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343 条记录 (耗时 0.05 秒)

    Radiation sources and methods of generating radiation
    71.
    发明授权
    Radiation sources and methods of generating radiation 有权
    辐射源和产生辐射的方法

    公开(公告)号：US08278636B2

    公开(公告)日：2012-10-02

    申请号：US12540596

    申请日：2009-08-13

    申请人： Erik Roelof Loopstra ,  Hendrikus Gijsbertus Schimmel

    发明人： Erik Roelof Loopstra ,  Hendrikus Gijsbertus Schimmel

    IPC分类号： G21K1/00

    CPC分类号： G03F7/70175 ,  G03F7/70033 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    摘要： A radiation source is configured to generate radiation. The radiation source includes a fuel droplet generator constructed and arranged to generate a stream of droplets of fuel that are directed to a plasma generation site; a laser constructed and arranged to generate a laser beam that is directed to the plasma generation site, an angle between the direction of movement of the stream of droplets and the direction of the laser beam being less than about 90°; and a collector constructed and arranged to collect radiation generated by a plasma formed at the plasma formation site when the beam of radiation and a droplet collide. The collector is configured to reflect the radiation substantially along an optical axis of the radiation source. The laser beam is directed to the plasma generation site through an aperture provided in the collector.

    摘要翻译： 辐射源被配置成产生辐射。 辐射源包括燃料液滴发生器，其被构造和布置成产生引导到等离子体产生位置的燃料液滴流; 激光器被构造和布置成产生被引导到等离子体产生位置的激光束，液滴流的移动方向与激光束的方向之间的角度小于约90°; 以及收集器，其被构造和布置成当辐射束和液滴碰撞时收集由等离子体形成部位形成的等离子体产生的辐射。 收集器被配置为基本上沿辐射源的光轴反射辐射。 激光束通过设置在收集器中的孔引导到等离子体产生位置。

    Lithographic apparatus and device manufacturing method
    74.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    光刻设备和器件制造方法

    公开(公告)号：US08013978B2

    公开(公告)日：2011-09-06

    申请号：US12213543

    申请日：2008-06-20

    申请人： Tammo Uitterdijk ,  Erik Roelof Loopstra ,  Laurens Anthony Sanderse

    发明人： Tammo Uitterdijk ,  Erik Roelof Loopstra ,  Laurens Anthony Sanderse

    IPC分类号： G03B27/42 ,  G03B27/52

    CPC分类号： G03F7/70341 ,  G03F7/70958

    摘要： In an immersion lithographic apparatus, a final element is disclosed having, on a surface nearest the substrate, a layer bonded to the surface and having an edge barrier, of the same material as the layer, extending from the layer away from the substrate to shield the final element from a liquid. In an embodiment, the final element is attached to the apparatus via the layer and/or edge barrier, which may be made of a material with a coefficient of thermal expansion lower than the coefficient of thermal expansion of the final element.

    摘要翻译： 在浸没式光刻设备中，公开了一种最终元件，其在最接近衬底的表面上具有与该层相同的材料结合到该表面并具有与层相同的材料的层，该层从该层延伸离开该衬底至该屏蔽层 来自液体的最终元素。 在一个实施例中，最终元件经由层和/或边缘屏障附接到设备，该层和/或边缘屏障可以由热膨胀系数低于最终元件的热膨胀系数的材料制成。

    LITHOGRAPHIC APPARATUS AND PATTERNING DEVICE
    77.
    发明申请
    LITHOGRAPHIC APPARATUS AND PATTERNING DEVICE 有权
    平面设备和图案设备

    公开(公告)号：US20110096311A1

    公开(公告)日：2011-04-28

    申请号：US12913539

    申请日：2010-10-27

    申请人： Hans BUTLER ,  Erik Roelof Loopstra

    发明人： Hans BUTLER ,  Erik Roelof Loopstra

    IPC分类号： G03B27/42

    CPC分类号： G03F7/7085 ,  G03F7/70358 ,  G03F7/70516

    摘要： A lithographic apparatus includes a support to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus includes a projection transfer measurement system to measure an optical projection transfer information of the projection system. The projection transfer measurement arrangement includes: an optical device to direct a measurement beam into the projection system during a scanning movement, a detector to detect the measurement beam having passed through the projection system during the scanning movement, and a measurement processor to determine the optical projection transfer information from the detected measurement beam. The optical device and the detector are arranged at an upstream end of the projection system.

