公开(公告)号：US20070190457A1

公开(公告)日：2007-08-16

申请号：US11702658

申请日：2007-02-06

申请人： Mutsuo Nakashima ,  Yoshitaka Hamada ,  Katsuya Takemura ,  Kazumi Noda

发明人： Mutsuo Nakashima ,  Yoshitaka Hamada ,  Katsuya Takemura ,  Kazumi Noda

IPC分类号： G03C1/00

CPC分类号： G03F7/0757 ,  G03F7/0045 ,  Y10S430/114

摘要： A resist composition is provided comprising a silicone resin, a photoacid generator, a nitrogen-containing organic compound, and a solvent. The silicone resin is obtained through cohydrolytic condensation of a mixture of three silane monomers containing a fluorinated norbornane group, an organic group having a carboxyl group protected with an acid labile group, and a lactone ring-bearing organic group, respectively. The resist composition has satisfactory resolution and overcomes the problem of a low selective etching ratio between resist film and organic film during oxygen reactive etching.

摘要翻译： 提供了包含有机硅树脂，光酸产生剂，含氮有机化合物和溶剂的抗蚀剂组合物。 有机硅树脂通过含有氟化降冰片烷基的三种硅烷单体和具有酸不稳定基团保护的羧基的有机基团和含有内酯环的有机基团的混合物的共水解缩合而获得。 抗蚀剂组合物具有令人满意的分辨率，并且克服了在氧反应蚀刻期间抗蚀剂膜和有机膜之间的选择性蚀刻比低的问题。

公开(公告)号：US20060224009A1

公开(公告)日：2006-10-05

申请号：US11393911

申请日：2006-03-31

申请人： Yoshitaka Hamada ,  Mutsuo Nakashima

发明人： Yoshitaka Hamada ,  Mutsuo Nakashima

IPC分类号： C07F7/00

CPC分类号： G03F7/0757 ,  C08G77/045 ,  G03F7/0045 ,  H01L21/3122

摘要： A silsesquioxane compound mixture having a high proportion of silsesquioxane compounds bearing bulky substituent groups on side chain and having a degree of condensation of substantially 100% is prepared by a first stage wherein a silane feed comprising a trifunctional silane bearing a bulky substituent group on side chain represented by formula (1): wherein Y is an aliphatic or aromatic organic group optionally having a functional group, X1, X2 and X3 are H, halogen, alkoxy or aryloxy is hydrolyzed in the presence of an acid or base catalyst, and a second stage wherein dehydrating condensation is carried out in the presence of a strong base catalyst while removing the water resulting from condensation out of the reaction system.

摘要翻译： 通过第一阶段制备具有高比例的在侧链上具有大体积取代基且具有基本上100％的缩合度的倍半硅氧烷化合物的倍半硅氧烷化合物混合物，其中包含在侧链上具有大体积取代基的三官能硅烷的硅烷进料 由式（1）表示：其中Y是任选具有官能团的脂族或芳族有机基团，X 1，X 2和X 3 O 在酸或碱催化剂的存在下，H，卤素，烷氧基或芳氧基被水解，第二步是在强碱催化剂的存在下进行脱水缩合，同时除去由反应物凝结出来的水 系统。

公开(公告)号：US06962767B2

公开(公告)日：2005-11-08

申请号：US10315069

申请日：2002-12-10

申请人： Takeru Watanabe ,  Takeshi Kinsho ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

发明人： Takeru Watanabe ,  Takeshi Kinsho ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

IPC分类号： G03F7/039 ,  C07D317/12 ,  C07D317/20 ,  C07D317/24 ,  C07D319/06 ,  C08F32/00 ,  C08F220/10 ,  C08F222/06 ,  C08F222/10 ,  C08G61/02 ,  C08G61/08 ,  G03C5/00

CPC分类号： C08G61/08 ,  C08G61/02 ,  Y10S430/106 ,  Y10S430/111

摘要： Acetal compounds in which a 5- or 6-membered ring acetal structure is connected to a norbornene structure through a linker represented by —(CH2)m— in which one hydrogen atom may be substituted with a hydroxyl or acetoxy group, and m is from 1 to 8 are novel. Using the acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.

摘要翻译： 其中5或6元环缩醛结构通过 - （CH 2 CH 2）m - 表示的连接体与降冰片烯结构连接的缩醛化合物，其中一个氢 原子可以被羟基或乙酰氧基取代，m为1至8的是新的。 使用缩醛化合物作为单体，得到聚合物。 包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，并且具有优异的灵敏度，分辨率和耐蚀刻性。

公开(公告)号：US06780563B2

公开(公告)日：2004-08-24

申请号：US09963465

申请日：2001-09-27

申请人： Koji Hasegawa ,  Takeshi Kinsho ,  Takeru Watanabe ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Tsunehiro Nishi ,  Jun Hatakeyama

发明人： Koji Hasegawa ,  Takeshi Kinsho ,  Takeru Watanabe ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Tsunehiro Nishi ,  Jun Hatakeyama

IPC分类号： G03F7039

CPC分类号： G03F7/0758 ,  G03F7/0045

摘要： A polymer bearing specific silicon-containing groups is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity and resolution at a wavelength of less than 300 nm, and high resistance to oxygen plasma etching. The resist composition lends itself to micropatterning for the fabrication of VLSIs.

