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公开(公告)号：US5207693A
公开(公告)日：1993-05-04
申请号：US780486
申请日：1991-10-23
Applicant: Edward H. Phillips
Inventor： Edward H. Phillips
CPC classification number: A61B17/06123 , A61B17/0469 , A61B2017/06052
Abstract: An endoscopic suture tool is provided to minimize extra-corporeal exposure of the suture to bacteria and to minimize the possibility of suture entanglement with external trocars and other instruments. The suture tool has a holder with a protrubing hub for accepting a standard suture reel and an orifice through which the suture feeds into and through the lumen of an extension member releasably carried by the holder. Adjacent the distal end of the extension member, a slot is located in the extension member for captively and releasably holding the free end of the suture.
Abstract translation: 提供内窥镜缝合工具以最小化缝合线对细菌的体外暴露并最小化与外套管套和其他器械的缝线缠结的可能性。 缝合工具具有一个保持器，其具有用于接收标准缝线卷轴和孔口的突出毂，缝合线通过该孔口进入并通过由保持器可释放地承载的延伸部件的内腔。 在延伸构件的远端附近，狭槽位于延伸构件中，用于可自由地和可释放地保持缝合线的自由端。
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公开(公告)号：US5195958A
公开(公告)日：1993-03-23
申请号：US528954
申请日：1990-05-25
Applicant: Edward H. Phillips
Inventor： Edward H. Phillips
IPC: A61B1/00 , A61B17/00 , A61B17/22 , A61B17/32 , A61B17/34 , A61B18/00 , A61B18/12 , A61B18/14 , A61B18/22 , A61M1/00
CPC classification number: A61M1/0064 , A61B18/1482 , A61M1/0056 , A61B17/22 , A61B18/22 , A61B2017/00464 , A61B2017/3445 , A61B2018/00196 , A61M1/0043 , Y10S604/902
Abstract: The invention relates to a instrument for laparoscopic surgery which permits the operating surgeon to irrigate or suction the operative area while performing electrocautery or laser hemostasis and dissection of body tissue with the same instrument.The invention also relates to a laparoscopic tool for evacuating free stones or blood clots from the operating area which are to large to be suctioned from the body cavity or to remove gallstones from a gallbladder which has been distended by stones and cannot be retrieved through an umbillical sheath.
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公开(公告)号：US5059900A
公开(公告)日：1991-10-22
申请号：US558603
申请日：1990-07-26
Applicant: Edward H. Phillips
Inventor： Edward H. Phillips
IPC: G01P3/44
CPC classification number: G01P3/44
Abstract: A tachometer particularly adapted for operation as a rotational velocity feedback transducer is provided. First and second proximity detectors are used to monitor orthogonal positions of an irregular surface portion of a rotating shaft and provide x and y signals that are substantially in quadrature. The x and y signals are differentiated with respect to time to provide differential signals that are representative of dx/dt and dy/dt, respectively. Signals representative of products x dy/dt and y dx/dt are generated from the x signal and the differential signal dy/dt, and the y signal and the differential signal dx/dt, respectively. A signal representative of algebraic sum x dy/dt-y dx/dt is generated from the signals representative of products x dy/dt and y dx/dt. A signal representative of quotient of (x dy/dt-y dx/dt) divided by the square of the displacement r.sup.2 of the irregular surface portion is generated from the signal representative of algebraic sum (x dy/dt-y dx/dt) which signal is representative of the rotational velocity of the rotating shaft.
