公开(公告)号：US3950431A

公开(公告)日：1976-04-13

申请号：US399248

申请日：1973-09-20

申请人： Hideaki Suda ,  Iwao Dohgane ,  Takashi Chinuki ,  Kenji Tanimoto ,  Hirokazu Hosaka ,  Yukimichi Nakao ,  Yuji Ueda ,  Seiya Imada ,  Hideki Yanagihara ,  Kunihiko Tanaka

发明人： Hideaki Suda ,  Iwao Dohgane ,  Takashi Chinuki ,  Kenji Tanimoto ,  Hirokazu Hosaka ,  Yukimichi Nakao ,  Yuji Ueda ,  Seiya Imada ,  Hideki Yanagihara ,  Kunihiko Tanaka

IPC分类号： C07C409/12 ,  B01D11/04 ,  C07C67/00 ,  C07C407/00 ,  C07C179/02

CPC分类号： C07C45/80 ,  B01D11/0488 ,  C07C407/00 ,  C07C407/003

摘要： Impurities, that is, by-products, in an oxidation product solution obtained by oxidation of diisopropylbenzene by molecular oxygen or in the oxidation product solution freed from diisopropylbenzene dihydroperoxide, are removed by extracting the by-products such as carbinols, ketones and styrenes from the solution with a mixture of an aqueous alkaline solution and at least one of alcohols having 1 to 3 carbon atoms such as methanol, ethanol, and isopropanol, as an extracting reagent at a temperature of 20.degree. to 80.degree.C.

摘要翻译： 通过用分子氧氧化二异丙基苯或通过从二异丙基苯二氢过氧化物中除去的氧化产物溶液获得的氧化产物溶液中的杂质，即副产物，通过从副产物溶液中提取副产物，例如甲醇，酮和苯乙烯 溶液与碱性水溶液和至少一种具有1至3个碳原子的醇的混合物如甲醇，乙醇和异丙醇作为萃取剂，在20至80℃的温度下进行。

公开(公告)号：US3932528A

公开(公告)日：1976-01-13

申请号：US391873

申请日：1973-08-27

申请人： Hideaki Suda ,  Iwao Dohgane ,  Takashi Chinuki ,  Kenji Tanimoto ,  Hirokazu Hosaka ,  Yukimichi Nakao ,  Yuji Ueda ,  Seiya Imada ,  Hideki Yanagihara ,  Kunihiko Tanaka

发明人： Hideaki Suda ,  Iwao Dohgane ,  Takashi Chinuki ,  Kenji Tanimoto ,  Hirokazu Hosaka ,  Yukimichi Nakao ,  Yuji Ueda ,  Seiya Imada ,  Hideki Yanagihara ,  Kunihiko Tanaka

IPC分类号： C07C409/12 ,  C07C67/00 ,  C07C407/00 ,  C07C179/02

CPC分类号： C07C407/006 ,  C07C407/003

摘要： Dihydroperoxides of dialkylaromatic hydrocarbons are separated in high yield from an aqueous alkaline solutions of hydroperoxides containing the dihydroperoxides by adding 0.01 to 1 % by weight of a compound having a nitrogen base, such as ammonia and aromatic amines, to the solution, based on the weight of the solution, thereby stabilizing the dihydroperoxides in the solution, and separating the dihydroperoxides therefrom by extraction.

