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公开(公告)号:US07514204B2
公开(公告)日:2009-04-07
申请号:US11976279
申请日:2007-10-23
申请人: Jun Hatakeyama , Wataru Kusaki , Yuji Harada , Takao Yoshihara
发明人: Jun Hatakeyama , Wataru Kusaki , Yuji Harada , Takao Yoshihara
CPC分类号: G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要: A resist composition comprises a polymer which increases its alkali solubility under the action of an acid as a base resin, and a copolymer comprising recurring units containing a sulfonic acid amine salt and recurring units containing at least one fluorine atom as an additive. The composition is suited for immersion lithography.
摘要翻译: 抗蚀剂组合物包含在酸作为基础树脂的作用下增加其碱溶解性的聚合物,以及包含含有磺酸胺盐的重复单元和含有至少一个氟原子作为添加剂的重复单元的共聚物。 该组合物适用于浸没光刻。
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公开(公告)号:US20090081588A1
公开(公告)日:2009-03-26
申请号:US12236359
申请日:2008-09-23
申请人: Jun Hatakeyama , Koji Hasegawa , Takeru Watanabe , Yuji Harada
发明人: Jun Hatakeyama , Koji Hasegawa , Takeru Watanabe , Yuji Harada
CPC分类号: G03F7/0382 , G03F7/0046 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/2041 , Y10S430/108 , Y10S430/111 , Y10S430/143
摘要: A resist composition comprises a base polymer which changes its alkali solubility under the action of an acid, and an additive copolymer comprising recurring units (a) and (b). R1 is F or CF3, R2 and R3 are H or alkyl or form a ring, R4 is H or an acid labile group, R5 to R6 are H, F, or alkyl, or two of R5 to R8 may together form a ring, m=0 or 1, 0.2≦a≦0.8, and 0.1≦b 0.6. A resist film of the composition has good barrier property against water so that leaching of the resist film with water is controlled, minimizing a change of pattern profile due to leach-out.
摘要翻译: 抗蚀剂组合物包含在酸的作用下改变其碱溶解性的基础聚合物和包含重复单元(a)和(b)的添加剂共聚物。 R1是F或CF3,R2和R3是H或烷基或形成环,R4是H或酸不稳定基团,R5至R6是H,F或烷基,或R5至R8中的两个可以一起形成环, m = 0或1,0.2 <= a <= 0.8,0.1 <= b 0.6。 该组合物的抗蚀剂膜对水具有良好的阻隔性,从而控制抗蚀剂膜与水的浸出,从而最小化由于浸出而导致的图案轮廓的变化。
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公开(公告)号:US20080118860A1
公开(公告)日:2008-05-22
申请号:US11905763
申请日:2007-10-03
申请人: Yuji Harada , Jun Hatakeyama , Takao Yoshihara , Wataru Kusaki , Tomohiro Kobayashi , Koji Hasegawa
发明人: Yuji Harada , Jun Hatakeyama , Takao Yoshihara , Wataru Kusaki , Tomohiro Kobayashi , Koji Hasegawa
CPC分类号: G03F7/0397 , C08F24/00 , C08F220/32 , G03F7/0046 , G03F7/11 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要: To a resist composition, an alkali-soluble polymer having fluorinated ester-containing lactone units incorporated therein is included as an additive. The resist composition forms a resist film having a reduced contact angle after development. The resist film prevents water penetration during immersion lithography.
摘要翻译: 作为添加剂,作为抗蚀剂组合物,含有含有含氟酯的内酯单元的碱溶性聚合物。 抗蚀剂组合物形成显影后具有降低的接触角的抗蚀剂膜。 抗蚀剂膜防止浸渍光刻时的水渗透。
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公开(公告)号:US20080090173A1
公开(公告)日:2008-04-17
申请号:US11905726
申请日:2007-10-03
申请人: Yuji Harada , Jun Hatakeyama , Wataru Kusaki
发明人: Yuji Harada , Jun Hatakeyama , Wataru Kusaki
CPC分类号: G03F7/2041 , C08F220/10 , C08F220/22 , C08F220/28 , G03F7/0046 , G03F7/0397 , G03F7/11
摘要: A resist composition comprising an alkali-soluble polymer having lactone units incorporated therein as an additive forms a resist film which has on its surface a reduced contact angle after development and prevents water penetration during immersion lithography.