Abstract translation: 提供特别适合作为旋转速度反馈换能器操作的转速计。 第一和第二接近检测器用于监测旋转轴的不规则表面部分的正交位置，并提供基本上正交的x和y信号。 x和y信号相对于时间差分，以分别提供代表dx / dt和dy / dt的差分信号。 产生代表x dy / dt和y dx / dt的信号分别由x信号和差分信号dy / dt以及y信号和差分信号dx / dt产生。 从代表乘积x dy / dt和y dx / dt的信号产生代表代数和x dy / dt-y dx / dt的信号。 代表代数和（x dy / dt-y dx / dt）的信号代表（x dy / dt-y dx / dt）的商除以不规则表面部分的位移r2的平方的信号， 该信号代表旋转轴的旋转速度。
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公开(公告)号：US4977361A
公开(公告)日：1990-12-11
申请号：US86923
申请日：1987-08-14
Applicant: Edward H. Phillips , Karl-Heinz Johannsmeier
Inventor： Edward H. Phillips , Karl-Heinz Johannsmeier
Abstract: In an X-Y addressable workpiece positioner the workpiece to be positioned, such as a semiconductive wafer to be aligned with a mask image, is coupled to move with a work stage moveable in X and Y direction and having a two-dimensional array of positioning indicia affixed thereto for movement therewith. An enlarged image of a portion of the positioning array is projected onto a relatively stationary sensor stage to derive an output determinative of the X and Y coordinates of the positioning array relative to the position of the sensor. The sensed X and Y coordinates of the positioning array are compared with the X and Y coordinates of a reference positioning address to derive an error output. The work stage is moved in response to the error output for causing the workpiece to be positioned to the reference address. In a preferred embodiment of a mask aligner, the approximately stationary sensing stage is moved relative to the enlarged image of the positioning array for interpolating the X and Y coordinates of the sensed address. A viewing system is arranged for permitting the operator to superimpose the image of a pattern on the reference addressed position of the semiconductive wafer with a mask image. The sensing stage is moved by the operator to obtain precise registration of the images, thereby zeroing the reference position address to the interpolated value. The machine then sequentially steps the interpolated (zeroed) reference position address by predetermined increments, related to the size mask pattern to be projected onto the wafer, to cause the wafer to be sequentially exposed to the mask pattern in different regions thereof.
Abstract translation: 在XY可寻址的工件定位器中，待定位的工件，例如与掩模图像对准的半导体晶片，被连接以便可在X和Y方向上移动的工作台移动并且具有固定的定位标记的二维阵列 用于移动。 将定位阵列的一部分的放大图像投射到相对固定的传感器台上，以导出定位阵列相对于传感器位置的X和Y坐标的输出决定。 将感测的定位阵列的X和Y坐标与参考定位地址的X和Y坐标进行比较，以得到误差输出。 响应于使工件定位到参考地址的错误输出而移动工作台。 在掩模对准器的优选实施例中，大致静止感测级相对于定位阵列的放大图像移动，用于内插感测地址的X和Y坐标。 观察系统被布置成允许操作者用掩模图像将图案的图像叠加在半导体晶片的参考寻址位置上。 感测级由操作者移动以获得图像的精确注册，从而将参考位置地址归零到内插值。 然后，机器顺序地将内插（零）参考位置地址按预定的增量进行步进，与要投影到晶片上的尺寸掩模图案相关，以使晶片在其不同区域中顺序地暴露于掩模图案。
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公开(公告)号：US4956590A
公开(公告)日：1990-09-11
申请号：US254968
申请日：1988-10-06
Applicant: Edward H. Phillips
Inventor： Edward H. Phillips
CPC classification number: B62D5/0415 , B62D5/008 , B62D5/0469 , B62D5/0484
Abstract: A steering assembly for multiplying steering torque and motion applied from a steering wheel of a vehicle by fixed and selectively varying ratios, respectively. The applied steering torque and motion are coupled via an input shaft to a sun gear of a planetary gear set. Supplementary torque and steering motion are generated by a servo motor which is coupled to a ring gear of the planetary gear set via an irreversible differential planetary gear set. Rotational motion of the input shaft is determined and rotational motion of the servo motor is controlled as a selected function of the rotational motion of the input shaft. Actual rotational motion of the servo motor is measured and additional rotational motion of the servo motor is terminated if the actual rotational motion of the servo motor does not substantially match the selected rotational motion. A set of planetary gears mounted in a planetary carrier receives combined output torque and rotational motion from both the sun and ring gears. The planetary carrier is coupled to an output shaft which delivers the output torque and rotational position to a steering gear.
