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    POLYMERIZABLE FLUORINATED ESTER COMPOUNDS AND THEIR PREPARING PROCESSES
    82.
    发明申请
    POLYMERIZABLE FLUORINATED ESTER COMPOUNDS AND THEIR PREPARING PROCESSES 有权
    可聚合氟化酯化合物及其制备方法

    公开(公告)号：US20070249858A1

    公开(公告)日：2007-10-25

    申请号：US10958373

    申请日：2004-10-06

    申请人： Takeshi Kinsho ,  Takeru Watanabe

    发明人： Takeshi Kinsho ,  Takeru Watanabe

    IPC分类号： C07C69/52

    CPC分类号： C07C67/29 ,  C07C29/40 ,  C07C45/512 ,  C07C49/172 ,  C07C49/173 ,  C07C49/245 ,  C07C67/14 ,  C07C69/653 ,  C07C2601/14 ,  C07C2603/74 ,  C07F7/1804 ,  C07C35/52 ,  C07C35/48 ,  C07C33/46 ,  C07C31/42

    摘要： Polymerizable fluorinated ester compounds having formulae (1) and (2) are novel wherein R1 is H, methyl or trifluoromethyl, R2 and R3 are H or a monovalent hydrocarbon group, R2 and R3 may form a ring, R4 is H, OH or a monovalent hydrocarbon group, and R5 is an acid labile group. They are useful as monomers to produce polymers for the manufacture of radiation-sensitive resist compositions which have high transparency to radiation having a wavelength of up to 500 nm and exhibit good development properties due to the presence of phenol-like acidic hydroxyl groups.

    摘要翻译： 具有式（1）和（2）的可聚合的氟化酯化合物是新的，其中R 1是H，甲基或三氟甲基，R 2和R 3 >为H或一价烃基，R 2和R 3可以形成环，R 4是H，OH或单价烃 基团，R 5是酸不稳定基团。 它们可用作制备用于制造辐射敏感性抗蚀剂组合物的聚合物，其对波长高达500nm的辐射具有高透明度，并且由于存在酚样酸性羟基而表现出良好的显影性能。

    Novel epoxy compounds having an alicyclic structure, polymer compounds, resist materials, and patterning methods
    84.
    发明申请
    Novel epoxy compounds having an alicyclic structure, polymer compounds, resist materials, and patterning methods 审中-公开
    具有脂环结构的新型环氧化合物，高分子化合物，抗蚀剂材料和图案化方法

    公开(公告)号：US20050142491A1

    公开(公告)日：2005-06-30

    申请号：US11057008

    申请日：2005-02-11

    申请人： Koji Hasegawa ,  Takeshi Kinsho ,  Takeru Watanabe

    发明人： Koji Hasegawa ,  Takeshi Kinsho ,  Takeru Watanabe

    IPC分类号： C08F34/00 ,  C08G61/12 ,  G03F7/039 ,  G03C1/76

    CPC分类号： G03F7/0397 ,  G03F7/0395

    摘要： Provided is a novel epoxy compound useful, in photolithography, as a monomer for preparing a photoresist material excellent in transparency and affinity to a substrate. More specifically, provided are an epoxy compound represented by the following formula (1): wherein, R1 and R2 each independently represents a hydrogen atom or a linear, branched or cyclic C1-10 alkyl group in which hydrogen atoms on one or more constituent carbon atoms thereof may be partially or entirely substituted by one or more halogen atoms, or the constituent —CH2— may be substituted by an oxygen atom, or R1 and R2 may be coupled together to form an aliphatic hydrocarbon ring; R3 represents a linear, branched or cyclic C1-10 alkyl group or a C1-15 acyl or alkoxycarbonyl group in which hydrogen atoms on one or more constituent carbon atoms thereof may be partially or entirely substituted by one or more halogen atoms; X represents CH2, oxygen or sulfur; k stands for 0 or 1; and m stands for an integer of 0 to 5; and a polymer compound having recurring units available therefrom.