摘要翻译: 包含其中掺入作为添加剂的具有内酯单元的碱溶性聚合物的抗蚀剂组合物形成抗蚀剂膜,其表面在显影后具有降低的接触角,并防止浸渍光刻期间的水渗透。
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公开(公告)号:US20070026341A1
公开(公告)日:2007-02-01
申请号:US11492957
申请日:2006-07-26
申请人: Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masayuki Endo , Masaru Sasago , Haruhiko Komoriya , Michitaka Ootani , Satoru Miyazawa , Kazuhiko Maeda
发明人: Jun Hatakeyama , Yuji Harada , Yoshio Kawai , Masayuki Endo , Masaru Sasago , Haruhiko Komoriya , Michitaka Ootani , Satoru Miyazawa , Kazuhiko Maeda
IPC分类号: G03C1/00
CPC分类号: G03F7/11 , G03F7/0046 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要: A resist protective coating material is provided comprising an α-trifluoromethylacrylic acid/norbornene copolymer having cyclic perfluoroalkyl groups as pendant. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography.
摘要翻译: 提供抗蚀剂保护涂层材料,其包含具有环状全氟烷基的α-三氟甲基丙烯酸/降冰片烯共聚物作为侧基。 在图案形成过程中,材料在抗蚀剂膜上形成保护性涂层,其是不溶于水的,可溶于碱性显影剂中并且与抗蚀剂膜不混溶,从而有效地实施浸渍光刻。
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公开(公告)号:US20050233254A1
公开(公告)日:2005-10-20
申请号:US11105510
申请日:2005-04-14
申请人: Jun Hatakeyama , Yuji Harada
发明人: Jun Hatakeyama , Yuji Harada
CPC分类号: G03F7/11 , G03F7/2041
摘要: In an immersion lithography process, a pattern is formed by forming a photoresist layer on a wafer, forming a protective coating on the photoresist layer from a resist overcoat material, exposing the layer structure to light in water, and developing. A water-insoluble, alkali-soluble material is used as the resist overcoat material.
摘要翻译: 在浸没式光刻工艺中,通过在晶片上形成光致抗蚀剂层形成图案,在抗蚀剂外涂层材料上在光致抗蚀剂层上形成保护涂层,将层结构暴露于水中并进行显影。 使用水不溶性碱溶性材料作为抗蚀剂外涂层材料。
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公开(公告)号:US06875556B2
公开(公告)日:2005-04-05
申请号:US10690777
申请日:2003-10-23
申请人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Satoru Miyazawa
发明人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Shinji Kishimura , Kazuhiko Maeda , Haruhiko Komoriya , Satoru Miyazawa
IPC分类号: C08F220/26 , C08F228/02 , C08F232/04 , C08F236/20 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号: G03F7/0046 , G03F7/0392 , G03F7/0397 , Y10S430/108 , Y10S430/111
摘要: A resist composition comprising as the base resin a blend of a fluorinated polymer which is sensitive to high-energy radiation and highly transparent at a wavelength of up to 200 nm and a sulfonate-containing polymer exhibiting a high contrast upon alkali dissolution is improved in transparency and alkali dissolution contrast as well as plasma etching resistance.
摘要翻译: 抗蚀剂组合物包含作为基础树脂的在高达200nm的波长下对高能量辐射敏感且高度透明的含氟聚合物的共混物和在碱溶解时显示出高对比度的含磺酸盐的聚合物的透明度 和碱溶性对比度以及等离子体耐蚀刻性。
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公开(公告)号:US08323872B2
公开(公告)日:2012-12-04
申请号:US11451498
申请日:2006-06-13
申请人: Jun Hatakeyama , Takeru Watanabe , Yuji Harada
发明人: Jun Hatakeyama , Takeru Watanabe , Yuji Harada
CPC分类号: G03F7/11 , G03F7/0046 , G03F7/2041
摘要: A resist protective coating material is provided comprising a polymer having a partial structure of formula (1) wherein R0 is H, F, alkyl or alkylene, and R1 is fluorinated alkyl or alkylene. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography. During alkali development, development of the resist film and removal of the protective coating can be simultaneously achieved.