Abstract translation: 一种转向组件，用于分别通过固定和选择性地变化的比率来乘坐转向转矩和从车辆的方向盘施加的运动。 所施加的转向扭矩和运动经由输入轴联接到行星齿轮组的太阳齿轮。 辅助扭矩和转向运动由伺服马达产生，该伺服马达通过不可逆的差速行星齿轮组联接到行星齿轮组的齿圈。 确定输入轴的旋转运动，并且控制伺服电动机的旋转运动作为输入轴的旋转运动的选定功能。 测量伺服电动机的实际旋转运动，如果伺服电动机的实际旋转运动基本上不匹配所选择的旋转运动，则伺服电动机的附加旋转运动被终止。 安装在行星架上的一组行星齿轮从太阳和环形齿轮接收组合的输出扭矩和旋转运动。 行星齿轮架联接到输出轴，该输出轴将输出扭矩和旋转位置传递到舵机。
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86.发明授权
公开(公告)号：US4767954A
公开(公告)日：1988-08-30
申请号：US850964
申请日：1986-04-11
Applicant: Edward H. Phillips
Inventor： Edward H. Phillips
IPC: H02K41/035 , H02K41/02 , H02K41/00
CPC classification number: H02K41/031
Abstract: An improved solid state commutated linear motor with an ironless multiphase armature is disclosed which has a magnetic field array having periodic alternating polarity, an ironless multiphase armature, and a solid state commutating system for driving a moving element and positioning it with respect to a reference element. In one embodiment, the magnetic field array is elongated and fixedly located with respect to the reference element, and the ironless multiphase armature is fixedly located with respect to the moving element. In a second embodiment, the ironless multiphase armature is elongated and fixedly located with respect to the reference element, and the magnetic field array is fixedly located with respect to the moving element. The magnetic field array is generated by an array of spaced alternate north and south poled magnets having an inter-pole distance L. The ironless multiphase armature is comprised of coils having a center-line span equal to the inter-pole distance L, wherein the coils are interleaved and staggered to form the various phases. Solid state switches are used to commutate the phases by first faulting a phase as it approaches a space between magnetic poles and then reversing the connections of that phase as it leaves the space between the magnetic poles.
Abstract translation: 公开了一种具有无铁多相电枢的改进的固态换向线性电动机，其具有具有周期性交替极性的磁场阵列，无铁多相电枢以及用于驱动移动元件并将其相对于参考元件定位的固态换向系统 。 在一个实施例中，磁场阵列相对于参考元件是细长的并且固定地定位，并且无铁多相电枢相对于移动元件固定地定位。 在第二实施例中，无铁多相电枢相对于参考元件是细长的并且固定地定位，并且磁场阵列相对于移动元件固定地定位。 磁场阵列由具有极间距离L的间隔交替的北极和南极极磁体的阵列产生。无铁多相电枢由具有等于极间距离L的中心线跨度的线圈组成，其中， 线圈交错并交错以形成各种相。 固态开关用于通过首先在相位接近磁极之间的空间时故障相位，然后在离开磁极之间的空间时反转该相的连接，来换相。
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公开(公告)号：US4742286A
公开(公告)日：1988-05-03
申请号：US792436
申请日：1985-10-29
Applicant: Edward H. Phillips
Inventor： Edward H. Phillips
CPC classification number: G03F7/70716
Abstract: An improved gas bearing X-Y-.theta. stage assembly is disclosed which has a base, a stage element with three retroreflectors fixedly mounted thereto, and a control system for controlling the movement of the stage element. The control system is made up of three interferometer measuring systems for measuring parameters associated with changes in position of the three retroreflectors as the stage element moves. Also, the control system includes a transport system for moving the three interferometers to maintain optical coupling between the interferometers and retroreflectors. In addition, the control system includes control circuitry for causing the stage element to move to a preselected X-Y-.theta. position in response to signals from the interferometer measuring systems. In one embodiment, a first interferometer of a first one of the three interferometer measuring systems is moved linearly by the transport system on a gas bearing slide in a direction parallel to the Y-axis of the system, while second and third interferometers of the other two interferometer measuring systems are moved together on a second gas bearing slide parallel to the X-axis of the system.
