Nitride semiconductor light-emitting device
    81.
    发明申请
    Nitride semiconductor light-emitting device 有权
    氮化物半导体发光器件

    公开(公告)号:US20100150199A1

    公开(公告)日:2010-06-17

    申请号:US12656932

    申请日:2010-02-19

    IPC分类号: H01S5/22

    摘要: A nitride semiconductor light-emitting device wherein a substrate or nitride semiconductor layer has a defect concentration region and a low defect density region other than the defect concentration region. A portion including the defect concentration region of the nitride semiconductor layer or substrate has a trench region deeper than the low defect density region. Thus by digging the trench in the defect concentration region, the growth detection is uniformized, and the surface planarity is improved. The uniformity of the characteristic in the wafer surface leads to improvement of the yield.

    摘要翻译: 一种氮化物半导体发光器件,其中衬底或氮化物半导体层具有缺陷浓度区域和除缺陷浓度区域之外的低缺陷密度区域。 包含氮化物半导体层或衬底的缺陷浓度区域的部分具有比低缺陷密度区域更深的沟槽区域。 因此,通过挖掘缺陷浓度区域中的沟槽,生长检测是均匀的,并且表面平面度得到改善。 晶片表面的特性的均匀性导致产率的提高。

    Nitride semiconductor light emitting device and method for manufacturing nitride semiconductor light emitting device
    83.
    发明申请

    公开(公告)号:US20090010293A1

    公开(公告)日:2009-01-08

    申请号:US12216295

    申请日:2008-07-02

    申请人: Takeshi Kamikawa

    发明人: Takeshi Kamikawa

    IPC分类号: H01S5/22 H01L33/00

    CPC分类号: H01S5/32341

    摘要: A nitride semiconductor light emitting device includes an n-type GaN substrate (101) that is a nitride semiconductor substrate, a nitride semiconductor layer including a p-type nitride semiconductor layer formed on the n-type GaN substrate (101). The p-type nitride semiconductor layer includes a p-type AlGaInN contact layer (108), a p-type AlGaInN cladding layer (107) under the p-type AlGaInN contact layer (108), and a p-type AlGaInN layer (106). A protection film (113) made of a silicon nitride film is formed above a current injection region formed in the p-type nitride semiconductor layer.

    摘要翻译: 氮化物半导体发光器件包括作为氮化物半导体衬底的n型GaN衬底(101),包括形成在n型GaN衬底(101)上的p型氮化物半导体层的氮化物半导体层。 p型氮化物半导体层包括p型AlGaInN接触层(108),p型AlGaInN接触层(108)下的p型AlGaInN覆盖层(107)和p型AlGaInN层(106) )。 在形成在p型氮化物半导体层中的电流注入区域的上方形成由氮化硅膜形成的保护膜(113)。

    Nitride semiconductor light emitting device and method of fabricating nitride semiconductor laser device
    84.
    发明申请
    Nitride semiconductor light emitting device and method of fabricating nitride semiconductor laser device 有权
    氮化物半导体发光器件及其制造方法

    公开(公告)号:US20070138491A1

    公开(公告)日:2007-06-21

    申请号:US11638581

    申请日:2006-12-14

    IPC分类号: H01L33/00

    摘要: There is provided a nitride semiconductor light emitting device having a light emitting portion coated with a coating film, the light emitting portion being formed of a nitride semiconductor, the coating film in contact with the light emitting portion being formed of an oxynitride film deposited adjacent to the light emitting portion and an oxide film deposited on the oxynitride film. There is also provided a method of fabricating a nitride semiconductor laser device having a cavity with a facet coated with a coating film, including the steps of: providing cleavage to form the facet of the cavity; and coating the facet of the cavity with a coating film formed of an oxynitride film deposited adjacent to the facet of the cavity and an oxide film deposited on the oxynitride film.

    摘要翻译: 提供了一种具有涂覆有涂膜的发光部分的氮化物半导体发光器件,该发光部分由氮化物半导体形成,与发光部分接触的涂膜由邻近沉积的氮氧化物膜形成 发光部分和沉积在氧氮化物膜上的氧化膜。 还提供了一种制造氮化物半导体激光器件的方法,该器件具有具有涂覆有涂膜的小面的空腔,包括以下步骤:提供切割以形成腔的小平面; 并用由邻近腔的沉积物沉积的氧氮化物膜和沉积在氧氮化物膜上的氧化膜形成的涂膜涂覆空腔的小面。

    Nitride semiconductor light emitting device
    86.
    发明申请
    Nitride semiconductor light emitting device 有权
    氮化物半导体发光器件

    公开(公告)号:US20060038166A1

    公开(公告)日:2006-02-23

    申请号:US11206222

    申请日:2005-08-18

    IPC分类号: H01L29/06

    摘要: A first region and a second region that has a defect density of which the value is higher than that of the first region are respectively formed so as to be aligned in stripe form in the direction parallel to the direction in which a dug out region extends, where atoms that terminate the surface of the first region are different from atoms that terminate the surface of the aforementioned second region, and the dug out region includes the first region and the second region.

    摘要翻译: 具有比第一区域的缺陷密度高的缺陷密度的第一区域和第二区域分别形成为在平行于挖出区域延伸的方向的方向上以条纹的形式排列, 其中终止第一区域的表面的原子不同于终止上述第二区域的表面的原子,并且该挖出区域包括第一区域和第二区域。

    Semiconductor light-emitting device
    90.
    发明授权
    Semiconductor light-emitting device 有权
    半导体发光装置

    公开(公告)号:US08742444B2

    公开(公告)日:2014-06-03

    申请号:US13572178

    申请日:2012-08-10

    IPC分类号: H01L33/00 H01L21/00

    摘要: A semiconductor light-emitting device (A) having a simple configuration whereby it is possible to easily and accurately confirm whether or not ultraviolet light is being emitted, the semiconductor light-emitting device comprising: a semiconductor light-emitting element (1) for emitting ultraviolet light in an ultraviolet or deep ultraviolet region; a cap part (6) having a through-hole (63) in the top part through which ultraviolet light passes and encircling the semiconductor light-emitting element (1); a translucent cover (7) for transmitting ultraviolet light, the translucent cover being disposed so as to hermetically close up the through-hole (63); and a UV-excited phosphor (8) which is excited by ultraviolet light and which emits visible light, the UV-excited phosphor being disposed inside the cap part (6).

    摘要翻译: 一种半导体发光装置(A),其具有简单的结构,由此可以容易且准确地确认是否发出紫外线,该半导体发光装置包括:用于发射的半导体发光元件(1) 在紫外线或深紫外线区域的紫外线; 帽部分(6),其在所述顶部部分中具有通孔(63),紫外线穿过所述通孔(63)并围绕所述半导体发光元件(1); 用于透射紫外光的半透明盖(7),所述半透明盖设置成气密地关闭所述通孔(63); 和紫外线激发的荧光体(8),所述紫外线激发的荧光体被紫外线激发并发出可见光,所述紫外线激发荧光体设置在所述帽部(6)的内部。