公开(公告)号：US5614988A

公开(公告)日：1997-03-25

申请号：US349754

申请日：1994-12-05

申请人： Kinya Kato ,  Masami Seki

发明人： Kinya Kato ,  Masami Seki

IPC分类号： G03F7/20 ,  G03B27/44 ,  G03B27/32

CPC分类号： G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： A projection exposure apparatus and method having a projection optical system with a plurality of projection optical units and being excellent in matching between images formed through the respective projection optical units. First and second substrates are moved relatively to a projection optical system to project a pattern formed on the first substrate through the projection optical system onto the second substrate to effect exposure thereon. The projection optical system is provided with a plurality of projection optical units each forming a real-size erect image of the pattern formed on the first substrate on the second substrate. Each of the projection optical units has a plurality of reflective surfaces and is telecentric at least on an image side. The projection exposure apparatus also has a correcting mechanism disposed to correct an error of orientation between a plurality of images formed on the second substrate by the plurality of projection optical units.

摘要翻译： 一种投影曝光装置和方法，具有具有多个投影光学单元的投影光学系统，并且通过各个投影光学单元形成的图像之间的匹配性优异。 第一和第二基板相对于投影光学系统移动，以通过投影光学系统将形成在第一基板上的图案投影到第二基板上，以在其上进行曝光。 投影光学系统设置有多个投影光学单元，每个投影光学单元形成形成在第二基板上的第一基板上的图案的实际直立图像。 每个投影光学单元具有多个反射表面，并且至少在像侧上是远心的。 投影曝光装置还具有校正机构，用于校正由多个投影光学单元在形成在第二基板上的多个图像之间的取向误差。

公开(公告)号：US5162933A

公开(公告)日：1992-11-10

申请号：US697991

申请日：1991-05-10

申请人： Nobuhiko Kakuda ,  Tsutomu Wada ,  Kinya Kato ,  Tadamichi Kawada ,  Masamichi Okamura ,  Shigeo Aoki ,  Yasuhiro Ukai ,  Kiyoshi Taruta ,  Tomihisa Sunata ,  Hiroshi Saito ,  Takanobu Nakagawa

发明人： Nobuhiko Kakuda ,  Tsutomu Wada ,  Kinya Kato ,  Tadamichi Kawada ,  Masamichi Okamura ,  Shigeo Aoki ,  Yasuhiro Ukai ,  Kiyoshi Taruta ,  Tomihisa Sunata ,  Hiroshi Saito ,  Takanobu Nakagawa

IPC分类号： G02F1/1345 ,  G02F1/1362 ,  H01L27/13

CPC分类号： H01L27/13 ,  G02F1/136213 ,  G02F1/136286 ,  G02F1/1345 ,  G02F1/136209 ,  G02F2001/13629

摘要： In an active matrix structure for liquid crystal display elements which includes pixel electrodes arranged in a matrix form on a glass base plate, thin film transistors having their drains connected to the pixel electrodes, respectively, data lines each connected to sources of the thin film transistors of one column and gate lines connected to gates of the thin film transistors of one row, there are provided in the same plane a light blocking layer disposed opposite each of the thin film transistors across an insulating layer, a storage capacitance electrode disposed partly opposite each of the pixel electrodes across the insulating layer and storage capacitance lines for interconnecting the capacitance electrodes. The light blocking layers, the storage capacitance electrodes and the storage capacitance lines are formed of the same material and at the same time.

公开(公告)号：US5041224A

公开(公告)日：1991-08-20

申请号：US329811

申请日：1989-03-28

申请人： Junji Ohyama ,  Harumi Iwashita ,  Kinya Kato ,  Nobuko Yamamoto ,  Masanori Sakuranaga ,  Tsunehiro Kanno ,  Yasuko Tomida

发明人： Junji Ohyama ,  Harumi Iwashita ,  Kinya Kato ,  Nobuko Yamamoto ,  Masanori Sakuranaga ,  Tsunehiro Kanno ,  Yasuko Tomida

IPC分类号： G01N27/333

CPC分类号： G01N27/3335

摘要： An ion permeable membrane, comprising two or more groups of substances having different sensitive wavelength regions in a lipid membrane, is provided.

