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    Radiation-sensitive resin composition
    2.
    发明授权
    Radiation-sensitive resin composition 有权
    辐射敏感树脂组合物

    公开(公告)号：US06800419B2

    公开(公告)日：2004-10-05

    申请号：US10369674

    申请日：2003-02-21

    申请人： Akimasa Soyano ,  Hiroyuki Ishii ,  Hidemitsu Ishida ,  Motoyuki Shima ,  Yukio Nishimura

    发明人： Akimasa Soyano ,  Hiroyuki Ishii ,  Hidemitsu Ishida ,  Motoyuki Shima ,  Yukio Nishimura

    IPC分类号： G03F7039

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/115

    摘要： A radiation-sensitive resin composition comprising: (A) an alkali insoluble or scarcely alkali-soluble resin having an acid-dissociable protecting group of the following formula [I], wherein R1 groups are monovalent alicyclic hydrocarbon groups or alkyl groups, provided that at least one of the R1 groups is the monovalent alicyclic hydrocarbon group, or any two of the R1 groups and the carbon atom form a divalent alicyclic hydrocarbon group, (B) a photoacid generator, and (C) propylene glycol monomethyl ether acetate, &ggr;-butyrolactone, and cyclohexanone as solvents. The resin composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays and exhibits excellent film thickness uniformity and storage stability.

    摘要翻译： 一种辐射敏感性树脂组合物，其包含：（A）具有下式[I]的酸解离保护基的碱不溶性或几乎不溶的碱溶性树脂，其中R 1为一价脂环族烃基或烷基， 条件是R 1基团中的至少一个为一价脂环族烃基，或者R 1基团和碳原子中的任何两个形成二价脂环族烃基，（B）光致酸发生剂和（C ）丙二醇单甲醚乙酸酯，γ-丁内酯和环己酮作为溶剂。 树脂组合物可用作用于使用深紫外线的微细加工的化学增幅抗蚀剂，并且显示出优异的膜厚均匀性和储存稳定性。

    RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND
    6.
    发明申请
    RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND 有权
    辐射敏感性树脂组合物，形成耐火图案的方法和聚合物和化合物

    公开(公告)号：US20130143160A1

    公开(公告)日：2013-06-06

    申请号：US13699003

    申请日：2011-05-19

    申请人： Yusuke Asano ,  Yoshifumi Oizumi ,  Akimasa Soyano ,  Takeshi Ishii

    发明人： Yusuke Asano ,  Yoshifumi Oizumi ,  Akimasa Soyano ,  Takeshi Ishii

    IPC分类号： G03F7/004

    CPC分类号： G03F7/004 ,  C07C69/653 ,  C07C69/753 ,  C07D307/93 ,  C08F22/18 ,  C08F24/00 ,  C08F220/24 ,  C08F220/26 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/2041

    摘要： A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a polymer having a structural unit (I) represented by the following formula (1), and (B) a radiation-sensitive acid generator.

    摘要翻译： 提供了一种在液浸光刻工艺中提供抗蚀剂涂膜的辐射敏感性树脂组合物，该曝光敏感性树脂组合物能够在曝光期间表现出很大的动态接触角，由此抗蚀剂涂膜的表面可呈现出 排水性优异，并且能够导致显影期间动态接触角显着降低的放射线敏感性树脂组合物，从而可以抑制显影缺陷的产生，并且进一步缩短动态变化所需的时间段 接触角启用。 一种辐射敏感性树脂组合物，其包含（A）具有由下式（1）表示的结构单元（I）的聚合物和（B）辐射敏感性酸产生剂。

    RADIATION-SENSITIVE RESIN COMPOSITION
    8.
    发明申请
    RADIATION-SENSITIVE RESIN COMPOSITION 审中-公开
    辐射敏感性树脂组合物

    公开(公告)号：US20110143279A1

    公开(公告)日：2011-06-16

    申请号：US13005539

    申请日：2011-01-13

    申请人： Tsutomu SHIMOKAWA ,  Takuma Ebata ,  Kaori Sakai ,  Yoshifumi Oizumi ,  Akimasa Soyano ,  Noboru Otsuka

    发明人： Tsutomu SHIMOKAWA ,  Takuma Ebata ,  Kaori Sakai ,  Yoshifumi Oizumi ,  Akimasa Soyano ,  Noboru Otsuka

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0045 ,  G03F7/0046 ,  G03F7/0397

    摘要： A radiation-sensitive resin composition includes a sulfonate or sulfonic acid group-containing photoacid generator and a resin. The sulfonate or sulfonic acid group-containing photoacid generator includes a partial structure shown by a following formula (1), wherein R1 represents a substituted or unsubstituted linear or branched monovalent hydrocarbon group having 1 to 30 carbon atoms, a substituted or unsubstituted cyclic or partially cyclic monovalent hydrocarbon group having 3 to 30 carbon atoms, a substituted or unsubstituted aryl group having 6 to 30 carbon atoms, or a substituted or unsubstituted cyclic monovalent organic group having 4 to 30 carbon atoms that include a hetero atom.

