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公开(公告)号:US07570342B2
公开(公告)日:2009-08-04
申请号:US11294348
申请日:2005-12-06
申请人: Klaus Simon , Enno Van Den Brink , Gerardus Johannes Joseph Keijsers , Adrianus Hubertus Henricus Van Dijk , Hubertus Antonius Marinus Baijens
发明人: Klaus Simon , Enno Van Den Brink , Gerardus Johannes Joseph Keijsers , Adrianus Hubertus Henricus Van Dijk , Hubertus Antonius Marinus Baijens
CPC分类号: G03F7/70933
摘要: An exposure apparatus is provided with a radiation source, a patterning structure, a projection system, a substrate, and a gas flushing system for removing gas from an area between the projection system and the substrate.
摘要翻译: 曝光装置设置有用于从投影系统和基板之间的区域去除气体的辐射源,图案形成结构,投影系统,基板和气体冲洗系统。