利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

77 条记录 (耗时 0.054 秒)

    Lithographic apparatus and device manufacturing method
    61.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20080246936A1

    公开(公告)日：2008-10-09

    申请号：US11783115

    申请日：2007-04-05

    申请人： Erik Roelof Loopstra ,  Henrikus Herman Marie Cox ,  Jeroen Johannes Sophia Maria Mertens ,  Wilhelmus Franciscus Johannes Simons ,  Paul Petrus Joannes Berkvens

    发明人： Erik Roelof Loopstra ,  Henrikus Herman Marie Cox ,  Jeroen Johannes Sophia Maria Mertens ,  Wilhelmus Franciscus Johannes Simons ,  Paul Petrus Joannes Berkvens

    IPC分类号： G03B27/42

    CPC分类号： G05B19/404 ,  G03F7/70725 ,  G03F7/709 ,  G05B2219/45031 ,  G05B2219/49189

    摘要： A position control system for a substrate support of a lithographic apparatus includes a position measurement system configured to determine a position of a sensor or sensor target on the substrate support, a controller configured to provide a control signal based on a desired position of a target portion of the substrate and the determined position, and one or more actuators configured to act on the substrate support. The position control system includes a stiffness compensation model of the substrate support, the stiffness compensation model including a relation between a difference in a change in position of the target portion and a change in position of the sensor or sensor target as a result of a force exerted on the substrate support. The position control system is configured to substantially correct at least during projection of a patterned radiation beam on the target portion, the position of the target portion using the stiffness compensation model.

    摘要翻译： 用于光刻设备的基板支撑件的位置控制系统包括：位置测量系统，被配置为确定传感器或传感器目标在基板支撑件上的位置;控制器，被配置为基于目标部分的期望位置提供控制信号 和一个或多个致动器构造成作用在基板支撑件上。 所述位置控制系统包括所述基板支撑件的刚度补偿模型，所述刚度补偿模型包括所述目标部分的位置变化的差异与所述传感器或传感器目标的位置变化之间的关系 施加在基板支撑件上。 位置控制系统被配置为至少在图案化的辐射束在目标部分上的投影期间基本上校正，目标部分的位置使用刚度补偿模型。

    Actuator assembly and lithographic apparatus comprising such an actuator assembly
    62.
    发明授权
    Actuator assembly and lithographic apparatus comprising such an actuator assembly 有权
    包括这种致动器组件的致动器组件和光刻设备

    公开(公告)号：US07167234B2

    公开(公告)日：2007-01-23

    申请号：US10967306

    申请日：2004-10-19

    申请人： Henrikus Herman Marie Cox ,  Sven Antoin Johan Hol ,  Hernes Jacobs

    发明人： Henrikus Herman Marie Cox ,  Sven Antoin Johan Hol ,  Hernes Jacobs

    IPC分类号： G03B27/58 ,  G03B27/62

    CPC分类号： G03F7/70758

    摘要： An actuator assembly includes a coil moveably positionable in a magnetic field generated by a magnet assembly, each of the coil and the magnet having substantially only one side facing the other. A magnetized field-shaping element is provided for shaping the magnetic field such that the magnetic field is substantially perpendicular to the direction of the electrical current for generating a force in a first degree of freedom. Thus, the coil may easily be mounted, since it does not need to be enclosed by magnet poles.

    摘要翻译： 致动器组件包括能够由磁体组件产生的磁场中的可移动地定位的线圈，线圈和磁体中的每一个基本上只有一个面朝向另一侧。 提供磁化场成形元件用于使磁场成形，使得磁场基本上垂直于用于产生第一自由度的电流的方向。 因此，线圈可以容易地安装，因为它不需要被磁极包围。

    Lithographic actuator mechanism, lithographic apparatus, and device manufacturing method
    63.
    发明授权
    Lithographic actuator mechanism, lithographic apparatus, and device manufacturing method 有权
    光刻致动器机构，光刻设备和器件制造方法

    公开(公告)号：US07079226B2

    公开(公告)日：2006-07-18

    申请号：US10797568

    申请日：2004-03-11

    申请人： Patricia Vreugdewater ,  Sven Antoin Johan Hol ,  Henrikus Herman Marie Cox

    发明人： Patricia Vreugdewater ,  Sven Antoin Johan Hol ,  Henrikus Herman Marie Cox

    IPC分类号： G03B27/58 ,  G03B27/62

    CPC分类号： G03F7/70758 ,  G03F7/70858

    摘要： The present invention relates to a Lorentz actuator in the context of a lithographic projection apparatus. The present invention improves the thermal performance of a Lorentz actuator over the prior art by employing a plurality of coils, separated by separation layers of high thermal conductivity material in good thermal contact with a cooling element. In this way, heat flows more quickly from hotspot regions near the center of the coils into the cooling element. According to an embodiment of the invention, the cooling element is arranged to be in line with the separation layers so as to optimize the thermal connection between these two members. It is found that splitting a parent coil into two coils provides a practical balance between improved thermal performance and undesirable increases in volume and complexity.