摘要翻译： 提供了一种在脂质膜中包含两组以上具有不同灵敏波长区域的物质的离子透过膜。

公开(公告)号：US09599905B2

公开(公告)日：2017-03-21

申请号：US14124034

申请日：2011-11-25

申请人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kinya Kato ,  Takashi Mori

发明人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kinya Kato ,  Takashi Mori

IPC分类号： G03B27/72 ,  G03F7/20 ,  G02B26/08 ,  G02B27/28 ,  G03F7/00

CPC分类号： G03F7/70191 ,  G02B26/0816 ,  G02B26/0833 ,  G02B27/286 ,  G03F7/0007 ,  G03F7/70116 ,  G03F7/70566

摘要： An illumination optical system which illuminates an illumination objective surface with a light from a light source. The illumination optical system includes a spatial light modulator which includes a plurality of optical elements arranged within a predetermined plane and controlled individually, and which forms a light intensity distribution in an illumination pupil of the illumination optical system; and a polarization unit which is arranged in a position optically conjugate with the predetermined plane, and which polarizes an incident light beam having a first and second partial light beams, coming into the polarization unit such that the first and second partial light beams have polarization states different from each other, and emits the polarized incident light beam as an outgoing light beam, wherein the polarization unit changes, in a cross section of the outgoing light beam, a ratio between a cross sectional areas of the first and second partial light beams.

公开(公告)号：US20140233008A1

公开(公告)日：2014-08-21

申请号：US14124034

申请日：2011-11-25

申请人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kinya Kato ,  Takashi Mori

发明人： Osamu Tanitsu ,  Hirohisa Tanaka ,  Kinya Kato ,  Takashi Mori

IPC分类号： G03F7/20 ,  G02B26/08 ,  G02B27/28

CPC分类号： G03F7/70191 ,  G02B26/0816 ,  G02B26/0833 ,  G02B27/286 ,  G03F7/0007 ,  G03F7/70116 ,  G03F7/70566

摘要： An illumination optical system which illuminates an illumination objective surface with a light from a light source. The illumination optical system includes a spatial light modulator which includes a plurality of optical elements arranged within a predetermined plane and controlled individually, and which forms a light intensity distribution in an illumination pupil of the illumination optical system; and a polarization unit which is arranged in a position optically conjugate with the predetermined plane, and which polarizes an incident light beam having a first and second partial light beams, coming into the polarization unit such that the first and second partial light beams have polarization states different from each other, and emits the polarized incident light beam as an outgoing light beam, wherein the polarization unit changes, in a cross section of the outgoing light beam, a ratio between a cross sectional areas of the first and second partial light beams.

摘要翻译： 照明光学系统，其利用来自光源的光照射照明物镜表面。 照明光学系统包括：空间光调制器，其包括布置在预定平面内的多个光学元件，并分别控制，并且在照明光学系统的照明光瞳中形成光强度分布; 以及偏振单元，其布置在与所述预定平面光学共轭的位置，并且使具有第一和第二部分光束的入射光束偏振到所述偏振单元中，使得所述第一和第二部分光束具有偏振状态 彼此不同，并且发射偏振入射光束作为输出光束，其中偏振单元在出射光束的横截面中改变第一和第二部分光束的横截面积之间的比率。

公开(公告)号：US20080192216A1

公开(公告)日：2008-08-14

申请号：US12078863

申请日：2008-04-07

申请人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

发明人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

IPC分类号： G03B27/44

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： An apparatus includes a plurality of projection optical systems, each including optical elements arranged in an optical path between a first plane and a second plane and forming a radiation pattern from the first plane onto an exposure field on the second plane via the optical elements. A movable portion is disposed in the side of the second plane with respect to the projection optical systems, which holds an object to be moved relative to the exposure field in a first direction in the second plane during scanning exposure of the object in which the radiation patterns are formed on the object as the object is moved in the first direction. The projection optical systems may include an adjustable wedge prism. The projection optical systems may include first and second optical units, optical axes of the first and second optical units being decentered from each other.

摘要翻译： 一种装置包括多个投影光学系统，每个投影光学系统包括布置在第一平面和第二平面之间的光路中的光学元件，并且通过光学元件将第一平面的辐射图形形成在第二平面上的曝光场上。 可移动部分相对于投影光学系统设置在第二平面的侧面，该投影光学系统在扫描曝光期间在第二平面中沿第一方向相对于曝光场移动物体，其中辐射 当物体沿第一方向移动时，在物体上形成图案。 投影光学系统可以包括可调楔形棱镜。 投影光学系统可以包括第一和第二光学单元，第一和第二光学单元的光轴彼此偏心。

公开(公告)号：US07144556B2

公开(公告)日：2006-12-05

申请号：US10411178

申请日：2003-04-11

申请人： Kinya Kato

发明人： Kinya Kato

IPC分类号： B01J19/08

CPC分类号： B01D53/73 ,  A62D2203/10 ,  B01D53/002 ,  B01J19/123 ,  B01J19/127 ,  B01J2219/0004 ,  B01J2219/00087 ,  B01J2219/00155 ,  B01J2219/0875

摘要： A decomposition apparatus and a decomposition method using the apparatus in which a substance to be decomposed is decomposed with high efficiency are disclosed. A decomposition apparatus includes condensation means for increasing the concentration of the substance, and decomposition means provided with a decomposition chamber (predetermined space) for receiving and decomposing the substance. The substance of which concentration is increased by the condensation means, in a gaseous state, is directly transported to the decomposition chamber and is decomposed.

