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    Method for forming coating material formulations substantially comprised of a saturated resin rich phase
    61.
    发明授权
    Method for forming coating material formulations substantially comprised of a saturated resin rich phase 失效
    形成由饱和树脂丰富的相组成的涂料材料配方的方法

    公开(公告)号：US5197800A

    公开(公告)日：1993-03-30

    申请号：US723468

    申请日：1991-06-28

    Applicant: Laurence B. Saidman ,  James C. Smith

    Inventor： Laurence B. Saidman ,  James C. Smith

    IPC: B05B12/14 ,  B05D1/02

    CPC classification number: B05D1/025 ,  B05D2401/90 ,  Y10T137/0329

    Abstract: A method and apparatus for forming and dispensing a coating material formulation containing a liquid coating composition and a supercritical fluid as a diluent comprises a closed vessel having a hollow interior; a system for supplying fluid diluent into the vessel interior and for transforming the fluid diluent into supercritical fluid within the vessel; and, a system for introducing liquid coating composition into the vessel interior in such a way that it is sufficiently exposed to the supercritical fluid to form a fluid diluent rich phase and a liquid coating composition or resin rich phase which is saturated with supercritical fluid up to or near its saturation point for the temperature and pressure conditions within the vessel. The resin rich phase has a higher density than the fluid diluent rich phase and therefore collects on the bottom of the vessel from where it is withdrawn and supplied to coating dispensers for deposition on a substrate. The coating material formulation which is not discharged from the dispensers is preferably recirculated back into the closed vessel in such a way that it is permitted to absorb sufficient supercritical fluid to return to the saturation point.

    Selection of nanoparticles using CO2-expanded liquids
    64.
    发明授权
    Selection of nanoparticles using CO2-expanded liquids 有权
    使用二氧化碳膨胀液体选择纳米颗粒

    公开(公告)号：US08377831B2

    公开(公告)日：2013-02-19

    申请号：US12082189

    申请日：2008-04-08

    Applicant: Christopher B. Roberts ,  Marshall Chandler McLeod ,  Madhu Anand

    Inventor： Christopher B. Roberts ,  Marshall Chandler McLeod ,  Madhu Anand

    IPC: H01L21/31

    CPC classification number: C30B7/00 ,  B05D1/18 ,  B05D2401/32 ,  B05D2401/90 ,  B82Y30/00 ,  C30B7/005 ,  C30B29/605 ,  Y10S977/70 ,  Y10S977/773

    Abstract: A method for size selection of nanostructures comprising utilizing a gas-expanded liquids (GEL) and controlled pressure to precipitate desired size populations of nanostructures, e.g., monodisperse. The GEL can comprise CO2 antisolvent and an organic solvent. The method can be carried out in an apparatus comprising a first open vessel configured to allow movement of a liquid/particle solution to specific desired locations within the vessel, a second pressure vessel, a location controller for controlling location of the particles and solution within the first vessel, a inlet for addition of antisolvent to the first vessel, and a device for measuring the amount of antisolvent added. Also disclosed is a method for forming nanoparticle thin films comprising utilizing a GEL containing a substrate, pressurizing the solution to precipitate and deposit nanoparticles onto the substrate, removing the solvent thereby leaving a thin nanoparticle film, removing the solvent and antisolvent, and drying the film.

    Abstract translation: 纳米结构尺寸选择的方法包括利用气体膨胀液体（GEL）和受控压力来沉淀所需尺寸的纳米结构体，例如单分散。 GEL可以包含CO 2抗溶剂和有机溶剂。 该方法可以在包括构造成允许液体/颗粒溶液移动到容器内的特定所需位置的第一开放容器的设备中进行，第二压力容器，位置控制器，用于控制颗粒和溶液的位置 第一容器，用于向第一容器添加抗溶剂的入口，以及用于测量加入的抗溶剂量的装置。 还公开了一种形成纳米颗粒薄膜的方法，其包括利用含有底物的GEL，使溶液加压沉淀并将纳米颗粒沉积到基底上，除去溶剂，从而留下薄的纳米颗粒膜，除去溶剂和反溶剂，并干燥该膜 。

    Methods for modifying surfaces
    65.
    发明授权
    Methods for modifying surfaces 有权
    修饰表面的方法

