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    CURRENT CONTROL IN PLASMA PROCESSING SYSTEMS
    1.
    发明申请
    CURRENT CONTROL IN PLASMA PROCESSING SYSTEMS 有权
    等离子体处理系统中的电流控制

    公开(公告)号：US20110115379A1

    公开(公告)日：2011-05-19

    申请号：US12908468

    申请日：2010-10-20

    申请人： Maolin Long ,  Seyed Jafar Jafarian-Tehrani ,  Arthur Sato ,  Neil Martin Paul Benjamin ,  Norman Williams

    发明人： Maolin Long ,  Seyed Jafar Jafarian-Tehrani ,  Arthur Sato ,  Neil Martin Paul Benjamin ,  Norman Williams

    IPC分类号： H05H1/24

    CPC分类号： H01J37/321 ,  H01J37/32174 ,  H01J37/32935

    摘要： A plasma processing system for generating plasma to process at least a wafer. The plasma processing system includes a coil for conducting a current for sustaining at least a portion of the plasma. The plasma processing system also includes a sensor coupled with the coil for measuring a magnitude of a supplied current to provide a magnitude measurement without measuring any phase angle of the supplied current. The supplied current is the current or a total current that is used for providing a plurality of currents (e.g., including the current). The plasma processing system also includes a controller coupled with the sensor for generating a command using the magnitude measurement and/or information derived using the magnitude measurement, without using information related to phase angle measurement, and for providing the command for controlling the magnitude of the supplied current and/or a magnitude of the total current.

    摘要翻译： 一种用于产生等离子体以处理至少晶片的等离子体处理系统。 等离子体处理系统包括用于传导用于维持等离子体的至少一部分的电流的线圈。 等离子体处理系统还包括与线圈耦合的传感器，用于测量供电电流的大小以提供幅度测量，而不测量所提供的电流的任何相位角。 所提供的电流是用于提供多个电流（例如，包括电流）的电流或总电流。 等离子体处理系统还包括与传感器耦合的控制器，用于使用使用幅度测量导出的幅度测量和/或信息来生成指令，而不使用与相位角测量有关的信息，并且用于提供用于控制 提供电流和/或总电流的大小。

    VACUUM SEALING RADIO FREQUENCY (RF) AND LOW FREQUENCY CONDUCTING ACTUATOR
    2.
    发明申请
    VACUUM SEALING RADIO FREQUENCY (RF) AND LOW FREQUENCY CONDUCTING ACTUATOR 有权
    真空密封无线电频率（RF）和低频导频执行器

    公开(公告)号：US20090152958A1

    公开(公告)日：2009-06-18

    申请号：US12333819

    申请日：2008-12-12

    申请人： Danny Brown ,  Allan Ronne ,  Arthur Sato ,  John Daugherty ,  Leonard Sharpless

    发明人： Danny Brown ,  Allan Ronne ,  Arthur Sato ,  John Daugherty ,  Leonard Sharpless

    IPC分类号： H02K41/02

    CPC分类号： F15B15/14

    摘要： A linear actuator comprised of an actuator body having a first portion and a second portion, each arranged along a longitudinal axis of the actuator body. A vacuum bellows is concentrically located in the first portion and is configured to seal a vacuum environment from the second portion. A linear motion shaft is concentrically located substantially within the actuator body and is configured to move in a linear direction along the longitudinal axis. An electrically conductive portion of the shaft is concentrically located substantially within the vacuum bellows and electrically insulated therefrom and is configured to receive and conduct a signal. A lift force generating portion of the shaft is concentrically located substantially within the second portion. An electrical contact pad is electrically coupled to the conductive portion of the shaft and is configured to couple the signal to another surface upon activation of the shaft.