摘要翻译： 具有特定含硅基团的聚合物是新颖的。 包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，并且在小于300nm的波长下具有优异的灵敏度和分辨率，以及高耐氧等离子体蚀刻性。 抗蚀剂组合物本身可用于制造VLSI的微图案。

公开(公告)号：US06670498B2

公开(公告)日：2003-12-30

申请号：US10288514

申请日：2002-11-06

申请人： Tsunehiro Nishi ,  Koji Hasegawa ,  Takeru Watanabe ,  Takeshi Kinsho ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

发明人： Tsunehiro Nishi ,  Koji Hasegawa ,  Takeru Watanabe ,  Takeshi Kinsho ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

IPC分类号： C07C6974

CPC分类号： G03F7/039 ,  C07C69/716 ,  C08G61/08 ,  G03F7/0045

摘要： An ester compound of the following formula (1) is provided. R1 is H, methyl or CH2CO2R3, R2 is H, methyl or CO2R3, R3 is C1-C15 alkyl, R4 is branched or cyclic, tertiary C5-C20 alkyl group, Z is a divalent C1-C10 hydrocarbon group, and k is 0 or 1. A resist composition comprising as the base resin a polymer resulting from the ester compound is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and is suited for micropatterning using electron beams or deep-UV.

摘要翻译： 提供下式（1）的酯化合物：R 1是H，甲基或CH 2 CO 2 R 3，R 2是H，甲基或CO 2 R 3，R 3是C 1 -C 15烷基 R 4是支链或环状的，叔C5-C20烷基，Z是二价C1-C10烃基，k是0或1.含有由酯化合物得到的聚合物作为基础树脂的抗蚀剂组合物是 对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，适用于使用电子束或深UV的微图案。

公开(公告)号：US06660448B2

公开(公告)日：2003-12-09

申请号：US09986274

申请日：2001-11-08

申请人： Seiichiro Tachibana ,  Mutsuo Nakashima ,  Tsunehiro Nishi ,  Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe ,  Jun Hatakeyama

发明人： Seiichiro Tachibana ,  Mutsuo Nakashima ,  Tsunehiro Nishi ,  Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe ,  Jun Hatakeyama

IPC分类号： C08F2400

CPC分类号： C08F222/06 ,  C08F232/08 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

摘要： The invention provides a polymer comprising recurring units containing bridged aliphatic rings in the backbone and having a hydroxyl, acyloxy or alkoxylcarbonyloxy group as well as a lactone structure bonded through a spacer, the polymer having a weight average molecular weight of 1,000-500,000. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.

公开(公告)号：US06500961B2

公开(公告)日：2002-12-31

申请号：US09867656

申请日：2001-05-31

申请人： Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

发明人： Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

IPC分类号： C07D30720

CPC分类号： C07D307/33 ,  G03F7/0395

摘要： Lactone compounds of formula (1) are useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography. R1 is H or C1-6 alkyl, R2 is H or an acyl or alkoxycarbonyl group of 1-15 carbon atoms which may be substituted with halogen atoms, Z is a divalent C1-15 organic group which forms a lactone ring with the carbonyloxy group, k is 0 or 1, and m is an integer from 0 to 5.

摘要翻译： 式（1）的内酯化合物可用作单体以形成适用于微图案光刻的化学放大抗蚀剂组合物的基础树脂.R1为H或C1-6烷基，R2为H或1-15碳的酰基或烷氧基羰基 可以被卤素原子取代的原子，Z是与羰基氧基形成内酯环的二价C1-15有机基团，k为0​​或1，m为0-5的整数。

公开(公告)号：US06472543B2

公开(公告)日：2002-10-29

申请号：US09897985

申请日：2001-07-05

申请人： Takeshi Kinsho ,  Takeru Watanabe ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

发明人： Takeshi Kinsho ,  Takeru Watanabe ,  Koji Hasegawa ,  Tsunehiro Nishi ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Jun Hatakeyama

IPC分类号： C07D40700

CPC分类号： C07D315/00 ,  G03F7/0395

摘要： Lactone compounds of formula (1) are novel and useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography. Letter k is 0 or 1 and m is an integer of 1-8.

摘要翻译： 式（1）的内酯化合物是新颖的并且可用作单体以形成适用于微图案光刻的化学放大抗蚀剂组合物的基础树脂。引发剂k为0或1，m为1-8的整数。

公开(公告)号：US06403823B2

公开(公告)日：2002-06-11

申请号：US09842006

申请日：2001-04-26

申请人： Koji Hasegawa ,  Takeru Watanabe ,  Takeshi Kinsho ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Tsunehiro Nishi ,  Jun Hatakeyama

发明人： Koji Hasegawa ,  Takeru Watanabe ,  Takeshi Kinsho ,  Mutsuo Nakashima ,  Seiichiro Tachibana ,  Tsunehiro Nishi ,  Jun Hatakeyama

IPC分类号： C07C6974

CPC分类号： G03F7/039 ,  C07C67/343 ,  C07C69/732

摘要： Ester compounds of formula (1) are useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography. R1 is H or C1-6 alkyl, R2 is an unsubstituted or halo-substituted acyl or alkoxycarbonyl group of 1-15 carbon atoms, R3 is an acid labile group, k is 0 or 1, and m is an integer from 0 to 5.

摘要翻译： 式（1）的酯化合物可用作单体以形成适用于微图案光刻的化学放大抗蚀剂组合物的基础树脂.R1是H或C1-6烷基，R2是未取代的或卤素取代的酰基或烷氧基羰基， -15个碳原子，R3是酸不稳定基团，k是0或1，m是0-5的整数。