Methods and loadport apparatus for purging a substrate carrier
    61.
    发明授权
    Methods and loadport apparatus for purging a substrate carrier 有权
    用于清洗衬底载体的方法和装载端装置

    公开(公告)号:US08601975B2

    公开(公告)日:2013-12-10

    申请号:US13287534

    申请日:2011-11-02

    摘要: In a first aspect, a loadport is provided. The loadport has a plate adapted to couple to a door of a substrate carrier to open the substrate carrier wherein the plate includes a first opening adapted to couple to a first port in the door of the substrate carrier on a first side of the plate and to couple to a gas source on a second side of the plate, and wherein the loadport is adapted to allow a flow of gas into the substrate carrier via the first opening in the plate. Methods of purging substrate carriers are provided, as are numerous other aspects.

    摘要翻译: 在第一方面,提供一种加载端口。 装载端口具有适于联接到基板载体的门以打开衬底载体的板,其中板包括适于联接到板的第一侧上的衬底载体的门中的第一端口的第一开口,并且 耦合到所述板的第二侧上的气体源,并且其中所述负载端口适于允许气体经由所述板中的所述第一开口流入所述衬底载体。 提供清洗衬底载体的方法,以及许多其它方面。

    Antifouling method and composition using chromen-4-one derivatives
    62.
    发明授权
    Antifouling method and composition using chromen-4-one derivatives 有权
    使用色烯-4-酮衍生物的防污方法和组合物

    公开(公告)号:US08557331B2

    公开(公告)日:2013-10-15

    申请号:US12933087

    申请日:2009-03-20

    IPC分类号: B05C13/00

    CPC分类号: C07D311/30 A01N43/16

    摘要: A method to utilize a chemical genus of chromen-4-one derivatives as non-toxic, environment friendly antifouling agent, a coating material for objects submerged under the water and subject to biofouling based on the chromen-4-one compounds, as well as a method of obtaining one of such chromen-4-one antifouling compounds, 4′,5,7-trihydroxy-isoflavone, from a natural source. Particularly exemplary of such substituted chromen-4-one antifouling compounds are provided and they are 4′,5,7 -trihydroxy-isoflavone, 4′,5-dihydroxy-3,6,7,8 tetramethoxy-flavone, 3′,5-dihydroxy-3,4′,6,8 tetramethoxy-flavone, 4′,5-dihydroxy-3,6,7-trimethoxy-flavone, 4′,5,7-trihydroxy-flavone, 3′,4′,6,7-tetrahydroxy-flavone, and 5-monohydroxy-flavone.

    摘要翻译: 利用色烯-4-酮衍生物的化学属的方法是无毒,环保的防污剂,用于淹没在水下的物体的涂层材料,并基于色烯-4-酮化合物进行生物污染,以及 从天然来源获得这种色烯-4-一防污化合物之一的方法,4',5,7-三羟基 - 异黄酮。 提供这种取代的苯甲酸-4-酮防污化合物的特别示例,它们是4',5,7-三羟基 - 异黄酮,4',5-二羟基-3,6,7,8四甲氧基 - 黄酮,3',5 二羟基-3,4',6,8四甲氧基黄酮,4',5-二羟基-3,6,7-三甲氧基黄酮,4',5,7-三羟基黄酮,3',4',6 ,7-四羟基 - 黄酮和5-单羟基 - 黄酮。

    SUBSTRATE PROCESSING SYSTEM HAVING SUSCEPTORLESS SUBSTRATE SUPPORT WITH ENHANCED SUBSTRATE HEATING CONTROL
    63.
    发明申请
    SUBSTRATE PROCESSING SYSTEM HAVING SUSCEPTORLESS SUBSTRATE SUPPORT WITH ENHANCED SUBSTRATE HEATING CONTROL 有权
    具有加强基板加热控制的无锡基板支撑的基板加工系统

    公开(公告)号:US20130256962A1

    公开(公告)日:2013-10-03

    申请号:US13788573

    申请日:2013-03-07

    IPC分类号: B05C13/00

    摘要: Methods and apparatus for processing substrates are provided herein. In some embodiments, an apparatus includes a process kit, the process kit comprising a first ring to support a substrate proximate a peripheral edge of the substrate; a second ring disposed about the first ring; and a path formed between the first and second rings that allows the first ring to rotate with respect to the second ring, wherein the path substantially prevents light from travelling between a first volume disposed below the first and second rings and a second volume disposed above the first and second rings.

