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    Electrical contacts for molecular electronic transistors
    1.
    发明授权
    Electrical contacts for molecular electronic transistors 有权
    分子电子晶体管的电触点

    公开(公告)号：US06989290B2

    公开(公告)日：2006-01-24

    申请号：US10714083

    申请日：2003-11-15

    Applicant: Ari Aviram

    Inventor： Ari Aviram

    IPC: H01L51/40

    CPC classification number: H01L51/0051 ,  B82Y10/00 ,  H01L51/0021 ,  H01L51/0036 ,  H01L51/0508 ,  H01L51/0595 ,  Y10S977/936

    Abstract: Electronic circuits based on molecular transistors, generally used in place of semiconductors. More particularly, the invention relates to a unique method of wiring of a three-terminal molecule (or an aggregate thereof) to serve as an electronic transistor, containing a gate electrode, a source electrode, and a drain electrode. The source electrode and drain electrode are fabricated from one metal and the gate electrode is fabricated from another metal. The usage of molecular properties in this context provides significant advantages over the fabrication methods of the prior art.

    Abstract translation: 基于分子晶体管的电子电路，通常用于代替半导体。 更具体地说，本发明涉及一种三端分子（或其聚集体）布线的独特方法，以用作含有栅电极，源电极和漏电极的电子晶体管。 源电极和漏极由一个金属制成，栅极由另一个金属制成。 在这种情况下，分子性质的使用提供了优于现有技术的制造方法的显着优点。

    Chemical heat amplification in thermal transfer printing
    5.
    发明授权
    Chemical heat amplification in thermal transfer printing 失效
    热转印中的化学热放大

    公开(公告)号：US4525722A

    公开(公告)日：1985-06-25

    申请号：US582694

    申请日：1984-02-23

    Applicant: Krishna G. Sachdev ,  Harbans S. Sachdev ,  Ari Aviram ,  Mark A. Wizner

    Inventor： Krishna G. Sachdev ,  Harbans S. Sachdev ,  Ari Aviram ,  Mark A. Wizner

    IPC: B41M5/392 ,  B41J31/00 ,  B41J31/02 ,  B41M5/26 ,  G01D15/10

    CPC classification number: B41M5/392 ,  Y10S428/913 ,  Y10S428/914 ,  Y10S430/146

    Abstract: Chemical heat amplification is provided in thermal transfer printing, wherein some of the heat necessary for melting and transferring ink from a solid fusible layer in a ribbon to a receiving medium is provided by an exothermic reaction. This chemical reaction is due to an exothermic material that is located in the ink layer, or in another layer of the ink bearing ribbon. The exothermic reaction reduces the amount of the input power which must be applied either electrically or with electromagnetic waves. Examples of suitable exothermic materials are those which will provide heat within the operative temperature range of the ink, and specifically hydrazone derivatives which are substantially colorless, and have a molecular weight in the approximate range 150-650.

    Abstract translation: 在热转印中提供化学热放大，其中通过放热反应提供熔融和将油墨从带中的固体可熔层转移到接收介质所需的一些热。 这种化学反应是由于位于油墨层中的放热材料或油墨支承带的另一层。 放热反应减少必须通过电气或电磁波施加的输入功率的量。 合适的放热材料的实例是在油墨的操作温度范围内提供热量，特别是基本上无色的分子量为150-650的腙衍生物。

    Metal-insulator resistive ribbon for thermal transfer printing
    6.
    发明授权
    Metal-insulator resistive ribbon for thermal transfer printing 失效
    用于热转印的金属绝缘体电阻带

    公开(公告)号：US4491431A

    公开(公告)日：1985-01-01

    申请号：US454812

    申请日：1982-12-30

    Applicant: Ari Aviram ,  Kwang K. Shih

    Inventor： Ari Aviram ,  Kwang K. Shih

    IPC: B41M5/382 ,  B41J31/00 ,  B41J31/02 ,  B41M5/20 ,  B41M5/24 ,  B41M5/26

    CPC classification number: B41M5/3825 ,  Y10S428/913 ,  Y10S428/914

    Abstract: A resistive ribbon printing technique is described in which the ribbon includes a resistive layer comprised of a metal-wide bandgap insulator combination. The ribbon also includes a support layer, where the support function can be provided by the resistive layer, and a fusible ink layer. Electrical current through the resistive layer produces heat which locally melts the ink for transfer to an adjacent receiving medium. The wide bandgap insulator of the resistive layer must have a bandgap of at least three volts. Many different metals and insulators can be used, where the relative amounts of metal and insulator are chosen to provide a desired resistivity for any type of resistive ribbon printing application.