Abstract translation: 公开了一种改进的气体轴承X-Y-θ台组件，其具有底座，具有固定地安装到其上的三个后向反射器的平台元件和用于控制舞台元件的运动的控制系统。 控制系统由三个干涉仪测量系统组成，用于测量与舞台元素移动时三个逆反射器位置变化相关的参数。 此外，控制系统包括用于移动三个干涉仪以保持干涉仪和后向反射器之间的光学耦合的传送系统。 此外，控制系统包括控制电路，用于响应于来自干涉仪测量系统的信号使载物台元件移动到预选的X-Y-θ位置。 在一个实施例中，三个干涉仪测量系统中的第一个干涉仪的第一干涉仪通过输送系统在气体轴承滑动件上在平行于系统的Y轴的方向上线性移动，而另一个的第二和第三干涉仪 两个干涉仪测量系统在与系统的X轴平行的第二气体支承滑动件上一起移动。
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公开(公告)号：US4676649A
公开(公告)日：1987-06-30
申请号：US802772
申请日：1985-11-27
Applicant: Edward H. Phillips
Inventor： Edward H. Phillips
IPC: B23Q1/00 , B23Q1/38 , B23Q1/48 , B23Q1/62 , G01B11/00 , G01B11/03 , G03F7/20 , G05B19/23 , G05B19/401 , H01L21/67 , H01L21/68
CPC classification number: G03F7/70716 , B23Q1/385 , B23Q1/621 , B23Q17/2495 , G01B11/002 , G05B19/231 , G05B19/4015 , G05B2219/37275 , G05B2219/41091 , G05B2219/41195 , G05B2219/41337 , G05B2219/45026 , G05B2219/49193 , G05B2219/49258 , G05B2219/49271 , G05B2219/49276 , G05B2219/50228
Abstract: An improved multi-axis gas bearing stage assembly is disclosed which has a base, an intermediate stage element, a stage, and a control system for controlling the movement of the intermediate stage element and the stage. The control system includes first and second Y-axes positioning sub-systems for differentially positioning first and second ends of the intermediate stage element along first and second Y-axes of motion, with respect to the base, and an X.sub.i -axis positioning sub-system for positioning the stage along an X.sub.i -axis of motion, with respect to the intermediate stage element. In one embodiment, the positioning sub-systems comprise motor-encoder driven leadscrews. In a second embodiment, the positioning sub-systems comprise linear motors, measuring scales, and read heads. In a third embodiment, the positioning sub-systems comprise linear motors and interferometer measuring systems. A method of achieving orthogonality between the Y- and X.sub.i -axes that features an orthogonality alignment standard is disclosed. In a another embodiment, the differential positioning capability of the first and second Y-axes is utilized for positioning the intermediate stage element along a .theta.-axis about a Z-direction orthogonal to both the Y- and X-axes, and a method of rotationally aligning a semiconductive wafer is disclosed. In other embodiments, two methods of kinematically positioning the improved multi-axis stage assembly within a utilization apparatus are disclosed. In another embodiment, three retroreflectors of an interferometer measuring system are mounted directly on a wafer chuck, located on the stage, and a transport system moves three interferometers rotationally, to maintain optical coupling between the interferometers and the retroreflectors. In still another embodiment, five retroreflectors are mounted directly on the wafer chuck and a five axis interferometer measuring system is utilized to eliminate all Abbe offset measurement errors in the position of a semiconductive wafer, placed upon the wafer chuck, along the X, Y, and .theta.-axes of motion.
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公开(公告)号：US4577958A
公开(公告)日：1986-03-25
申请号：US710232
申请日：1985-03-11
Applicant: Edward H. Phillips
Inventor： Edward H. Phillips
CPC classification number: G03F9/70
Abstract: A projection lens and a source of exposure light are employed for projecting an image of a reticle onto a first reference mark or a semiconductive wafer, both of which are movably supported in the image plane of the projection lens. Optical apparatus, including a source of nonexposure light and the projection lens, is provided for imaging a second adjustable reference mark onto the first reference mark or the semiconductive wafer to facilitate use of the projection lens in aligning a semiconductive wafer covered with a photoresist opaque to exposure light.
Abstract translation: 采用投影透镜和曝光光源将掩模版的图像投影到第一参考标记或半导体晶片上，两者均可移动地支撑在投影透镜的图像平面中。 提供了包括非曝光源和投影透镜的光学设备，用于将第二可调参考标记成像到第一参考标记或半导体晶片上，以便于使投影透镜对准覆盖有不透光光致抗蚀剂的半导体晶片 曝光灯
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公开(公告)号：US4516958A
公开(公告)日：1985-05-14
申请号：US548450
申请日：1983-11-03
Applicant: Edward H. Phillips
Inventor： Edward H. Phillips
CPC classification number: F16D3/005
Abstract: A flexible coupling is provided transmitting torque and thrust loads between parallel misaligned shafts, but does not permit any nonparallel misalignment between the shafts. The coupling comprises members that are attached to the shafts, each of which has two parallel bendable arms. The arms are nested and attached to a central rigid member located between the arms.
Abstract translation: 提供了一种柔性联轴器，用于在平行的不对准轴之间传递扭矩和推力载荷，但不允许轴之间的任何不平行的不对准。 联接器包括附接到轴的构件，每个轴具有两个平行的可弯曲臂。 臂被嵌套并且附接到位于臂之间的中心刚性构件。