    摘要翻译： 线性致动器包括具有第一部分和第二部分的致动器本体，每个部分沿致动器主体的纵向轴线布置。 真空波纹管同心地位于第一部分中并且构造成从第二部分密封真空环境。 直线运动轴基本上位于致动器主体内并且被构造成沿着纵向轴线沿直线方向移动。 轴的导电部分基本上位于真空波纹管内并与其电绝缘，并且被配置为接收和传导信号。 轴的提升力产生部分同心地位于第二部分内。 电接触焊盘电耦合到轴的导电部分并且被配置为在激活轴时将信号耦合到另一表面。

    Vacuum sealing radio frequency (RF) and low frequency conducting actuator
    3.
    发明授权
    Vacuum sealing radio frequency (RF) and low frequency conducting actuator 有权
    真空密封射频（RF）和低频传导致动器

    公开(公告)号：US08597428B2

    公开(公告)日：2013-12-03

    申请号：US12333819

    申请日：2008-12-12

    申请人： Danny Brown ,  Allan Ronne ,  Arthur Sato ,  John Daugherty ,  Leonard Sharpless

    发明人： Danny Brown ,  Allan Ronne ,  Arthur Sato ,  John Daugherty ,  Leonard Sharpless

    IPC分类号： C23C16/00 ,  H01J7/24 ,  H05B31/26 ,  B60P1/00 ,  B65F1/00 ,  B65F3/00

    CPC分类号： F15B15/14

    摘要： A linear actuator comprised of an actuator body having a first portion and a second portion, each arranged along a longitudinal axis of the actuator body. A vacuum bellows is concentrically located in the first portion and is configured to seal a vacuum environment from the second portion. A linear motion shaft is concentrically located substantially within the actuator body and is configured to move in a linear direction along the longitudinal axis. An electrically conductive portion of the shaft is concentrically located substantially within the vacuum bellows and electrically insulated therefrom and is configured to receive and conduct a signal. A lift force generating portion of the shaft is concentrically located substantially within the second portion. An electrical contact pad is electrically coupled to the conductive portion of the shaft and is configured to couple the signal to another surface upon activation of the shaft.

    摘要翻译： 线性致动器包括具有第一部分和第二部分的致动器本体，每个部分沿致动器主体的纵向轴线布置。 真空波纹管同心地位于第一部分中并且构造成从第二部分密封真空环境。 直线运动轴基本上位于致动器主体内并且被构造成沿着纵向轴线沿直线方向移动。 轴的导电部分基本上位于真空波纹管内并与其电绝缘，并且被配置为接收和传导信号。 轴的提升力产生部分同心地位于第二部分内。 电接触焊盘电耦合到轴的导电部分并且被配置为在激活轴时将信号耦合到另一表面。

    Method of measuring the amount of capacitive coupling of RF power in an inductively coupled plasma
    6.
    发明授权
    Method of measuring the amount of capacitive coupling of RF power in an inductively coupled plasma 失效
    测量感应耦合等离子体中RF功率的电容耦合量的方法

    公开(公告)号：US5667701A

    公开(公告)日：1997-09-16

    申请号：US475878

    申请日：1995-06-07

    申请人： Arthur Sato ,  Xue-Yu Qian

    发明人： Arthur Sato ,  Xue-Yu Qian

    IPC分类号： H01L21/66 ,  H01L21/822

    CPC分类号： B24B37/013 ,  H01L22/26

    摘要： The amount of capacitive coupling of RF power to a semiconductor substrate or wafer in an inductively coupled RF plasma reactor is quantitatively measured by separating the RF current from the plasma through the wafer pedestal into the Fourier components including the fundamental frequency (F) of the RF power and the second harmonic (2F) of the frequency of the RF power and then measuring the current or power of the fundamental component. As an additional feature, the amount of inductive coupling is measured by measuring the current or power of the second harmonic.

    摘要翻译： 通过将来自等离子体的RF电流通过晶片基座分离成包括RF的基频（F）的傅立叶分量来定量地测量RF功率到电感耦合RF等离子体反应器中的半导体衬底或晶片的电容耦合量 功率和二次谐波（2F）的RF功率的频率，然后测量基波分量的电流或功率。 作为附加特征，通过测量二次谐波的电流或功率来测量电感耦合的量。

    Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor
    7.
    发明授权
    Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor 失效
    电感耦合等离子体反应器的RF电源的自动频率调谐

    公开(公告)号：US5919382A

    公开(公告)日：1999-07-06

    申请号：US720588

    申请日：1996-09-30

    申请人： Xue-Yu Qian ,  Arthur Sato

    发明人： Xue-Yu Qian ,  Arthur Sato

    IPC分类号： H05H1/46 ,  C23C16/50 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31 ,  B23K10/00

