公开(公告)号：US5447409A

公开(公告)日：1995-09-05

申请号：US226101

申请日：1994-04-11

申请人： Howard Grunes ,  Avi Tepman ,  Robert Lowrance

发明人： Howard Grunes ,  Avi Tepman ,  Robert Lowrance

IPC分类号： B25J9/10 ,  B25J9/12 ,  B25J21/00 ,  H01L21/673 ,  H01L21/677 ,  B25J18/00

CPC分类号： B25J9/107 ,  B25J21/005 ,  B25J9/126 ,  H01L21/67742 ,  Y10S414/13 ,  Y10S414/135 ,  Y10S414/139 ,  Y10T74/20317

摘要： A robot assembly, including a central hub, has two arms arranged for independent rotation about the hub. Two carriers, oriented 180.degree. apart from each other, are coupled to an end of each of the arms. A drive is provided for rotating the arms in opposite directions to extend one or the other of said carriers radially from said central hub, and for rotating the arms in the same direction to effect rotation of the carriers.

摘要翻译： 包括中心轮毂的机器人组件具有布置成围绕轮毂独立旋转的两个臂。 两个彼此相隔180度的载体被联接到每个臂的端部。 提供驱动器用于沿相反方向旋转臂以使所述载体中的一个或另一个从所述中心毂径向延伸，并且用于沿相同方向旋转臂以实现载体的旋转。

公开(公告)号：US5228501A

公开(公告)日：1993-07-20

申请号：US939542

申请日：1992-09-02

申请人： Avi Tepman ,  Howard Grunes ,  Dana Andrews

发明人： Avi Tepman ,  Howard Grunes ,  Dana Andrews

IPC分类号： C23C14/50 ,  H01J37/32 ,  H01L21/00 ,  H01L21/687

CPC分类号： H01L21/68721 ,  C23C14/50 ,  H01J37/32477 ,  H01J37/32623 ,  H01J37/32743 ,  H01J37/32862 ,  H01L21/67069 ,  H01L21/68735 ,  Y10T29/41

摘要： A clamping ring and temperature regulated platen for clamping a wafer to the platen and regulating the temperature of the wafer. The force of the clamping ring against the wafer is produced by the weight of the clamping ring. A roof shields all but a few contact regions of the interface between the wafer and clamp from receiving depositing particles so that a coating formed on the wafer makes continuous contact with the clamping ring in only a few narrow regions that act as conductive bridges when the depositing layer is conductive.

摘要翻译： 用于将晶片夹持到压板并调节晶片的温度的夹紧环和温度调节压板。 夹紧环抵靠晶片的力由夹紧环的重量产生。 屋顶屏蔽来自接收沉积颗粒的晶片和夹具之间的接口的所有除了几个接触区域，使得形成在晶片上的涂层在仅存在几个狭窄区域中与夹紧环连续接触，当狭缝区域当存在 层是导电的。

公开(公告)号：US5226632A

公开(公告)日：1993-07-13

申请号：US866961

申请日：1992-04-10

申请人： Avi Tepman ,  Dana L. Andrews

发明人： Avi Tepman ,  Dana L. Andrews

IPC分类号： F16K1/10 ,  F16K51/02 ,  H01L21/00

CPC分类号： H01L21/67126 ,  F16K1/10 ,  F16K51/02 ,  Y10T137/6065

摘要： A slit valve apparatus associated with an aperture in a chamber wall through which a semiconductor wafer may be passed along a transfer plane. The apparatus is characterized by a valve seat which is angled relative to the transfer plane and a door which moves linearly along an axis substantially perpendicular to the valve seat. All frictionally engaged parts of the slit valve assembly are isolated from the interior of the chamber by a bellow sleeve to reduce the formation of particles. The method is characterized by the steps of surrounding the aperture with a first seating surface defining a sealing plane which is angularly disposed with respect to the transfer plane and engaging or disengaging a second seating surface with the first seating surface by linearly moving the second seating surface in a direction perpendicular to the sealing plane.

摘要翻译： 与腔室壁中的孔相关联的狭缝阀装置，半导体晶片可以沿着转移平面通过。 该装置的特征在于相对于传送平面成角度的阀座和沿着基本垂直于阀座的轴线性地线性移动的门。 狭缝阀组件的所有摩擦接合部分通过波纹管套筒与室的内部隔离以减少颗粒的形成。 该方法的特征在于，围绕孔的步骤包括限定相对于传送平面成角度设置的密封平面的第一安置面，并且通过使第二安置面线性地移动而使第二安置面与第一座面接合或分离 在垂直于密封平面的方向上。

公开(公告)号：US5171412A

公开(公告)日：1992-12-15

申请号：US749096

申请日：1991-08-23

申请人： Homoyoun Talieh ,  Avi Tepman ,  Hoa Thi Kieu ,  Chien-Rhone Wang

发明人： Homoyoun Talieh ,  Avi Tepman ,  Hoa Thi Kieu ,  Chien-Rhone Wang

IPC分类号： C23C14/04 ,  C23C14/22 ,  C23C14/34 ,  C23C14/54 ,  C23C14/58 ,  C23C28/00 ,  H01L21/203 ,  H01L21/28 ,  H01L21/285 ,  H01L21/321 ,  H01L21/768