摘要翻译： 基于重量，通过向溶液中加入0.01至1重量％的具有氮碱的化合物（例如氨和芳族胺），将二烷基芳烃的二氢​​过氧化物以高产率与含有二氢过氧化物的氢过氧化物的碱性水溶液分离。 的溶液，从而稳定溶液中的二氢过氧化物，并通过萃取从其中分离二氢过氧化物。

公开(公告)号：US08536540B2

公开(公告)日：2013-09-17

申请号：US13381953

申请日：2010-05-14

申请人： Makoto Suzuki ,  Kenji Tanimoto ,  Takuma Yamamoto

发明人： Makoto Suzuki ,  Kenji Tanimoto ,  Takuma Yamamoto

IPC分类号： H01J37/26

CPC分类号： H01J37/28 ,  H01J37/026 ,  H01J37/20 ,  H01J2237/004 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： Since charging characteristics differ between the outer circumferential portion and the center portion of a sample to be inspected, equivalent inspection sensitivities cannot be obtained in the outer circumferential portion and the center portion of the sample to be inspected. A sample cover is provided in the outer circumferential portion of a sample holder on which the sample to be inspected is placed. Charging characteristics of the sample cover are changed according to charging characteristics of the sample to be inspected. Consequently, uniform charged states can be formed in the outer circumferential portion and the center portion of the sample. Inspection/observation of the outer circumferential portion of the sample can be realized at higher sensitivity than in the past.

摘要翻译： 由于待检查样品的外周部分和中心部分的充电特性不同，所以待检样品的外周部分和中心部分不能获得相同的检查灵敏度。 在待检测样品放置的样品架的外周部设置有样品盖。 样品盖的充电特性根据待检样品的充电特性而改变。 因此，可以在样品的外周部分和中心部分形成均匀的带电状态。 可以以比以往更高的灵敏度实现样品的外周部的检查/观察。

公开(公告)号：US20120126118A1

公开(公告)日：2012-05-24

申请号：US13381953

申请日：2010-05-14

申请人： Makoto Suzuki ,  Kenji Tanimoto ,  Takuma Yamamoto

发明人： Makoto Suzuki ,  Kenji Tanimoto ,  Takuma Yamamoto

IPC分类号： H01J37/26 ,  H01J37/20

CPC分类号： H01J37/28 ,  H01J37/026 ,  H01J37/20 ,  H01J2237/004 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： Since charging characteristics differ between the outer circumferential portion and the center portion of a sample to be inspected, equivalent inspection sensitivities cannot be obtained in the outer circumferential portion and the center portion of the sample to be inspected. A sample cover is provided in the outer circumferential portion of a sample holder on which the sample to be inspected is placed. Charging characteristics of the sample cover are changed according to charging characteristics of the sample to be inspected. Consequently, uniform charged states can be formed in the outer circumferential portion and the center portion of the sample. Inspection/observation of the outer circumferential portion of the sample can be realized at higher sensitivity than in the past.

摘要翻译： 由于待检查样品的外周部分和中心部分的充电特性不同，所以待检样品的外周部分和中心部分不能获得相同的检查灵敏度。 在待检测样品放置的样品架的外周部设置有样品盖。 样品盖的充电特性根据待检样品的充电特性而改变。 因此，可以在样品的外周部分和中心部分形成均匀的带电状态。 可以以比以往更高的灵敏度实现样品的外周部的检查/观察。

公开(公告)号：US07887714B2

公开(公告)日：2011-02-15

申请号：US10015675

申请日：2001-12-17

申请人： Isao Ota ,  Kenji Tanimoto ,  Tohru Nishimura

发明人： Isao Ota ,  Kenji Tanimoto ,  Tohru Nishimura

IPC分类号： C09K13/00

CPC分类号： B82Y30/00 ,  C01F17/0043 ,  C01P2002/01 ,  C01P2002/72 ,  C01P2004/10 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/12 ,  C09G1/02 ,  C09K3/1472

摘要： There is provided an abrasive used for polishing a substrate which comprises silica as a main component, for example a rock crystal, a quartz glass for photomask, for CMP of an organic film, Inter Layer Dielectric (ILD) and shallow trench isolation of a semiconductor device, or for polishing a hard disk made of glass.A sol which particles are dispersed in a medium, wherein the particles have a particle size of 0.005 to 1 μm and comprise as a main component crystalline cerium oxide of the cubic system and as an additional component a lanthanum compound, a neodymium compound or a combination thereof, wherein the additional component is contained in X/(Ce+X) molar ratio of 0.001 to 0.5 in which X is lanthanum atoms, neodymium atoms or a combination thereof.The sol is prepared by reacting an aqueous solution which a cerium (III) salt is mixed with a lanthanum (III) salt and/or a neodymium (III) salt, with an alkaline substance to give a suspension in which cerium (III) hydroxide is homogeneously mixed with lanthanum (III) hydroxide and/or neodymium (III) hydroxide, and blowing oxygen or a gas containing oxygen into the suspension.

