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    METHODS AND APPARATUS TO DETERMINE PARAMETERS IN METAL-CONTAINING FILMS
    2.
    发明申请
    METHODS AND APPARATUS TO DETERMINE PARAMETERS IN METAL-CONTAINING FILMS 有权
    确定金属膜中参数的方法和装置

    公开(公告)号：US20120274318A1

    公开(公告)日：2012-11-01

    申请号：US13095279

    申请日：2011-04-27

    申请人： ABRAHAM RAVID

    发明人： ABRAHAM RAVID

    IPC分类号： G01R33/12 ,  G01N25/00

    CPC分类号： G01R33/007 ,  G01B7/105 ,  G01N27/72 ,  G01N27/9033

    摘要： A method and apparatus to determine a parameter of a metal-containing film are provided herein. In some embodiments, a method of determining a parameter of a metal-containing film may include generating a first magnetic field by flowing an alternating current through a coil disposed adjacent to and spaced apart from the metal-containing film, wherein the first magnetic field induces a second magnetic field proximate the metal-containing film; heating the metal-containing film from a first temperature to a second temperature; measuring a response of the first magnetic field to the second magnetic field as the metal-containing film is heated from the first temperature to the second temperature; and correlating the response with a rate of temperature change of the metal-containing film as the metal-containing film is heated from the first temperature to the second temperature to determine a parameter of the metal-containing film.

    摘要翻译： 本文提供了确定含金属膜的参数的方法和装置。 在一些实施例中，确定含金属膜的参数的方法可以包括通过使交流电流通过邻近于和含有金属的膜设置的线圈而产生第一磁场，其中第一磁场诱发 接近含金属膜的第二磁场; 将含金属膜从第一温度加热至第二温度; 当所述含金属膜从所述第一温度加热到所述第二温度时，测量所述第一磁场对所述第二磁场的响应; 并且当含金属膜从第一温度加热到第二温度时，将响应与含金属膜的温度变化率相关联，以确定含金属膜的参数。

    Determining Physical Property of Substrate
    5.
    发明申请
    Determining Physical Property of Substrate 有权
    确定基材的物理性质

    公开(公告)号：US20090033942A1

    公开(公告)日：2009-02-05

    申请号：US12253160

    申请日：2008-10-16

    申请人： Abraham Ravid ,  Boguslaw A. Swedek ,  Jeffrey Drue David ,  Jun Qian ,  Ingemar Carlsson ,  Dominic J. Benvegnu ,  Harry Q. Lee ,  Lakshmanan Karuppiah

    发明人： Abraham Ravid ,  Boguslaw A. Swedek ,  Jeffrey Drue David ,  Jun Qian ,  Ingemar Carlsson ,  Dominic J. Benvegnu ,  Harry Q. Lee ,  Lakshmanan Karuppiah

    IPC分类号： G01N21/55 ,  G01B11/02

    CPC分类号： G01B11/0683 ,  G01B11/0625 ,  Y10S707/99936

    摘要： A method of determining a physical property of a substrate includes recording a first spectrum obtained from a substrate, the first spectrum being obtained during a polishing process that alters a physical property of the substrate. The method includes identifying, in a database, at least one of several previously recorded spectra that is similar to the recorded first spectrum. Each of the spectra in the database has a physical property value associated therewith. The method includes generating a signal indicating that a first value of the physical property is associated with the first spectrum, the first value being determined using the physical property value associated with the identified previously recorded spectrum in the database. A system for determining a physical property of a substrate includes a polishing machine, an endpoint determining module, and a database.

    摘要翻译： 确定基板的物理性质的方法包括记录从基板获得的第一光谱，第一光谱是在改变基板的物理性质的抛光工艺期间获得的第一光谱。 该方法包括在数据库中识别与记录的第一光谱相似的几个先前记录的光谱中的至少一个。 数据库中的每个光谱具有与之相关联的物理属性值。 该方法包括产生指示物理属性的第一值与第一频谱相关联的信号，第一值使用与数据库中所识别的先前记录的频谱相关联的物理属性值来确定。 用于确定基板的物理性质的系统包括抛光机，端点确定模块和数据库。

    Methods and apparatus to determine parameters in metal-containing films
    7.
    发明授权
    Methods and apparatus to determine parameters in metal-containing films 有权