CPC分类号： C23C14/046 ,  C23C14/34 ,  H01L21/2855 ,  H01L21/321 ,  H01L21/76877

摘要： The improved material deposition process of the present invention utilizes a first, low temperature deposition step followed by a second, high temperature/high power deposition step. In the first deposition step a collimation plate is placed between the sputtering target and the substrate, such that a collimated stream of sputtered material is deposited upon the substrate. The collimated stream provides a seed layer which aids in eliminating voids by partially filling the holes and grooves in the surface of the substrate. The second deposition step is conducted as a high temperature sputtering deposition. At the high temperature the sputtered material joins and flows with the seed layer, whereby the holes and grooves are more easily filled without voids and an improved planarized layer is achieved.

公开(公告)号：US08398832B2

公开(公告)日：2013-03-19

申请号：US11229139

申请日：2005-09-15

申请人： Jaim Nulman ,  Sergio Edelstein ,  Mani Subramani ,  Zheng Xu ,  Howard E. Grunes ,  Avi Tepman ,  John C. Forster ,  Praburam Gopalraja

发明人： Jaim Nulman ,  Sergio Edelstein ,  Mani Subramani ,  Zheng Xu ,  Howard E. Grunes ,  Avi Tepman ,  John C. Forster ,  Praburam Gopalraja

IPC分类号： C23C14/34

CPC分类号： C23C14/34 ,  H01J37/321 ,  H01J37/34

摘要： A sputtering coil for a plasma chamber in a semiconductor fabrication system is provided. The sputtering coil couples energy into a plasma and also provides a source of sputtering material to be sputtered onto a workpiece from the coil to supplement material being sputtered from a target onto the workpiece. Alternatively a plurality of coils may be provided, one primarily for coupling energy into the plasma and the other primarily for providing a supplemental source of sputtering material to be sputtered on the workpiece.

公开(公告)号：US07774887B2

公开(公告)日：2010-08-17

申请号：US12102846

申请日：2008-04-14

申请人： Joseph Yudovsky ,  Avi Tepman ,  Kenneth R. Reynolds ,  Younes Achkire ,  Dan A. Marohl ,  Steve G. Ghanayem ,  Alexander S. Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

发明人： Joseph Yudovsky ,  Avi Tepman ,  Kenneth R. Reynolds ,  Younes Achkire ,  Dan A. Marohl ,  Steve G. Ghanayem ,  Alexander S. Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

IPC分类号： B08B7/00 ,  A47L25/00

CPC分类号： H01L21/67046 ,  B08B1/04

摘要： A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.

摘要翻译： 提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器 电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器 以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度 刷子

公开(公告)号：US20100084023A1

公开(公告)日：2010-04-08

申请号：US12247013

申请日：2008-10-07

申请人： Chris Melcer ,  Thuy Britcher ,  Avi Tepman ,  Simon Y. Yavelberg ,  Sheshraj L. Tulshibagwale

发明人： Chris Melcer ,  Thuy Britcher ,  Avi Tepman ,  Simon Y. Yavelberg ,  Sheshraj L. Tulshibagwale

IPC分类号： F16K11/00

CPC分类号： H01L21/67219 ,  B24B37/04 ,  B24B57/02 ,  H01L21/67017 ,  Y10T137/0396 ,  Y10T137/877

摘要： Embodiments described herein provide an application for delivery of fluids within substrate processing systems. More particularly, embodiments described herein provide applications for delivery of processing chemicals within substrate processing systems. In one embodiment, a fluid delivery system is provided. The fluid delivery system comprises a bulk fluid source for supplying fluids, a fluid delivery module for controlling and monitoring a ratio of fluids flowing from the bulk fluid source, a first stream line positioned downstream from the fluid delivery module, a first switch positioned along the first stream line, a second stream line positioned downstream from the fluid delivery module, and a second switch positioned along the second stream line, wherein the fluid delivery module splits the fluids from the bulk fluid source into two streams flowing through the first stream line and the second stream line according to a pre-defined ratio.

