公开(公告)号：US20070177787A1

公开(公告)日：2007-08-02

申请号：US11655226

申请日：2007-01-19

申请人： Shunji Maeda ,  Kaoru Sakai

发明人： Shunji Maeda ,  Kaoru Sakai

IPC分类号： G06K9/00

CPC分类号： G06K9/00557 ,  G06T7/001

摘要： A fault inspection method and apparatus in which the scattergram is separated or objects of comparison are combined in such a manner as to reduce the difference between an inspection object image and a reference image. As a result, the difference between images caused by the thickness difference in the wafer can be tolerated and the false information generation prevented without adversely affecting the sensitivity.

摘要翻译： 将分散图分离的故障检查方法和装置或比较对象组合起来，以减少检查对象图像与参考图像之间的差异。 结果，可以容忍由晶片的厚度差导致的图像之间的差异，并且可以防止错误的信息产生而不会不利地影响灵敏度。

公开(公告)号：US07231079B2

公开(公告)日：2007-06-12

申请号：US10050519

申请日：2002-01-18

申请人： Hirohito Okuda ,  Yuji Takagi ,  Masahiro Watanabe ,  Shunji Maeda ,  Minori Noguchi ,  Yoshimasa Ooshima ,  Makoto Ono

发明人： Hirohito Okuda ,  Yuji Takagi ,  Masahiro Watanabe ,  Shunji Maeda ,  Minori Noguchi ,  Yoshimasa Ooshima ,  Makoto Ono

IPC分类号： G06K9/00

CPC分类号： G01N21/956 ,  G01N21/9501 ,  G01N2021/8854 ,  G01N2021/8861

摘要： For the purpose of reducing a false report and shortening inspection time, an area to be inspected is locally inspected under optimum inspection conditions. In order to avoid the number of detected defects from increasing explosively, and thereby to facilitate control of a critical defect, general-purpose layout data, which is used for producing a mask of a semiconductor wafer, is accumulated in a design information server 2. With reference to the layout data, an area to be inspected, which is inspected by a pattern inspecting apparatus 1, is divided into partial inspection areas including a cell portion and a non-cell portion. Inspection parameters are set for each of the partial inspection areas. In addition, the defect reviewing apparatus 8 obtains an inspection result of the pattern inspecting apparatus 1. When obtaining a defect image, the defect reviewing apparatus 8 identifies a position, where the defect occurred, from among a cell portion, a non-cell portion, a pattern dense portion, and the like according to layout data. Moreover, the defect reviewing apparatus 8 sets inspection parameters, such as pickup magnification of this defect, in response to a result of the identification to set a control criterion of criticality.

摘要翻译： 为了减少虚假报告和缩短检查时间，在最佳检查条件下对被检查区域进行局部检查。 为了避免检测到的缺陷数量爆炸性增加，从而有利于控制关键缺陷，用于制造半导体晶片的掩模的通用布局数据被累积在设计信息服务器2中。 参照布局数据，由图案检查装置1检查的被检查区域被划分为包括单元部分和非单元部分的局部检查区域。 为每个部分检查区域设置检查参数。 另外，缺陷检查装置8获得图案检查装置1的检查结果。 当获得缺陷图像时，缺陷检查装置8根据布局数据从单元部分，非单元部分，图案密集部分等中识别发生缺陷的位置。 此外，缺陷检查装置8响应于识别的结果设置检查参数，例如该缺陷的拾取倍率，以设置关键性的控制标准。

公开(公告)号：US20070002318A1

公开(公告)日：2007-01-04

申请号：US11518195

申请日：2006-09-11

申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

IPC分类号： G01N21/88

CPC分类号： G01N21/95607 ,  G01N21/9501 ,  G01N21/95684 ,  G01N2021/9513

摘要： A method and apparatus for inspecting pattern defects emitting a laser beam, adjusting a light-amount of the laser beam, converting the light-amount adjusted laser beam into a slit-like laser light flux, lowering coherency of the slit-like laser light flux, and irradiating a sample with the coherence reduced slit-like laser light flux. An image of reflection light from the sample is obtained, and a detector is provided which includes the image sensor for receiving the image of the reflection light and for converting it into a detected image signal. An image processor is provided for detecting defects on patterns formed on the sample in accordance with the detected image signal.

