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89 条记录 (耗时 0.023 秒)

    Filters of electronic displays
    81.
    发明授权
    Filters of electronic displays 失效
    电子显示屏过滤器

    公开(公告)号：US07242542B2

    公开(公告)日：2007-07-10

    申请号：US10516749

    申请日：2003-07-03

    申请人： Ikuo Shimizu ,  Motoharu Kinugasa ,  Hiroshi Toyoda ,  Masanori Ikuta ,  Kyoko Katagi

    发明人： Ikuo Shimizu ,  Motoharu Kinugasa ,  Hiroshi Toyoda ,  Masanori Ikuta ,  Kyoko Katagi

    IPC分类号： G02B5/22 ,  C07D209/02

    CPC分类号： C07D207/335 ,  C07D209/14 ,  C07D403/08 ,  G02B5/223 ,  H01J2211/44 ,  Y10T428/1041

    摘要： A filter of an electronic display device provides a clear image, the filter comprising an squarylium compound represent by formula (II): wherein R15 and R17 independently represent a hydrogen atom, a halogen atom, substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted aryl group, a nitro group, a cyano group, a hydroxyl group, a substituted or unsubstituted amino group, or a substituted or unsubstituted heterocyclic group; R16 and R18 independently represent an alkoxyalkoxyl-substituted alkyl group; R19 and R20 independently represent a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxyl group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted aryl group, a nitro group, a cyano group, a hydroxyl group, a substituted or unsubstituted amino group, or a substituted or unsubstituted heterocyclic group; m represents an integer of 0 to 4, wherein, when m is 2 to 4, R19 may be the same or different, respectively; and n represents an integer of 0 to 4, wherein, when n is 2 to 4, R20 may be the same or different respectively.

    摘要翻译： 电子显示装置的滤光器提供清晰的图像，该滤光片包括由式（II）表示的方酸化合物：其中R 15和R 17独立地表示氢原子 卤素原子，取代或未取代的烷基，取代或未取代的烷氧基，取代或未取代的芳烷基，取代或未取代的芳基，硝基，氰基，羟基，取代或未取代的氨基 ，或取代或未取代的杂环基; R 16和R 18独立地表示烷氧基烷氧基取代的烷基; R 19和R 20独立地表示卤素原子，取代或未取代的烷基，取代或未取代的烷氧基，取代或未取代的芳烷基，取代或未取代的烷基 芳基，硝基，氰基，羟基，取代或未取代的氨基或取代或未取代的杂环基; m表示0〜4的整数，其中，当m为2〜4时，R 19可以相同或不同， n表示0〜4的整数，n为2〜4时，R 20可以相同也可以不同。

    Method of making multi-level wiring in a semiconductor device
    88.
    发明授权
    Method of making multi-level wiring in a semiconductor device 有权
    在半导体器件中制造多层布线的方法

    公开(公告)号：US06579785B2

    公开(公告)日：2003-06-17

    申请号：US09767724

    申请日：2001-01-24

    申请人： Hiroshi Toyoda ,  Tetsuo Matsuda ,  Hisashi Kaneko ,  Hideaki Hirabayashi

    发明人： Hiroshi Toyoda ,  Tetsuo Matsuda ,  Hisashi Kaneko ,  Hideaki Hirabayashi

    IPC分类号： H01L2144

    CPC分类号： H01L21/76849 ,  H01L21/76819 ,  H01L21/7684 ,  H01L21/76843 ,  H01L21/76855 ,  H01L21/76873 ,  H01L21/76877 ,  H01L23/53238 ,  H01L23/53242 ,  H01L23/53252 ,  H01L2924/0002 ,  H01L2924/00

    摘要： A method of manufacturing a semiconductor device, which comprises the steps of forming an intermediate layer on an insulating layer, forming a groove in the intermediate layer and the insulating layer, forming a first barrier layer on the intermediate layer, depositing a wiring layer on the first barrier layer to thereby fill the groove with the wiring layer, performing a flattening treatment of the wiring layer, removing a surface portion of the wiring to thereby permit the surface of the wiring to be recessed lower than a surface of the insulating layer, thus forming a recessed portion, forming a second barrier layer on the intermediate layer and on an inner wall of the recessed portion, performing a flattening treatment of the second barrier layer, thereby, and selectively removing the intermediate layer, exposing the insulating layer.

    摘要翻译： 一种制造半导体器件的方法，包括以下步骤：在绝缘层上形成中间层，在中间层中形成沟槽和绝缘层，在中间层上形成第一阻挡层，在其上沉积布线层 第一阻挡层，从而使布线层填充沟槽，对布线层进行平坦化处理，去除布线的表面部分，从而允许布线的表面比绝缘层的表面凹陷，因此 形成凹部，在所述中间层和所述凹部的内壁上形成第二阻挡层，对所述第二阻挡层进行平坦化处理，从而选择性地除去所述中间层，使所述绝缘层露出。

    Linear motor and method of producing the same
    89.
    发明授权
    Linear motor and method of producing the same 有权

    公开(公告)号：US06548920B2

    公开(公告)日：2003-04-15

    申请号：US09796618

    申请日：2001-03-02

    申请人： Kim Houng Joong ,  Hiromitsu Seino ,  Ryouichi Naganuma ,  Hiroshi Toyoda ,  Kohji Maki

    发明人： Kim Houng Joong ,  Hiromitsu Seino ,  Ryouichi Naganuma ,  Hiroshi Toyoda ,  Kohji Maki

    IPC分类号： H02K4103

    CPC分类号： H02K41/031

    摘要： A linear motor and a method of producing the linear motor are provided to reduce a leak magnetic flux flowing between an armature and a moving element to reduce a one-direction magnetic attraction force generated between the armature and the moving element. The linear motor includes the armature having a core formed of a magnetic body and a winding wound around the core, and the moving element supported so as for the moving element to move relatively to the armature via a gap, magnetic pole teeth disposed above and below the moving element, disposed at predetermined pitches along a moving direction of the moving element and disposed opposite to each other via the moving element, and a winding for exciting the magnetic pole teeth such that adjacent and opposite magnetic pole teeth have different magnetic poles, and the moving element is reciprocated relatively to the armature by exciting the winding according to a predetermined control circuit.