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    Novel material forming supramolecular structures, process and uses
    1.
    发明申请
    Novel material forming supramolecular structures, process and uses 有权

    公开(公告)号：US20080200718A1

    公开(公告)日：2008-08-21

    申请号：US11603733

    申请日：2006-11-22

    申请人： Wayne Hayes ,  Philip James Woodward ,  Alex Clarke ,  Andrew Trevithick Slark

    发明人： Wayne Hayes ,  Philip James Woodward ,  Alex Clarke ,  Andrew Trevithick Slark

    IPC分类号： C07C271/28 ,  C07C271/10

    CPC分类号： C08G18/325 ,  C08G18/10 ,  C08G18/2875 ,  C08G18/3275 ,  C08G18/3281 ,  C09J175/02 ,  C09J2201/61

    摘要： The invention relates to novel material, forming supramolecular structures below its transition temperature, which contains at least one C=O and/or C=S group and at least one N—H, O—H and/or S—H group and wherein the material has the structure A(—X—B)n   (1) wherein A is a cyclic, aromatic and/or aliphatic group, n being a number of 1 to 4, —X—B is, if n is 2, the same or different, and if n is 3 or 4, the same, partly the same or different and has one of the structures (2) to (4) NH—C(Y)—Y—B   (2) —NH—C(Y)—NR—B   (3) —Y—C(Y)—NR—B   (4) with Y being an Oxygen and/or Sulfur atom, B being an organic group with at least one heteroatom, where the heteroatom is bound to at least two carbon atoms when B is linear or cyclic, and where the heteroatom is bound to at least one carbon atom when B is branched, and R being a Hydrogen atom, a cyclic, aromatic and/or aliphatic group or another B group which is the same or different. The material can be made by reacting at least one isocyanate and/or thioisocyanate with at least one amine, alcohol and/or thiol. Typically, the material is used first below its transition temperature, followed by increasing the temperature to around or above the transition temperature, carrying out a process step and subsequently decrease the temperature below the transition temperature.