    公开(公告)号：US09880233B2

    公开(公告)日：2018-01-30

    申请号：US13095279

    申请日：2011-04-27

    申请人： Abraham Ravid

    发明人： Abraham Ravid

    IPC分类号： G01R33/00 ,  G01B7/06 ,  G01N27/72 ,  G01N27/90

    CPC分类号： G01R33/007 ,  G01B7/105 ,  G01N27/72 ,  G01N27/9033

    摘要： A method and apparatus to determine a parameter of a metal-containing film are provided herein. In some embodiments, a method of determining a parameter of a metal-containing film may include generating a first magnetic field by flowing an alternating current through a coil disposed adjacent to and spaced apart from the metal-containing film, wherein the first magnetic field induces a second magnetic field proximate the metal-containing film; heating the metal-containing film from a first temperature to a second temperature; measuring a response of the first magnetic field to the second magnetic field as the metal-containing film is heated from the first temperature to the second temperature; and correlating the response with a rate of temperature change of the metal-containing film as the metal-containing film is heated from the first temperature to the second temperature to determine a parameter of the metal-containing film.

    Method for imaging workpiece surfaces at high robot transfer speeds with reduction or prevention of motion-induced distortion
    9.
    发明授权
    Method for imaging workpiece surfaces at high robot transfer speeds with reduction or prevention of motion-induced distortion 有权
    通过减少或防止运动引起的失真，以高机器人传送速度对工件表面进行成像的方法

    公开(公告)号：US08620064B2

    公开(公告)日：2013-12-31

    申请号：US12707548

    申请日：2010-02-17

    申请人： Abraham Ravid ,  Todd Egan ,  Karen Lingel

    发明人： Abraham Ravid ,  Todd Egan ,  Karen Lingel

    IPC分类号： G06K9/00

    CPC分类号： H01L21/681 ,  H01L21/67253 ,  H01L21/67288

    摘要： A method is provided for imaging a workpiece by capturing successive frames of an elongate stationary field of view transverse to a workpiece transit path of a robot, while the workpiece is transported by the robot. The robot transit path is illuminated with an elongate illumination pattern transverse to the transit path to obtain a workpiece image of successive frames. Motion-induced image distortion is prevented or reduced adjusting the camera frame rate in real time in proportion to changes in robot velocity profile of the workpiece along the transit path.

    摘要翻译： 提供了一种用于通过捕获横跨机器人的工件运输路径的细长静止视场的连续框架来对工件成像的方法，同时工件由机器人运送。 机器人运输路径用横向于运输路径的细长照明图案照亮，以获得连续帧的工件图像。 运动引起的图像失真被防止或减小，与传送路径上的工件的机器人速度分布的变化成比例地实时地调整相机帧速率。

    Determining Physical Property of Substrate
    10.
    发明申请
    Determining Physical Property of Substrate 有权
    确定基材的物理性质

    公开(公告)号：US20100261413A1

    公开(公告)日：2010-10-14

    申请号：US12822096

    申请日：2010-06-23

    申请人： Abraham Ravid ,  Boguslaw A. Swedek ,  Jeffrey Drue David ,  Jun Qian ,  Ingemar Carlsson ,  Dominic J. Benvegnu ,  Harry Q. Lee ,  Lakshmanan Karuppiah

    发明人： Abraham Ravid ,  Boguslaw A. Swedek ,  Jeffrey Drue David ,  Jun Qian ,  Ingemar Carlsson ,  Dominic J. Benvegnu ,  Harry Q. Lee ,  Lakshmanan Karuppiah

    IPC分类号： B24B49/02 ,  B24B49/12

    CPC分类号： G01B11/0683 ,  G01B11/0625 ,  Y10S707/99936

    摘要： A method of determining a physical property of a substrate includes recording a first spectrum obtained from a substrate, the first spectrum being obtained during a polishing process that alters a physical property of the substrate. The method includes identifying, in a database, at least one of several previously recorded spectra that is similar to the recorded first spectrum. Each of the spectra in the database has a physical property value associated therewith. The method includes generating a signal indicating that a first value of the physical property is associated with the first spectrum, the first value being determined using the physical property value associated with the identified previously recorded spectrum in the database. A system for determining a physical property of a substrate includes a polishing machine, an endpoint determining module, and a database.

    摘要翻译： 确定基板的物理性质的方法包括记录从基板获得的第一光谱，第一光谱是在改变基板的物理性质的抛光工艺期间获得的第一光谱。 该方法包括在数据库中识别与记录的第一光谱相似的几个先前记录的光谱中的至少一个。 数据库中的每个光谱具有与之相关联的物理属性值。 该方法包括产生指示物理属性的第一值与第一频谱相关联的信号，第一值使用与数据库中所识别的先前记录的频谱相关联的物理属性值来确定。 用于确定基板的物理性质的系统包括抛光机，端点确定模块和数据库。