FLUX AND RESIN COMPOSITION FOR FLUX
    1.
    发明申请

    公开(公告)号:US20190358754A1

    公开(公告)日:2019-11-28

    申请号:US16306858

    申请日:2018-04-04

    摘要: An object of the present invention is to provide a flux in which the occurrence of a bridge and a ball is suppressed at the time of soldering, and a resin composition for the flux.The flux comprising: at least one selected from 0.3 to 2.0 mass % of an organochlorine compound, and more than 0.04 mass % and 1.00 mass % or less of an amine hydrochloride; and0.2 to 1.5 mass % of an organophosphorus compound that is at least one selected from a phosphonic acid ester and a phenyl-substituted phosphinic acid, each based on the whole flux.

    FLUX AND SOLDER PASTE
    4.
    发明申请

    公开(公告)号:US20230087892A1

    公开(公告)日:2023-03-23

    申请号:US17911485

    申请日:2021-03-16

    摘要: A solder paste is adopted, the solder paste containing: a solder alloy powder in which a content of solder alloy particles having a particle size of 8 μm or less is 99% by mass or more with respect to a total mass of the solder alloy powder; and a flux. This flux contains an acid-modified rosin, a solvent, an activator, and a thixotropic agent, in which the activator contains a halogenated aliphatic compound, and a dicarboxylic acid represented by General Formula (2). [in the formula, R represents an alkylene group having 1 to 7 carbon atoms, or a single bond, provided that a methylene group constituting the alkylene group may be substituted with an oxygen atom]

    CORE MATERIAL, ELECTRONIC COMPONENT AND METHOD FOR FORMING BUMP ELECTRODE

    公开(公告)号:US20220212294A1

    公开(公告)日:2022-07-07

    申请号:US17610876

    申请日:2020-09-30

    IPC分类号: B23K35/26 C22C13/02

    摘要: A core material has a core 12; a solder layer 16 made of a (Sn—Bi)-based solder alloy provided on an outer side of the core 12; and a Sn layer 20 provided on an outer side of the solder layer 16. The core contains metal or a resin. When a concentration ratio of Bi contained in the solder layer 16 is a concentration ratio (%)=a measured value of Bi (% by mass)/a target Bi content (% by mass), or a concentration ratio (%)=an average value of measured values of Bi (% by mass)/a target Bi content (% by mass), the concentration ratio is 91.4% to 106.7%. The thickness of the Sn layer 20 is 0.215% or more and 36% or less of the thickness of the solder layer 16.