基底布置在处理腔中; 向所述处理室供应载气; 分别向处理室供应烃前体气体或硅前体气体; 向处理室供应金属前体气体; 在处理室中产生或供应等离子体之一; 以及分别在衬底上沉积金属掺杂的无定形碳硬掩模膜或金属掺杂的非晶硅硬掩模膜。
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公开(公告)号：US09394605B1
公开(公告)日：2016-07-19
申请号：US14339121
申请日：2014-07-23
Applicant: QUANTUM INNOVATIONS, INC.
Inventor： Norman L. Kester , Cliff J. Leidecker , John B. Glarum
CPC classification number: C23C16/458 , C23C14/50 , C23C14/568
Abstract: A deposition system includes a system housing having a housing interior, a fixture transfer assembly having a generally sloped fixture transfer rail extending through the housing interior, a plurality of processing chambers connected by the fixture transfer rail, a controller interfacing with the processing chambers and at least one fixture carrier assembly carried by the fixture transfer rail and adapted to contain at least one substrate. The fixture carrier assembly travels along the fixture transfer rail under influence of gravity. A deposition method is also disclosed.
Abstract translation: 沉积系统包括具有壳体内部的系统壳体，具有延伸穿过壳体内部的大致倾斜的固定件传送轨道的固定件传送组件，通过夹具传送轨道连接的多个处理室，与处理室相连接的控制器 由夹具传送轨道承载并适于容纳至少一个基底的至少一个夹具托架组件。 夹具支架组件在重力的影响下沿夹具传送轨道行进。 还公开了一种沉积方法。
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59.发明申请Substrate Processing Apparatus, Gas Dispersion Unit, Method of Manufacturing Semiconductor Device and Non-Transitory Computer-Readable Recording Medium 审中-公开基板处理装置，气体分散单元，制造半导体器件的方法和非瞬时计算机可读记录介质
公开(公告)号：US20160201193A1
公开(公告)日：2016-07-14
申请号：US14669982
申请日：2015-03-26
Applicant: Hitachi Kokusai Electric Inc.
Inventor： Shuhei SAIDO
IPC: C23C16/455 , C23C16/458 , C23C16/50
CPC classification number: C23C16/455 , C23C16/34 , C23C16/45544 , C23C16/45574 , C23C16/458 , C23C16/50
Abstract: Characteristics of a film formed on a substrate and a manufacturing throughput can be improved. A substrate processing apparatus includes a process chamber configured to process a substrate; a substrate placement unit; and a gas dispersion unit, the gas dispersion unit including: a first supply region facing the substrate and including a first gas dispersion hole configured to supply a first gas and a second gas dispersion hole configured to supply a second gas; and a second supply region facing a portion of a surface of the substrate placement unit outer than a portion of the surface of the substrate placement unit occupied by the substrate and including a third gas dispersion hole having a diameter greater than that of the second gas dispersion hole and configured to supply the second gas.
Abstract translation: 可以提高在基板上形成的膜的特性和制造能力。 基板处理装置包括：处理室，被配置为处理基板; 衬底放置单元; 气体分散单元，所述气体分散单元包括：与所述基板相对的第一供应区域，并且包括构造成供应第一气体的第一气体分散孔和被配置为供应第二气体的第二气体分散孔; 以及面对衬底放置单元的表面的一部分的第二供应区域，其比由衬底占据的衬底放置单元的表面的一部分外部包括直径大于第二气体分散体的直径的第三气体分散孔 并配置成供应第二气体。
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公开(公告)号：US09390910B2
公开(公告)日：2016-07-12
申请号：US14549380
申请日：2014-11-20
Applicant: Applied Materials, Inc.
Inventor： Prashant Kumar Kulshreshtha , Sudha Rathi , Praket P. Jha , Saptarshi Basu , Kwangduk Douglas Lee , Martin J. Seamons , Bok Hoen Kim , Ganesh Balasubramanian , Ziqing Duan , Lei Jing , Mandar B. Pandit
IPC: H01L21/443 , H01L21/02 , H01L21/66 , H01L21/033 , C23C16/458 , C23C16/46 , C23C16/455
CPC classification number: H01L21/02274 , C23C16/04 , C23C16/26 , C23C16/455 , C23C16/45502 , C23C16/45508 , C23C16/45565 , C23C16/458 , C23C16/4584 , C23C16/4586 , C23C16/46 , H01L21/02115 , H01L21/0337 , H01L21/31144 , H01L22/12
Abstract: Methods for modulating local stress and overlay error of one or more patterning films may include modulating a gas flow profile of gases introduced into a chamber body, flowing gases within the chamber body toward a substrate, rotating the substrate, and unifying a center-to-edge temperature profile of the substrate by controlling the substrate temperature with a dual zone heater. A chamber for depositing a film may include a chamber body comprising one or more processing regions. The chamber body may include a gas distribution assembly having a blocker plate for delivering gases into the one or more processing regions. The blocker plate may have a first region and a second region, and the first region and second region each may have a plurality of holes. The chamber body may have a dual zone heater.
Abstract translation: 用于调制一个或多个图案化膜的局部应力和覆盖误差的方法可以包括调节引入室主体的气体的气流分布，将腔体内的气体朝向衬底流动，旋转衬底， 通过使用双区加热器控制基板温度，来实现基板的边缘温度分布。 用于沉积膜的室可以包括包括一个或多个处理区域的室主体。 腔室主体可以包括气体分配组件，其具有用于将气体输送到一个或多个处理区域中的阻挡板。 阻挡板可以具有第一区域和第二区域，并且第一区域和第二区域各自可以具有多个孔。 腔体可以具有双区加热器。
