公开(公告)号：US07267497B2

公开(公告)日：2007-09-11

申请号：US11117552

申请日：2005-04-29

申请人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

发明人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

IPC分类号： G03D5/00

CPC分类号： H01L21/67184 ,  H01L21/67173 ,  H01L21/67178

摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with either of a case where antireflection films are formed and where any antireflection film is not formed. Film forming unit blocks: TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks: DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively where antireflection films are formed and any antireflection film is not formed. The coating and developing system is controlled by a carrying program and software.

摘要翻译： 涂布显影系统包括：抗蚀剂膜形成单元块和抗反射膜形成单元块，其层叠以形成抗蚀剂膜和抗反射膜下面的抗反射膜以及在小空间中覆盖抗蚀剂膜的抗反射膜。 涂覆和显影系统可以应对形成防反射膜的情况和其中没有形成任何抗反射膜的情况。 成膜单元块：TCT层B 3，COT层B 4和BCT层B 5以及显影单元块DEV层B 1和B 2在处理块S2中层叠。 选择性地使用TCT层B 3，COT层B 4和BCT层B 5，其中形成防反射膜并且不形成任何抗反射膜。 涂层和显影系统由携带程序和软件控制。

公开(公告)号：US20060201423A1

公开(公告)日：2006-09-14

申请号：US11276662

申请日：2006-03-09

申请人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

发明人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

IPC分类号： B05C13/02 ,  B05C11/00

CPC分类号： H01L21/67742 ,  G03F7/162 ,  H01L21/6715 ,  H01L21/67173 ,  H01L21/67178

摘要： A coating/developing device includes a processing block having a plurality of coating unit blocks stacked and a developing unit block stacked on the coating unit blocks. Each of the unit blocks is provided with a liquid processing unit for coating a liquid chemical on a substrate, a heating unit for heating the substrate, a cooling unit for cooling the substrate and a transfer unit for transferring the substrate between the units. The liquid processing unit is provided with a coating unit for coating a resist liquid on the substrate, a first bottom antireflection coating (BARC) forming unit for coating a liquid chemical for a BARC on the substrate before the resist liquid is coated thereon, and a second BARC forming unit for coating a liquid chemical for the BARC on the substrate after the resist liquid is coated thereon.

摘要翻译： 涂覆/显影装置包括具有堆叠的多个涂布单元块的处理块和堆叠在涂布单元块上的显影单元块。 每个单元块设置有用于在基板上涂覆液体化学品的液体处理单元，用于加热基板的加热单元，用于冷却基板的冷却单元和用于在单元之间转移基板的转移单元。 液体处理单元设置有用于在基板上涂覆抗蚀剂液体的涂布单元，在其上涂覆抗蚀剂液体之前，在基板上涂布用于BARC的液体化学品的第一底部抗反射涂层（BARC）形成单元，以及 第二BARC形成单元，用于在其上涂覆抗蚀剂液体之后，在基板上涂覆用于BARC的液体化学品。

公开(公告)号：US20060067528A1

公开(公告)日：2006-03-30

申请号：US11235163

申请日：2005-09-27

申请人： Yoshio Kimura

发明人： Yoshio Kimura

IPC分类号： H04N7/167

CPC分类号： H04N7/1675 ,  H04N21/2347 ,  H04N21/4334 ,  H04N21/4405 ,  H04N21/4408 ,  H04N21/4623 ,  H04N21/4627 ,  H04N21/835

摘要： A communication device comprises a decoding unit which encodes a content signal C by an encoding key Kc and outputs an encoded content signal Kc•C, a key encoding unit which encodes the encoding key Kc by use of a static device key k and a dynamic device key K1 stored in advance, and outputs an encoded encoding key k•K1•Kc, communicating units which communicate so as to record the encoded encoding key k•K1•Kc output by the key encoding unit into a predetermined area on a network, and further record in duplication the encoded encoding key together with an encoded content signal Kc•C into a predetermined device on the network, and a key updating unit which updates the stored dynamic device key, when the encoding key Kc is abolished.

