Lithographic apparatus and device manufacturing method
    71.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号:US20050118528A1

    公开(公告)日:2005-06-02

    申请号:US10972788

    申请日:2004-10-26

    申请人: Arno Bleeker

    发明人: Arno Bleeker

    摘要: An array of individually controllable elements is comprised of elements, each formed of a stack of layers of dielectric material. At least one layer is an electro-optical material. The at least one layer's refractive index for radiation that is plane polarized in a given direction can be changed by application of a voltage in order to change the reflection/transmission characteristic of the boundary between this layer and the adjacent layer.

    摘要翻译: 单独可控元件的阵列由元件组成,每个元件由电介质材料层的堆叠构成。 至少一层是电光材料。 可以通过施加电压来改变在给定方向上被平面偏振的用于辐射的至少一层的折射率,以便改变该层与相邻层之间的边界的反射/透射特性。

    Lithographic apparatus and device manufacturing method
    72.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号:US20050018997A1

    公开(公告)日:2005-01-27

    申请号:US10868380

    申请日:2004-06-16

    申请人: Arno Bleeker

    发明人: Arno Bleeker

    IPC分类号: G03F7/20 H01L21/027 G02B6/00

    摘要: A system and method are used to limit a proportion of a programmable patterning means used to pattern a substrate. This is done such that a size of a repeated pattern to be exposed on the substrate is an integer multiple of a size of a pattern exposed on the substrate by the patterned beam.

    摘要翻译: 使用系统和方法来限制用于对衬底进行图案化的可编程图案形成装置的比例。 这样做使得要暴露在基板上的重复图案的尺寸是通过图案化的光束在基板上暴露的图案的尺寸的整数倍。