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75 条记录 (耗时 0.015 秒)

    Clutch hydraulic mechanism
    71.
    发明授权
    Clutch hydraulic mechanism 失效
    离合器液压机构

    公开(公告)号：US06889805B2

    公开(公告)日：2005-05-10

    申请号：US10202709

    申请日：2002-07-24

    申请人： Hideo Nakayama ,  Mamoru Kobayashi ,  Eiichi Sakai

    发明人： Hideo Nakayama ,  Mamoru Kobayashi ,  Eiichi Sakai

    IPC分类号： F16D48/02 ,  F16H61/02 ,  F16H61/06 ,  B60K41/22

    CPC分类号： F16D48/02 ,  F16D25/14 ,  F16D48/0206 ,  F16D48/068 ,  F16D2048/0203 ,  F16D2048/0209 ,  F16D2048/0221 ,  F16D2500/1112 ,  F16D2500/30805 ,  F16D2500/50293 ,  F16H61/0272 ,  F16H61/067

    摘要： A check valve is installed in a hydraulic line for hydraulic oil to be fed to a forward movement hydraulic clutch, while an accumulator for accumulating some amount of the hydraulic oil fed to the hydraulic clutch is installed between the check valve and the hydraulic clutch. Further installed is a control spool that is operated by the hydraulic oil fed to the forward movement hydraulic clutch and that cooperates with the check valve to hold the hydraulic oil accumulated in the accumulator. According to this arrangement, even if the oil pressure drops momentarily due to a speed gear shift, the pressure for the hydraulic clutch before the gear shift is held by the hydraulic oil accumulated in the accumulator. Thus, a delay in torque restoration due to a slip of the hydraulic clutch can be eliminated, so that an operator can be freed from having a feeling of torque loss or a shock, and a feeling of uneasiness such as a feeling of reversing on an uphill slope, during the gear shift.

    摘要翻译： 止回阀安装在用于液压油的液压管路中以供给前进液压离合器，而在止回阀和液压离合器之间安装有用于积蓄供给液压离合器的一些液压油的蓄能器。 进一步安装的是控制阀芯，其由供给到前进液压离合器的液压油操作，并且与止回阀配合以保持积聚在蓄能器中的液压油。 根据该结构，即使油压由于变速而暂时下降，变速前的液压离合器的压力由积存在蓄能器中的液压油保持。 因此，可以消除由于液压离合器的滑动导致的转矩恢复的延迟，使得操作者能够避免扭矩损失或冲击的感觉，以及不舒服的感觉 上坡时，换档期间。

    Method of manufacturing a semiconductor laser device
    73.
    发明授权
    Method of manufacturing a semiconductor laser device 失效
    制造半导体激光器件的方法

    公开(公告)号：US5394425A

    公开(公告)日：1995-02-28

    申请号：US201342

    申请日：1994-02-24

    申请人： Hideki Fukunaga ,  Nobuaki Ueki ,  Hiromi Otoma ,  Hideo Nakayama

    发明人： Hideki Fukunaga ,  Nobuaki Ueki ,  Hiromi Otoma ,  Hideo Nakayama

    IPC分类号： H01S5/00 ,  H01S5/20 ,  H01S5/22 ,  H01S5/223 ,  H01S3/19

    CPC分类号： H01S5/22 ,  H01S5/20 ,  H01S5/2059 ,  H01S5/2226 ,  H01S5/223

    摘要： The method applies to manufacture of a semiconductor laser device which comprises a semiconductor substrate and a plurality of semiconductor layers piled sequentially one on top of another on the semiconductor substrate, the semiconductor layers including at least a first clad layer; an active layer interposed between a pair of optical waveguide layers, and a second clad layer. In the present manufacturing method, a first impurity diffusion source film is applied on top of the semiconductor layers, an insulation film is applied on top of the first impurity diffusion source film, two layers consisting of the first impurity diffusion source film and insulation film are removed respectively into a stripe shape except for the areas of the semiconductor layers in which impurities are to be diffused, a diffusion protect film to be etched selectively with respect to the insulation film is formed on the surfaces of the semiconductor layers and two layers, an impurity is thermally diffused from the first impurity diffusion source film, a diffusion protect film is etched selectively with respect to the insulation film, and a second impurity is diffused with the insulation film as a mask.

    摘要翻译： 该方法适用于半导体激光器件的制造，该半导体激光器件包括半导体衬底和在半导体衬底上依次堆叠在一起的多个半导体层，半导体层至少包括第一覆盖层; 介于一对光波导层之间的有源层和第二覆层。 在本制造方法中，将第一杂质扩散源膜施加在半导体层的顶部，在第一杂质扩散源膜的顶部施加绝缘膜，由第一杂质扩散源膜和绝缘膜构成的两层 除去杂质要扩散的半导体层的区域以外的条纹状，在半导体层和两层的表面上形成相对于绝缘膜选择性地蚀刻的扩散保护膜， 杂质从第一杂质扩散源膜热扩散，相对于绝缘膜选择性地蚀刻扩散保护膜，第二杂质以绝缘膜作为掩模扩散。

    Method of disrupting the chlorella cell wall by cell rupture
    74.
    发明授权
    Method of disrupting the chlorella cell wall by cell rupture 失效
    通过细胞破裂破坏小球藻细胞壁的方法

    公开(公告)号：US5330913A

    公开(公告)日：1994-07-19

    申请号：US939264

    申请日：1992-09-02

    申请人： Hideo Nakayama

    发明人： Hideo Nakayama

    IPC分类号： C12M1/33 ,  C12N1/06 ,  C12N1/12

    CPC分类号： C12N1/06 ,  C12M47/06 ,  Y10S435/803

    摘要： The CHLORELLA cell wall is disrupted by forming partially high- and low-pressure portions at high density in an aqueous suspension of CHLORELLA cells, instantaneously shifting the CHLORELLA cells in the aqueous suspension from a high-pressure state to a low-pressure state by interaction of the movement, dissipation and growth of these high- and low-pressure portions and the flowing of the aqueous suspension, and rupturing the CHLORELLA cells by their rapid expansion upon the shift.

    摘要翻译： 通过在CHLORELLA细胞的水性悬浮液中以高密度形成部分高压和低压部分来CHLORELLA细胞壁被破坏，通过相互作用瞬时将水悬浮液中的CHLORELLA细胞从高压状态移动到低压状态 这些高压部分和低压部分的运动，耗散和生长以及水性悬浮液的流动，并且通过它们在移动时的快速膨胀来破坏CHLORELLA细胞。