    摘要翻译： 提供了一种新颖的环氧化合物，在光刻中可用作制备对基材透明性和亲和性优异的光致抗蚀剂材料的单体。 更具体地，提供由下式（1）表示的环氧化合物：其中R 1和R 2各自独立地表示氢原子或直链，支链或 其中一个或多个构成碳原子上的氢原子可以被一个或多个卤素原子部分或全部取代的环状C 1-10烷基，或者构成-CH 2 可以被氧原子取代，或者R 1和R 2可以连接在一起形成脂族烃环; R 3表示直链，支链或环状C 1-10烷基或C 1-15酰基或烷氧基羰基，其中氢原子 其一个或多个构成碳原子可以部分或全部被一个或多个卤素原子取代; X表示CH 2，氧或硫; k代表0或1; m表示0〜5的整数。 和具有可从其获得的重复单元的高分子化合物。

    Tertiary alcohol compounds having alicyclic structure
    85.
    发明授权
    Tertiary alcohol compounds having alicyclic structure 有权
    具有脂环结构的叔醇化合物

    公开(公告)号：US06774258B2

    公开(公告)日：2004-08-10

    申请号：US10012419

    申请日：2001-12-12

    申请人： Koji Hasegawa ,  Takeru Watanabe ,  Takeshi Kinsho

    发明人： Koji Hasegawa ,  Takeru Watanabe ,  Takeshi Kinsho

    IPC分类号： C07C6974

    CPC分类号： C07C69/753 ,  C07C69/608 ,  C07C2602/42 ,  C07C2603/86

    摘要： Tertiary alcohol compounds of formula (1) are novel wherein R1 and R2 are C1-10 alkyl groups which may have halogen substituents, or R1 and R2 may form an aliphatic hydrocarbon ring, Y and Z are a single bond or a divalent C1-10 organic group, and k=0 or 1. Using the tertiary alcohol compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, etching resistance and substrate adhesion.

    摘要翻译： 式（1）的叔醇化合物是新的，其中R 1和R 2是可具有卤素取代基的C 1-10烷基，或R 1和R 2可以形成脂族烃环，Y Z为单键或二价C 1-10有机基团，k = 0或1.使用叔醇化合物作为单体，得到聚合物。 包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率，耐蚀刻性和基材粘合性。

    Process for preparing tetrakis (trimethylsily) silane and tris (trimethysilyl) silane
    86.
    发明授权
    Process for preparing tetrakis (trimethylsily) silane and tris (trimethysilyl) silane 有权
    制备四（三甲基甲硅烷基）硅烷和三（三甲基甲硅烷基）硅烷的方法

    公开(公告)号：US06337415B1

    公开(公告)日：2002-01-08

    申请号：US09704557

    申请日：2000-11-03

    申请人： Ayumu Kiyomori ,  Tohru Kubota ,  Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe

    发明人： Ayumu Kiyomori ,  Tohru Kubota ,  Takeshi Kinsho ,  Koji Hasegawa ,  Takeru Watanabe

    IPC分类号： C07F704

    CPC分类号： C07F7/0803

    摘要： Tetrakis(trimethylsilyl)silane is prepared by reacting tetrachlorosilane with chlorotrimethylsilane in the presence of lithium metal, adding a compound with active proton(s) to the reaction mixture for treating the residual lithium metal therewith while maintaining the mixture neutral or acidic, and separating tetrakis(trimethylsilyl)silane from the organic layer. The residual lithium metal is treated in a safe and simple manner. Reaction of the tetrakis(trimethylsilyl)silane with an alkyl lithium or alkali metal alkoxide, followed by acid hydrolysis, affords tris(trimethylsilyl)silane. The desired compounds are prepared in high yields and on an industrial scale.

    摘要翻译： 通过四氯硅烷与氯代三甲基硅烷在锂金属的存在下反应制备四（三甲基甲硅烷基）硅烷，在反应混合物中加入具有活性质子的化合物，用于处理残留的锂金属同时保持混合物中性或酸性，并分离四 （三甲基甲硅烷基）硅烷。 剩余的锂金属以安全和简单的方式进行处理。 四（三甲基甲硅烷基）硅烷与烷基锂或碱金属醇盐的反应，然后进行酸水解，得到三（三甲基甲硅烷基）硅烷。 所需化合物以高产率和工业规模制备。

    Method for producing molecule immobilizing substrate, and molecule immobilizing substrate
    87.
    发明授权
    Method for producing molecule immobilizing substrate, and molecule immobilizing substrate 有权
    制备分子固定底物的方法和分子固定底物

