摘要:
In a first aspect, a loadport is provided. The loadport has a plate adapted to couple to a door of a substrate carrier to open the substrate carrier wherein the plate includes a first opening adapted to couple to a first port in the door of the substrate carrier on a first side of the plate and to couple to a gas source on a second side of the plate, and wherein the loadport is adapted to allow a flow of gas into the substrate carrier via the first opening in the plate. Methods of purging substrate carriers are provided, as are numerous other aspects.
摘要:
A method to utilize a chemical genus of chromen-4-one derivatives as non-toxic, environment friendly antifouling agent, a coating material for objects submerged under the water and subject to biofouling based on the chromen-4-one compounds, as well as a method of obtaining one of such chromen-4-one antifouling compounds, 4′,5,7-trihydroxy-isoflavone, from a natural source. Particularly exemplary of such substituted chromen-4-one antifouling compounds are provided and they are 4′,5,7 -trihydroxy-isoflavone, 4′,5-dihydroxy-3,6,7,8 tetramethoxy-flavone, 3′,5-dihydroxy-3,4′,6,8 tetramethoxy-flavone, 4′,5-dihydroxy-3,6,7-trimethoxy-flavone, 4′,5,7-trihydroxy-flavone, 3′,4′,6,7-tetrahydroxy-flavone, and 5-monohydroxy-flavone.
摘要:
Methods and apparatus for processing substrates are provided herein. In some embodiments, an apparatus includes a process kit, the process kit comprising a first ring to support a substrate proximate a peripheral edge of the substrate; a second ring disposed about the first ring; and a path formed between the first and second rings that allows the first ring to rotate with respect to the second ring, wherein the path substantially prevents light from travelling between a first volume disposed below the first and second rings and a second volume disposed above the first and second rings.
摘要:
A three dimensional object may be formed by forming voxels on a sheet of material and positioning the voxels together to form the three dimensional object by rolling up the sheet.
摘要:
A diameter of a mounting unit of the stage of an ashing processing apparatus is less than a diameter of a mounting unit of the stage of an etching processing apparatus, and the diameter of the mounting unit of the stage of the etching processing apparatus is less than a diameter of an objective item.
摘要:
The present invention is to achieve a reduction both in size of a plasma processing apparatus and an installation area thereof. A dry etching apparatus includes a stock unit that includes a cassette storing a tray that can be conveyed and that stores substrates. In a conveying unit storing a conveying apparatus of the tray, a rotary stage is provided. Rotational angular position adjustment of the tray is performed by rotating the rotary stage placed on the tray before being subjected to dry etching and detecting a notch by a notch detecting sensor.
摘要:
A masking system protects portions of a part, such as a turbine engine component, to be coated. The masking system has a base, a conduit positioned on said base, a part to be coated being positioned over the conduit, and an annular plate positioned over the conduit and resting on a first portion of the part.
摘要:
A plasma processing apparatus includes: a processing chamber produced from a metal; a susceptor configured to mount a substrate; an electromagnetic wave source that supplies an electromagnetic wave; one or more dielectric member provided at an inner wall of the processing chamber, and configured to transmit the electromagnetic wave into an inside of the processing chamber; one or more metal electrode, wherein each metal electrode is installed on a bottom surface of each dielectric member such that a part of the each dielectric member is exposed to the inside of the processing chamber; and a surface wave propagating section which is a metal surface facing the susceptor, the surface wave propagating section being installed adjacent to the dielectric member and being exposed to the inside of the processing chamber. The surface wave propagating section and a bottom surface of the metal electrode are positioned on the same plane.
摘要:
A susceptor including a generally circular body having a face with a radially inward section and a radially outward section proximate a circumference of the body, the radially outward section having at least one ring extending upward for contacting a bottom surface of a substrate, and wherein the radially inward section lacks a ring extending upward from the face.
摘要:
A system for forming one or more layers of material on one or more substrates is described. The system includes a vacuum chamber and a showerhead located in the vacuum chamber. A door in a wall of the vacuum chamber allows for loading and unloading of the one or more substrates in the vacuum chamber while under vacuum. A drive mechanism coupled to the showerhead moves the showerhead between a first position and a second position while under vacuum. In the first position, the showerhead is positioned to allow access to the door for loading and unloading of the one or more substrates through the door. In the second position, the showerhead is positioned to inhibit access to the door inside the vacuum chamber.