公开(公告)号：US07023527B2

公开(公告)日：2006-04-04

申请号：US10920294

申请日：2004-08-18

申请人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

发明人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

IPC分类号： G03B27/42 ,  G03B27/44 ,  G03B27/54

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： A scanning projection exposure apparatus transfers a pattern of a mask onto a photosensitive substrate while moving the photosensitive substrate along a scanning direction. The scanning projection exposure apparatus can include an illumination optical system optically connected to a light source, and a projection optical system arranged in an optical path between the mask and the substrate. The illumination optical system illuminates the mask with linearly polarized light whose polarization direction extends along one of the scanning direction and a direction perpendicular to the scanning direction, without losses in quantity of light. The illumination optical system of the scanning projection exposure apparatus also can include a wave plate which is rotatable about a traveling direction of the light.

摘要翻译： 扫描投影曝光装置在沿着扫描方向移动感光基板的同时将掩模的图案转印到感光基板上。 扫描投影曝光装置可以包括光学连接到光源的照明光学系统和布置在掩模和基板之间的光路中的投影光学系统。 照明光学系统以偏振方向沿着扫描方向和与扫描方向垂直的方向延伸的线偏振光照射掩模，而不损失光量。 扫描投影曝光装置的照明光学系统也可以包括能够围绕光的行进方向旋转的波片。

公开(公告)号：US20050034971A1

公开(公告)日：2005-02-17

申请号：US10952903

申请日：2004-09-30

申请人： Kinya Kato ,  Masahiro Kawaguchi ,  Akira Kuriyama

发明人： Kinya Kato ,  Masahiro Kawaguchi ,  Akira Kuriyama

IPC分类号： A62D3/00 ,  A62D3/17 ,  A62D3/176 ,  A62D3/34 ,  A62D3/35 ,  A62D101/22 ,  B01J19/00 ,  B01J19/12 ,  B01J19/26 ,  B01D53/70 ,  B01J19/08 ,  C07C1/00

CPC分类号： A62D3/176 ,  A62D2203/10 ,  B01J19/0006 ,  B01J19/123 ,  B01J19/26 ,  B01J2219/00186

摘要： The present invention enables efficient decomposition without involving burdensome operations of carrying out decomposition of undecomposed pollutants discharged at the time of starting decomposition processing and undecomposed pollutants remaining at the time of interruption and termination of decomposition processing, separately from primary decomposition. At the time of starting decomposition, the steps of supplying a substance, which functions to decompose the pollutant, to a decomposition area, applying light to the decomposition area and supplying a decomposition target substance to the reaction area are carried out in the recited order, while at the time of ending decomposition, the operations of supplying the decomposition target substance, applying light to the decomposition area and supplying the substance, which functions to decompose the pollutant to the decomposition area are carried out in the recited order.

摘要翻译： 本发明能够有效地分解，而不需要在分解处理开始时分解未分解污染物的分解和在分解处理中断和终止分解处理时残留的未分解污染物与主分解相分离的繁琐操作。 在开始分解时，按顺序进行将分解污染物的物质供给到分解区域，向分解区域施加光并向反应区域供给分解对象物质的工序， 在结束分解的同时，以所列举的顺序进行供给分解对象物质，向分解区域供给物质并将该污染物分解成分解区域的物质的供给动作。

公开(公告)号：US20050012917A1

公开(公告)日：2005-01-20

申请号：US10920294

申请日：2004-08-18

申请人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

发明人： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

IPC分类号： G02B13/22 ,  G02B17/00 ,  G02B17/06 ,  G02B17/08 ,  G02B27/10 ,  G03F7/20 ,  G03B27/54

CPC分类号： G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

摘要： A scanning projection exposure apparatus transfers a pattern of a mask onto a photosensitive substrate while moving the photosensitive substrate along a scanning direction. The scanning projection exposure apparatus can include an illumination optical system optically connected to a light source, and a projection optical system arranged in an optical path between the mask and the substrate. The illumination optical system illuminates the mask with linearly polarized light whose polarization direction extends along one of the scanning direction and a direction perpendicular to the scanning direction, without losses in quantity of light. The illumination optical system of the scanning projection exposure apparatus also can include a wave plate which is rotatable about a traveling direction of the light.

摘要翻译： 扫描投影曝光装置在沿着扫描方向移动感光基板的同时将掩模的图案转印到感光基板上。 扫描投影曝光装置可以包括光学连接到光源的照明光学系统和布置在掩模和基板之间的光路中的投影光学系统。 照明光学系统以偏振方向沿着扫描方向和与扫描方向垂直的方向延伸的线偏振光照射掩模，而不损失光量。 扫描投影曝光装置的照明光学系统也可以包括能够围绕光的行进方向旋转的波片。