    摘要翻译： 本发明涉及在光刻投影装置的上下文中的洛伦兹致动器。 本发明通过采用多个线圈来提高洛伦兹致动器的热性能，该多个线圈由与散热元件良好热接触的高热导率材料的分离层隔开。 以这种方式，热量从线圈中心附近的热点区域更快地流入冷却元件。 根据本发明的实施例，冷却元件布置成与分离层成一直线，以便优化这两个构件之间的热连接。 发现将母线圈分成两个线圈提供了改进的热性能和不期望的体积和复杂性增加之间的实际平衡。

    Positioning system, a lithographic apparatus and a method for positional control
    64.
    发明授权
    Positioning system, a lithographic apparatus and a method for positional control 有权
    定位系统，光刻设备和位置控制方法

    公开(公告)号：US09229339B2

    公开(公告)日：2016-01-05

    申请号：US13301505

    申请日：2011-11-21

    申请人： Hans Butler ,  Henrikus Herman Marie Cox

    发明人： Hans Butler ,  Henrikus Herman Marie Cox

    IPC分类号： G03F7/20 ,  G03B27/53 ,  G03B27/58

    CPC分类号： G03F7/70775 ,  G03B27/53 ,  G03B27/58 ,  G03F7/70725

    摘要： A positioning system for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the positioning system including: a measuring device configured to determine an error in the momentary position of one of the components with respect to a setpoint position in a measurement coordinate; and a controller configured to control movement of the other component in a control coordinate based on the determined error; wherein the measurement coordinate is different from the control coordinate.

    摘要翻译： 一种用于控制光刻设备的第一部件和第二部件之间的相对位置的定位系统，其中每个部件的位置由一组正交坐标定义，所述定位系统包括：测量装置，其被配置为确定 相对于测量坐标中的设定点位置的部件之一的瞬时位置; 以及控制器，被配置为基于所确定的误差来控制所述另一部件在控制坐标中的移动; 其中测量坐标与控制坐标不同。

    Method for positioning an object by an electromagnetic motor, stage apparatus and lithographic apparatus
    65.
    发明授权
    Method for positioning an object by an electromagnetic motor, stage apparatus and lithographic apparatus 有权
    用于通过电磁马达，平台装置和光刻设备定位物体的方法

    公开(公告)号：US08982327B2

    公开(公告)日：2015-03-17

    申请号：US13330161

    申请日：2011-12-19

    申请人： Henrikus Herman Marie Cox ,  Thomas Augustus Mattaar

    发明人： Henrikus Herman Marie Cox ,  Thomas Augustus Mattaar

    IPC分类号： G03B27/32 ,  G03B27/54 ,  G03F7/20

    CPC分类号： G03B27/32 ,  G03B27/54 ,  G03F7/70725 ,  G03F7/70758

    摘要： A method to enable positioning of an object by a positioning device that includes an electromagnetic motor to control the position of the object in a lithographic apparatus, the method including receiving desired motor signals at the electromagnetic motor to produce a plurality of primary forces and a pitch torque associated with the primary forces within a motor control cycle, wherein for the motor control cycle, the pitch torque is based on either the primary forces to be generated by the electromagnetic motor or the desired forces and torques for positioning the object; and in response to the desired motor signals, causing the electromagnetic motor to generate the primary forces, wherein prior to the primary forces are determined for a next motor control cycle, the desired forces and torques for positioning the object are modified using the pitch torque associated with a previous motor control cycle.

    摘要翻译： 一种能够通过包括电磁马达的定位装置来定位物体的方法，以控制物体在光刻设备中的位置，该方法包括在电磁马达处接收所需的马达信号以产生多个主力和俯仰 与电动机控制周期内的主力相关联的扭矩，其中对于电动机控制循环，俯仰转矩基于要由电磁电动机产生的主要力或用于定位物体的期望力和扭矩; 并且响应于期望的电动机信号，使得电磁电动机产生主力，其中在为下一个电动机控制循环确定主力之前，用于定位物体的期望力和转矩使用相关的俯仰转矩来修改 与以前的电机控制周期。