摘要翻译： 本文所述的实施例提供了在衬底处理系统内输送流体的应用。 更具体地，本文描述的实施例提供了在衬底处理系统内递送处理化学品的应用。 在一个实施例中，提供流体输送系统。 流体输送系统包括用于供应流体的体液源，流体输送模块，用于控制和监测从大量流体源流出的流体的比例，位于流体输送模块下游的第一流线，沿着流体输送模块定位的第一开关 第一流线，位于流体输送模块下游的第二流线和沿着第二流线定位的第二开关，其中流体输送模块将流体从本体流体源分流成流过第一流线的两股流， 第二条流线根据预定义的比例。

公开(公告)号：US20080038998A1

公开(公告)日：2008-02-14

申请号：US11876202

申请日：2007-10-22

申请人： Alexander Polyak ,  Avi Tepman

发明人： Alexander Polyak ,  Avi Tepman

IPC分类号： B24B7/04

CPC分类号： B24B37/04 ,  B24B37/042 ,  B24B57/02

摘要： A polishing fluid delivery apparatus has been provided that in one embodiment includes a support member, a dispense arm, a polishing fluid delivery tube and a variable restricting device. The dispense arm extends from an upper portion of the support member and has an outlet of the delivery tube coupled thereto. The restricting device interfaces with the delivery tube and is adapted to provide a variable restriction to flow passing through the delivery tube. In another embodiment, the restricting device is a pinch valve and the tube in continuous from the outlet to beyond a portion that interfaces with the pinch valve. In yet another embodiment, the position of the dispense arm is controllable.

摘要翻译： 已经提供了一种抛光流体输送装置，其在一个实施例中包括支撑构件，分配臂，抛光流体输送管和可变限制装置。 分配臂从支撑构件的上部延伸并且具有与其连接的输送管的出口。 限制装置与输送管接口并且适于对通过输送管的流动提供可变的限制。 在另一个实施例中，限制装置是夹管阀，并且管从出口连续到超过与夹紧阀相接合的部分。 在另一个实施例中，分配臂的位置是可控的。

公开(公告)号：US20050167048A1

公开(公告)日：2005-08-04

申请号：US10970365

申请日：2004-10-21

申请人： Alexander Polyak ,  Avi Tepman

发明人： Alexander Polyak ,  Avi Tepman

IPC分类号： B24B37/04 ,  B24B53/007 ,  H01L21/3105 ,  C23F1/00

CPC分类号： B24B53/017 ,  H01L21/31053

摘要： In a first aspect, a first apparatus is provided for a chemical mechanical polishing (CMP) process. The first apparatus includes (1) a rotatable member; (2) an end effector adapted to receive and retain a conditioning disk; and (3) an elastic device disposed between the rotatable member and the end effector. The elastic device is (a) adapted to rotate the end effector via a torque from the rotatable member, and (b) flexibly extensible so as to impart a force to the end effector while permitting the end effector to deviate from a perpendicular alignment with the rotatable member in order for a conditioning surface of the conditioning disk to conform to an irregular polishing surface of a pad being conditioned. Numerous other aspects are provided, including methods and apparatus for using liquid or gas to deter polishing slurry or debris from entering the conditioning head.

摘要翻译： 在第一方面，提供了用于化学机械抛光（CMP）工艺的第一设备。 第一装置包括（1）可旋转构件; （2）适于接收和保持调节盘的端部执行器; 和（3）设置在可旋转构件和末端执行器之间的弹性装置。 弹性装置是（a）适于通过来自可旋转构件的扭矩旋转末端执行器，以及（b）柔性可伸展的，以便向末端执行器施加力，同时允许末端执行器偏离与 可旋转构件，以便调节盘的调节表面与被调节的垫的不规则抛光表面相一致。 提供了许多其它方面，包括使用液体或气体来阻止抛光浆料或碎屑进入调节头的方法和装置。

公开(公告)号：US20050087212A1

公开(公告)日：2005-04-28

申请号：US10976012

申请日：2004-10-28

申请人： Joseph Yudovsky ,  Avi Tepman ,  Kenneth Reynolds ,  Younes Achkire ,  Dan Marohl ,  Steve Ghanayem ,  Alexander Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

发明人： Joseph Yudovsky ,  Avi Tepman ,  Kenneth Reynolds ,  Younes Achkire ,  Dan Marohl ,  Steve Ghanayem ,  Alexander Polyak ,  Gary Ettinger ,  Haochuan Zhang ,  Hui Chen

IPC分类号： B08B1/04 ,  H01L21/00

CPC分类号： H01L21/67046 ,  B08B1/04

摘要： A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a base to which the supports are pivotally mounted via spherical bearings adapted to permit toe-in of the scrubber brushes, a brush gap actuator adapted, via a crank and rocker mechanism, to substantially simultaneously pivot the supports toward or away from each other so as to permit the scrubber brushes to substantially simultaneously achieve or break contact with the substrate, and a toe-in actuator adapted to move two of the spherical bearings toward or away from each other so as to adjust a toe-in angle between the scrubber brushes.

摘要翻译： 提供了一种洗涤器箱，其包括适于接收用于清洁的基底的罐，支撑在罐外部并且适于耦合到设置在罐内的洗涤器刷的端部;马达，其安装到每个支撑件上并适于旋转洗涤器 电刷，支架通过适于允许洗涤器刷子进入的球面轴承可枢转地安装的基座，经由曲柄和摇臂机构适应的基本上同时地使支撑件朝向或远离彼此枢转的电刷间隙致动器 以便允许洗涤器刷子基本上同时实现或断开与基板的接触，以及适于将两个球形轴承朝向或远离彼此移动的脚趾致动器，以便调节洗涤器之间的束缚角度 刷子