公开(公告)号：US5681216A

公开(公告)日：1997-10-28

申请号：US597680

申请日：1996-02-06

申请人： Dean Jennings

发明人： Dean Jennings

IPC分类号： B24B1/00 ,  B24B7/22 ,  B24B13/00 ,  B24D7/10 ,  H01L21/304 ,  B24B57/00

CPC分类号： H01L21/02024 ,  B24B1/00 ,  B24B13/00 ,  B24B7/228 ,  B24D7/10

摘要： A polishing tool having a polishing wheel that forms a set of pockets wherein the pockets receive a stream of water and are formed such that a high hydrostatic pressure builds in the pockets as the polishing tool rotates in a high precision grinding machine and addresses a surface of a substrate. The high hydrostatic pressure removes material from the surface of the substrate while preserving the precise thickness variation control of the high precision grinding machine.

摘要翻译： 一种抛光工具，其具有形成一组凹穴的抛光轮，其中凹穴接收水流并且形成为使得当抛光工具在高精度研磨机中旋转时，在袋中形成高静压力，并且处理 底物。 高静态压力从基材表面除去材料，同时保持高精度磨床的精确厚度变化控制。

公开(公告)号：US20120238111A1

公开(公告)日：2012-09-20

申请号：US13485699

申请日：2012-05-31

申请人： Dean Jennings ,  Haifan Liang ,  Mark Yam ,  Vijay Parihar ,  Abhilash J. Mayur ,  Aaron Hunter ,  Bruce Adams ,  Joseph Michael Ranish

发明人： Dean Jennings ,  Haifan Liang ,  Mark Yam ,  Vijay Parihar ,  Abhilash J. Mayur ,  Aaron Hunter ,  Bruce Adams ,  Joseph Michael Ranish

IPC分类号： H01L21/268

CPC分类号： B23K26/0608 ,  B23K26/0604 ,  B23K26/0613 ,  B23K26/073 ,  B23K26/0732 ,  B23K26/0736 ,  B23K26/0738 ,  B23K26/352 ,  H01L21/02675 ,  H01L21/2026 ,  H01L21/268 ,  H01L21/324

摘要： A thermal processing apparatus and method in which a first laser source, for example, a CO2 emitting at 10.6 μm is focused onto a silicon wafer as a line beam and a second laser source, for example, a GaAs laser bar emitting at 808 nm is focused onto the wafer as a larger beam surrounding the line beam. The two beams are scanned in synchronism in the direction of the narrow dimension of the line beam to create a narrow heating pulse from the line beam when activated by the larger beam. The energy of GaAs radiation is greater than the silicon bandgap energy and creates free carriers. The energy of the CO2 radiation is less than the silicon bandgap energy so silicon is otherwise transparent to it, but the long wavelength radiation is absorbed by the free carriers.

公开(公告)号：US20080025354A1

公开(公告)日：2008-01-31

申请号：US11461397

申请日：2006-07-31

申请人： Dean Jennings

发明人： Dean Jennings

IPC分类号： H01S3/13

CPC分类号： G02F1/11

摘要： A method for processing a coherent light pulse is provided. A coherent light pulse is dithered at a high frequency when it is reflected off of or transmitted through a piezoelectric material having an optical interface surface. A SAW-producing device that is disposed on the piezoelectric material generates a surface acoustic wave (SAW) on the optical interface surface. A travelling SAW or a standing SAW may be generated on the optical interface surface.

摘要翻译： 提供了一种处理相干光脉冲的方法。 当相干光脉冲被反射离开或透过具有光学界面表面的压电材料时，其高频抖动。 设置在压电材料上的SAW制造装置在光学界面上产生声表面波（SAW）。 可以在光学接口表面上产生行进的SAW或立体SAW。

公开(公告)号：US20070108166A1

公开(公告)日：2007-05-17

申请号：US11561784

申请日：2006-11-20

申请人： Dean Jennings ,  Mark Yam ,  Abhilash Mayur ,  Vernon Behrens ,  Paul O'Brien ,  Leonid Tertitski ,  Alexander Goldin

发明人： Dean Jennings ,  Mark Yam ,  Abhilash Mayur ,  Vernon Behrens ,  Paul O'Brien ,  Leonid Tertitski ,  Alexander Goldin

IPC分类号： B23K26/08

CPC分类号： H01L21/02683 ,  B23K26/032 ,  B23K26/034 ,  B23K26/04 ,  B23K26/0608 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/0665 ,  B23K26/0738 ,  B23K26/082 ,  B23K26/083 ,  B23K26/0838 ,  B23K26/0869 ,  B23K26/123 ,  B23K26/125 ,  B23K26/142 ,  B23K26/32 ,  B23K26/34 ,  B23K26/705 ,  B23K2101/34 ,  B23K2101/40 ,  B23K2103/08 ,  B23K2103/50 ,  C23C8/00 ,  C23C8/10 ,  C23C8/22 ,  C23C16/047 ,  C23C16/481 ,  G02B27/0955 ,  H01L21/00 ,  H01L21/2026 ,  H01L21/67115

摘要： The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.

