Method of making diode structures
    4.
    发明授权
    Method of making diode structures 有权
    制造二极管结构的方法

    公开(公告)号:US07141863B1

    公开(公告)日:2006-11-28

    申请号:US10722643

    申请日:2003-11-26

    IPC分类号: H01L29/00

    摘要: A method of making a diode structure includes the step of depositing a transparent electrode layer of any one or more of the group ZnO, ZnS and CdO onto a substrate layer, and depositing an active semiconductor junction having an n-type layer and a p-type layer onto the transparent electrode layer under process conditions that avoid substantial degradation of the electrode layer. A back electrode coating layer is applied to form a diode structure.

    摘要翻译: 制造二极管结构的方法包括将ZnO,ZnS和CdO族中的任何一种或多种的透明电极层沉积到衬底层上的步骤,以及沉积具有n型层和p-型层的有源半导体结, 在避免电极层的显着劣化的工艺条件下,在透明电极层上形成类型层。 施加背电极涂层以形成二极管结构。