摘要翻译： 提供了用于抛光基底的磨料，其包括二氧化硅作为主要成分，例如岩石晶体，用于光掩模的石英玻璃，用于有机膜的CMP，层间介电（ILD）和半导体的浅沟槽隔离 装置或用于抛光由玻璃制成的硬盘。 一种溶胶，其中颗粒分散在介质中，其中颗粒的粒度为0.005至1μm，并且包含作为立方体系的结晶二氧化铈的主要组分，并且作为附加组分的镧化合物，钕化合物或组合 其中所述附加成分以X =（Ce + X）摩尔比为0.001〜0.5，X为镧原子，钕原子或其组合。 通过使铈（III）盐与镧（III）盐和/或钕（III）盐混合的水溶液与碱性物质反应制备溶胶，得到悬浮液，其中氢氧化铈（III） 与氢氧化镧（III）和/或氢氧化钕（III）均匀混合，并将氧气或含有氧的气体吹入悬浮液中。

公开(公告)号：US07765817B2

公开(公告)日：2010-08-03

申请号：US11631859

申请日：2005-11-21

申请人： Masaaki Takegami ,  Satoru Sakae ,  Kenji Tanimoto

发明人： Masaaki Takegami ,  Satoru Sakae ,  Kenji Tanimoto

IPC分类号： F25B49/00

CPC分类号： F25B41/046 ,  F25B1/10 ,  F25B13/00 ,  F25B49/005 ,  F25B2313/0292 ,  F25B2400/0751 ,  F25B2400/22 ,  F25B2500/26 ,  F25B2600/021 ,  F25B2600/23 ,  F25B2700/1933 ,  Y02B30/741

摘要： In a refrigeration system, a first non-inverter compressor (2B) backs up one of an inverter compressor (2A) and a second non-inverter compressor (2C) by switching of a third four-way selector valve (3C). The refrigeration system includes: a suction pressure detection section (81) for detecting the suction pressure of the first non-inverter compressor (2B) after the issue of a switching command to the third four-way selector valve (3C); a command holding section (82) for, when the detected pressure of the suction pressure detection section (81) becomes lower than a predetermined value, determining that the third four-way selector valve (3C) has malfunctioned and holding the switching command; and a compressor standby section (83) for, upon the command holding section (82) holding the switching command, stopping the first non-inverter compressor (2B) and putting it into standby for a predetermined time.

摘要翻译： 在制冷系统中，通过切换第三四通换向阀（3C），第一非变频压缩机（2B）备用逆变器压缩机（2A）和第二非变频压缩机（2C）中的一个。 该制冷系统包括：在向第三四通换向阀（3C）发出切换指令之后，检测第一非变换器压缩机（2B）的吸入压力的吸入压力检测部（81） 指示保持部（82），当所述吸入压力检测部（81）的检测压力变得低于预定值时，确定所述第三四通换向阀（3C）发生故障并保持所述切换命令; 和压缩机待机部分（83），用于在保持切换命令的命令保持部分（82）上停止第一非逆变器压缩机（2B）并将其置于预定时间待机状态。