    公开(公告)号：US08263192B2

    公开(公告)日：2012-09-11

    申请号：US11454652

    申请日：2006-06-16

    Applicant: Jeffrey T. Koberstein ,  Peng Wang ,  Feng Pan

    Inventor： Jeffrey T. Koberstein ,  Peng Wang ,  Feng Pan

    IPC: B05D5/00 ,  B05D3/06 ,  C08J7/18

    CPC classification number: C08J7/12 ,  A61L27/34 ,  A61L29/085 ,  B05D1/185 ,  B05D1/32 ,  B05D3/067 ,  B05D3/107 ,  B05D2401/90 ,  B82Y30/00 ,  B82Y40/00 ,  C03C17/32 ,  C07K17/00 ,  C08J7/047 ,  C08J7/18 ,  D06M23/005 ,  G03F7/0048 ,  G03F7/0392 ,  G03F7/165 ,  G03F7/265 ,  H05K3/389

    Abstract: The invention is directed to methods for coating monolayer films of surface-active polymers onto substrates of arbitrary shape, and molecular-based methods and processes to control the chemical and physical nature of surfaces and interfaces. The invention is also directed to methods for modifying a surface of a monolayer comprising a) coating a monolayer on a substrate, wherein the monolayer is formed by self-assembly of end-surfactant molecules, thereby positioning a photoactive functional group at the air-monolayer interface; and b) exposing the monolayer to radiation, wherein each organic group of the monolayer contains a first functionality that is not converted to a second functionality upon exposure to acid.

    Abstract translation: 本发明涉及将表面活性聚合物的单层膜涂覆到任意形状的基底上的方法，以及用于控制表面和界面的化学和物理性质的基于分子的方法和方法。 本发明还涉及用于修饰单层表面的方法，其包括：a）在基底上涂覆单层，其中通过端表面活性剂分子的自组装形成单层，从而将光活性官能团定位在空气单层 接口; 和b）将单层暴露于辐射，其中单层的每个有机基团含有当暴露于酸时不转化为第二官能团的第一官能度。

    Selection and deposition of nanoparticles using CO2-expanded liquids
    67.
    发明申请
    Selection and deposition of nanoparticles using CO2-expanded liquids 有权
    使用二氧化碳膨胀液体选择和沉积纳米颗粒

    公开(公告)号：US20100323527A1

    公开(公告)日：2010-12-23

    申请号：US12082189

    申请日：2008-04-08

    Applicant: Christopher B. Roberts ,  Marshall Chandler McLeod ,  Madhu Anand

    Inventor： Christopher B. Roberts ,  Marshall Chandler McLeod ,  Madhu Anand

    IPC: H01L21/30

    CPC classification number: C30B7/00 ,  B05D1/18 ,  B05D2401/32 ,  B05D2401/90 ,  B82Y30/00 ,  C30B7/005 ,  C30B29/605 ,  Y10S977/70 ,  Y10S977/773

    Abstract: A method for size selection of nanostructures comprising utilizing a gas-expanded liquids (GEL) and controlled pressure to precipitate desired size populations of nanostructures, e.g., monodisperse. The GEL can comprise CO2 antisolvent and an organic solvent. The method can be carried out in an apparatus comprising a first open vessel configured to allow movement of a liquid/particle solution to specific desired locations within the vessel, a second pressure vessel, a location controller for controlling location of the particles and solution within the first vessel, a inlet for addition of antisolvent to the first vessel, and a device for measuring the amount of antisolvent added. Also disclosed is a method for forming nanoparticle thin films comprising utilizing a GEL containing a substrate, pressurizing the solution to precipitate and deposit nanoparticles onto the substrate, removing the solvent thereby leaving a thin nanoparticle film, removing the solvent and antisolvent, and drying the film.

    Abstract translation: 纳米结构尺寸选择的方法包括利用气体膨胀液体（GEL）和受控压力来沉淀所需尺寸的纳米结构体，例如单分散。 GEL可以包含CO 2抗溶剂和有机溶剂。 该方法可以在包括构造成允许液体/颗粒溶液移动到容器内的特定所需位置的第一开放容器的设备中进行，第二压力容器，位置控制器，用于控制颗粒和溶液的位置 第一容器，用于向第一容器添加抗溶剂的入口，以及用于测量加入的抗溶剂量的装置。 还公开了一种用于形成纳米颗粒薄膜的方法，其包括使用含有底物的GEL，将溶液加压沉淀并将纳米颗粒沉积到基底上，除去溶剂从而留下薄的纳米颗粒膜，除去溶剂和反溶剂，并干燥该膜 。