摘要翻译： 用于检查发射激光束的图案缺陷的方法和装置，调节激光束的光量，将调整光量的激光束转换成狭缝状激光束，降低狭缝状激光光束的相干性 并且用相干减少的狭缝状激光束照射样品。 获得来自样品的反射光的图像，并且提供检测器，其包括用于接收反射光的图像并将其转换成检测到的图像信号的图像传感器。 提供了一种图像处理器，用于根据检测到的图像信号检测在样本上形成的图案上的缺陷。

公开(公告)号：US07142708B2

公开(公告)日：2006-11-28

申请号：US10176611

申请日：2002-06-24

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： An object of the present invention is to provide a defect detection method and its apparatus which can adjust sensitivity easily by managing both reduction in the number of false reports and highly-sensitive detection of a defect using single threshold value setting in comparison inspection that compares an image to be inspected with a reference image to detect a defect judging from a difference between the images. According to the present invention, adjusting the brightness before inspection so that a difference becomes small at the edges of a high-contrast pattern in a target image enables reduction in the number of false reports caused by an alignment error, and achievement of highly-sensitive defect inspection using a low threshold value, without increasing the threshold value. Moreover, in the case of inspection targeted for a semiconductor wafer, which produces a problem of irregularity in brightness of a pattern caused by a difference between film thicknesses, the present invention reduces the number of false reports caused by the irregularity in brightness, and realizes inspection with high sensitivity without increasing a threshold value, by adjusting the brightness of both images before the inspection.

公开(公告)号：US07110105B2

公开(公告)日：2006-09-19

申请号：US11192021

申请日：2005-07-29

申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

IPC分类号： G01N21/00

CPC分类号： G01N21/95607 ,  G01N21/9501 ,  G01N21/95684 ,  G01N2021/9513

摘要： A method and apparatus for inspecting pattern defects emitting a laser beam, adjusting a light-amount of the laser beam, converting the light-amount adjusted laser beam into a slit-like laser light flux, lowering coherency of the slit-like laser light flux, and irradiating a sample with the coherence reduced slit-like laser light flux. An image of reflection light from the sample is obtained, and a detector is provided which includes the image sensor for receiving the image of the reflection light and for converting it into a detected image signal. An image processor is provided for detecting defects on patterns formed on the sample in accordance with the detected image signal.

公开(公告)号：US20060159330A1

公开(公告)日：2006-07-20

申请号：US11328231

申请日：2006-01-10

申请人： Kaoru Sakai ,  Shunji Maeda ,  Hisae Shibuya ,  Hidetoshi Nishiyama

发明人： Kaoru Sakai ,  Shunji Maeda ,  Hisae Shibuya ,  Hidetoshi Nishiyama

IPC分类号： G06K9/00

CPC分类号： G06T7/0004 ,  G06T7/001 ,  G06T2207/30148

摘要： In a pattern inspection apparatus, influences of pattern brightness variations that is caused in association with, for example, a film thickness difference or a pattern width variation can be reduced, high sensitive pattern inspection can be implemented, and a variety of defects can be detected. Thereby, the pattern inspection apparatus adaptable to a broad range of processing steps is realized. In order to realize this, the pattern inspection apparatus of the present invention performs comparison between images of regions corresponding to patterns formed to be same patterns, thereby determining mismatch portions across the images to be defects. The apparatus includes multiple sensors capable of synchronously acquiring images of shiftable multiple detection systems different from one another, and an image comparator section corresponding thereto. In addition, the apparatus includes means of detecting a statistical offset value from the feature amount to be a defect, thereby enabling the defect to be properly detected even when a brightness difference is occurring in association with film a thickness difference in a wafer.

摘要翻译： 在图案检查装置中，可以减少与膜厚差或图案宽度变化相关联引起的图案亮度变化的影响，可以实现高灵敏度图案检查，并且可以检测各种缺陷 。 由此，可以实现适应于广泛的处理步骤的图案检查装置。 为了实现这一点，本发明的图案检查装置对与形成为相同图案的图案相对应的区域的图像进行比较，从而确定跨越图像的不匹配部分是缺陷。 该装置包括能够同时获取彼此不同的可移动多个检测系统的图像的多个传感器，以及与其对应的图像比较部。 此外，该装置包括检测从特征量成为缺陷的统计偏移值的装置，从而即使当与膜中的厚度差相关联地发生亮度差时，也能够适当地检测缺陷。

公开(公告)号：US20050264800A1

公开(公告)日：2005-12-01

申请号：US11192021

申请日：2005-07-29

申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe

IPC分类号： G01N21/00 ,  G01N21/95 ,  G01N21/956

CPC分类号： G01N21/95607 ,  G01N21/9501 ,  G01N21/95684 ,  G01N2021/9513

摘要： A method and apparatus for inspecting pattern defects emitting a laser beam, adjusting a light-amount of the laser beam, converting the light-amount adjusted laser beam into a slit-like laser light flux, lowering coherency of the slit-like laser light flux, and irradiating a sample with the coherence reduced slit-like laser light flux. An image of reflection light from the sample is obtained, and a detector is provided which includes the image sensor for receiving the image of the reflection light and for converting it into a detected image signal. An image processor is provided for detecting defects on patterns formed on the sample in accordance with the detected image signal.