摘要翻译： 通信设备包括：解码单元，其通过编码密钥Kc对内容信号C进行编码，并输出编码内容信号Kc.C，通过使用静态设备密钥k对编码密钥Kc进行编码的密钥编码单元;以及动态设备 键K 1，并且输出编码编码密钥kK1Kc，通信单元，其通信以将由密钥编码单元输出的编码编码密钥kK1.Kc记录到网络上的预定区域中，并且进一步 将编码编码密钥与编码内容信号Kc.C一起复制到网络上的预定设备中，以及当消除编码密钥Kc时，更新存储的动态设备密钥的密钥更新单元。

公开(公告)号：US06447184B2

公开(公告)日：2002-09-10

申请号：US09126387

申请日：1998-07-30

申请人： Yoshio Kimura ,  Akihiko Noda

发明人： Yoshio Kimura ,  Akihiko Noda

IPC分类号： B41J1300

CPC分类号： G06F3/1204 ,  G06F3/1205 ,  G06F3/1232 ,  G06F3/126 ,  G06F3/1288

摘要： A networked printing system has the capability of selecting a particular paper feeding slot of a printer by designating a paper name assigned to that particular paper feeding slot. Thus, an optimum printing operation is performed by the printer assigned that paper name. A controller communicates with the respective printers and produces a paper name information table. A paper name list is then produced according to this paper name information table. In accordance with the paper name list, a list of selectable paper names is displayed on a printing operation control screen. If a particular paper name is selected by a user from this list, then a printer assigned the selected paper name is retrieved from the paper name information table, and the retrieve printer is employed as the destination to which printing information is output.

摘要翻译： 网络打印系统具有通过指定分配给特定给纸槽的纸张名称来选择打印机的特定进纸槽的能力。 因此，分配该纸名的打印机进行最佳打印操作。 控制器与相应的打印机进行通信，并产生纸名信息表。 然后根据本文的名称信息表生成纸名列表。 根据纸张名称列表，在打印操作控制屏幕上显示可选纸张名称的列表。 如果用户从该列表中选择特定纸名，则从纸名信息表中检索分配了所选纸名的打印机，并且采用检索打印机作为输出打印信息的目的地。

公开(公告)号：US06444029B1

公开(公告)日：2002-09-03

申请号：US09338544

申请日：1999-06-23

申请人： Yoshio Kimura ,  Issei Ueda

发明人： Yoshio Kimura ,  Issei Ueda

IPC分类号： B05C1100

CPC分类号： H01L21/67178 ,  B05C11/08 ,  G03F7/162 ,  G03F7/3021 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/6715 ,  H01L21/67184

摘要： The system comprises a multistage spin unit having a plurality of compartments stacked vertically in a multistage, a main arm mechanism comprising a wafer holder and driving means for causing the wafer holder to advance and retreat longitudinally, moving the wafer holder up and down along a vertical shaft and turning the wafer holder around the vertical shaft, a spin chuck provided on each of the compartments for holding and spin-rotating the wafer delivered by the main arm mechanism, a cup for surrounding the spin chuck to receive and discharge a treatment solution separated from the substrate by centrifugal force, a shared nozzle for supplying the treatment solution toward the substrate held by the spin chuck in the compartment, a nozzle moving passageway provided along the multistage spin unit for communicating with each compartment to move the shared nozzle therethrough, and a nozzle moving mechanism for moving the shared nozzle.

摘要翻译： 该系统包括多级旋转单元，该多级旋转单元具有多级垂直堆叠的多个隔间;主臂机构，包括晶片保持架和驱动装置，用于使晶片架沿纵向前进和后退;沿垂直方向上移和移动晶片架 并且将晶片保持器围绕垂直轴转动，设置在每个隔室上的旋转卡盘，用于保持和旋转由主臂机构输送的晶片，用于围绕旋转卡盘的杯子，以接收和排出分离的处理溶液 通过离心力从基板通过用于将处理溶液朝着由旋转卡盘保持在隔室中的基板供应的共用喷嘴，沿着多级旋转单元设置的喷嘴移动通道，用于与每个隔间连通以使共享喷嘴通过其移动;以及 用于使共享喷嘴移动的喷嘴移动机构。