摘要翻译： 热处理装置包括平台，连续波电磁辐射源，一系列透镜，平移机构，检测模块，三维自动对焦以及计算机系统。 该台被配置为在其上接收基板。 连续波电磁辐射源被设置在与该台相邻的位置，并且被配置成沿着朝向衬底的路径发射连续波电磁辐射。 该系列透镜设置在连续波电磁辐射源和台之间，并被配置为将连续波电磁辐射冷凝成基片表面上的连续波电磁辐射线。 翻译机构被配置为相对于彼此平移连续波电磁辐射的阶段和线。 检测模块位于路径内，被配置为检测连续波电磁辐射。

公开(公告)号：US20070032095A1

公开(公告)日：2007-02-08

申请号：US11199572

申请日：2005-08-08

申请人： Kartik Ramaswamy ,  Hiroji Hanawa ,  Biagio Gallo ,  Kenneth Collins ,  Kai Ma ,  Vijay Parihar ,  Dean Jennings ,  Abhilash Mayur ,  Amir Al-Bayati ,  Andrew Nguyen

发明人： Kartik Ramaswamy ,  Hiroji Hanawa ,  Biagio Gallo ,  Kenneth Collins ,  Kai Ma ,  Vijay Parihar ,  Dean Jennings ,  Abhilash Mayur ,  Amir Al-Bayati ,  Andrew Nguyen

IPC分类号： H01L21/00

CPC分类号： B23K26/0738 ,  B23K26/0608 ,  B23K26/0876 ,  B23K26/361 ,  B23K26/40 ,  B23K2103/172 ,  B23K2103/50 ,  H01L21/76843 ,  H01L21/76864 ,  H01L21/76873 ,  H01L21/76877 ,  H01L21/76886

摘要： A method of forming a conductor in a thin film structure on a semiconductor substrate includes forming high aspect ratio openings in a base layer having vertical side walls, depositing a dielectric barrier layer comprising a dielectric compound of a barrier metal on the surfaces of the high aspect ratio openings including the vertical side walls, depositing a metal barrier layer comprising the barrier metal on the first barrier layer, depositing a main conductor species seed layer on the metal barrier layer and depositing a main conductor layer. The method further includes annealing the main conductor layer by (a) directing light from an array of continuous wave lasers into a line of light extending at least partially across the thin film structure, and (b) translating the line of light relative to the thin film structure in a direction transverse to the line of light. The method of Claim 1 further comprising, prior to the annealing step, depositing an amorphous carbon optical absorber layer on the main conductor layer. The step of depositing an amorphous carbon optical absorber layer includes introducing a carbon-containing process gas into a reactor chamber containing the substrate in a process zone of the reactor, applying RF source power to an external reentrant conduit of the reactor to generate a reentrant toroidal RF plasma current passing through the process zone and applying a bias voltage to the substrate.

摘要翻译： 在半导体衬底上形成薄膜结构中的导体的方法包括在具有垂直侧壁的基底层中形成高纵横比的开口，在高方面的表面上沉积包含阻挡金属的电介质化合物的介电阻挡层 比例开口，包括垂直侧壁，在第一阻挡层上沉积包括阻挡金属的金属阻挡层，在金属阻挡层上沉积主导体种子种子层并沉积主导体层。 该方法还包括通过以下步骤来退火主导体层：（a）将来自连续波激光器阵列的光引导到至少部分穿过薄膜结构的光线，以及（b）相对于薄的平面 薄膜结构在横向于光线的方向上。 2.根据权利要求1所述的方法，还包括在所述退火步骤之前，在所述主导体层上沉积无定形碳光吸收层。 沉积无定形碳光吸收层的步骤包括将含碳工艺气体引入反应器的反应器室中，该反应器室在反应器的工艺区域中，将RF源功率施加到反应器的外部折入导管以产生可重入环形 RF等离子体电流通过工艺区域并向衬底施加偏置电压。