摘要翻译： 用于检查发射激光束的图案缺陷的方法和装置，调节激光束的光量，将调整光量的激光束转换成狭缝状激光束，降低狭缝状激光光束的相干性 并且用相干减少的狭缝状激光束照射样品。 获得来自样品的反射光的图像，并且提供检测器，其包括用于接收反射光的图像并将其转换成检测到的图像信号的图像传感器。 提供了一种图像处理器，用于根据检测到的图像信号检测在样本上形成的图案上的缺陷。

公开(公告)号：US20050206888A1

公开(公告)日：2005-09-22

申请号：US11131379

申请日：2005-05-18

申请人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

发明人： Minoru Yoshida ,  Shunji Maeda ,  Atsushi Shimoda ,  Kaoru Sakai ,  Takafumi Okabe ,  Masahiro Watanabe

IPC分类号： G01N21/956 ,  G03F7/20 ,  G03F9/00

CPC分类号： G03F7/7065 ,  G01N21/95684

摘要： A pattern inspection apparatus includes a light source which emits ultraviolet light, an irradiator which reduces coherency of the ultraviolet light and irradiates the coherency reduced ultraviolet light onto a specimen on which a pattern is formed through an objective lens, and a focus control means which projects light on the specimen from outside the objective lens, detects light reflected from the specimen by the projection and adjusts a height of the specimen relative to the objective lens. The apparatus further includes an image which forms an image of the specimen irradiated with the ultraviolet light and detects the formed image with a sensor, an image processor which processes a signal outputted from the sensor to detect a defect of the specimen, and a display which displays information of the defect detected by the image processor.

摘要翻译： 图案检查装置包括发出紫外线的光源，减少紫外线的相干性并将相干性降低的紫外光照射到通过物镜形成图案的样本的照射器，以及投影 从物镜外部对样品进行光照射，通过投影检测从样品反射的光，并调整样本相对于物镜的高度。 该装置还包括形成用紫外线照射的样本的图像并用传感器检测形成的图像的图像，处理从传感器输出的信号以检测样本的缺陷的图像处理器，以及显示器 显示由图像处理器检测到的缺陷的信息。

公开(公告)号：US06943876B2

公开(公告)日：2005-09-13

申请号：US10223423

申请日：2002-08-20

申请人： Minoru Yoshida ,  Sachio Uto ,  Shunji Maeda ,  Toshihiko Nakata

发明人： Minoru Yoshida ,  Sachio Uto ,  Shunji Maeda ,  Toshihiko Nakata

IPC分类号： G01B11/30 ,  G01N21/956 ,  H01L21/66 ,  G02N21/88

CPC分类号： G01N21/95684

摘要： A method and apparatus for detecting pattern defects which includes annularly scanning of a laser beam emitted from a laser light source on a pupil of an objective lens, illuminating the scanned laser beam, through the objective lens, onto a sample on which there is formed a pattern coated with an optically transparent thin film, acquiring an optical image of the illuminated sample, and processing the acquired image to find defects in the pattern. The annular scan diameter of the laser beam is determined based on the thickness of the optically transparent thin film.

摘要翻译： 一种用于检测图案缺陷的方法和装置，其包括从物镜的瞳孔上的激光光源发射的激光束的环状扫描，将扫描的激光束通过物镜照射到其上形成有 涂覆有光学透明薄膜的图案，获取照射样品的光学图像，以及处理所获取的图像以发现图案中的缺陷。 基于光学透明薄膜的厚度确定激光束的环形扫描直径。

公开(公告)号：US06841403B2

公开(公告)日：2005-01-11

申请号：US10348747

申请日：2003-01-21

申请人： Maki Tanaka ,  Shunji Maeda ,  Minori Noguchi ,  Takafumi Okabe ,  Yuji Takagi ,  Chie Shishido

发明人： Maki Tanaka ,  Shunji Maeda ,  Minori Noguchi ,  Takafumi Okabe ,  Yuji Takagi ,  Chie Shishido

IPC分类号： H01L21/00 ,  H01L21/66 ,  G06F19/00

CPC分类号： H01L21/67276 ,  H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

摘要： Disclosed herein is a method for manufacturing semiconductor device and a method and apparatus for processing detected defect data, making it possible to quickly infer or determine a process and related manufacturing equipment that causes defects in a fabrication line of semiconductor devices, take remedy action, and achieve a constant and high yield. The method of the invention comprises quantitatively evaluating similarity of a defects distribution on a wafer that suffered abnormal occurrence of defects to inspection results for wafers inspected in the past, analyzing cyclicity of data sequence of evaluated similarity, evaluating relationship between the cyclicity of defects obtained from the analysis and the process method according to each manufacturing equipment in the fabrication line, and inferring or determining a causal process and equipment that caused the defects.

摘要翻译： 本发明公开了一种用于制造半导体器件的方法和用于处理检测到的缺陷数据的方法和装置，使得可以快速推断或确定导致半导体器件制造线中的缺陷的处理和相关制造设备，采取补救措施，以及 实现恒定和高收益。 本发明的方法包括定量评估在异常发生缺陷的晶片上的缺陷分布与以往检查的晶片的检查结果的相似性，分析评估的相似性的数据序列的循环性，评估从 根据制造线上每个制造设备的分析和处理方法，并推断或确定引起缺陷的因果过程和设备。