    Repairing and restoring strength of etch-damaged low-k dielectric materials
    68.
    发明授权
    Repairing and restoring strength of etch-damaged low-k dielectric materials 有权
    蚀刻损坏的低k电介质材料的修复和恢复强度

    公开(公告)号：US07807219B2

    公开(公告)日：2010-10-05

    申请号：US11475206

    申请日：2006-06-27

    Applicant: James DeYoung

    Inventor： James DeYoung

    IPC: B05D3/00 ,  B05D3/10

    CPC classification number: B05D1/185 ,  B05D5/005 ,  B05D2401/90 ,  B82Y30/00 ,  B82Y40/00 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/3105 ,  H01L21/76814 ,  H01L21/76826

    Abstract: A process of repairing a plasma etched low-k dielectric material having surface-bound silanol groups includes exposing at least one surface of the dielectric material to (a) a catalyst so as to form hydrogen bonds between the catalyst and the surface-bound silanol groups obtaining a catalytic intermediary that reacts with the silane capping agent so as to form surface-bound silane compounds, or (b) a solution comprising a supercritical solvent, a catalyst, and a silane capping agent so as to form hydrogen bonds between a catalyst and the surface-bound silanol groups obtaining a catalytic intermediary that reacts with the silane capping agent so as to form surface-bound silane compounds. Horizontal networks can be formed between adjacent surface-bound silane compounds. The dielectric material can be further treated with an organic acid so as to catalyze a hydrolytic reaction with alkoxy groups on the surface-bound silane compounds forming silanol groups that can be condensed via heat to remove water as a byproduct.

    Abstract translation: 修复具有表面结合硅烷醇基团的等离子体蚀刻的低k电介质材料的方法包括将电介质材料的至少一个表面暴露于（a）催化剂，以便在催化剂和表面结合的硅烷醇基团之间形成氢键 获得与硅烷封端剂反应以形成表面结合的硅烷化合物的催化中间体，或（b）包含超临界溶剂，催化剂和硅烷封端剂的溶液，以在催化剂和 表面结合的硅烷醇基团获得与硅烷封端剂反应以形成表面结合的硅烷化合物的催化中间体。 可以在相邻的表面结合的硅烷化合物之间形成水平网络。 电介质材料可以用有机酸进一步处理，以催化表面结合的硅烷化合物上的烷氧基的水解反应，形成硅烷醇基团，可以通过加热冷凝以除去水作为副产物。

    Method of manufacturing a color filter
    70.
    发明授权
    Method of manufacturing a color filter 有权
    彩色滤光片的制造方法

    公开(公告)号：US07160573B2

    公开(公告)日：2007-01-09

    申请号：US10460814

    申请日：2003-06-12

    Applicant: Sridhar Sadasivan ,  Ramesh Jagannathan ,  Seshadri Jagannathan ,  Rajesh Mehta ,  David J. Nelson ,  Glen C. Irvin, Jr.

    Inventor： Sridhar Sadasivan ,  Ramesh Jagannathan ,  Seshadri Jagannathan ,  Rajesh Mehta ,  David J. Nelson ,  Glen C. Irvin, Jr.

    IPC: B05D5/06

    CPC classification number: B05D1/12 ,  B05D1/025 ,  B05D1/04 ,  B05D1/06 ,  B05D1/32 ,  B05D2401/90 ,  G02B5/223

    Abstract: A method of forming a color filter is provided. The method includes providing a mixture of a color filter material and a compressed fluid; providing at least a partially controlled environment for retaining a substrate, the at least partially controlled environment being in fluid communication with the mixture of the color filter material and the compressed fluid; providing a shadow mask in close proximity to the substrate retained in the at least partially controlled environment; and chargably releasing the mixture of the color filter material and the compressed fluid into the at least partially controlled environment, wherein the color filter material becomes free of the compressed fluid prior to contacting the substrate at locations defined by the shadow mask thereby forming a patterned deposition on the substrate.

    Abstract translation: 提供一种形成滤色器的方法。 该方法包括提供滤色器材料和压缩流体的混合物; 提供用于保持基底的至少部分受控的环境，所述至少部分控制的环境与所述滤色器材料和所述压缩流体的混合物流体连通; 在保持在所述至少部分控制的环境中的衬底附近提供荫罩; 并且将所述滤色器材料和所述压缩流体的混合物充分地释放到所述至少部分受控的环境中，其中所述滤色器材料在由所述荫罩限定的位置接触所述基板之前变得没有压缩流体，从而形成图案化沉积 在基板上。

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