    Abstract translation: 描述了一种电阻色带打印技术，其中色带包括由金属宽带隙绝缘体组合构成的电阻层。 该带还包括支撑层，其中支撑功能可由电阻层提供，以及易熔油墨层。 通过电阻层的电流产生热量，其局部熔化墨水以转移到相邻的接收介质。 电阻层的宽带隙绝缘体必须具有至少三伏的带隙。 可以使用许多不同的金属和绝缘体，其中选择金属和绝缘体的相对量以为任何类型的电阻丝带打印应用提供期望的电阻率。

    Photodeformable polymeric compositions
    8.
    发明授权
    Photodeformable polymeric compositions 失效
    光变形聚合物组合物

    公开(公告)号：US4247622A

    公开(公告)日：1981-01-27

    申请号：US50931

    申请日：1979-06-21

    Applicant: Ari Aviram

    Inventor： Ari Aviram

    IPC: G03F7/00 ,  G03C1/68

    CPC classification number: G03F7/001

    Abstract: The invention is directed to polymeric materials which undergo deformation upon exposure to actinic radiation. These polymeric materials contain at least one photoionizable group attached to a polymer backbone structure. Typically, photoionizable groups can include N,N-dimethyl-p-phenylenediamine, tetrathiafulvalene, tetraselenafulvalene, ferrocene, tetrathiatetracene and leuco dyes such as leuco methyl violet. Polymer backbone structures which can be used can be chosen from polyacrylics, polyglutamate, polyvinyl amine, polyvinyl alcohol, polystyrene and the like.Films of these materials when exposed to actinic radiation display deformations with dilations of about 35% in each dimension. They are useful for forming relief images for printing, three dimensional photography, photocopy, holographic information storage, information storage and actinometry.

    Abstract translation: 本发明涉及在暴露于光化辐射时经历变形的聚合物材料。 这些聚合物材料含有至少一个连接到聚合物主链结构上的可光化离子基团。 通常，可光致电离的基团可以包括N，N-二甲基对苯二胺，四硫富瓦烯，四烯基富瓦烯，二茂铁，四氮杂四环和无色染料如无色甲基紫。 可以使用的聚合物骨架结构可以选自聚丙烯酸，聚谷氨酸，聚乙烯胺，聚乙烯醇，聚苯乙烯等。 当暴露于光化辐射时，这些材料的膜显示出在每个维度上具有约35％的扩张的变形。 它们可用于形成用于印刷，三维摄影，复印，全息信息存储，信息存储和放射照相术的浮雕图像。

    RIE etch resistant nonchemically amplified resist composition and use thereof
    9.
    发明授权
    RIE etch resistant nonchemically amplified resist composition and use thereof 失效
    RIE蚀刻抗化学放大抗蚀剂组合物及其用途

    公开(公告)号：US06348299B1

    公开(公告)日：2002-02-19

    申请号：US09351428

    申请日：1999-07-12

    Applicant: Ari Aviram ,  Inna V. Babich

    Inventor： Ari Aviram ,  Inna V. Babich

    IPC: G03C516

    CPC classification number: G03F7/039 ,  G03F7/0042

    Abstract: Photoresist compositions of improved reactive ion etching comprising polymers of 2-hydroxyalkyl methacrylate and/or 2-hydroxyalkylacrylate and a titanate, zirconate and/or hafnate are provided. The photoresist compositions are used for forming positive lithographic patterns.

    Abstract translation: 提供了包括2-羟烷基甲基丙烯酸酯和/或2-羟基烷基丙烯酸酯和钛酸酯，锆酸酯和/或铪酸盐的聚合物的改进的反应离子蚀刻的光致抗蚀剂组合物。 光致抗蚀剂组合物用于形成正的光刻图案。

    Graft polymers and use thereof
    10.
    发明授权
    Graft polymers and use thereof 失效
    接枝聚合物及其用途

    公开(公告)号：US06197896B1

    公开(公告)日：2001-03-06

    申请号：US09351421

    申请日：1999-07-12

    Applicant: Ari Aviram ,  Inna V. Babich

    Inventor： Ari Aviram ,  Inna V. Babich

    IPC: C08F842

    CPC classification number: C08F8/42

    Abstract: Solutions of graft polymers of a polymer having reactive hydrogen groups and grafted through reactive hydrogen groups an alkoxy metallic compound wherein the metal is titanium, zirconium and/or hafnium are useful as photoresist materials which are resistant to plasma. Also, compounds and graft polymers wherein the alkoxy metallic compound also contains silicon, tin or germanium are provided.

    Abstract translation: 具有反应性氢基并通过反应性氢基接枝的聚合物的接枝聚合物的溶液是烷氧基金属化合物，其中金属是钛，锆和/或铪可用作耐等离子体的光致抗蚀剂材料。 此外，提供了其中烷氧基金属化合物还含有硅，锡或锗的化合物和接枝聚合物。

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