公开(公告)号：US20180072571A1

公开(公告)日：2018-03-15

申请号：US15661412

申请日：2017-07-27

Applicant: Air Liquide Advanced Materials Inc. ,  L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude ,  Air Liquide Electronics U.S. LP ,  American Air Liquide, Inc. ,  Air Liquide Advanced Materials LLC

Inventor： Antonio SANCHEZ ,  Gennadiy ITOV ,  Manish KHANDELWAL ,  Cole RITTER ,  Peng ZHANG ,  Jean-Marc GIRARD ,  Zhiwen WAN ,  Glenn KUCHENBEISER ,  David ORBAN ,  Sean KERRIGAN ,  Reno PESARESI ,  Matthew Damien STEPHENS ,  Yang WANG ,  Guillaume HUSSON

IPC: C01B21/087 ,  C04B35/589 ,  C04B35/597 ,  C04B35/14 ,  C09D1/00 ,  C01B21/082 ,  B05D1/02 ,  B05D1/00 ,  B05D1/18 ,  C23C16/24

Abstract: Solid or liquid N—H free, C-free, and Si-rich perhydropolysilazane compositions comprising units having the following formula [—N(SiH3)x(SiH2-)y], wherein x=0, 1, or 2 and y=0, 1, or 2 when x+y=2; and x=0, 1 or 2 and y=1, 2, or 3 when x+y=3 are disclosed. Also disclosed are synthesis methods and applications for the same.

公开(公告)号：US20180099872A1

公开(公告)日：2018-04-12

申请号：US15836518

申请日：2017-12-08

Applicant: Air Liquide Advanced Materials LLC ,  L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude ,  Air Liquide Advanced Materials, Inc. ,  American Air Liquide, Inc.

Inventor： Cole RITTER ,  Gennadiy Itov ,  Manish Khandelwal ,  Jean-Marc Girard ,  Glenn Kuchenbeiser ,  Sean Kerrigan ,  Peng Zhang ,  Larry Kit-wing Leung

IPC: C01B33/107 ,  C23C16/30 ,  C23C16/448 ,  C23C16/455

CPC classification number: C01B33/107 ,  C23C16/30 ,  C23C16/448 ,  C23C16/4481 ,  C23C16/45525

Abstract: Methods of synthesizing Si—H containing iodosilanes, such as diiodosilane or pentaiododisilane, using a halide exchange reaction are disclosed.

公开(公告)号：US20160063414A1

公开(公告)日：2016-03-03

申请号：US14475054

申请日：2014-09-02

Applicant: Air Liquide Global E&C Solutions US Inc. ,  Air Liquide Large Industries U.S. LP ,  L'Air Liquide, Société Anonyme pour l'Etude et l'E ,  Air Liquide Global E&C Solutions Germany GmbH

Inventor： Alain GUILLARD ,  Alexander ROESCH ,  Erik Jon ANDERSON ,  Siva ARIYAPADI ,  Francois FUENTES ,  Veronika GRONEMANN ,  Paul Manfred KRIMLOWSKI ,  Jakob Balthasar PERLWITZ ,  Krishna Anand PUNWASI ,  Bharatkumar SONI ,  Etienne Jean STURM

IPC: G06Q10/06

CPC classification number: G06Q10/06313 ,  G06Q10/0635 ,  G06Q10/0637 ,  Y02P90/845

Abstract: A method includes receiving input corresponding to a proposed configuration of a methanol production facility and identifying a plurality of components utilized to produce methanol at the facility. The method includes determining an alternative configuration that is different from the proposed configuration. Determining the alternative configuration may include identifying resources accessible to a proposed location for the methanol production facility and whether at least one of the resources accessible to the proposed location corresponds to a resource generated by a component identified by the proposed configuration, and determining whether to omit at least one component of the plurality of components identified by the proposed configuration. The method includes omitting the at least one component from the alternative configuration, and generating a report based on the proposed configuration and the alternative configuration. The report includes information indicating a difference between the proposed configuration and the alternative configuration.

