公开(公告)号：US20200257206A1

公开(公告)日：2020-08-13

申请号：US16859584

申请日：2020-04-27

Applicant: Magic Leap, Inc.

Inventor： Vikramjit Singh ,  Michael Nevin Miller ,  Frank Y. Xu ,  Shuqiang Yang

IPC: G03F7/20 ,  G02B1/118 ,  G03F7/00

Abstract: An imprint lithography method of configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate for changing an effective refractive index of the substrate and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate such that a relative amount of light transmittable through the substrate is changed by a selected amount.

公开(公告)号：US20180059297A1

公开(公告)日：2018-03-01

申请号：US15683706

申请日：2017-08-22

Applicant: Magic Leap, Inc.

Inventor： Christophe Peroz ,  Mauro Melli ,  Vikramjit Singh ,  David Jurbergs ,  Jeffrey Dean Schmulen ,  Zongxing Wang ,  Shuqiang Yang ,  Frank Y. Xu ,  Kang Luo ,  Marlon Edward Menezes ,  Michael Nevin Miller

IPC: G02B5/18 ,  F21V8/00 ,  G02B27/01

Abstract: A method of manufacturing a waveguide having a combination of a binary grating structure and a blazed grating structure includes cutting a substrate off-axis, depositing a first layer on the substrate, and depositing a resist layer on the first layer. The resist layer includes a pattern. The method also includes etching the first layer in the pattern using the resist layer as a mask. The pattern includes a first region and a second region. The method further includes creating the binary grating structure in the substrate in the second region and creating the blazed grating structure in the substrate in the first region.