公开(公告)号：US07578862B2

公开(公告)日：2009-08-25

申请号：US10678093

申请日：2003-10-06

申请人： Isao Ota ,  Tohru Nishimura ,  Kenji Tanimoto

发明人： Isao Ota ,  Tohru Nishimura ,  Kenji Tanimoto

IPC分类号： C09K3/14 ,  C03C19/00 ,  B24B37/00

CPC分类号： C09G1/02 ,  C01F17/0043 ,  C01P2002/72 ,  C01P2004/61 ,  C01P2006/12 ,  C03C19/00 ,  C09K3/1463

摘要： The present invention provides an abrasive compound suitable for polishing the surface of a glass substrate for an optical disk platter or a magnetic disk platter. More specifically, the present invention provides an abrasive compound for a glass hard disk platter, characterized as comprising a stable slurry having water and, dispersed therein as an abrasive, cerium(IV) oxide particles having an average secondary particle size of 0.1 to 0.5 μm and containing CeO2 in a concentration of 0.2 to 30 wt %. Preferably, the present invention provides the above abrasive compound in which cerium amounts for 95% or more in terms of oxides of the total amount of rare earth elements in the abrasive.

摘要翻译： 本发明提供一种适用于抛光用于光盘盘或磁盘盘的玻璃基板的表面的磨料化合物。 更具体地说，本发明提供了一种用于玻璃硬盘盘的磨料化合物，其特征在于包括一种具有水的稳定的浆料，并在其中分散为研磨剂，其平均二次粒径为0.1-0.5μm的氧化铈（IV）颗粒 并含有浓度为0.2〜30重量％的CeO 2。 优选地，本发明提供了上述磨料化合物，其中铈以磨料中稀土元素总量的氧化物计为95％以上。

公开(公告)号：US07534155B2

公开(公告)日：2009-05-19

申请号：US10589819

申请日：2006-01-11

申请人： Hiroyuki Yonehara ,  Masanori Suzuki ,  Makoto Morita ,  Daisuke Adachi ,  Yasuyuki Akata ,  Kenji Tanimoto

发明人： Hiroyuki Yonehara ,  Masanori Suzuki ,  Makoto Morita ,  Daisuke Adachi ,  Yasuyuki Akata ,  Kenji Tanimoto

IPC分类号： H01J9/00

CPC分类号： H01J9/241

摘要： A method of manufacturing display panels includes forming a material layer on a substrate, and baking the material layer formed on substrate which is placed on a supporting bed. The supporting bed is formed of a first supporting bed and a second supporting bed placed on the first supporting bed. A difference in thermal expansion coefficient between the second supporting bed and the substrate is smaller than a difference in thermal expansion coefficient between the first supporting bed and the substrate, and the substrate is placed on the second supporting bed such that the substrate is positioned entirely within the perimeter of the second supporting bed during the baking and heating. This structure allows reduction of scratches on a surface of the substrate.

摘要翻译： 制造显示面板的方法包括在基板上形成材料层，并烘焙形成在放置在支撑床上的基板上的材料层。 支撑床由放置在第一支撑床上的第一支撑床和第二支撑床形成。 第二支撑床和基板之间的热膨胀系数的差异小于第一支撑床和基板之间的热膨胀系数差，并且将基板放置在第二支撑床上，使得基板完全位于 在烘烤和加热期间第二支撑床的周边。 这种结构允许减少基板表面上的划痕。