    公开(公告)号：US09034661B2

    公开(公告)日：2015-05-19

    申请号：US12709020

    申请日：2010-02-19

    申请人： Wataru Kusaki ,  Toshinobu Ishihara ,  Takeshi Kinsho ,  Takeru Watanabe

    发明人： Wataru Kusaki ,  Toshinobu Ishihara ,  Takeshi Kinsho ,  Takeru Watanabe

    IPC分类号： G01N33/544 ,  G01N33/543 ,  G01N33/53 ,  C08L83/04 ,  C08L83/06

    CPC分类号： G01N33/54393 ,  C08L83/04 ,  C08L83/06 ,  G01N33/543 ,  G01N33/54353

    摘要： There is disclosed a method for producing a molecule immobilizing substrate, comprising at least the steps of: forming, on a substrate, a monomolecular film including hydroxyl groups, cyano groups, or oxiranyl groups, which are oriented toward an outmost surface of the monomolecular film; and chemically modifying the hydroxyl groups, cyano groups, or oxiranyl groups of the monomolecular film to transform them into carboxyl groups, to thereby form, on the substrate, the monomolecular film including the carboxyl groups, which are oriented toward an outmost surface of the monomolecular film. There can be provided: a method for producing a molecule immobilizing substrate which is free of occurrence of an immobilized-molecule peeling problem in the case of conducting an assay by immobilizing molecules on the substrate.

    摘要翻译： 公开了一种分子固定基板的制造方法，至少包括以下步骤：在基板上形成包含羟基，氰基或环氧乙烷基的单分子膜，该单分子膜朝向单分子膜的最外表面 ; 并对单分子膜的羟基，氰基或环氧乙烷基进行化学改性，将其转化为羧基，从而在基材上形成包含羧基的单分子膜，该单分子膜朝向单分子膜的最外表面 电影。 可以提供：在通过将分子固定在基材上进行测定的情况下，制备不存在固定化分子剥离问题的分子固定化基质的方法。

    Resist composition and patterning process
    90.
    发明授权
    Resist composition and patterning process 有权
    抗蚀剂组成和图案化工艺

    公开(公告)号：US08592133B2

    公开(公告)日：2013-11-26

    申请号：US13427621

    申请日：2012-03-22

    申请人： Satoshi Watanabe ,  Akinobu Tanaka ,  Takeru Watanabe ,  Takeshi Kinsho

    发明人： Satoshi Watanabe ,  Akinobu Tanaka ,  Takeru Watanabe ,  Takeshi Kinsho

    IPC分类号： G03F7/00 ,  G03F7/20 ,  G03F7/028 ,  G03F7/40 ,  G03F1/08

    CPC分类号： G03F7/0045 ,  G03F7/0382 ,  Y10S430/114 ,  Y10S430/128

    摘要： The present invention relates to: a resist composition such as a chemically amplified resist composition for providing an excellent pattern profile even at a substrate-side boundary face of resist, in addition to a higher resolution in photolithography for micro-fabrication, and particularly in photolithography adopting, as an exposure source, KrF laser, ArF laser, F2 laser, ultra-short ultraviolet light, electron beam, X-rays, or the like; and a patterning process utilizing the resist composition. The present invention provides a chemically amplified resist composition comprising one or more kinds of amine compounds or amine oxide compounds (except for those having a nitrogen atom of amine or amine oxide included in a ring structure of an aromatic ring) at least having a carboxyl group and having no hydrogen atoms covalently bonded to a nitrogen atom as a basic center.

    摘要翻译： 本发明涉及：抗蚀剂组合物，例如化学放大抗蚀剂组合物，除了在微制造的光刻中具有更高分辨率之外，甚至在抗蚀剂的衬底侧边界面上也提供优异的图案图形，特别是在光刻 采用KrF激光，ArF激光，F2激光，超短紫外光，电子束，X射线等作为曝光源; 以及利用抗蚀剂组合物的图案化工艺。 本发明提供一种化学放大抗蚀剂组合物，其包含至少具有羧基的一种或多种胺化合物或氧化胺化合物（除了具有包含在芳环的环结构中的胺或氧化胺的氮原子的那些） 并且不具有与氮原子共价键合的氢原子作为碱性中心。