    摘要翻译: 本文提供了处理衬底的方法和装置。 在一些实施例中,一种装置包括处理套件,该处理套件包括第一环以支撑靠近衬底的周边边缘的衬底; 设置在所述第一环周围的第二环; 以及形成在所述第一和第二环之间的路径,其允许所述第一环相对于所述第二环旋转,其中所述路径基本上防止光在设置在所述第一和第二环下方的第一容积和设置在所述第二环之上的第二体积 第一和第二个戒指。

    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    66.
    发明申请
    PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD 有权
    等离子体加工设备和等离子体处理方法

    公开(公告)号:US20130180953A1

    公开(公告)日:2013-07-18

    申请号:US13823945

    申请日:2012-03-26

    申请人: Tetsuhiro Iwai

    发明人: Tetsuhiro Iwai

    IPC分类号: B05C13/00 B44C1/22 C23C16/50

    摘要: The present invention is to achieve a reduction both in size of a plasma processing apparatus and an installation area thereof. A dry etching apparatus includes a stock unit that includes a cassette storing a tray that can be conveyed and that stores substrates. In a conveying unit storing a conveying apparatus of the tray, a rotary stage is provided. Rotational angular position adjustment of the tray is performed by rotating the rotary stage placed on the tray before being subjected to dry etching and detecting a notch by a notch detecting sensor.

    摘要翻译: 本发明是为了实现等离子体处理装置的尺寸和其安装面积的减小。 干蚀刻装置包括一个储存单元,该储存单元包括一个储存可输送并存储基板的托盘的盒。 在存放托盘的输送装置的输送单元中,设置有旋转台。 通过在进行干蚀刻之前旋转放置在托盘上的旋转台并通过切口检测传感器检测凹口来进行托盘的旋转角位置调整。

    PLASMA PROCESSING APPARATUS
    68.
    发明申请
    PLASMA PROCESSING APPARATUS 有权
    等离子体加工设备

    公开(公告)号:US20130112352A1

    公开(公告)日:2013-05-09

    申请号:US13726913

    申请日:2012-12-26

    IPC分类号: C23C16/511 B05C13/00

    摘要: A plasma processing apparatus includes: a processing chamber produced from a metal; a susceptor configured to mount a substrate; an electromagnetic wave source that supplies an electromagnetic wave; one or more dielectric member provided at an inner wall of the processing chamber, and configured to transmit the electromagnetic wave into an inside of the processing chamber; one or more metal electrode, wherein each metal electrode is installed on a bottom surface of each dielectric member such that a part of the each dielectric member is exposed to the inside of the processing chamber; and a surface wave propagating section which is a metal surface facing the susceptor, the surface wave propagating section being installed adjacent to the dielectric member and being exposed to the inside of the processing chamber. The surface wave propagating section and a bottom surface of the metal electrode are positioned on the same plane.

    摘要翻译: 一种等离子体处理装置,包括:由金属制成的处理室; 被配置为安装衬底的感受体; 提供电磁波的电磁波源; 一个或多个电介质构件,设置在所述处理室的内壁处,并且被配置为将所述电磁波传输到所述处理室的内部; 一个或多个金属电极,其中每个金属电极安装在每个电介质构件的底表面上,使得每个电介质构件的一部分暴露于处理室的内部; 表面波传播部分是面对基座的金属表面,表面波传播部分与电介质部件相邻设置并暴露于处理室的内部。 表面波传播部分和金属电极的底表面位于同一平面上。

    LOADING AND UNLOADING SYSTEM FOR THIN FILM FORMATION AND METHOD THEREOF
    70.
    发明申请
    LOADING AND UNLOADING SYSTEM FOR THIN FILM FORMATION AND METHOD THEREOF 审中-公开
    用于薄膜形成的装载和卸载系统及其方法

    公开(公告)号:US20130108792A1

    公开(公告)日:2013-05-02

    申请号:US13282125

    申请日:2011-10-26

    申请人: Cheng Chieh Yang

    发明人: Cheng Chieh Yang

    摘要: A system for forming one or more layers of material on one or more substrates is described. The system includes a vacuum chamber and a showerhead located in the vacuum chamber. A door in a wall of the vacuum chamber allows for loading and unloading of the one or more substrates in the vacuum chamber while under vacuum. A drive mechanism coupled to the showerhead moves the showerhead between a first position and a second position while under vacuum. In the first position, the showerhead is positioned to allow access to the door for loading and unloading of the one or more substrates through the door. In the second position, the showerhead is positioned to inhibit access to the door inside the vacuum chamber.

    摘要翻译: 描述了在一个或多个基底上形成一层或多层材料的系统。 该系统包括位于真空室中的真空室和喷头。 在真空室的壁上的门允许在真空下在真空室中装载和卸载一个或多个基板。 联接到喷头的驱动机构在真空下在第一位置和第二位置之间移动喷头。 在第一位置,喷头被定位成允许进入门以通过门装载和卸载一个或多个基板。 在第二位置,喷头被定位成禁止进入真空室内的门。