摘要翻译: 提供抗蚀剂保护涂层材料,其包含具有式(1)的部分结构的聚合物,其中R 0是H,F,烷基或亚烷基,R 1是氟化烷基或亚烷基。 在图案形成过程中,材料在抗蚀剂膜上形成保护性涂层,其是不溶于水的,可溶于碱性显影剂中并且与抗蚀剂膜不混溶,从而有效地实施浸渍光刻。 在碱显影过程中,可以同时实现抗蚀剂膜的开发和保护涂层的去除。
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公开(公告)号:US20100266957A1
公开(公告)日:2010-10-21
申请号:US12761202
申请日:2010-04-15
申请人: Yuji HARADA , Jun Hatakeyama , Koji Hasegawa , Tomohiro Kobayashi
发明人: Yuji HARADA , Jun Hatakeyama , Koji Hasegawa , Tomohiro Kobayashi
CPC分类号: G03F7/0397 , G03F7/0046 , G03F7/2041
摘要: An additive polymer comprising recurring units of formula (1) is added to a resist composition comprising a base resin, a photoacid generator, and an organic solvent. R1 is hydrogen or methyl, R2 is alkylene or fluoroalkylene, and R3 is fluoroalkyl. The additive polymer is highly transparent to radiation with wavelength of up to 200 nm. Water repellency, water slip, acid lability, hydrolysis and other properties of the polymer may be adjusted by a choice of polymer structure.
摘要翻译: 将包含式(1)的重复单元的添加剂聚合物加入到包含基础树脂,光致酸发生剂和有机溶剂的抗蚀剂组合物中。 R1是氢或甲基,R2是亚烷基或氟代亚烷基,R3是氟烷基。 添加剂聚合物对波长高达200nm的辐射是高度透明的。 通过选择聚合物结构可以调节聚合物的拒水性,水滑动性,酸性,水解性和其它性能。
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公开(公告)号:US07771914B2
公开(公告)日:2010-08-10
申请号:US11872952
申请日:2007-10-16
申请人: Jun Hatakeyama , Takao Yoshihara , Yuji Harada , Wataru Kusaki
发明人: Jun Hatakeyama , Takao Yoshihara , Yuji Harada , Wataru Kusaki
CPC分类号: G03F7/0397 , C08F220/10 , G03F7/0046 , G03F7/0382 , G03F7/0392 , Y10S430/108 , Y10S430/111 , Y10S430/143
摘要: A resist composition comprises a polymer comprising recurring units having formula (1) wherein R1, R4, R7, and R14 are H or methyl, R2, R3, R15, and R16 are H, alkyl or fluoroalkyl, R is F or H, R5 is alkylene, R6 is fluorinated alkyl, R8 is a single bond or alkylene, R10 and R11 are H, F, methyl or trifluoromethyl, R12 and R13 are a single bond, —O— or —CR18R19—, R9, R18, and R19 are H, F, methyl or trifluoromethyl, R17 is alkylene, X1, X2 and X3 are —C(═O)—O—, —O—, or —C(═O)—R20—C(═O)—O— wherein R20 is alkylene, 0≦(a-1)
摘要翻译: 抗蚀剂组合物包含含有式(1)的重复单元的聚合物,其中R 1,R 4,R 7和R 14为H或甲基,R 2,R 3,R 15和R 16为H,烷基或氟代烷基,R为F或H,R 5 是亚烷基,R6是氟化烷基,R8是单键或亚烷基,R10和R11是H,F,甲基或三氟甲基,R12和R13是单键,-O-或-CR18R19-,R9,R18和R19 是H,F,甲基或三氟甲基,R 17是亚烷基,X 1,X 2和X 3是-C(= O)-O-,-O-或-C(= O)-R 20 -C(= O)-O (a-1)+(a-2)+(a-1)+(a-2)+(a-2) (a-3)<1,0
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