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11 条记录 (耗时 0.016 秒)

    Antireflective compositions for photoresists
    2.
    发明授权
    Antireflective compositions for photoresists 有权
    用于光致抗蚀剂的抗反射组合物

    公开(公告)号：US07691556B2

    公开(公告)日：2010-04-06

    申请号：US11159002

    申请日：2005-06-22

    申请人： Hengpeng Wu ,  Shuji Ding-Lee ,  Zhong Xiang ,  Aritaka Hishida ,  Jianhui Shan ,  Hong Zhuang

    发明人： Hengpeng Wu ,  Shuji Ding-Lee ,  Zhong Xiang ,  Aritaka Hishida ,  Jianhui Shan ,  Hong Zhuang

    IPC分类号： G03F7/00 ,  G03F7/004

    CPC分类号： G03F7/091

    摘要： The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with at least one reactive compound containing at least one hydroxy group and/or at least one acid group, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.

    摘要翻译： 本发明涉及一种包含通过使甘脲化合物与至少一种含有至少一个羟基和/或至少一个酸基团的反应性化合物反应而得到的聚合物的涂层溶液，此外，聚合物可溶于有机溶剂中。 本发明还涉及一种用于对涂覆在这种涂料组合物上的光致抗蚀剂和用于涂料组合物的聚合物进行成像的方法。

    Radiation-sensitive composition of chemical amplification type
    4.
    发明授权
    Radiation-sensitive composition of chemical amplification type 有权
    化学放大型辐射敏感组合物

    公开(公告)号：US06358665B1

    公开(公告)日：2002-03-19

    申请号：US09529371

    申请日：2000-07-03

    申请人： Georg Pawlowski ,  Hiroshi Okazaki ,  Yoshiaki Kinoshita ,  Naoko Tsugama ,  Aritaka Hishida ,  Xiao-Ming Ma ,  Yuko Yamaguchi

    发明人： Georg Pawlowski ,  Hiroshi Okazaki ,  Yoshiaki Kinoshita ,  Naoko Tsugama ,  Aritaka Hishida ,  Xiao-Ming Ma ,  Yuko Yamaguchi

    IPC分类号： G03F7004

    CPC分类号： G03F7/004 ,  C07C309/06 ,  C07C381/12 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/039 ,  G03F7/0392 ,  Y10S430/115 ,  Y10S430/122

    摘要： Disclosed is a chemically amplified radiation sensitive composition containing a hydroxystyrene resin and an onium salt precursor which generates a fluorinated alkanesulfonic acid as a photoacid generator, wherein the photoacid generator is a sulfonium or iodonium salt of a fluorinated alkane sulfonic acid, represented by formula (I): Y+ASO3−  (I) wherein A represents CF3CHFCF2 or CF3CF2CF2CF2; and Y represents wherein R1, R2, R3, R4, and R5 each independently represent an alkyl group, a monocyclic or bicyclic alkyl group, a cyclic alkylcarbonyl group, a phenyl group, a naphthyl group, an anthryl group, a peryl group, a pyryl group, a thienyl group, an aralkyl group, or an arylcarbonylmethylene group, or any two of R1, R2, and R3 or R4 and R5 together represent an alkylene or an oxyalkylene which forms a five- or six-membered ring together with the interposing sulfur or iodine, said ring being optionally condensed with aryl groups.

    摘要翻译： 公开了含有羟基苯乙烯树脂和鎓盐前体的化学放大的辐射敏感性组合物，其产生氟代烷烃磺酸作为光酸产生剂，其中光酸产生剂是由式（I）表示的氟化烷烃磺酸的锍盐或碘鎓盐 ）：其中A表示CF 3 CHFCF 2或CF 3 CF 2 CF 2 CF 2; Y表示其中R 1，R 2，R 3，R 4和R 5各自独立地表示烷基，单环或双环烷基，环烷基羰基，苯基，萘基，蒽基，戊基，吡啶基 基团，噻吩基，芳烷基或芳基羰基亚甲基，或R 1，R 2和R 3或R 4和R 5中的任何两个一起表示与插入物形成五元或六元环的亚烷基或氧化烯 硫或碘，所述环任选地与芳基稠合。

    Positive-Working Photoimageable Bottom Antireflective Coating
    8.
    发明申请
    Positive-Working Photoimageable Bottom Antireflective Coating 有权
    正面照相底部防反射涂层

    公开(公告)号：US20080038666A1

    公开(公告)日：2008-02-14

    申请号：US11876332

    申请日：2007-10-22

    申请人： Hengpeng Wu ,  Mark Neisser ,  Shuji Ding-Lee ,  Aritaka Hishida ,  Joseph Oberlander ,  Medhat Toukhy

    发明人： Hengpeng Wu ,  Mark Neisser ,  Shuji Ding-Lee ,  Aritaka Hishida ,  Joseph Oberlander ,  Medhat Toukhy

    IPC分类号： G03C1/00

    CPC分类号： G03F7/091 ,  G03F7/0392 ,  Y10S430/115 ,  Y10S438/952

    摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.

    摘要翻译： 本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂。 本发明还涉及使用这种组合物的方法。

    Antireflective compositions for photoresists
    9.
    发明申请
    Antireflective compositions for photoresists 有权
    用于光致抗蚀剂的抗反射组合物

    公开(公告)号：US20060058468A1

    公开(公告)日：2006-03-16

    申请号：US11159002

    申请日：2005-06-22

    申请人： Hengpeng Wu ,  Shuji Ding-Lee ,  Zhong Xiang ,  Aritaka Hishida ,  Jianhui Shan ,  Hong Zhuang

    发明人： Hengpeng Wu ,  Shuji Ding-Lee ,  Zhong Xiang ,  Aritaka Hishida ,  Jianhui Shan ,  Hong Zhuang

    IPC分类号： C08F8/00

    CPC分类号： G03F7/091

    摘要： The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with at least one reactive compound containing at least one hydroxy group and/or at least one acid group, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.

    摘要翻译： 本发明涉及一种包含通过使甘脲化合物与至少一种含有至少一个羟基和/或至少一个酸基团的反应性化合物反应而得到的聚合物的涂层溶液，此外，聚合物可溶于有机溶剂中。 本发明还涉及一种用于对涂覆在这种涂料组合物上的光致抗蚀剂和用于涂料组合物的聚合物进行成像的方法。

    Antireflective compositions for photoresists
    10.
    发明申请
    Antireflective compositions for photoresists 审中-公开
    用于光致抗蚀剂的抗反射组合物

    公开(公告)号：US20060057501A1

    公开(公告)日：2006-03-16

    申请号：US10941221

    申请日：2004-09-15

    申请人： Hengpeng Wu ,  Shuji Ding-Lee ,  Zhong Xiang ,  Aritaka Hishida ,  Jianhui Shan

    发明人： Hengpeng Wu ,  Shuji Ding-Lee ,  Zhong Xiang ,  Aritaka Hishida ,  Jianhui Shan

    IPC分类号： G03C5/00

    CPC分类号： G03F7/091

    摘要： The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with a reactive compound containing hydroxy groups and/or acid groups, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.

    摘要翻译： 本发明涉及一种包含通过使甘脲化合物与含有羟基和/或酸基的反应性化合物反应而得到的聚合物的涂层溶液，此外聚合物可溶于有机溶剂中。 本发明还涉及一种用于对涂覆在这种涂料组合物上的光致抗蚀剂和用于涂料组合物的聚合物进行成像的方法。