    摘要翻译： 光刻设备包括支撑件以支撑图案形成装置，图案形成装置能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，构造成保持衬底的衬底台和投影系统 被配置为将所述图案化的辐射束投影到所述基板的目标部分上。 光刻设备包括用于测量投影系统的光学投影传递信息的投影传递测量系统。 投影传送测量装置包括：在扫描运动期间将测量光束引导到投影系统中的光学装置，用于检测在扫描运动期间通过投影系统的测量光束的检测器，以及用于确定光学器件的测量处理器 来自检测的测量光束的投影传送信息。 光学装置和检测器布置在投影系统的上游端。

    Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product
    78.
    发明授权
    Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product 有权
    控制系统，光刻投影装置，控制支撑结构的方法以及计算机程序产品

    公开(公告)号：US07804579B2

    公开(公告)日：2010-09-28

    申请号：US11812817

    申请日：2007-06-21

    申请人： Erik Roelof Loopstra ,  Engelbertus Antonlus Fransiscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst

    发明人： Erik Roelof Loopstra ,  Engelbertus Antonlus Fransiscus Van Der Pasch ,  Marc Wilhelmus Maria Van Der Wijst

    IPC分类号： G03B27/42 ,  G03B27/58 ,  G03B27/32 ,  G01B11/00 ,  G01B11/14

    CPC分类号： G03F7/709 ,  G03F7/70775 ,  G03F7/70858 ,  G03F9/7096

    摘要： A control system is provided for controlling a support structure in a lithographic apparatus. The control system includes a first measurement system arranged to measure the position of a substrate supported by the support structure, the position being measured in a first coordinate system. The control system further includes a second measurement system for measuring the position of the support structure in a second coordinate system, the first measurement system having a presumed position in the second coordinate system. The control system further comprises a controller configured to control the position of the support structure based on measurements by the second measurement system, to convert the measured position of the substrate into a converted position of the support structure in the second coordinate system, to position the support structure based on the converted position, to receive a position error signal indicative of a difference between the presumed position and an actual position of the first measurement system in the second coordinate system, and to position the support structure in a manner dependent upon the position error signal.

    摘要翻译： 提供了一种用于控制光刻设备中的支撑结构的控制系统。 控制系统包括第一测量系统，其布置成测量由支撑结构支撑的基板的位置，该位置在第一坐标系中被测量。 所述控制系统还包括用于在第二坐标系中测量所述支撑结构的位置的第二测量系统，所述第一测量系统在所述第二坐标系中具有推测位置。 所述控制系统还包括控制器，所述控制器被配置为基于所述第二测量系统的测量来控制所述支撑结构的位置，以将所述基板的测量位置转换成所述支撑结构在所述第二坐标系中的转换位置， 基于转换位置的支撑结构，接收表示第二坐标系中的第一测量系统的推测位置和实际位置之间的差异的位置误差信号，并且以取决于位置的方式定位支撑结构 误差信号。

    Device Manufacturing Method, Lithographic Apparatus and a Computer Program
    80.
    发明申请
    Device Manufacturing Method, Lithographic Apparatus and a Computer Program 有权
    设备制造方法，平版印刷设备和计算机程序

    公开(公告)号：US20100231890A1

    公开(公告)日：2010-09-16

    申请号：US12531230

    申请日：2008-03-14

    申请人： Alex Oudshoorn ,  Roland Blok ,  Erik Roelof Loopstra ,  Leon Martin Levasier

    发明人： Alex Oudshoorn ,  Roland Blok ,  Erik Roelof Loopstra ,  Leon Martin Levasier

    IPC分类号： G03B27/32

    CPC分类号： G03F7/70725 ,  G03F9/7003 ,  G03F9/7026 ,  G03F9/7034

    摘要： The invention relates to a device manufacturing method comprising exposing a substrate with a patterned beam of radiation formed by a reticle mounted on a displaceable reticle stage, wherein the method comprises the steps of determining a non-linear function for approximating a height and a tilt profile of a reticle surface with respect to the reticle stage and controlling a displacement of the reticle stage during exposure of the substrate in accordance with the non-linear function. The invention further relates to a lithographic apparatus and a computer program.

    摘要翻译： 本发明涉及一种器件制造方法，包括用安装在可移位标线片平台上的掩模版形成的图案化的辐射束暴露衬底，其中该方法包括以下步骤：确定近似高度和倾斜轮廓的非线性函数 的标线片表面，并且根据非线性函数控制在衬底曝光期间标线片台的位移。 本发明还涉及光刻设备和计算机程序。