    CPC分类号： H01J37/321 ,  H01J37/32082

    摘要： The invention is embodied in a coil antenna for radiating RF power supplied by an RF source into a vacuum chamber of an inductively coupled plasma reactor which processes a semiconductor wafer in the vacuum chamber, the reactor having a gas supply inlet for supplying processing gases into the vacuum chamber, the coil antenna including plural concentric spiral conductive windings, each of the windings having an interior end near an apex of a spiral of the winding and an outer end at a periphery of the spiral of the winding, and a common terminal connected to the interior ends of the plural concentric spiral windings, the RF power source being connected across the terminal and the outer end of each one of the windings. In embodiment, the inner ends of the concentric spiral windings are connected radially outwardly of a common conductor rather than inwardly to an apex terminal. In another embodiment, the concentric spiral windings are each powered at a point intermediate the radially inner and outer ends. In yet another embodiment, there are plural radially separate groups of concentric spiral windings, each connected to a separately controlled RF power source to enable adjustment of radial distribution of the plasma ion density. In a further embodiment, the spiral concentric windings are not conformal with the shape of the chamber ceiling, and can extend above the ceiling.

    摘要翻译： 本发明体现在用于将由RF源提供的RF功率辐射到电感耦合等离子体反应器的真空室中的线圈天线，所述电感耦合等离子体反应器处理真空室中的半导体晶片，所述反应器具有用于将处理气体供应到 真空室，线圈天线包括多个同心的螺旋导电绕组，每个绕组具有靠近绕组螺旋的顶点的内端和绕组的螺旋周边的外端，以及连接到 多个同心螺旋绕组的内端，RF电源跨越端子和每个绕组的外端连接。 在实施例中，同心螺旋绕组的内端部连接到公共导体的径向外侧而不是向内连接到顶点端子。 在另一个实施例中，同心螺旋绕组各自在径向内端和外端之间的点处供电。 在另一个实施例中，存在多个径向分开的同心螺旋绕组组，每组连接到单独控制的RF功率源，以能够调整等离子体离子密度的径向分布。 在另一个实施例中，螺旋同心绕组不与室顶的形状保持一致，并且可以在天花板上方延伸。

    Current control in plasma processing systems
    8.
    发明授权
    Current control in plasma processing systems 有权
    等离子体处理系统中的电流控制

    公开(公告)号：US08736175B2

    公开(公告)日：2014-05-27

    申请号：US12908468

    申请日：2010-10-20

    申请人： Maolin Long ,  Seyed Jafar Jafarian-Tehrani ,  Arthur Sato ,  Neil Martin Paul Benjamin ,  Norman Williams

    发明人： Maolin Long ,  Seyed Jafar Jafarian-Tehrani ,  Arthur Sato ,  Neil Martin Paul Benjamin ,  Norman Williams

    IPC分类号： H05B31/26

    CPC分类号： H01J37/321 ,  H01J37/32174 ,  H01J37/32935

    摘要： A plasma processing system for generating plasma to process at least a wafer. The plasma processing system includes a coil for conducting a current for sustaining at least a portion of the plasma. The plasma processing system also includes a sensor coupled with the coil for measuring a magnitude of a supplied current to provide a magnitude measurement without measuring any phase angle of the supplied current. The supplied current is the current or a total current that is used for providing a plurality of currents (e.g., including the current). The plasma processing system also includes a controller coupled with the sensor for generating a command using the magnitude measurement and/or information derived using the magnitude measurement, without using information related to phase angle measurement, and for providing the command for controlling the magnitude of the supplied current and/or a magnitude of the total current.

    摘要翻译： 一种用于产生等离子体以处理至少晶片的等离子体处理系统。 等离子体处理系统包括用于传导用于维持等离子体的至少一部分的电流的线圈。 等离子体处理系统还包括与线圈耦合的传感器，用于测量供电电流的大小以提供幅度测量，而不测量所提供的电流的任何相位角。 所提供的电流是用于提供多个电流（例如，包括电流）的电流或总电流。 等离子体处理系统还包括与传感器耦合的控制器，用于使用使用幅度测量导出的幅度测量和/或信息来生成指令，而不使用与相位角测量相关的信息，并且用于提供用于控制 提供电流和/或总电流的大小。