ULTRA LOW POWER SUPER-REGENERATIVE RECEIVER AND METHOD THEREOF
    74.
    发明申请
    ULTRA LOW POWER SUPER-REGENERATIVE RECEIVER AND METHOD THEREOF 有权
    超低功率超再生接收器及其方法

    公开(公告)号:US20130170588A1

    公开(公告)日:2013-07-04

    申请号:US13729190

    申请日:2012-12-28

    IPC分类号: H04B1/06

    CPC分类号: H04B1/06 H03D11/00 H04B1/24

    摘要: An ultra low power super-regenerative receiver is provided. The ultra low power super-regenerative receiver includes a bit synchronizer configured to use a value sampled from a signal output from a super-regenerative oscillator to estimate a pulse-level position having a maximum amplitude value in a single period of a received symbol, a frame synchronizer configured to combine a plurality of pulse-level positions determined based on the estimated pulse-level position, and detect a predetermined bit sequence using the plurality of pulse-level positions combined, the frame synchronizer being configured to perform frame synchronization, and a data detector configured to detect data using the plurality of pulse-level positions determined after the frame synchronization is completed.

    摘要翻译: 提供超低功率超再生接收机。 超低功率超再生接收机包括位同步器,其被配置为使用从超再生振荡器输出的信号采样的值来估计在接收符号的单个周期中具有最大振幅值的脉冲电平位置, 帧同步器,其被配置为组合基于所估计的脉冲电平位置确定的多个脉冲电平位置,并且使用组合的所述多个脉冲级位置来检测预定位序列,所述帧同步器被配置为执行帧同步;以及 数据检测器,被配置为使用在帧同步完成之后确定的多个脉冲级位置来检测数据。

    HEATING ELEMENT AND METHOD FOR MANUFACTURING SAME
    77.
    发明申请
    HEATING ELEMENT AND METHOD FOR MANUFACTURING SAME 审中-公开
    加热元件及其制造方法

    公开(公告)号:US20130020303A1

    公开(公告)日:2013-01-24

    申请号:US13638485

    申请日:2011-03-30

    IPC分类号: H05B3/84 H01C17/06 B60L1/02

    摘要: The present invention relates to a heating element and to a method for manufacturing same, and more particularly, to a heating element and to a method for manufacturing same wherein the heating element comprises a) a transparent substrate, and b) a conductive heating pattern formed on at least one surface of the transparent substrate, wherein the average distance between lines in a vertical direction of the conductive heating pattern is wider than the average distance between lines in a horizontal direction thereof. The heating element according to the present invention not only minimizes the side effects due to diffraction and interference phenomena of light but also exhibits superior heating performance at a low voltage while being invisible.

    摘要翻译: 本发明涉及一种加热元件及其制造方法,更具体地说,涉及一种加热元件及其制造方法,其中加热元件包括a)透明基底,和b)形成的导电加热图案 在所述透明基板的至少一个表面上,其中所述导电加热图案的垂直方向上的线之间的平均距离比在水平方向上的线之间的平均距离宽。 根据本发明的加热元件不仅使由于光的衍射和干涉现象引起的副作用最小化,而且在不可见的同时在低电压下表现出优异的加热性能。

    Photochromic compositions and photochromic films
    78.
    发明授权
    Photochromic compositions and photochromic films 有权
    光致变色组合物和光致变色膜

    公开(公告)号:US08323535B2

    公开(公告)日:2012-12-04

    申请号:US12740965

    申请日:2008-10-31

    IPC分类号: G02B5/23 G02C7/02

    CPC分类号: C09D133/14 Y10T428/24322

    摘要: The present invention relates to a photochromic composition comprising multifunctional (meth)acrylate-based monomers having two or more functional groups, a photochromic dye and an aromatic vinyl compound, in which the content of the aromatic vinyl compound is more than 30% by weight and 70% by weight or less, a photochromic film produced by using the same, and a method for producing the photochromic film.

    摘要翻译: 本发明涉及一种光致变色组合物,其包含具有两个或更多个官能团的多官能(甲基)丙烯酸酯基单体,光致变色染料和芳族乙烯基化合物,其中芳族乙烯基化合物的含量大于30重量%,和 70重量%以下,通过使用其制造的光致变色膜,以及光致变色膜的制造方法。

    Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry comprising the same
    80.
    发明授权
    Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry comprising the same 有权
    用于控制抛光选择性的辅助剂和包含其的化学机械抛光浆料

    公开(公告)号:US08163650B2

    公开(公告)日:2012-04-24

    申请号:US11634238

    申请日:2006-12-06

    IPC分类号: H01L21/302

    摘要: Disclosed is an adjuvant for use in simultaneous polishing of a cationically charged material and an anionically charged material, which forms an adsorption layer on the cationically charged material in order to increase polishing selectivity of the anionically charged material, wherein the adjuvant comprises a polyelectrolyte salt containing: (a) a mixture of a linear polyelectrolyte having a weight average molecular weight of 2,000˜50,000 with a graft type polyelectrolyte that has a weight average molecular weight of 1,000˜20,000 and comprises a backbone and a side chain; and (b) a basic material. CMP (chemical mechanical polishing) slurry comprising the above adjuvant and abrasive particles is also disclosed. The adjuvant comprising a mixture of a linear polyelectrolyte with a graft type polyelectrolyte makes it possible to increase polishing selectivity as compared to CMP slurry using the linear polyelectrolyte alone, and to obtain a desired range of polishing selectivity by controlling the ratio of the linear polyelectrolyte to the graft type polyelectrolyte.

    摘要翻译: 公开了一种用于同时抛光阳离子电荷材料和阴离子充电材料的佐剂,其在阳离子电荷材料上形成吸附层,以增加阴离子带电材料的抛光选择性,其中助剂包含含有 :(a)重均分子量为2,000〜50,000的线性聚电解质与重均分子量为1,000〜20,000的接枝型聚电解质的混合物,其包含骨架和侧链; 和(b)基本材料。 还公开了包含上述助剂和磨料颗粒的CMP(化学机械抛光)浆料。 包含线性聚电解质与接枝型聚电解质的混合物的佐剂使得可以使用单独的线性聚电解质与CMP浆料相比提高抛光选择性,并且通过控制线性聚电解质与 接枝型聚电解质。