公开(公告)号：US20070032054A1

公开(公告)日：2007-02-08

申请号：US11199593

申请日：2005-08-08

申请人： Kartik Ramaswamy ,  Hiroji Hanawa ,  Biagio Gallo ,  Kenneth Collins ,  Kai Ma ,  Vijay Parihar ,  Dean Jennings ,  Abhilash Mayur ,  Amir Al-Bayati ,  Andrew Nguyen

发明人： Kartik Ramaswamy ,  Hiroji Hanawa ,  Biagio Gallo ,  Kenneth Collins ,  Kai Ma ,  Vijay Parihar ,  Dean Jennings ,  Abhilash Mayur ,  Amir Al-Bayati ,  Andrew Nguyen

IPC分类号： H01L21/26

CPC分类号： H01L21/0276 ,  C23C16/26 ,  C23C16/507 ,  H01J37/321 ,  H01L21/0332 ,  H01L21/0337 ,  H01L21/268 ,  H01L21/3081 ,  H01L21/3086 ,  H01L21/31144 ,  H01L21/32139 ,  Y10S430/151

摘要： A method of processing a thin film structure on a semiconductor substrate using an optically writable mask includes placing the substrate in a reactor chamber, the substrate having on its surface a target layer to be etched in accordance with a predetermined pattern, and depositing a carbon-containing hard mask layer on the substrate by (a) introducing a carbon-containing process gas into the chamber, (b) generating a reentrant toroidal RF plasma current in a reentrant path that includes a process zone overlying the workpiece by coupling plasma RF source power to an external portion of the reentrant path, and (c) coupling RF plasma bias power or bias voltage to the workpiece. The method further includes photolithographically defining the predetermined pattern in the carbon-containing hard mask layer, and etching the target layer in the presence of the hard mask layer.

摘要翻译： 使用光学可写掩模在半导体衬底上处理薄膜结构的方法包括将衬底放置在反应室中，所述衬底在其表面上根据预定图案在其表面上具有待蚀刻的靶层，并且沉积碳 - （a）将含碳工艺气体引入所述腔室中，（b）在折入路径中产生可重入环形的RF等离子体电流，所述凹入的RF等离子体电流包括通过耦合等离子体RF源功率的工件区域 到（c）将RF等离子体偏置功率或偏置电压耦合到工件的外部部分。 该方法还包括光刻地限定含碳硬掩模层中的预定图案，并且在存在硬掩模层的情况下蚀刻目标层。

公开(公告)号：US20060292808A1

公开(公告)日：2006-12-28

申请号：US11467074

申请日：2006-08-24

申请人： Luc Autryve ,  Chris Bencher ,  Dean Jennings ,  Haifan Liang ,  Abhilash Mayur ,  Mark Yam ,  Wendy Yeh ,  Richard Brough

发明人： Luc Autryve ,  Chris Bencher ,  Dean Jennings ,  Haifan Liang ,  Abhilash Mayur ,  Mark Yam ,  Wendy Yeh ,  Richard Brough

IPC分类号： H01L21/336

CPC分类号： H01L21/02115 ,  H01L21/02274 ,  H01L21/02354 ,  H01L21/0276 ,  H01L21/26513 ,  H01L21/268 ,  H01L21/3146 ,  H01L21/324

摘要： A method of processing a substrate comprising depositing a layer comprising amorphous carbon on the substrate and then laser annealing the substrate is provided. Optionally, the layer further comprises a dopant selected from the group consisting of nitrogen, boron, phosphorus, fluorine, and combinations thereof. In one aspect, the layer comprising amorphous carbon is an anti-reflective coating and an absorber layer that absorbs electromagnetic radiation emitted by the laser and anneals a top surface layer of the substrate.

摘要翻译： 提供一种处理衬底的方法，包括在衬底上沉积包含非晶碳的层，然后激光退火衬底。 任选地，该层还包括选自氮，硼，磷，氟及其组合的掺杂剂。 一方面，包含无定形碳的层是抗反射涂层和吸收层，其吸收由激光发射的电磁辐射并退火衬底的顶表面层。

公开(公告)号：US07109087B2

公开(公告)日：2006-09-19

申请号：US10679189

申请日：2003-10-03

申请人： Luc Van Autryve ,  Chris D. Bencher ,  Dean Jennings ,  Haifan Liang ,  Abhilash J. Mayur ,  Mark Yam ,  Wendy H. Yeh ,  Richard A. Brough