公开(公告)号：US06439822B1

公开(公告)日：2002-08-27

申请号：US09401486

申请日：1999-09-22

申请人： Yoshio Kimura ,  Issei Ueda ,  Mitiaki Matsushita ,  Kazuhiko Ito

发明人： Yoshio Kimura ,  Issei Ueda ,  Mitiaki Matsushita ,  Kazuhiko Ito

IPC分类号： B65G110

CPC分类号： H01L21/67778 ,  H01L21/67769 ,  H01L21/67772 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

摘要： A substrate processing apparatus comprises a processing section for performing processing for a substrate, a substrate carrier transfer section into/out of which a substrate carrier holding a plurality of substrates is carried, and a substrate transfer mechanism for taking an unprocessed substrate out of the substrate carrier carried into the substrate carrier transfer section to deliver it to the processing section and for receiving a processed substrate from the processing section to deliver it into the substrate carrier placed on the substrate carrier transfer section. The substrate carrier transfer section shifts the position of the substrate carrier between a first position at which the substrate carrier is carried to/from the outside and a second position at which the substrate in the substrate carrier is delivered to/from the substrate transfer mechanism.

公开(公告)号：US06427717B1

公开(公告)日：2002-08-06

申请号：US09340963

申请日：1999-06-28

申请人： Yoshio Kimura

发明人： Yoshio Kimura

IPC分类号： F16K4900

CPC分类号： F16L53/32 ,  Y10T137/6579

摘要： A process solution supplying apparatus for supplying a process solution onto a substrate to be processed, comprising a process solution supply source, a process solution supply tube having its upstream end connected to the process solution supply source and serving to discharge the process solution from the downstream end thereof onto the substrate, a fluid passageway opening-closing valve device mounted on a downstream side of the process solution supply tube for opening-closing the process solution supply tube, and a temperature adjusting solution tube, through which flows a temperature adjusting solution, arranged continuously through the fluid passageway opening-closing valve device in a downstream portion of the process solution supply tube including the fluid passageway opening-closing valve device for adjusting the temperature of the process solution within the process solution supply tube.

摘要翻译： 一种用于将处理溶液供应到待处理的基板上的处理溶液供应装置，包括处理溶液供应源，其上游端连接到处理液供应源并用于从下游排出处理溶液的处理溶液供应管 安装在处理液供给管的下游侧的流通通道开闭阀装置，用于打开处理液供给管的开闭部，温度调节溶液管流过温度调节液， 在包括流体通道开闭阀装置的处理溶液供应管的下游部分中连续地布置流体通道打开 - 关闭阀装置，用于调节处理溶液供应管内的处理溶液的温度。

公开(公告)号：US06398429B1

公开(公告)日：2002-06-04

申请号：US09524282

申请日：2000-03-13

申请人： Takayuki Toshima ,  Tsutae Omori ,  Yoshio Kimura

发明人： Takayuki Toshima ,  Tsutae Omori ,  Yoshio Kimura

IPC分类号： G03D500

CPC分类号： G03D5/04 ,  G03F7/3021 ,  G03F7/38 ,  Y10S134/902

摘要： A solution having a photosensitive radical is applied onto a resist film, a developing solution is applied thereonto, and the entire surface of the solution having the photosensitive radical is exposed all at once. Developing of the resist film progresses all at once after a coating film of the solution having the photosensitive radical dissolves in the developing solution, and hence time difference in the start time of developing does not occur in the surface of a substrate, thereby enabling uniform developing and an improvement in line width uniformity (CD value uniformity) in the surface of the substrate.