公开(公告)号：US20090042393A1

公开(公告)日：2009-02-12

申请号：US12285498

申请日：2008-10-07

申请人： Noriyuki Takakuma ,  Isao Ota ,  Kenji Tanimoto

发明人： Noriyuki Takakuma ,  Isao Ota ,  Kenji Tanimoto

IPC分类号： H01L21/306

CPC分类号： C01G25/02 ,  B82Y30/00 ,  C01P2004/64 ,  C09K3/1409 ,  C09K3/1463

摘要： A production method of a semiconductor device including: producing a polishing composition containing zirconium oxide sol; and planarizing a substrate having an uneven surface with said polishing composition, wherein the polishing composition containing zirconium oxide is produced by the steps comprising: baking at a temperature ranging from 400 to 1000° C., a zirconium compound having d50 (where d50 represents a particle diameter meaning that the number of particles having this particle diameter or less is 50% of the total number of particles) of zirconium compound particles of 5 to 25 μm and d99 (where d99 represents a particle diameter meaning that the number of particles having this particle diameter or less is 99% of the total number of particles) of zirconium compound particles of 60 μm or less, wherein d50 and d99 are measured by measuring a slurry of the zirconium compound by a laser diffractometry; and wet-grinding a powder of zirconium oxide obtained in the above baking in an aqueous medium until d50 of zirconium oxide particles becomes 80 to 150 nm and d99 of zirconium oxide particles becomes 150 to 500 nm, wherein d50 and d99 are measured by measuring a slurry of the zirconium compound by a laser diffractometry.

摘要翻译： 一种半导体器件的制造方法，包括：制造含有氧化锆溶胶的研磨用组合物; 并且用所述抛光组合物平坦化具有不平坦表面的衬底，其中所述包含氧化锆的抛光组合物通过以下步骤制备，所述步骤包括：在400至1000℃的温度下焙烧具有d50的锆化合物（其中d50表示 粒径为5〜25μm的锆化合物粒子和d99（d99表示具有该粒子的粒子的粒子数）的粒子总数的50％） 粒径为99％以下的锆化合物粒子为60μm以下，其中d50和d99通过激光衍射法测定锆化合物的浆料来测量; 在水性介质中湿式研磨上述焙烧得到的氧化锆粉末，直到氧化锆粒子的d50为80〜150nm，氧化锆粒子的d99为150〜500nm，其中d50和d99为 锆化合物的浆料通过激光衍射法。

公开(公告)号：US20090007589A1

公开(公告)日：2009-01-08

申请号：US11659121

申请日：2005-08-01

申请人： Masaaki Takegami ,  Takeo Ueno ,  Kenji Tanimoto ,  Satoru Sakae

发明人： Masaaki Takegami ,  Takeo Ueno ,  Kenji Tanimoto ,  Satoru Sakae

IPC分类号： F25B1/00 ,  F25B39/02 ,  F25B41/04

CPC分类号： F25B13/00 ,  F25B2313/0231

摘要： A refrigeration apparatus (1) is provided with a refrigerant circuit (1E) along which are connected a compressor (2), an outdoor heat exchanger (4), an expansion mechanism, an indoor heat exchanger (41) for providing room air conditioning, and a cooling heat exchanger (45, 51) for providing storage compartment cooling. The refrigerant circuit (1E) includes a discharge side three way switch valve (101) for varying the flow rate of a portion of the refrigerant which is discharged out of the compressor (2) and then distributed to the indoor heat exchanger (41) and the outdoor heat exchanger (4) during a heat recovery operation mode in which the indoor heat exchanger (41) and the outdoor heat exchanger (4) operate as condensers. As a result of such arrangement, even when the amount of heat obtained in the cooling heat exchanger (45, 51) exceeds the amount of heat required in the indoor heat exchanger (41), surplus heat is discharged without excessive decrease in the discharge pressure of the compressor (2).

摘要翻译： 制冷装置（1）具备：制冷剂回路（1E），连接有压缩机（2），室外热交换器（4），膨胀机构，室内空调用的室内热交换器（41） 以及用于提供储藏室冷却的冷却热交换器（45,51）。 制冷剂回路（1E）包括排出侧三通切换阀（101），用于改变从压缩机（2）排出的一部分制冷剂的流量，然后分配到室内热交换器（41）和 在室内热交换器（41）和室外热交换器（4）作为冷凝器运转的热回收运转模式中的室外热交换器（4）。 作为这种结构的结果，即使在冷却热交换器（45,51）中获得的热量超过室内热交换器（41）所需的热量的情况下，也可以排出多余的热量而不会使排出压力过度降低 的压缩机（2）。