PROFILE INFORMATION SYSTEM AND INFORMATION PROCESSING APPARATUS

    公开(公告)号:US20190268425A1

    公开(公告)日:2019-08-29

    申请号:US16281878

    申请日:2019-02-21

    IPC分类号: H04L29/08 H04L12/28

    摘要: There is a need to acquire more reliable profile information without relying on only the personal subjective judgment on the profile information. Profile information about a dweller is automatically extracted by evaluating and comprehensively determining each of feature amounts concerning the dweller from sensing data acquired from a sensor or a usage log concerning an equipment instrument in a living space based on a criterion for the feature amounts predetermined for a profile item. The reliability of the self-reported profile information is evaluated by comparing and verifying the automatically extracted profile information with the self-reported profile information supplied by the dweller.

    SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20230111142A1

    公开(公告)日:2023-04-13

    申请号:US17886049

    申请日:2022-08-11

    摘要: A semiconductor device includes a plurality of unit cells. Each of the plurality of unit cells has a pair of column regions, a pair of trenches formed between the pair of column regions in the X direction, and a pair of gate electrodes formed in the pair of trenches via a gate insulating film, respectively. The two unit cells adjacent in the X direction share one column region of the pair of column regions and are arranged to be symmetrical about the shared column region. Here, a distance between the two trenches, which are adjacent with the one column region interposed therebetween, of the trenches in the two adjacent unit cells is different from a distance between the pair of trenches in the one unit cell.

    SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20230090409A1

    公开(公告)日:2023-03-23

    申请号:US17480007

    申请日:2021-09-20

    摘要: A semiconductor device includes a semiconductor substrate, a first dielectric film, a conductive film, at least one ferroelectric film, a second dielectric film, a memory gate electrode, a third dielectric film and a control gate electrode. The semiconductor substrate includes a source region and a drain region. The semiconductor substrate includes a first region and a second region between the source region and the drain region. The first dielectric film is formed on the first region. The conductive film is formed on the first dielectric film. The at least one ferroelectric film is formed on one hart of the conductive film. The second dielectric film is formed on the other part of the conductive film. The memory gate electrode is formed on the ferroelectric film. The third dielectric film is formed on the second region. The control gate electrode is formed on the third dielectric film.

    SEMICONDUCTOR DEVICE
    7.
    发明申请

    公开(公告)号:US20230088709A1

    公开(公告)日:2023-03-23

    申请号:US17879524

    申请日:2022-08-02

    摘要: A semiconductor device includes a first regulator for generating a first power supply potential, a second regulator for generating a second power supply potential lower than the first power supply potential, and a static random access memory (SRAM) having a normal operation mode and a resume standby mode. The SRAM includes power supply switching circuits receiving a first power supply potential and a second power supply potential, and a memory array including a plurality of memory cells. When the SRAM is in the normal operation mode, the power switch circuit is controlled so that the first power supply potential is supplied from the power switch circuit to the memory array, and when SRAM is in the resume standby mode, the second power supply potential is supplied from the power switch circuit to the memory array.

    SEMICONDUCTOR DEVICE AND METHOD FOR CONTROLLING BODY BIAS THEREOF

    公开(公告)号:US20230081996A1

    公开(公告)日:2023-03-16

    申请号:US17940348

    申请日:2022-09-08

    IPC分类号: H03K17/687 H03K3/03

    摘要: A semiconductor device and a method for controlling body bias thereof capable of properly controlling body bias of a transistor even in a case where process variation occurs are provided. Operation speeds of ring oscillators ROSCn and ROSCp respectively change due to an influence of process variation at an NMOS transistor MN side and a PMOS transistor MP side. Speed/bias data represent a correspondence relationship between the operation speeds of the ring oscillators ROSCn and ROSCp and set values V1n and V1p of body biases VBN and VBP. A body bias controller receives speed values Sn and Sp measured for the ring oscillators ROSCn and ROSCp to which the body biases VBN and VBP based on default values are respectively applied, and obtains the set values V1n and V1p on the basis of the speed/bias data.

    PLL circuit using intermittent operation amplifier

    公开(公告)号:US11606097B2

    公开(公告)日:2023-03-14

    申请号:US17501389

    申请日:2021-10-14

    发明人: Atsushi Motozawa

    摘要: A PLL circuit includes a phase comparator, an integrator path, a proportional path, a current controlled oscillator, a divider, and a double integrator path. The double integrator path includes an intermittent operation gm amplifier, a filter circuit, and a voltage-current conversion circuit. The intermittent operation gm amplifier receives an output voltage of a filter circuit. When a pulse CLK for an intermittent operation is ON, the intermittent operation gm amplifier outputs its voltage to the filter circuit. When the pulse CLK for the intermittent operation is OFF, the intermittent operation gm amplifier does not output the output voltage of the filter circuit to the filter circuit. Even when the pulse CLK for the intermittent operation is OFF, an input potential of the voltage-current conversion circuit is held by the filter circuit, and a current to the current controlled oscillator flows. This makes it possible to oscillate at a high frequency without increasing an area of the filter circuit.