摘要翻译： 将具有光敏基团的溶液施加到抗蚀剂膜上，将显影液施加到其上，并且具有光敏基团的溶液的整个表面全部被曝光。 在具有感光性自由基的溶液的涂膜溶解在显影液中之后，抗蚀剂膜的显影全部进行，因此在基板表面上不会发生显影开始时间的时间差，从而能够均匀显影 以及衬底表面的线宽均匀性（CD值均匀性）的改善。

公开(公告)号：US06318980B1

公开(公告)日：2001-11-20

申请号：US09466662

申请日：1999-12-20

申请人： Masayuki Kurihara ,  Iwao Uchikado ,  Yoshio Kimura ,  Tetsuya Noda ,  Kazuhiko Takai

发明人： Masayuki Kurihara ,  Iwao Uchikado ,  Yoshio Kimura ,  Tetsuya Noda ,  Kazuhiko Takai

IPC分类号： F04B3910

CPC分类号： F04B27/1009 ,  F04B39/1073 ,  F04B39/108 ,  Y10T137/7892

摘要： Discharge holes and suction holes having shapes that suppress the turbulence of a refrigerant gas flow are disclosed. The shape of the discharge hole according to the present invention has a tapered surface wall, such that the circumference of the discharge hole increases from the piston cylinder surface to the discharge chamber surface. Similarly, the shape of the suction hole according to the present invention has a tapered surface wall such that the circumference of the suction hole increases from the suction chamber surface to the piston cylinder surface. The present invention allows the flow path of the refrigerant gas to flow approximately tangential to the valve reed by providing a tapered surface wall. The flow resistance of the discharge hole or the suction hole is reduced such that the volume efficiency of the compressor is improved and compressor noise is suppressed.

摘要翻译： 公开了具有抑制制冷剂气流的湍流的形状的排出孔和吸入孔。 根据本发明的排出孔的形状具有锥形表面壁，使得排出孔的周长从活塞筒表面增加到排出室表面。 类似地，根据本发明的吸入孔的形状具有锥形表面壁，使得吸入孔的周长从吸入室表面增加到活塞筒表面。 本发明通过提供锥形表面壁允许制冷剂气体的流动路径大致与阀簧片相切。 排气孔或吸入孔的流动阻力减小，压缩机的体积效率提高，压缩机噪音受到抑制。

公开(公告)号：US06158990A

公开(公告)日：2000-12-12

申请号：US56796

申请日：1998-04-08

申请人： Yoshio Kimura ,  Hideto Shimizu

发明人： Yoshio Kimura ,  Hideto Shimizu

IPC分类号： F04C18/02 ,  F01C1/02

CPC分类号： F04C18/0253

摘要： In order to increase productivity of spiral machining, to provide a low-cost scroll member for a scroll type of fluid machinery, and to provide a scroll type of fluid machinery that does not generate a burr in a base plate surface at the time of finishing, a scroll member (39) has a spiral element (43) formed in a spiral shape around an axis and a base plate (41) provided in one piece in an end face of the spiral element (43) in an axial direction. In addition, the scroll member (39) compresses fluid with forming a fluid pocket between the spiral elements by performing swing motion that is prevented from relatively rotating to a counterpart of scroll member having a spiral element meshing with the spiral element (43) and a base plate facing to the base plate (41). A chamfered section (149) is formed in a bare surface on the base plate surface (141) on an extension line (89) of an inner wall surface's spiral end of this spiral element (43) wall surface so that a distance from the extension line of the spiral end toward the center may be within a range less than the thickness of a spiral element's wall of the counterpart of scroll member.

摘要翻译： 为了提高螺旋加工的生产率，为了提供一种用于涡旋式流体机械的低成本涡旋构件，并且提供在完成时不会在基板表面产生毛刺的涡旋式流体机械 涡旋构件（39）具有围绕轴线形成为螺旋状的螺旋形元件（43）和沿轴向设置在螺旋形元件（43）的端面中的一体的基板（41）。 此外，涡旋构件（39）通过执行防止相对旋转的旋转运动而在具有与螺旋形元件（43）啮合的螺旋形元件的涡旋构件的对应物之间通过在螺旋形元件之间形成流体袋来压缩流体，并且 基板面向基板（41）。 在该螺旋形元件（43）壁表面的内壁表面的螺旋端的延伸线（89）上的基板表面（141）的裸露表面上形成倒角部分（149），使得距离延伸部 螺旋端朝向中心的线可以在小于涡旋构件的对应物的螺旋元件的壁的厚度的范围内。