-
公开(公告)号:US20170368664A1
公开(公告)日:2017-12-28
申请号:US15626936
申请日:2017-06-19
申请人: Yen-Chu Yang , Stephen Jew , Jianshe Tang , Haosheng Wu , Shou-Sung Chang , Paul D. Butterfield , Alexander John Fisher , Bum Jick Kim
发明人: Yen-Chu Yang , Stephen Jew , Jianshe Tang , Haosheng Wu , Shou-Sung Chang , Paul D. Butterfield , Alexander John Fisher , Bum Jick Kim
CPC分类号: B24B57/02 , B24B37/10 , H01L21/67075 , H01L21/6708
摘要: An apparatus for chemical mechanical polishing includes a rotatable platen having a surface to support a polishing pad, a carrier head to hold a substrate in contact with the polishing pad, and a polishing liquid distribution system. The polishing liquid distribution system includes a dispenser positioned to deliver a polishing liquid to a portion of a polishing surface of the polishing pad, and a first barrier positioned before the portion of the polishing surface and configured to block used polishing liquid from reaching the portion of the polishing surface. The first barrier includes a solid first body having a first flat bottom surface and having a first leading surface configured to contact the used polishing liquid.
-
公开(公告)号:US20170368663A1
公开(公告)日:2017-12-28
申请号:US15626857
申请日:2017-06-19
申请人: Yen-Chu Yang , Stephen Jew , Jianshe Tang , Haosheng Wu , Shou-Sung Chang , Paul D. Butterfield , Alexander John Fisher , Bum Jick Kim
发明人: Yen-Chu Yang , Stephen Jew , Jianshe Tang , Haosheng Wu , Shou-Sung Chang , Paul D. Butterfield , Alexander John Fisher , Bum Jick Kim
CPC分类号: B24B57/02 , B24B37/10 , H01L21/67075 , H01L21/6708
摘要: An apparatus for chemical mechanical polishing includes a rotatable platen having a surface to support a polishing pad, a carrier head to hold a substrate in contact with the polishing pad, and a polishing liquid distribution system. The polishing liquid distribution system includes a dispenser positioned to deliver a polishing liquid to a portion of a polishing surface of the polishing pad, and a first barrier positioned before the portion of the polishing surface and configured to block used polishing liquid from reaching the portion of the polishing surface.
-