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158 条记录 (耗时 0.038 秒)

    Photoresist topcoat for a photolithographic process
    72.
    发明授权
    Photoresist topcoat for a photolithographic process 有权
    光刻面漆，用于光刻工艺

    公开(公告)号：US07910290B2

    公开(公告)日：2011-03-22

    申请号：US12128129

    申请日：2008-05-28

    申请人： Robert David Allen ,  Ratnam Sooriyakumaran ,  Linda Karin Sundberg

    发明人： Robert David Allen ,  Ratnam Sooriyakumaran ,  Linda Karin Sundberg

    IPC分类号： G03F7/20 ,  G03F7/30 ,  G03F7/38 ,  G03F7/40 ,  G03F7/11

    CPC分类号： C08G77/04 ,  C08G77/045 ,  G03F7/0752 ,  G03F7/11 ,  G03F7/2041

    摘要： A method of forming an image using a topcoat composition. A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous base soluble moieties. Mixtures of the functionalized polyhedral oligomeric silsesquioxanes derivatives are highly suitable as a topcoat for photoresist in photolithography and immersion photolithography applications.

    摘要翻译： 使用面漆组合物形成图像的方法。 提供了式TmR3的官能化多面体低聚倍半硅氧烷衍生物，其中m等于8,10或12，QnMnR1，R2，R3其中n等于8,10或12的组合物。 官能团包括碱水溶性部分。 官能化多面体低聚倍半硅氧烷衍生物的混合物非常适合用作光刻和浸没光刻应用中的光致抗蚀剂的顶涂层。

    Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions
    73.
    发明授权
    Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions 失效
    氟化倍半硅氧烷聚合物及其在平版光刻胶组合物中的应用

    公开(公告)号：US07550254B2

    公开(公告)日：2009-06-23

    申请号：US11789902

    申请日：2007-04-25

    申请人： Ratnam Sooriyakumaran ,  Robert David Allen ,  Debra Fenzel-Alexander

    发明人： Ratnam Sooriyakumaran ,  Robert David Allen ,  Debra Fenzel-Alexander

    IPC分类号： G03F7/30 ,  G03F7/075

    CPC分类号： G03F7/0757 ,  G03F7/0045 ,  G03F7/0046

    摘要： Fluorocarbinol- and/or fluoroacid-functionalized silsesquioxane polymers and copolymers are provided. The polymers are substantially transparent to ultraviolet radiation (UV), i.e., radiation of a wavelength less than 365 nm and are also substantially transparent to deep ultraviolet radiation (DUV), i.e., radiation of a wavelength less than 250 nm, including 157 nm, 193 nm and 248 nm radiation, and are thus useful in single and bilayer, positive and negative, lithographic photoresist compositions, providing improved sensitivity and resolution. A process for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.

    摘要翻译： 提供氟代甲醇和/或氟酸官能化的倍半硅氧烷聚合物和共聚物。 聚合物对紫外线（UV）基本上是透明的，即波长小于365nm的辐射，并且对深紫外辐射（DUV）也是基本透明的，即波长小于250nm（包括157nm）的辐射， 193 nm和248 nm辐射，因此可用于单层和双层，正面和负面，平版印刷光刻胶组合物，提供更高的灵敏度和分辨率。 还提供了使用该组合物在衬底上产生抗蚀剂图像的方法，即在集成电路等的制造中。

    POLYMERIC FILMS MADE FROM POLYHEDRAL OLIGOMERIC SILSESQUIOXANE (POSS) AND A HYDROPHILIC COMONOMER
    74.
    发明申请
    POLYMERIC FILMS MADE FROM POLYHEDRAL OLIGOMERIC SILSESQUIOXANE (POSS) AND A HYDROPHILIC COMONOMER 有权
    聚偏氟乙烯（POSS）和亲水性聚合物制成的聚合物薄膜

    公开(公告)号：US20110120940A1

    公开(公告)日：2011-05-26

    申请号：US12624605

    申请日：2009-11-24

    申请人： Robert David Allen ,  Young-Hye Na ,  Ratnam Sooriyakumaran

    发明人： Robert David Allen ,  Young-Hye Na ,  Ratnam Sooriyakumaran

    IPC分类号： B01D71/40 ,  C08J7/04

    CPC分类号： B01D69/12 ,  B01D69/125 ,  B01D71/70 ,  B01D71/82 ,  B01D2323/34 ,  B01D2325/20 ,  C08J7/18

    摘要： A composite membrane includes a filtration membrane and a layer on a surface of the filtration membrane. The layer includes a polymer including a polyhedral oligomeric silsesquioxane (POSS) derivative with a hydrophilic moiety attached to at least one vertex thereof. A method for making a composite membrane includes applying to a surface of a filtration membrane a photopolymerizable composition including a POSS compound, a hydrophilic comonomer, and a photoinitiator. The composition is cured to form a hydrophilic layer on the filtration membrane.

    摘要翻译： 复合膜包括过滤膜和过滤膜表面上的层。 该层包括聚合物，其包括具有连接到其至少一个顶点的亲水部分的多面体低聚倍半硅氧烷（POSS）衍生物。 制造复合膜的方法包括向过滤膜的表面施加包含POSS化合物，亲水性共聚单体和光引发剂的光聚合性组合物。 固化组合物以在过滤膜上形成亲水层。