    摘要翻译： 辐射敏感性树脂组合物包含含磺酸酯基或含磺酸基的光酸产生剂和树脂。 含有磺酸基或含磺酸基的光酸产生剂包括由下式（1）表示的部分结构，其中R 1表示取代或未取代的具有1至30个碳原子的直链或支链一价烃基，取代或未取代的环状或部分 具有3〜30个碳原子的环状一价烃基，取代或未取代的碳原子数为6〜30的芳基，或取代或未取代的包含杂原子的碳原子数为4〜30的环状一价有机基团。

    WATERMARK DEFECT REDUCTION BY RESIST OPTIMIZATION
    9.
    发明申请
    WATERMARK DEFECT REDUCTION BY RESIST OPTIMIZATION 审中-公开
    通过耐压优化降低水价缺陷

    公开(公告)号：US20080213689A1

    公开(公告)日：2008-09-04

    申请号：US11863117

    申请日：2007-09-27

    申请人： Michael Kocsis ,  Roel Gronheid ,  Akimasa Soyano

    发明人： Michael Kocsis ,  Roel Gronheid ,  Akimasa Soyano

    IPC分类号： G03F7/004 ,  G03F7/26

    CPC分类号： G03F7/2041 ,  G03F7/0045

    摘要： A method is disclosed for lithographic processing. In one aspect, the method comprises obtaining a resist material with predetermined resist properties. The method further comprises using the resist material for providing a resist layer on the device to be lithographic processed. The method further comprises illuminating the resist layer according to a predetermined pattern to be obtained. The obtained resist material comprises a tuned photo-acid generator component and/or a tuned quencher component and/or a tuned acid mobility as to reduce watermark defects on the lithographic processed device. In another aspect, a corresponding resist material, a set of resist materials, use of such materials and a method for setting up a lithographic process are disclosed.

    摘要翻译： 公开了一种用于光刻处理的方法。 一方面，该方法包括获得具有预定抗蚀剂性质的抗蚀剂材料。 该方法还包括使用抗蚀剂材料在待光刻处理的器件上提供抗蚀剂层。 该方法还包括根据要获得的预定图案来照射抗蚀剂层。 获得的抗蚀剂材料包括调节的光酸产生剂组分和/或调谐的猝灭剂组分和/或调谐的酸迁移率，以减少光刻加工设备上的水印缺陷。 另一方面，公开了相应的抗蚀剂材料，一组抗蚀剂材料，这种材料的使用以及用于建立光刻工艺的方法。

    RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND
    10.
    发明申请
    RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYMER AND COMPOUND 有权
    辐射敏感性树脂组合物，形成耐火图案的方法和聚合物和化合物

    公开(公告)号：US20140004463A9

    公开(公告)日：2014-01-02

    申请号：US13699003

    申请日：2011-05-19

    申请人： Yusuke Asano ,  Yoshifumi Oizumi ,  Akimasa Soyano ,  Takeshi Ishii

    发明人： Yusuke Asano ,  Yoshifumi Oizumi ,  Akimasa Soyano ,  Takeshi Ishii

    IPC分类号： G03F7/004

    CPC分类号： G03F7/004 ,  C07C69/653 ,  C07C69/753 ,  C07D307/93 ,  C08F22/18 ,  C08F24/00 ,  C08F220/24 ,  C08F220/26 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/2041

    摘要： A radiation-sensitive resin composition that provides a resist coating film in a liquid immersion lithography process is provided, the radiation-sensitive resin composition being capable of exhibiting a great dynamic contact angle during exposure, whereby the surface of the resist coating film can exhibit a superior water draining property, and the radiation-sensitive resin composition being capable of leading to a significant decrease in the dynamic contact angle during development, whereby generation of development defects can be inhibited, and further shortening of a time period required for change in a dynamic contact angle is enabled. A radiation-sensitive resin composition including (A) a polymer having a structural unit (I) represented by the following formula (1), and (B) a radiation-sensitive acid generator.

    摘要翻译： 提供了一种在液浸光刻工艺中提供抗蚀剂涂膜的辐射敏感性树脂组合物，该曝光敏感性树脂组合物能够在曝光期间表现出很大的动态接触角，由此抗蚀剂涂膜的表面可呈现出 排水性优异，并且能够导致显影期间动态接触角显着降低的放射线敏感性树脂组合物，从而可以抑制显影缺陷的产生，并且进一步缩短动态变化所需的时间段 接触角启用。 一种辐射敏感性树脂组合物，其包含（A）具有由下式（1）表示的结构单元（I）的聚合物和（B）辐射敏感性酸产生剂。