Abstract translation: 一种方法包括接收对应于甲醇生产设备的建议配置的输入，并且识别用于在设施处产生甲醇的多个组分。 该方法包括确定与所提出的配置不同的替代配置。 确定替代配置可以包括识别用于甲醇生产设备的建议位置可访问的资源以及所提出的位置可访问的资源中的至少一个是否与由所提出的配置识别的组件生成的资源相对应，并且确定是否省略 由所提出的配置识别的多个组件中的至少一个组件。 该方法包括从替代配置中省略至少一个组件，以及基于所提出的配置和替代配置来生成报告。 该报告包括指示所提出的配置和替代配置之间的差异的信息。

公开(公告)号：US20210146074A1

公开(公告)日：2021-05-20

申请号：US16621562

申请日：2017-11-30

Applicant: Air Liquide Santé (International) ,  Air Liquide Medical Systems

Inventor： THierry BOULANGER ,  Jean-Christophe RICHARD ,  Marceau RIGOLLOT ,  Jean-Marc GINER

IPC: A61M16/00 ,  A61M16/20

Abstract: The invention concerns an artificial resuscitation bag (5) comprising a deformable bag (54) comprising a gas inlet (54A) and a gas outlet (54B), a gas reservoir (59) comprising an outlet orifice (59A), a first conduit element (56) fluidly connected to the outlet orifice (59A) of the gas reservoir (59) and to the gas inlet (54A) of the deformable bag (54), a first one-way admission valve (57) arranged in the first conduit element (56) and fluidly communicating with the ambient atmosphere for allowing ambient air to enter into the first conduit element (56), and a second one-way valve (55) arranged in the first conduit element (56) between the first one-way admission valve (57) and the gas inlet (54A) of the deformable bag (54) for allowing gas to travel only from the first conduit element (56) to the deformable bag (54).

公开(公告)号：US10410878B2

公开(公告)日：2019-09-10

申请号：US15798476

申请日：2017-10-31

Applicant: American Air Liquide, Inc. ,  Air Liquide Electronics U.S. LP ,  L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude

Inventor： Hui Sun ,  Fabrizio Marchegiani ,  James Royer ,  Nathan Stafford ,  Rahul Gupta

IPC: C09K13/00 ,  H01L21/027 ,  H01L21/311 ,  H01L27/11556 ,  H01L27/11582

Abstract: A method for using a hydrofluorocarbon etching compound selected from the group consisting of 2,2,2-Trifluoroethanamine (C2H4F3N), 1,1,2-Trifluoroethan-1-amine (Iso-C2H4F3N), 2,2,3,3,3-Pentafluoropropylamine (C3H4F5N), 1,1,1,3,3-Pentafluoro-2-Propanamine (Iso-C3H4F5N), 1,1,1,3,3-Pentafluoro-(2R)-2-Propanamine (Iso-2R—C3H4F5N) and 1,1,1,3,3-Pentafluoro-(2S)-2-Propanamine (Iso-2S—C3H4F5N), 1,1,1,3,3,3-Hexafluoroisopropylamine (C3H3F6N) and 1,1,2,3,3,3-Hexafluoro-1-Propanamine (Iso-C3H3F6N) to selectively plasma etching silicon containing films, such as a dielectric antireflective coat (DARC) layer (e.g., SiON), alternating SiO/SiN layers, alternating SiO/p-Si layers, versus a photoresist layer and/or a hard mask layer (e.g., amorphous carbon layer), wherein the photoresist layer is reinforced and SiO/SiN and/or SiO/p-Si are etched non-selectively.

公开(公告)号：US20180366336A1

公开(公告)日：2018-12-20

申请号：US16114371

申请日：2018-08-28

Applicant: American Air Liquide, Inc. ,  L'Air Liquide, Société Anonyme pour l'Etude et l'Etude et l'Exploitation des Procédés Georges Cla ,  Air Liquide Electronics U.S. LP

Inventor： Peng Shen ,  Christian Dussarrat ,  Curtis Anderson ,  Rahul Gupta ,  Vincent M. Omarjee ,  Nathan Stafford

IPC: H01L21/3065 ,  C09K13/00

Abstract: Replacement chemistries for the cC4F8 passivation gas in the Bosch etch process and processes for using the same are disclosed. These chemistries have the formula CxHyFz, with 1≤x

公开(公告)号：US20180076046A1

公开(公告)日：2018-03-15

申请号：US15699668

申请日：2017-09-08

Applicant: American Air Liquide, Inc. ,  L'Air Liquide, Société Anonyme Pour I'Etude et I'Exploitation des Precédés Georges Claude ,  Air Liquide Electronics U.S. LP

Inventor： Peng SHEN ,  Christian DUSSARRAT ,  Curtis ANDERSON ,  Rahul GUPTA ,  Vincent M. OMARJEE ,  Nathan STAFFORD

IPC: H01L21/3065 ,  C09K13/00

CPC classification number: H01L21/30655 ,  C09K13/00

Abstract: Replacement chemistries for the cC4F8 passivation gas in the Bosch etch process and processes for using the same are disclosed. These chemistries have the formula CxHyFz, with 1≦x

公开(公告)号：US20150325097A1

公开(公告)日：2015-11-12

申请号：US14801789

申请日：2015-07-16

Applicant: Air Liquide Electronics U.S. LP ,  American Air Liquide, Inc.