发明人： Luc Van Autryve ,  Chris D. Bencher ,  Dean Jennings ,  Haifan Liang ,  Abhilash J. Mayur ,  Mark Yam ,  Wendy H. Yeh ,  Richard A. Brough

IPC分类号： H01L21/336 ,  H01L21/425 ,  H01L21/26

CPC分类号： H01L21/3146 ,  H01L21/0276 ,  H01L21/26513 ,  H01L21/268 ,  H01L21/324

摘要： A method of processing a substrate comprising depositing a layer comprising amorphous carbon on the substrate and then laser annealing the substrate is provided. Optionally, the layer further comprises a dopant selected from the group consisting of nitrogen, boron, phosphorus, fluorine, and combinations thereof. In one aspect, the layer comprising amorphous carbon is an anti-reflective coating and an absorber layer that absorbs electromagnetic radiation emitted by the laser and anneals a top surface layer of the substrate.

摘要翻译： 提供一种处理衬底的方法，包括在衬底上沉积包含非晶碳的层，然后激光退火衬底。 任选地，该层还包含选自氮，硼，磷，氟及其组合的掺杂剂。 一方面，包含无定形碳的层是抗反射涂层和吸收层，其吸收由激光发射的电磁辐射并退火衬底的顶表面层。

公开(公告)号：US20060102607A1

公开(公告)日：2006-05-18

申请号：US11195380

申请日：2005-08-02

申请人： Bruce Adams ,  Dean Jennings ,  Aaron Hunter ,  Abhilash Mayur ,  Vijay Parihar ,  Timothy Thomas

发明人： Bruce Adams ,  Dean Jennings ,  Aaron Hunter ,  Abhilash Mayur ,  Vijay Parihar ,  Timothy Thomas

IPC分类号： B23K26/03 ,  B23K26/067

CPC分类号： G02B5/281 ,  G01J5/06 ,  H01S5/005 ,  H01S5/4012

摘要： A thermal processing system includes a source of laser radiation emitting at a laser wavelength, beam projection optics disposed between the reflective surface and a substrate support capable of holding a substrate to be processed, a pyrometer responsive to a pyrometer wavelength, and a wavelength responsive optical element having a first optical path for light in a first wavelength range including the laser wavelength, the first optical path being between the source of laser radiation and the beam projection optics, and a second optical path for light in a second wavelength range including the pyrometer wavelength, the second optical path being between the beam projection optics and the pyrometer. The system can further include a pyrometer wavelength blocking filter between the source of laser radiation and the wavelength responsive optical element.

公开(公告)号：US20060102599A1

公开(公告)日：2006-05-18

申请号：US11185454

申请日：2005-07-20

申请人： Bruce Adams ,  Dean Jennings ,  Aaron Hunter ,  Abhilash Mayur ,  Vijay Parihar

发明人： Bruce Adams ,  Dean Jennings ,  Aaron Hunter ,  Abhilash Mayur ,  Vijay Parihar

IPC分类号： B23K26/067

CPC分类号： B23K26/032 ,  B23K26/03 ,  B23K26/0604 ,  B23K26/0676 ,  B23K26/0738 ,  B23K26/702 ,  B23K2101/40

摘要： A thermal processing system includes a source of laser radiation having an array of lasers emitting light at a laser wavelength, a substrate support, optics disposed between said source and said substrate support for forming a line beam in a substrate plane of the substrate support from the light emitted by the source of laser radiation, and scanning apparatus for effecting movement of said line beam relative to said substrate support in a direction transverse to the longitudinal axis of said line beam. The system further includes a housing encompassing said optics, a light detector disposed inside said housing for sensing an ambient light level, a power supply coupled to the source of laser radiation, and a controller governing said power supply and responsive to said light detector for interrupting said power supply upon an increase in the output of said light detector above a threshold ambient level.

摘要翻译： 热处理系统包括激光辐射源，其具有发射激光波长的光的激光阵列，衬底支撑件，设置在所述源极和所述衬底支撑件之间的光学器件，用于在衬底支撑件的衬底平面中形成线束 由激光辐射源发射的光以及用于在垂直于所述线束的纵向轴线的方向上相对于所述衬底支撑件实现所述线束的运动的扫描装置。 该系统还包括包围所述光学元件的壳体，设置在所述壳体内用于感测环境光级别的光检测器，耦合到激光辐射源的电源，以及控制所述电源并响应于所述光检测器中断的控制器 所述电源在所述光检测器的输出增加超过阈值环境水平时。