Abstract:
An exemplary thin film transistor (TFT) array substrate includes a glass substrate (430), a semiconductor layer (440) formed on the glass substrate, a gate insulating layer (407) formed on the semiconductor layer, and a plurality of gate electrodes (410) and common electrodes (411) formed on the gate insulating layer. A portion of the gate insulating layer corresponding to the common electrode includes introduced impurities to enhance a dielectric constant thereof. A method for manufacturing the TFT array substrate is also provided.