Inventor： Ashutosh MISRA ,  Benjamin J. JURCIK, JR.

IPC: G08B21/18

CPC classification number: G08B21/18 ,  G01F23/0076 ,  G01F23/292

Abstract: Disclosed are smart canisters for use in the materials industry. The smart canisters include sensors and communication devices that allow users to continuously monitor various physical and chemical properties of the product insider the canisters. For a variety of products that have limited stability and tend to decompose over time, variations in product properties can adversely impact the process in which the material is used. The smart canister can alert the user, in real time, when the product is starting to deviate from pre-set functional parameters.

Abstract translation: 公开了用于材料工业的智能罐。 智能罐包括传感器和通信设备，允许用户持续监控产品内部罐的各种物理和化学特性。 对于具有有限稳定性并随时间倾向分解的各种产品，产品性能的变化可能对使用材料的过程产生不利影响。 智能罐可以在产品开始偏离预先设定的功能参数时实时提醒用户。

公开(公告)号：US09034407B2

公开(公告)日：2015-05-19

申请号：US14201014

申请日：2014-03-07

Applicant: American Air Liquide, Inc. ,  Air Liquide Industrial U.S. L.P.

Inventor： David C. Braithwaite ,  Meenakshi Sundaram ,  Vasuhi Rasanayagam

IPC: A23B4/09 ,  A23B4/08 ,  A23B4/20 ,  A23B4/24 ,  A23B4/26 ,  A23B4/28 ,  A23L1/314 ,  A23L3/3463 ,  A23L3/3526 ,  A23L3/358 ,  A23L3/36 ,  A23L3/37 ,  A23L3/375 ,  F25D3/12

CPC classification number: A23B4/09 ,  A23B4/08 ,  A23B4/20 ,  A23B4/24 ,  A23B4/26 ,  A23B4/28 ,  A23L3/3463 ,  A23L3/3526 ,  A23L3/358 ,  A23L3/36 ,  A23L3/37 ,  A23L3/375 ,  A23L13/42 ,  F25D3/127

Abstract: Embodiments of the invention generally provide methods and systems that distribute an additive in solid carbon dioxide in an interior of food processing equipment. The additive may be injected into a flow of liquid carbon dioxide upstream of an expander at or adjacent to the interior. Injection of the additive into the interior may be alternated with directing a flow of expanded carbon dioxide into the interior. In some embodiments, the freezing point of the additive with or without a diluent composition and/or additive(s) is lower than a temperature of the liquid carbon dioxide.

Abstract translation: 本发明的实施方案通常提供在食品加工设备的内部将固体二氧化碳中的添加剂分配的方法和系统。 添加剂可以在内部或邻近内部的膨胀器上游注入液体二氧化碳流中。 将添加剂注入内部可以与引导膨胀的二氧化碳流进入内部交替。 在一些实施方案中，具有或不具有稀释剂组合物和/或添加剂的添加剂的凝固点低于液体二氧化碳的温度。

公开(公告)号：US20140322924A1

公开(公告)日：2014-10-30

申请号：US14329108

申请日：2014-07-11

Applicant: L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude ,  American Air Liquide, Inc. ,  Air Liquide Electronics U.S. LP

Inventor： Christian DUSSARRAT ,  Glenn KUCHENBEISER ,  Vincent M. OMARJEE ,  Ziyun WANG

IPC: H01L21/02

CPC classification number: H01L21/02208 ,  C23C16/401 ,  C23C16/405 ,  C23C16/45553 ,  H01L21/02148 ,  H01L21/02219 ,  H01L21/0228

Abstract: Disclosed are silicon containing compounds and their use in vapor deposition methods of hafnium silicate films having a desired silicon concentration. More particularly, deposition of hafnium silicate films by atomic layer deposition using moisture and the disclosed silicon containing compounds produce films having a desired silicon concentration.

Abstract translation: 公开了含硅化合物及其在具有期望的硅浓度的硅酸铪膜的气相沉积方法中的用途。 更具体地，通过使用水分的原子层沉积来沉积硅酸铪膜，并且所公开的含硅化合物产生具有期望的硅浓度的膜。